IT1401417B1 - Dispositivo per la generazione di plasma e per dirigere un flusso di elettroni verso un bersaglio - Google Patents

Dispositivo per la generazione di plasma e per dirigere un flusso di elettroni verso un bersaglio

Info

Publication number
IT1401417B1
IT1401417B1 ITBO2010A000525A ITBO20100525A IT1401417B1 IT 1401417 B1 IT1401417 B1 IT 1401417B1 IT BO2010A000525 A ITBO2010A000525 A IT BO2010A000525A IT BO20100525 A ITBO20100525 A IT BO20100525A IT 1401417 B1 IT1401417 B1 IT 1401417B1
Authority
IT
Italy
Prior art keywords
manage
target
flow
plasma generation
electrons towards
Prior art date
Application number
ITBO2010A000525A
Other languages
English (en)
Inventor
Carlo Taliani
Libuse Nozarova
Original Assignee
Organic Spintronics S R L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Organic Spintronics S R L filed Critical Organic Spintronics S R L
Priority to ITBO2010A000525A priority Critical patent/IT1401417B1/it
Priority to PCT/IT2011/000301 priority patent/WO2012025947A1/en
Publication of ITBO20100525A1 publication Critical patent/ITBO20100525A1/it
Application granted granted Critical
Publication of IT1401417B1 publication Critical patent/IT1401417B1/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/077—Electron guns using discharge in gases or vapours as electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/025—Electron guns using a discharge in a gas or a vapour as electron source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06366—Gas discharge electron sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Drying Of Semiconductors (AREA)
ITBO2010A000525A 2010-08-23 2010-08-23 Dispositivo per la generazione di plasma e per dirigere un flusso di elettroni verso un bersaglio IT1401417B1 (it)

Priority Applications (2)

Application Number Priority Date Filing Date Title
ITBO2010A000525A IT1401417B1 (it) 2010-08-23 2010-08-23 Dispositivo per la generazione di plasma e per dirigere un flusso di elettroni verso un bersaglio
PCT/IT2011/000301 WO2012025947A1 (en) 2010-08-23 2011-08-23 Device for generating plasma and for directing a flow of electrons towards a target

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITBO2010A000525A IT1401417B1 (it) 2010-08-23 2010-08-23 Dispositivo per la generazione di plasma e per dirigere un flusso di elettroni verso un bersaglio

Publications (2)

Publication Number Publication Date
ITBO20100525A1 ITBO20100525A1 (it) 2012-02-24
IT1401417B1 true IT1401417B1 (it) 2013-07-26

Family

ID=43739432

Family Applications (1)

Application Number Title Priority Date Filing Date
ITBO2010A000525A IT1401417B1 (it) 2010-08-23 2010-08-23 Dispositivo per la generazione di plasma e per dirigere un flusso di elettroni verso un bersaglio

Country Status (2)

Country Link
IT (1) IT1401417B1 (it)
WO (1) WO2012025947A1 (it)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITBO20120320A1 (it) * 2012-06-11 2013-12-12 Libuse Skocdopolova Un apparato ed un metodo per la grenerazione di elettroni e di plasma da un getto di gas
ITBO20120695A1 (it) 2012-12-20 2014-06-21 Organic Spintronics S R L Dispositivo di deposizione a plasma impulsato
GB2528141B (en) 2014-09-18 2016-10-05 Plasma App Ltd Virtual cathode deposition (VCD) for thin film manufacturing

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10207835C1 (de) * 2002-02-25 2003-06-12 Karlsruhe Forschzent Kanalfunkenquelle zur Erzeugung eines stabil gebündelten Elektronenstrahls
ITMI20050585A1 (it) * 2005-04-07 2006-10-08 Francesco Cino Matacotta Apparato e processo per la generazione accelerazione e propagazione di fasci di elettroni e plasma
US7557511B2 (en) * 2005-08-01 2009-07-07 Neocera, Llc Apparatus and method utilizing high power density electron beam for generating pulsed stream of ablation plasma
IT1395701B1 (it) * 2009-03-23 2012-10-19 Organic Spintronics S R L Dispositivo per la generazione di plasma e per dirigere un flusso di elettroni verso un bersaglio

Also Published As

Publication number Publication date
WO2012025947A1 (en) 2012-03-01
ITBO20100525A1 (it) 2012-02-24

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