EP1479090A2 - Kanalfunkenquelle zur erzeugung eines stabil gebündelten elektronenstrahls - Google Patents
Kanalfunkenquelle zur erzeugung eines stabil gebündelten elektronenstrahlsInfo
- Publication number
- EP1479090A2 EP1479090A2 EP03702521A EP03702521A EP1479090A2 EP 1479090 A2 EP1479090 A2 EP 1479090A2 EP 03702521 A EP03702521 A EP 03702521A EP 03702521 A EP03702521 A EP 03702521A EP 1479090 A2 EP1479090 A2 EP 1479090A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- hollow cathode
- channel spark
- channel
- source according
- dielectric tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/025—Electron guns using a discharge in a gas or a vapour as electron source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/025—Hollow cathodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/52—Generating plasma using exploding wires or spark gaps
Definitions
- the invention relates to a channel spark source for generating a bundled electron beam. It is constructed coaxially and consists of a dielectric tube in which a trigger plasma is generated. This is followed at the end by a hollow cathode, to which a dielectric channel spark body attaches. At the end of this channel spark body is an anode, which has a central passage, so that a further piece of dielectric tube forms the anodic end of the entire channel spark tube.
- a capacitor as an electrical energy store is connected to the anode and the hollow cathode. Lying opposite the hollow cathode, an electrode melted into the bottom of the dielectric tube protrudes into the trigger plasma space. It is connected to earth potential via a spark gap.
- a charging resistor bridges the electrode in the dielectric tube and the hollow cathode. In principle, this corresponds to a structure as described in DP 42 08 764.
- the object of the invention is to improve existing channel spark gaps / sources in such a way that very high numbers of shots are achieved, each with a constant beam quality, and such an improved channel spark source can be a component in industrial plants.
- the approach for the invention lies in the gas occupancy on the inner wall 3 of the channel spark tube 5, the hollow cathode and the connected trigger system 7, it acts as a gas reservoir or internal gas leak that wears out over time. There are no instabilities during this time. However, the energy content of the beam or the power density in this phase is not yet sufficient to effectively ablate. The full beam power density is only observed shortly before the instability occurs. This gives rise to the idea of installing a gas supply in the area of the hollow cathode 1 of the channel spark system and setting a gas pressure there at which the instability does not yet occur, but the beam already has an energy content which can be used for the coating process.
- the sleeve 21, which is a component of the hollow cathode 1 projects into the hollow cathode 1 from the trigger plasma side with a conical opening opening towards the anode 17 to form an annular gap 13, it ends in front of the anode-side forehead of the hollow cathode 1. It remains so a residual volume with the inside width of the hollow cathode 1, into which the annular gap 13 opens.
- the field of a permanent magnet 12 or an electromagnet 12 completely penetrates the dielectric tube 7 of the trigger source in sections.
- the device 12 for generating the magnetic field can be moved along the dielectric tube 7, and the magnetic field axis can also be pivoted. This increases the charge carriers due to electron drift in the trigger plasma and favors the ignition of the channel spark discharge after the trigger plasma has been ignited. Further measures are specified in subclaims 2 to 13 which sustainably support the reliable long-term operation of the channel spark source:
- the ratio of the length from the entrance to the hollow cathode 1 to the exit from the same to the inside width of the sleeve 21 at the trigger source-side entrance is at least 4 but at most 10.
- the inside width of the sleeve 21 on the beam exit side is at least equal to the inside Width of the channel spark tube 11.
- a specially designed valve 16 sits in the gas supply for the metered gas inlet. It consists of a membrane (claim 3), which separates the interior of the hollow cathode 1 from a gas space of higher pressure, through which gas in a correspondingly small amount passes in accordance with the membrane structure, the pressure gradient and the set ambient temperature.
- the membrane can be, for example, a plastic film made of thermostable materials, such as polyester, polyvinyl chloride, silicone rubber, Teflon (claim 4).
- the sealing device on one of the two or on both end faces of the hollow cathode 1 has leak structures in the form of micro bumps / channels into the interior of the hollow cathode 1, through which gas flows metered from the outside to the inside / licks (claim 5).
- the micro bumps / channels sit in one or both end faces of the vessel of the hollow cathode.
- microchannel-like leak structures can also be introduced in the area of contact of the 0-rings with the respective sealing surface (claim 7). Since the clear flow cross section is decisive for the metering of the gas supply (claim 8), a squeezed section of a capillary in the leak gas supply is also conceivable.
- the introduction of such an obstacle into the housing wall of the hollow cathode would be, for example, a metallic tube squeezed at its end or a very fine glass capillary.
- the required gas supply for example air
- the required gas supply may only be very small, a pV flow of about 10 "7. If the gas supply is in the range of s
- Hollow cathode 1 is located, there is a pressure difference along the entire channel structure 9 at, for example, 5 mm diameter. reference of 10 -4 Pascal.
- the magnetic field in the region of the dielectric tube 7 of the trigger plasma has its physical meaning explained above.
- a magnetic field can be applied with a permanent magnet 12, which is a ring magnet (claim 10). It can also be a permanent magnet with pole pieces that are at least least at a distance from the diameter of the dielectric tube 7 (claim 11).
- a DC magnetic field can also be generated with an electromagnet excited with DC (claim 12).
- DC electromagnet excited with DC (claim 12).
- the electromagnet can consist of a cylindrical (claim 13) winding or a flat spiral (claim 13).
- the electromagnet would be used from a winding around a gap-forming iron core (claim 14).
- a criterion for the stability of the self-focused electron beams from channel spark tubes is the range of the beam after leaving the channel spark tube. The higher the range or the ability to ablate distant targets 4, the more stable the quality of the beam can be assessed. It can be seen that the beam stabilized by gas supply from previously approx. 5-10 mm can now travel up to 90 mm through the free space to the target.
- the channel in the hollow cathode 1 must begin with a conically widening shape at its entrance 8.
- the electron beam is extracted from the plasma entering the hollow cathode 1 from the trigger plasma source via the passage of the electric field between the anode 17 and the hollow cathode 1.
- the following geometric adaptation must exist for the usable electron beam formation:
- the conical channel of the sleeve (21) at the connection point to the dielectric tube (7) should have an opening of a few square millimeters and open towards the entrance (10) of the channel spark body (11) on its inside width, the length of the sleeve at least 4 but at most 10 times the diameter of the channel spark tube (9).
- a further increase in factor causes an undesired decoupling between the trigger plasma and the channel spark discharge.
- the invention relates to modifications in the region of the hollow cathode with the consequence that the electron beams generated there rarely or no longer touch the inner wall of the channel and layer material ablatively there.
- this has the advantage that the power of the electron beam leaves the channel radio system undiminished and can then interact with a target.
- the service life of the channel spark system is significantly increased.
- FIG. 1 the structure of the channel spark source
- FIG. 2 the entry area into the hollow cathode
- FIG. 3 a section of the hollow cathode with gas supply through the membrane.
- the structure of the channel spark source in FIG. 1 is shown to scale in the section through the longitudinal axis.
- the vessel 7 for the trigger plasma is test tube-shaped and made of quartz glass. It is flanged gas-tight to the hollow cathode 1 via a support and rubber ring. From this coupling point, the conically widening sleeve 21 projects concentrically into the hollow cathode 1 into the hollow cathode. Between the hollow cathode 1 and the sleeve 21 there is an annular gap. The Hollow cathode 1 and the sleeve 21 are made of metal. The sleeve 21 ends in the interior of the hollow cathode, so there is still an interior part with the clear width of the hollow cathode 1.
- the channel spark body 11 forms part of the channel spark tube 9 and is also flanged on like the vessel 7 for the trigger plasma.
- the channel spark body is made of dielectric material.
- the ring-shaped anode On the other end of the channel spark body 11 sits the ring-shaped anode, in which the end part 5 of the channel spark tube 9 is inserted and abuts the channel spark body 11.
- the electrode 18 projects into the interior of the same through the bottom of the vessel 7 for the trigger plasma source. This electrode 18 is connected on the one hand to the hollow cathode 1 via the charging resistor 20 and on the other hand via the spark gap 19 to the reference potential, here the earth.
- the vessel 7 for the trigger plasma is preferably simply filled with air.
- the filling pressure is 2 Pa and is kept constant during operation.
- the annular permanent magnet is pushed over the vessel 7 and fixed shortly before its exit 8. It is axially displaceable for quality adjustment of the electron beam 2.
- the pulsed electron beam 2 generated in the hollow cathode strikes the target 4, on which it knocks out / evaporates the exposed target material, which then partly deposits on the substrate 22.
- the metered gas supply inside the hollow cathode is of crucial importance for the long-term beam quality of the electron beam.
- the small gas supply is established with the small flange at the beginning of the hollow cathode 1 between the hollow cathode 1 and the vessel 7.
- the sealing O-ring 14 on the side facing the hollow cathode is sanded with abrasive paper with a grain size of 9 ⁇ m and is thus made to leak specifically, as a result of which a small gas inflow via the annular gap 13 is set into the hollow cathode.
- Fig. 3 shows another possibility of realizing the low gas supply in the cathode area.
- the metered gas supply is achieved by the permeation of air / the desired gas through the plastic film 16 via the pipe connection 15 into the hollow cathode 11.
- the amount of air / gas passing through the film depends on the one hand on the differential pressure there, but also on the type of film, the area of the membrane 16, the film thickness and the operating or ambient temperature.
- polyester was used as the film material. name list
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Particle Accelerators (AREA)
- Radiation-Therapy Devices (AREA)
- Physical Vapour Deposition (AREA)
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10207835 | 2002-02-25 | ||
DE10207835A DE10207835C1 (de) | 2002-02-25 | 2002-02-25 | Kanalfunkenquelle zur Erzeugung eines stabil gebündelten Elektronenstrahls |
PCT/EP2003/000719 WO2003071577A2 (de) | 2002-02-25 | 2003-01-24 | Kanalfunkenquelle zur erzeugung eines stabil gebündelten elektronenstrahls |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1479090A2 true EP1479090A2 (de) | 2004-11-24 |
EP1479090B1 EP1479090B1 (de) | 2006-03-22 |
Family
ID=7713927
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03702521A Expired - Lifetime EP1479090B1 (de) | 2002-02-25 | 2003-01-24 | Kanalfunkenquelle zur erzeugung eines stabil gebündelten elektronenstrahls |
Country Status (6)
Country | Link |
---|---|
US (1) | US7183564B2 (de) |
EP (1) | EP1479090B1 (de) |
JP (1) | JP3906207B2 (de) |
AT (1) | ATE321354T1 (de) |
DE (2) | DE10207835C1 (de) |
WO (1) | WO2003071577A2 (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ITMI20040008A1 (it) * | 2004-01-08 | 2004-04-08 | Valentin Dediu | Processo per la produzione di nanotubi di carbonio a singola parete |
ITMI20050585A1 (it) * | 2005-04-07 | 2006-10-08 | Francesco Cino Matacotta | Apparato e processo per la generazione accelerazione e propagazione di fasci di elettroni e plasma |
JP2009267203A (ja) * | 2008-04-28 | 2009-11-12 | Panasonic Corp | プラズマドーピング装置 |
IT1395701B1 (it) * | 2009-03-23 | 2012-10-19 | Organic Spintronics S R L | Dispositivo per la generazione di plasma e per dirigere un flusso di elettroni verso un bersaglio |
DE102009017648A1 (de) * | 2009-04-16 | 2010-10-21 | Siemens Aktiengesellschaft | Gasinjektionssystem und Verfahren zum Betrieb eines Gasinjektionssystems, insbesondere für eine Partikeltherapieanlage |
IT1401417B1 (it) * | 2010-08-23 | 2013-07-26 | Organic Spintronics S R L | Dispositivo per la generazione di plasma e per dirigere un flusso di elettroni verso un bersaglio |
JP5681030B2 (ja) * | 2011-04-15 | 2015-03-04 | 清水電設工業株式会社 | プラズマ・電子ビーム発生装置、薄膜製造装置及び薄膜の製造方法 |
US10225919B2 (en) * | 2011-06-30 | 2019-03-05 | Aes Global Holdings, Pte. Ltd | Projected plasma source |
US9028289B2 (en) * | 2011-12-13 | 2015-05-12 | Federal-Mogul Ignition Company | Electron beam welded electrode for industrial spark plugs |
ITBO20120320A1 (it) | 2012-06-11 | 2013-12-12 | Libuse Skocdopolova | Un apparato ed un metodo per la grenerazione di elettroni e di plasma da un getto di gas |
GB2528141B (en) * | 2014-09-18 | 2016-10-05 | Plasma App Ltd | Virtual cathode deposition (VCD) for thin film manufacturing |
IT201600115342A1 (it) * | 2016-11-15 | 2018-05-15 | Consorzio Di Ricerca Hypatia | Macchina per la deposizione di film sottili |
CN107633986B (zh) * | 2017-08-25 | 2023-09-05 | 金华职业技术学院 | 一种产生电子束的方法 |
US11812540B1 (en) * | 2019-09-30 | 2023-11-07 | Board Of Trustees Of The University Of Alabama, For And On Behalf Of The University Of Alabama In Huntsville | Continuous large area cold atmospheric pressure plasma sheet source |
CN111145623B (zh) * | 2019-12-31 | 2021-12-10 | 河海大学常州校区 | 不同参数的正负电晕与物质作用实验研究装置及方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3864640A (en) * | 1972-11-13 | 1975-02-04 | Willard H Bennett | Concentration and guidance of intense relativistic electron beams |
US4363774A (en) * | 1978-01-24 | 1982-12-14 | Bennett Willard H | Production and utilization of ion cluster acceleration |
US4201921A (en) * | 1978-07-24 | 1980-05-06 | International Business Machines Corporation | Electron beam-capillary plasma flash x-ray device |
DE3014151C2 (de) * | 1980-04-12 | 1982-11-18 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Generator für gepulste Elektronenstrahlen |
US4748378A (en) * | 1986-03-31 | 1988-05-31 | The United States Of America As Represented By The Department Of Energy | Ionized channel generation of an intense-relativistic electron beam |
DE3844814A1 (de) * | 1988-03-19 | 1992-02-27 | Kernforschungsz Karlsruhe | Teilchenbeschleuniger zur erzeugung einer durchstimmbaren punktfoermigen hochleistungs-pseudofunken-roentgenquelle |
JP2819420B2 (ja) * | 1989-11-20 | 1998-10-30 | 東京エレクトロン株式会社 | イオン源 |
DE4208764C2 (de) * | 1992-03-19 | 1994-02-24 | Kernforschungsz Karlsruhe | Gasgefüllter Teilchenbeschleuniger |
DE19813589C2 (de) * | 1998-03-27 | 2002-06-20 | Karlsruhe Forschzent | Verfahren zum Erzeugen eines gepulsten Elektronenstrahls und Elektronenstrahlquelle zur Durchführung des Verfahrens |
DE19849894C1 (de) * | 1998-10-29 | 2000-06-29 | Karlsruhe Forschzent | Gepulste Plasmaquelle für einen gasgefüllten Teilchenbeschleuniger |
US7122949B2 (en) * | 2004-06-21 | 2006-10-17 | Neocera, Inc. | Cylindrical electron beam generating/triggering device and method for generation of electrons |
-
2002
- 2002-02-25 DE DE10207835A patent/DE10207835C1/de not_active Expired - Fee Related
-
2003
- 2003-01-24 EP EP03702521A patent/EP1479090B1/de not_active Expired - Lifetime
- 2003-01-24 AT AT03702521T patent/ATE321354T1/de not_active IP Right Cessation
- 2003-01-24 DE DE50302736T patent/DE50302736D1/de not_active Expired - Fee Related
- 2003-01-24 WO PCT/EP2003/000719 patent/WO2003071577A2/de active IP Right Grant
- 2003-01-24 JP JP2003570382A patent/JP3906207B2/ja not_active Expired - Fee Related
-
2004
- 2004-08-11 US US10/915,834 patent/US7183564B2/en not_active Expired - Lifetime
Non-Patent Citations (1)
Title |
---|
See references of WO03071577A3 * |
Also Published As
Publication number | Publication date |
---|---|
DE50302736D1 (de) | 2006-05-11 |
US20050012441A1 (en) | 2005-01-20 |
JP2005518637A (ja) | 2005-06-23 |
WO2003071577A2 (de) | 2003-08-28 |
US7183564B2 (en) | 2007-02-27 |
EP1479090B1 (de) | 2006-03-22 |
WO2003071577A3 (de) | 2003-12-24 |
ATE321354T1 (de) | 2006-04-15 |
JP3906207B2 (ja) | 2007-04-18 |
DE10207835C1 (de) | 2003-06-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1479090B1 (de) | Kanalfunkenquelle zur erzeugung eines stabil gebündelten elektronenstrahls | |
DE102005025624B4 (de) | Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas | |
DE971610C (de) | Dynamische Druckstufenstrecke zur UEberfuehrung eines Korpuskular-strahlbuendels aus Raeumen niederen Gasdruckes in Raeume hoeheren Gasdruckes | |
DE102006037144B4 (de) | ECR-Plasmaquelle | |
DE2619071A1 (de) | Elektronenkanone | |
DE202014011339U1 (de) | Vorrichtung zum tiegelfreien Schmelzen eines Materials und zum Zerstäuben des geschmolzenen Materials zum Herstellen von Pulver | |
DE2729286A1 (de) | Zerstaeubungsvorrichtung und verfahren zum zerstaeuben mit hilfe einer derartigen vorrichtung | |
DE2112215B2 (de) | Neutronengenerator | |
EP2191699B1 (de) | Hochspannungsisolatoranordnung und ionenbeschleunigeranordnung mit einer solchen hochspannungsisolatoranordnung | |
DE1153463B (de) | Plasmaerzeuger zur Erzeugung eines kontinuierlichen Plasmastrahls | |
DE2433781C2 (de) | Elektronenquelle | |
DE68922364T2 (de) | Mit einer multizellulären Ionenquelle mit magnetischem Einschluss versehene abgeschmolzene Neutronenröhre. | |
DE102006034988B4 (de) | Ionenquelle zur Erzeugung negativ geladener Ionen | |
WO1986002498A1 (en) | High power gas laser with axial gas flow | |
DE1214804B (de) | Vorrichtung zum Erzeugen und Einschliessen eines Plasmas | |
DE4214417C1 (en) | Plasma lens e.g. for focussing charged particle beam - has insulating wall enclosing cylindrical discharge plasma between two opposing electrodes with aligned apertures for passage of particle beam | |
EP1401249A2 (de) | Plasmaquelle | |
DE1265338B (de) | Gasentladungseinrichtung mit Penning-Entladung zur Erzeugung und Messung von Hochvakuum | |
DE1564445C (de) | Verfahren und Vorrichtung zur Gleich richtung großer Strome im Hochspannungsbe reich | |
DE2421907C3 (de) | Vorrichtung zur Erzeugung eines Elektronen- bzw. Ionenstrahl | |
DE2141376C3 (de) | Vorrichtung zur Erzeugung von relativistischen Elektronenstrahlimpulsen mit magnetischer Selbstfokussierung | |
DE2254444C3 (de) | Ionenkanone zur Erzeugung von lonenstrahlen | |
DE102015120212A1 (de) | Heissfilamentdruckmessung in Ionenpumpe | |
DE3038624A1 (de) | Gasentladungs-elektronenkanone mit einer kaltkathode | |
DE2421907B2 (de) | Vorrichtung zur erzeugung eines elektronen- bzw. ionenstrahls |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20040731 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT SE SI SK TR |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: 7H 05H 1/24 B Ipc: 7H 01J 1/02 A Ipc: 7H 01J 3/02 B |
|
RTI1 | Title (correction) |
Free format text: CHANNEL SPARK SOURCE FOR GENERATING A STABLY FOCUSSED ELECTRON BEAM |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: 7H 01J 1/02 A Ipc: 7H 05H 1/24 B Ipc: 7H 01J 3/02 B |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT SE SI SK TR |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED. Effective date: 20060322 Ref country code: GB Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060322 Ref country code: SI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060322 Ref country code: SK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060322 Ref country code: NL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060322 Ref country code: IE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060322 |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D Free format text: LANGUAGE OF EP DOCUMENT: GERMAN |
|
REF | Corresponds to: |
Ref document number: 50302736 Country of ref document: DE Date of ref document: 20060511 Kind code of ref document: P |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060622 Ref country code: SE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060622 Ref country code: BG Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060622 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060703 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060822 |
|
NLV1 | Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act | ||
GBV | Gb: ep patent (uk) treated as always having been void in accordance with gb section 77(7)/1977 [no translation filed] |
Effective date: 20060322 |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FD4D |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070131 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070131 Ref country code: MC Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070131 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20070322 Year of fee payment: 5 |
|
26N | No opposition filed |
Effective date: 20061227 |
|
EN | Fr: translation not filed | ||
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
BERE | Be: lapsed |
Owner name: FORSCHUNGSZENTRUM KARLSRUHE G.M.B.H. Effective date: 20070131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070309 Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060623 Ref country code: CZ Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060322 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060322 Ref country code: AT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070124 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: EE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060322 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20080801 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060322 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070124 Ref country code: CY Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060322 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: HU Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060923 Ref country code: TR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20060322 |