ZA878480B - A method for selectively curing a liquid photosensitive resin by masking exposure - Google Patents

A method for selectively curing a liquid photosensitive resin by masking exposure

Info

Publication number
ZA878480B
ZA878480B ZA878480A ZA878480A ZA878480B ZA 878480 B ZA878480 B ZA 878480B ZA 878480 A ZA878480 A ZA 878480A ZA 878480 A ZA878480 A ZA 878480A ZA 878480 B ZA878480 B ZA 878480B
Authority
ZA
South Africa
Prior art keywords
photosensitive resin
liquid photosensitive
selectively curing
masking exposure
masking
Prior art date
Application number
ZA878480A
Other languages
English (en)
Inventor
Kojima Tsutomu
Yamashita Takashi
Original Assignee
Asahi Kasei Kogyo Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Kogyo Kabushiki Kaisha filed Critical Asahi Kasei Kogyo Kabushiki Kaisha
Publication of ZA878480B publication Critical patent/ZA878480B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polymerisation Methods In General (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
ZA878480A 1986-11-12 1987-11-11 A method for selectively curing a liquid photosensitive resin by masking exposure ZA878480B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61267715A JP2515521B2 (ja) 1986-11-12 1986-11-12 改良されたマスキング露光方法及びそれを用いた製版方法

Publications (1)

Publication Number Publication Date
ZA878480B true ZA878480B (en) 1988-05-09

Family

ID=17448546

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA878480A ZA878480B (en) 1986-11-12 1987-11-11 A method for selectively curing a liquid photosensitive resin by masking exposure

Country Status (7)

Country Link
EP (1) EP0267600B1 (xx)
JP (1) JP2515521B2 (xx)
AU (1) AU599164B2 (xx)
DE (1) DE3751023D1 (xx)
ES (1) ES2066757T3 (xx)
NO (1) NO174880C (xx)
ZA (1) ZA878480B (xx)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3906179A1 (de) * 1989-02-28 1990-08-30 Basf Ag Vorrichtung zum belichten von photopolymeren druckplatten
JP2886254B2 (ja) * 1990-04-25 1999-04-26 旭化成工業株式会社 感光性樹脂版の製造方法及びそれに用いる製版装置
IT1271919B (it) * 1993-01-12 1997-06-10 Caria Riccardo De Procedimento di produzione di lastre di stampa fotosensibili perfezionate
US5813342A (en) * 1997-03-27 1998-09-29 Macdermid Imaging Technology, Incorporated Method and assembly for producing printing plates
ES2261094B1 (es) * 2005-09-12 2007-09-16 Ricardo Angel Ruggiero Procedimiento para la fabricacion de rodillos para la impresion de materiales laminares, maquina para la realizacion del procedimiento y soporte de impresion para los rodillos de impresion.
JP2009157122A (ja) * 2007-12-27 2009-07-16 Nakan Corp 感光性樹脂版シートの製造装置および製造方法
JP4872921B2 (ja) * 2008-01-07 2012-02-08 株式会社島津製作所 反応容器
US20100141969A1 (en) * 2008-12-08 2010-06-10 Brazier David B Method and Apparatus for Making Liquid Flexographic Printing Elements
US8198013B2 (en) * 2010-05-05 2012-06-12 E. I. Du Pont De Nemours And Company Method for preparing a printing form
JP2016126240A (ja) * 2015-01-07 2016-07-11 住友ゴム工業株式会社 印刷用樹脂原版の製造方法およびフレキソ印刷版
US9740103B2 (en) * 2015-11-09 2017-08-22 Macdermid Printing Solutions, Llc Method and apparatus for producing liquid flexographic printing plates
CN106094428A (zh) * 2016-08-22 2016-11-09 昆山良品丝印器材有限公司 精密网版晒板夹具
US10625334B2 (en) * 2017-04-11 2020-04-21 Macdermid Graphics Solutions, Llc Method of producing a relief image from a liquid photopolymer resin

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3507593A (en) * 1967-05-08 1970-04-21 Tektronix Inc Contact negative with method and apparatus employing the same
JPS5031488B2 (xx) * 1971-10-11 1975-10-11
JPS502936A (xx) * 1973-05-08 1975-01-13
JPS5623150A (en) * 1979-07-31 1981-03-04 Kawasaki Seisakusho:Kk Double paper sheet detector
DE2932086A1 (de) * 1979-08-08 1981-02-19 Mohn Gmbh Reinhard Kontaktkopierverfahren sowie vorrichtung zur durchfuehrung des verfahrens
JPS5636653A (en) * 1979-08-31 1981-04-09 Unitika Ltd Photosensitive resin plate for relief
IT8121966V0 (it) * 1981-06-03 1981-06-03 Repro Master Electonic Srl Perfezionamento nelle macchine grafiche del tipo foto-lito, repro, serigrafico, bromografico.
JPS59146056A (ja) * 1983-02-09 1984-08-21 Hitachi Chem Co Ltd 印刷配線板用基板に形成された光重合性樹脂フイルムの焼付法
EP0169294B1 (en) * 1984-07-23 1992-04-01 Asahi Kasei Kogyo Kabushiki Kaisha A resin printing plate and preparation thereof
JPS61172148A (ja) * 1984-11-10 1986-08-02 Osaka Seihan Center Kyogyo Kumiai 樹脂刷版の製版方法
JPS61172149A (ja) * 1984-11-21 1986-08-02 Osaka Seihan Center Kyogyo Kumiai 樹脂刷版の製造方法

Also Published As

Publication number Publication date
AU8111287A (en) 1988-05-19
EP0267600B1 (en) 1995-01-25
NO874706D0 (no) 1987-11-11
NO874706L (no) 1988-05-13
NO174880B (no) 1994-04-18
AU599164B2 (en) 1990-07-12
JP2515521B2 (ja) 1996-07-10
EP0267600A2 (en) 1988-05-18
EP0267600A3 (en) 1990-04-04
JPS63121849A (ja) 1988-05-25
ES2066757T3 (es) 1995-03-16
NO174880C (no) 1994-08-10
DE3751023D1 (de) 1995-03-09

Similar Documents

Publication Publication Date Title
GB2030575B (en) Photosensitive resin and method for manufacture thereof
GB2129822B (en) Photosensitive plate for lithographic printing plate
DE3571086D1 (en) Improved surface tack-free photosensitive resin composition and a method using same
ZA878480B (en) A method for selectively curing a liquid photosensitive resin by masking exposure
EP0460919A3 (en) Process for exposing a photosensitive resin composition to light
JPS54130205A (en) Method and device for making photosensitive resin cylinder
DE3369741D1 (en) Photosensitive resin composition
DE3163825D1 (en) Photosensitive polyamide resin composition
DE3380792D1 (en) Method for making phenol-formaldehyde-polyamine curing agents for epoxy resins
DE3373024D1 (en) Photosensitive resin composition
DE3270758D1 (en) Photosensitive lithographic plate
KR870009861A (ko) 수지에 대한 인쇄방법
DE3277646D1 (en) Photosensitive resin composition and method for forming fine patterns with said composition
DE3362334D1 (en) Latent curing agents for epoxy resins
GB8328787D0 (en) Curing method for unsaturated polyester resin
EP0426470A3 (en) Method for developing a waterless light-sensitive lithographic plate
AR244717A1 (es) Metodo para aumentar la funcionalidad de epoxi-resinas.
GB2081465B (en) A photographic element for planography and a method for producing a planographic printing plate
JPS56165326A (en) Method of producing photosensitive resin structure
EP0273393A3 (en) Photosensitive resin composition
ES503494A0 (es) Un procedimiento de encapsular residuos
EP0273699A3 (en) Developing device for photosensitive material
GB2069879B (en) Developing device for a photocopier
EP0100633A3 (en) Latent curing agents for epoxy resins
DE3468112D1 (en) Photopolymerizable epoxy resin composition