EP2669407B1 - Galvanische Bäder zur Herstellung einer niederkarätigen Goldlegierung und galvanischer Process verwendent diese Bäder - Google Patents

Galvanische Bäder zur Herstellung einer niederkarätigen Goldlegierung und galvanischer Process verwendent diese Bäder Download PDF

Info

Publication number
EP2669407B1
EP2669407B1 EP13170067.6A EP13170067A EP2669407B1 EP 2669407 B1 EP2669407 B1 EP 2669407B1 EP 13170067 A EP13170067 A EP 13170067A EP 2669407 B1 EP2669407 B1 EP 2669407B1
Authority
EP
European Patent Office
Prior art keywords
salts
galvanic
amounts
gold
baths
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP13170067.6A
Other languages
English (en)
French (fr)
Other versions
EP2669407A1 (de
Inventor
Lorenzo Cavaciocchi
Elena Banchelli
Danilo Vincenzo Canelli
Massimo Innocenti
Ilaria Bencista
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bluclad SpA
Original Assignee
Bluclad SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bluclad SpA filed Critical Bluclad SpA
Publication of EP2669407A1 publication Critical patent/EP2669407A1/de
Application granted granted Critical
Publication of EP2669407B1 publication Critical patent/EP2669407B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/005—Jewels; Clockworks; Coins

Definitions

  • the invention relates to the field of compounds used in galvanic processes, in particular galvanic baths for obtaining a low-carat gold alloy, and to the galvanic process for obtaining said alloy.
  • Galvanic baths containing considerable amounts of toxic substances, such as cyanides, and heavy metals, which are also toxic and difficult to remove, for example cadmium, in the matrix have been used for decades to obtain a gold alloy containing less than 75% by weight of gold as metal (corresponding to a gold alloy of 18 carats or less).
  • baths of this type also include baths that utilise cyanide in the matrix or that, although they do not contain cyanide in the matrix, contain other doped elements of a certain toxicity.
  • US4358351 describes a bath containing gold, copper, zinc, free cyanide and arsenic as gloss additive
  • US4487664 describes a bath containing gold-silver and free cyanide
  • US5085744 describes a bath containing gold, copper, zinc, free cyanide and antimony as gloss additive
  • US4687557 describes a bath containing gold, copper, and cadmium devoid of free cyanide in solution.
  • WO 2009/037180 describes a gold alloy plating bath comprising gold, copper and indium ions and free cyanide.
  • the present invention makes it possible to satisfy the above-mentioned needs due to alkaline galvanic baths according to claim 1.
  • galvanic bath means the aqueous solutions in which the surfaces to be treated by means of the galvanic process are immersed.
  • the gold salts are preferably selected from: potassium dicyanoaurate, potassium tetracyanoaurate, ammonium cyanoaurate, or a combination thereof.
  • the amount of gold calculated on the basis of the respective salts, is between 0.7 and 4 g/L, preferably between 1.5 and 3 g/L, in order to achieve the desired efficiency and thicknesses.
  • copper salts means, for example: sulfate, phosphate, pyrophosphate, chloride, or other salts that are stable under the working conditions of the bath.
  • Copper calculated on the basis of the respective salts, is present in an amount between 0.3 and 2.5 g/L, preferably between 0.5 and 2 g/L, in relation to the desired carat value in the 12 - 18 carat range.
  • Indium salts useful in accordance with the invention are, for example: chloride, sulfate, citrate, tartrate, gluconate, or any other organic or amine complex compatible with the working conditions of the bath.
  • the concentration of indium ranges from 0.1 to 2 g/L, preferably from 0.5 to 1,5 g/L, in relation to the desired carat value in the 12 - 18 carat range.
  • the matrix of the bath is formed by polycarboxylic acid salts having both buffer characteristics and complexing power, such as citrates, tartrates, gluconates, maleates, malonates, possibly in combination with the corresponding acids for creation of the expedient buffer, and possibly mixed together in order to achieve the expedient complexing power.
  • buffer characteristics and complexing power such as citrates, tartrates, gluconates, maleates, malonates, possibly in combination with the corresponding acids for creation of the expedient buffer, and possibly mixed together in order to achieve the expedient complexing power.
  • These acids and the respective salts are each used in an amount ranging from 30 to 150 g/L, more commonly from 50 to 100 g/L.
  • Complexing agents that can be expediently used in order to improve the stability of the metals in solution and to regulate the properties thereof in alloy include, for example, ethylenediaminetetraacetic acid and salts thereof, etidronic acid and salts thereof, ethylenediamine tetramethyl phosphonic acid and salts thereof, iminodiacetic acid and salts thereof, nitrilotriphosphonic acid and salts thereof, and nitrilotriacetic acid and salts thereof; these complexing agents normally being used in amounts ranging from 1 to 50 g/L according to the complexing power of each one thereof, a person skilled in the art knowing which complexing agent will be the most suitable for use and in what amounts and combinations, according to the desired carat value in the 12 - 18 carat range.
  • a complexing and regulatory action of the alloy metals is due to the amine component of the bath.
  • the amines used for this purpose are triethylenetetramine, diethylenetetramine, ethylenediamine and tetraethylenepentamine.
  • the amine in question is used in amounts ranging from 0.05 to 1 g/L, more expediently from 0.1 to 0.7 g/L, depending on the desired percentage of indium in alloy, within the carat range from 12 to 18 carats.
  • the bath may also obviously contain other components normally used in galvanic processes for their glossing and surfactant action.
  • elements such as silver, tellurium, bismuth, iron, zinc, iridium, rhenium, vanadium, molybdenum, tungsten, in such a form so as to be soluble and stable under the working conditions; the amounts to be used range from 0.005 to 0.2 g/L of element as such, and more in particular from 0.010 to 0.1 g/L.
  • the formulations according to the invention may also comprise sulfurated compounds, such as organic thiols belonging to the classes of mercaptotetrazoles, mercaptopyrimidines, mercaptopyrrols, mercaptoimidazoles and mercaptotriazoles, possibly containing a sulfur atom in the aromatic ring, possibly having a nitrogen ring condensed with a benzene ring, having one or more thio groups.
  • sulfurated compounds such as organic thiols belonging to the classes of mercaptotetrazoles, mercaptopyrimidines, mercaptopyrrols, mercaptoimidazoles and mercaptotriazoles, possibly containing a sulfur atom in the aromatic ring, possibly having a nitrogen ring condensed with a benzene ring, having one or more thio groups.
  • the surfactants have both glossing and surfactant action, and those used normally within galvanic scope in baths having matrices of this type are used in this invention: a person skilled in the art will be able to identify the most suitable type to use; however, the amounts used are never greater than 0.005 L/L of an aqueous solution thereof (10% w/v): higher doses lower the efficiency of the bath and create interference with the regular properties of the metals in alloy.
  • the bath preferably functions in a pH range between 7 and 12, and more expediently between 8 and 10; the pH is regulated with organic acids belonging to the selected buffer pair, or with mineral acids such as sulfuric acid, phosphoric acid, sulfamic acid, methanesulfonic acid, pyridinesulfonic acid, or with alkali metal hydroxides, such as potassium and sodium.
  • organic acids belonging to the selected buffer pair, or with mineral acids such as sulfuric acid, phosphoric acid, sulfamic acid, methanesulfonic acid, pyridinesulfonic acid, or with alkali metal hydroxides, such as potassium and sodium.
  • the pH is not a critical parameter in this formulation for obtaining a precise carat value, but it is fundamental that the pH is alkaline for the stability of the components in solution.
  • the working temperature of the galvanic bath in question is preferably between 50°C and 70°C; however, this is not a critical parameter for obtaining a precise carat value.
  • the current to be applied to the galvanic bath according to the invention is normally between 0.5 - 3 A/cm 2 , preferably 0.7 - 2 A/cm 2 .
  • the application times vary according to the amperage imposed and the desired thickness: with the bath according to the invention, it is possible to obtain deposits having thicknesses up to 500 microns.
  • gold alloys in which the gold varies from 50% to 75% (percentages expressed in weight) are obtained by deposit at the cathode of the galvanic cell.
  • a bath having the following composition was prepared:
  • a current of 0.7 A/cm 2 was applied for 3 minutes to a sheet of nickel-plated brass having a surface area of 0.5 cm 2 , suitably de-greased and re-rinsed with deionised water.
  • the sheet was rinsed with deionised water and dried by compressed air.
  • a bath having the following composition was prepared:
  • the bath was brought to pH 9.5 with potassium hydroxide and heated to 60°C.
  • a current of 1.5 A/cm 2 was applied for 5 minutes to a sheet of nickel-plated brass having a surface area of 0.5 cm 2 , suitably de-greased and re-rinsed with deionised water.
  • the sheet was rinsed with deionised water and dried by compressed air.
  • the surface of the alloy was analysed by electronic scan microscope; the following percentages were found

Claims (9)

  1. Galvanisches Bad, umfassend wässrige Lösungen mit einem alkalischen pH-Wert, die Goldsalze, Kupfersalze und Indiumsalze, organische Polycarbonsäuresalze, organische Amine und möglicherweise Komplexbildner, schwefelhaltige Verbindungen, Tenside und andere Metalle umfassen, wobei die Konzentration an Indium, berechnet auf der Basis der jeweiligen Salze, im Bereich von 0,1 bis 2 g/l liegt;
    wobei die organischen Amine ausgewählt sind aus der Gruppe umfassend Triethylentetramin, Diethylentetramin, Ethylendiamin und Tetraethylenpentamin; wobei die Amine in Mengen von 0,05 bis 1 g/l verwendet werden;
    der Komplexbildner ausgewählt ist aus der Gruppe bestehend aus Ethylendiamintetraessigsäure und deren Salzen, Etidronsäure und deren Salzen, Ethylendiamintetramethylphosphonsäure und deren Salzen, Iminodiessigsäure und deren Salzen, Nitrilotriphosphonsäure und deren Salzen sowie Nitrilotriessigsäure und deren Salzen;
    die sulfurierten Verbindungen ausgewählt sind aus der Gruppe bestehend aus organischen Thiolen, die zu den Klassen 2-(2-Pyrazin)ethanthiol, Mercaptotetrazole, Mercaptopyrimidine, Mercaptopyrrole, Mercaptoimidazole und Mercaptotriazole gehören, die möglicherweise ein Schwefelatom im aromatischen Ring enthalten, möglicherweise einen mit einem Benzolring kondensierten Stickstoffring aufweisen, eine oder mehrere Thiogruppen aufweisen;
    wobei die Tenside sowohl eine glänzende als auch eine oberflächenaktive Wirkung haben und solche sind, die normalerweise in galvanischen Bädern mit Matrizen verwendet werden, die durch die organischen Polycarbonsäuresalze gebildet werden; wobei die Tenside in einer Menge verwendet werden, die niemals größer als 0,005 l/l einer 10 Gew.%-igen wässrigen Lösung davon ist;
    die anderen Metalle mit glänzender Wirkung ausgewählt sind aus der Gruppe bestehend aus Silber, Tellur, Wismut, Eisen, Zink, Iridium, Rhenium, Vanadium, Molybdän, Wolfram in einer solchen Form, dass sie unter den Arbeitsbedingungen in Mengen zwischen 0,005 und 0,2 g/l des Elements als solches löslich und stabil sind;
    diese Polycarbonsäuresalze sowohl Puffereigenschaften als auch komplexbildende Wirkung aufweisen, gegebenenfalls in Kombination mit den entsprechenden Säuren zur Herstellung des zweckmäßigen Puffers, wobei diese Säuren und die jeweiligen Salze jeweils in einer Menge von 30 bis 150 g/l verwendet werden;
    dadurch gekennzeichnet, dass Cyanid in der Matrix des Bades nicht vorhanden ist und sein Gehalt in der galvanischen Lösung allein durch seine Gegenionenfunktion in den Goldsalzen bedingt ist.
  2. Galvanisches Bad nach Anspruch 1, wobei die Goldsalze ausgewählt sind aus: Kaliumdicyanoaurat, Kaliumtetracyanoaurat, Ammoniumcyanoaurat oder einer Kombination davon; die Kupfersalze ausgewählt sind aus: Sulfat, Phosphat, Pyrophosphat, Chlorid oder anderen Salzen, die unter den Arbeitsbedingungen des Bades selbst stabil sind, und die Indiumsalze ausgewählt sind aus Chlorid, Sulfat, Citrat, Tartrat, Gluconat oder einem organischen oder Aminkomplex.
  3. Galvanisches Bad nach Anspruch 2, wobei die Menge an Gold im Bereich von 0,7 bis 4 g/l, vorzugsweise von 1,5 bis 3 g/l, liegt und die Menge an Kupfer zwischen 0,3 und 2,5 g/l, vorzugsweise zwischen 0,5 und 2 g/l beträgt.
  4. Galvanisches Bad nach einem der Ansprüche 1 bis 3, wobei die Polycarbonsäuresalze ausgewählt sind aus: Citraten, Tartraten, Maleaten, Malonaten, möglicherweise in Kombination mit den entsprechenden Säuren zur Herstellung des geeigneten Puffers und möglicherweise in einer Mischung von Mischungen davon, und vorzugsweise in Mengen zwischen 50 und 100 g/l.
  5. Galvanisches Bad nach einem der Ansprüche 1 bis 4, wobei die Amine Triethylentetramin und Diethylentetramin sind, vorzugsweise in Mengen, die von 0,1 bis 0,7 g/l variieren.
  6. Galvanisches Bad nach einem der Ansprüche 1-5, wobei die anderen Metalle in Mengen zwischen 0,010 und 0,1 g/l verwendet werden.
  7. Galvanische Bäder nach einem der Ansprüche 1 bis 6, wobei die schwefelhaltigen Verbindungen in Mengen zwischen 0,01 und 0,500 g/l und insbesondere in Mengen zwischen 0,05 und 0,200 g/l vorhanden sind.
  8. Galvanisches Verfahren zur Beschichtung von Gegenständen mit Goldlegierungen von 12 - 18 Karat, dadurch gekennzeichnet, dass die Bäder nach den Ansprüchen 1 bis 7 verwendet werden.
  9. Galvanisches Verfahren nach Anspruch 8, wobei das Verfahren in einem pH-Bereich zwischen 7 und 12, bei einer Temperatur zwischen 50 °C und 70 °C und mit einem angelegten Strom zwischen 0,5 - 3 A/cm2 durchgeführt wird.
EP13170067.6A 2012-06-01 2013-05-31 Galvanische Bäder zur Herstellung einer niederkarätigen Goldlegierung und galvanischer Process verwendent diese Bäder Active EP2669407B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT000103A ITFI20120103A1 (it) 2012-06-01 2012-06-01 Bagni galvanici per l'ottenimento di una lega di oro a bassa caratura e processo galvanico che utilizza detti bagni.

Publications (2)

Publication Number Publication Date
EP2669407A1 EP2669407A1 (de) 2013-12-04
EP2669407B1 true EP2669407B1 (de) 2022-03-30

Family

ID=46582807

Family Applications (1)

Application Number Title Priority Date Filing Date
EP13170067.6A Active EP2669407B1 (de) 2012-06-01 2013-05-31 Galvanische Bäder zur Herstellung einer niederkarätigen Goldlegierung und galvanischer Process verwendent diese Bäder

Country Status (4)

Country Link
EP (1) EP2669407B1 (de)
ES (1) ES2918576T3 (de)
IT (1) ITFI20120103A1 (de)
PT (1) PT2669407T (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016020812A1 (en) * 2014-08-04 2016-02-11 Nutec International Srl Electrolytic bath, electrolytic deposition method and item obtained with said method
EP2990507A1 (de) * 2014-08-25 2016-03-02 ATOTECH Deutschland GmbH Zusammensetzung, ihre Verwendung und Verfahren zur galvanischen Abscheidung von Gold enthaltenden Schichten
US20160145756A1 (en) * 2014-11-21 2016-05-26 Rohm And Haas Electronic Materials Llc Environmentally friendly gold electroplating compositions and methods
CN109504991B (zh) * 2019-01-21 2020-08-07 南京市产品质量监督检验院 一种无氰18k金电铸液、其制备方法及其应用

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL273924A (de) * 1961-01-24
ZA734253B (en) * 1972-07-10 1975-02-26 Degussa Electrolytic bath
DE2244434C3 (de) * 1972-09-06 1982-02-25 Schering Ag, 1000 Berlin Und 4619 Bergkamen Wäßriges Bad zur galvanischen Abscheidung von Gold und Goldlegierungen
US4088549A (en) * 1976-04-13 1978-05-09 Oxy Metal Industries Corporation Bright low karat silver gold electroplating
GB2028873B (en) * 1978-08-31 1982-11-10 Lea Ronal Uk Ltd Gold alloy electroplating bath and method
DE3020765A1 (de) 1980-05-31 1981-12-10 Degussa Ag, 6000 Frankfurt Alkalisches bad zum galvanischen abscheiden niederkaraetiger rosa- bis gelbfarbener goldlegierungsschichten
DE3309397A1 (de) 1983-03-16 1984-09-20 Degussa Ag, 6000 Frankfurt Elektrolytisches bad zum abscheiden von niederkaraetigen, glaenzenden gold-silber-legierungsueberzuegen
GB8501245D0 (en) * 1985-01-18 1985-02-20 Engelhard Corp Gold electroplating bath
CH662583A5 (fr) 1985-03-01 1987-10-15 Heinz Emmenegger Bain galvanique pour le depot electrolytique d'alliages d'or-cuivre-cadmium-zinc.
US5085744A (en) 1990-11-06 1992-02-04 Learonal, Inc. Electroplated gold-copper-zinc alloys
DE19629658C2 (de) * 1996-07-23 1999-01-14 Degussa Cyanidfreies galvanisches Bad zur Abscheidung von Gold und Goldlegierungen
JP4308969B2 (ja) * 1999-04-28 2009-08-05 セイコーホールディングス株式会社 めっき皮膜、それを備えた装飾品及びめっき皮膜の製造方法
SG127854A1 (en) * 2005-06-02 2006-12-29 Rohm & Haas Elect Mat Improved gold electrolytes
JPWO2008108181A1 (ja) * 2007-03-02 2010-06-10 シチズン東北株式会社 金合金被膜、金合金被膜被覆積層体及び金合金被膜被覆部材
CH710184B1 (fr) * 2007-09-21 2016-03-31 Aliprandini Laboratoires G Procédé d'obtention d'un dépôt d'alliage d'or jaune par galvanoplastie sans utilisation de métaux ou métalloïdes toxiques.

Also Published As

Publication number Publication date
ITFI20120103A1 (it) 2013-12-02
EP2669407A1 (de) 2013-12-04
ES2918576T3 (es) 2022-07-19
PT2669407T (pt) 2022-06-28

Similar Documents

Publication Publication Date Title
EP2855732B1 (de) Plattierbad zur stromlosen abscheidung von nickelschichten
KR100883131B1 (ko) 구리-주석 합금 도금용 피로인산욕
JP3871018B2 (ja) 錫−銅合金電気めっき浴及びそれを使用するめっき方法
EP2669407B1 (de) Galvanische Bäder zur Herstellung einer niederkarätigen Goldlegierung und galvanischer Process verwendent diese Bäder
TWI427194B (zh) 無氰電鍍銀溶液
JP6370380B2 (ja) 銀−パラジウム合金の電着のための電解質、及びその析出方法
CN108441902B (zh) 基于生物碱复合配位的一价金无氰镀金电镀液及其应用
KR101727358B1 (ko) 주석 및 주석 합금의 성막을 위한 자가촉매 도금욕 조성물
US6620304B1 (en) Bath system for galvanic deposition of metals
DE102011105207B4 (de) Elektrolyt und seine Verwendung zur Abscheidung von Schwarz-Ruthenium-Überzügen und so erhaltene Überzüge und Artikel
TW201544632A (zh) 無氰化物之酸性消光銀電鍍組成物及方法
EP3159435B1 (de) Zusatz für silber-palladium-legierungselektrolyte
EP3332044B1 (de) Palladiumhaltige zinn-/kupferlegierungen, verfahren zu deren herstellung und verwendung davon
TWI391533B (zh) 鍍鈀及鍍鈀合金之高速方法
JP2013534276A (ja) 銅−錫合金層を沈着する電解質および方法
JP2013534276A5 (de)
CN101289756A (zh) 用于金铜合金电解沉积的电解组合物及方法
JP5583896B2 (ja) パラジウムおよびパラジウム合金の高速めっき方法
TWI417429B (zh) An electroplating bath using the electroplating bath, and a substrate deposited by the electrolytic plating
JP2009191335A (ja) めっき液及び電子部品
TWI558858B (zh) 非氰系金－鈀合金鍍覆液及鍍覆方法
RU2323276C2 (ru) Электролит серебрения
CN107419209A (zh) 镀锡铜线用镀锡助焊剂及制备方法
JP2016532004A (ja) 電気めっき浴
CN107406998B (zh) 使用了硫鎓盐的电镀液

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

17P Request for examination filed

Effective date: 20140326

RBV Designated contracting states (corrected)

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

17Q First examination report despatched

Effective date: 20171124

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: BLUCLAD S.P.A.

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTG Intention to grant announced

Effective date: 20210719

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

RIN1 Information on inventor provided before grant (corrected)

Inventor name: INNOCENTI, MASSIMO

Inventor name: CANELLI, DANILO VINCENZO

Inventor name: BANCHELLI, ELENA

Inventor name: CAVACIOCCHI, LORENZO

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

RIN1 Information on inventor provided before grant (corrected)

Inventor name: BENCISTA, ILARIA

Inventor name: INNOCENTI, MASSIMO

Inventor name: CANELLI, DANILO VINCENZO

Inventor name: BANCHELLI, ELENA

Inventor name: CAVACIOCCHI, LORENZO

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602013081241

Country of ref document: DE

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 1479258

Country of ref document: AT

Kind code of ref document: T

Effective date: 20220415

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: PT

Ref legal event code: SC4A

Ref document number: 2669407

Country of ref document: PT

Date of ref document: 20220628

Kind code of ref document: T

Free format text: AVAILABILITY OF NATIONAL TRANSLATION

Effective date: 20220622

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG9D

REG Reference to a national code

Ref country code: ES

Ref legal event code: FG2A

Ref document number: 2918576

Country of ref document: ES

Kind code of ref document: T3

Effective date: 20220719

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220630

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220630

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20220330

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 1479258

Country of ref document: AT

Kind code of ref document: T

Effective date: 20220330

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220701

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220730

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602013081241

Country of ref document: DE

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20220531

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220531

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220531

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220531

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20220630

26N No opposition filed

Effective date: 20230103

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220531

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20220330

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220630

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220531

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: PT

Payment date: 20230601

Year of fee payment: 11

Ref country code: IT

Payment date: 20230529

Year of fee payment: 11

Ref country code: FR

Payment date: 20230510

Year of fee payment: 11

Ref country code: ES

Payment date: 20230605

Year of fee payment: 11

Ref country code: DE

Payment date: 20230510

Year of fee payment: 11

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20130531