EP1475217B1 - Traitement anti-brillant, sa méthode de fabrication, traitement anti-réfléchissant, lame polarisante et dispositif d'affichage d'images - Google Patents

Traitement anti-brillant, sa méthode de fabrication, traitement anti-réfléchissant, lame polarisante et dispositif d'affichage d'images Download PDF

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Publication number
EP1475217B1
EP1475217B1 EP04010814A EP04010814A EP1475217B1 EP 1475217 B1 EP1475217 B1 EP 1475217B1 EP 04010814 A EP04010814 A EP 04010814A EP 04010814 A EP04010814 A EP 04010814A EP 1475217 B1 EP1475217 B1 EP 1475217B1
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EP
European Patent Office
Prior art keywords
film
layer
equal
embossing
refractive index
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Expired - Lifetime
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EP04010814A
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German (de)
English (en)
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EP1475217A1 (fr
Inventor
Naoyuki Kawanishi
Tadashi Hayashi
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Fujifilm Corp
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Fujifilm Corp
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L9/00—Disinfection, sterilisation or deodorisation of air
    • A61L9/16—Disinfection, sterilisation or deodorisation of air using physical phenomena
    • A61L9/22—Ionisation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H9/00—Machining specially adapted for treating particular metal objects or for obtaining special effects or results on metal objects
    • B23H9/04—Treating surfaces of rolls
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • B29C59/046—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts for layered or coated substantially flat surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B30—PRESSES
    • B30B—PRESSES IN GENERAL
    • B30B3/00—Presses characterised by the use of rotary pressing members, e.g. rollers, rings, discs
    • B30B3/005—Roll constructions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
    • B29K2995/0018—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds having particular optical properties, e.g. fluorescent or phosphorescent
    • B29K2995/003—Reflective
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
    • B29K2995/0018—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds having particular optical properties, e.g. fluorescent or phosphorescent
    • B29K2995/0034—Polarising
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2330/00—Aspects of power supply; Aspects of display protection and defect management
    • G09G2330/02—Details of power systems and of start or stop of display operation
    • G09G2330/021—Power management, e.g. power saving
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2330/00—Aspects of power supply; Aspects of display protection and defect management
    • G09G2330/02—Details of power systems and of start or stop of display operation
    • G09G2330/028—Generation of voltages supplied to electrode drivers in a matrix display other than LCD

Definitions

  • the present invention relates to antiglare film, method of producing the same, anti-reflection film, polarizing plate, and image display device. More particularly, the present invention relates to antiglare film, and a method of producing the same both with high performance and with great ease, and anti-reflection film, polarizing plate, and image display device.
  • Anti-reflection film is provided in several sorts of image display devices, such as a liquid crystal display (LCD), a plasma display panel (PDP), an electro luminescence display (ELD), a cathode-ray tube (CRT) and the like.
  • the anti-reflection film is used for an eyeglass, of a lens incorporated in a camera.
  • Several types of the anti-reflection films have been proposed. Some of them have a multi-layers structure or a nonuniform layer structure, and are widely used.
  • a film support is provided with a plurality of transparent layers of metal oxides, so as to prevent the reflection in a wide wavelength range of a visible ray.
  • Such transparent layers of metal oxides are usually formed in methods of vapor deposition.
  • methods of vapor deposition there are chemical vapor deposition (CVD) and physical vapor deposition (PVD).
  • CVD chemical vapor deposition
  • PVD physical vapor deposition
  • some substances are evaporated, such that a gas thereof in form of molecules or atoms forms a thin layer.
  • the PVD is often made in vacuum deposition method and sputtering method. However, those are unsuitable for mass production, due to low productivity.
  • the PVD is often carried out on a film support, while a metal layer on the film support is provided with the protruding and retreating surface pattern in accordance with the way of use.
  • a metal layer on the film support is provided with the protruding and retreating surface pattern in accordance with the way of use.
  • parallel transmittance becomes lower than in the anti-reflection film having a smooth surface on which that vapor deposition is performed.
  • the protruding and retreating surface pattern scatters the external light to suppress mirroring.
  • the produced anti-reflection film has antiglare property. Accordingly, such anti-reflection films improve the display quality of the image display device.
  • JP-B 60-059250 (corresponding to JP-A 56-084729 ) and JP-A 59-050401 .
  • JP-B 60-059250 a solution is cast on a film support to form an anti-reflection layer including inorganic micro particles and micro voids. After the solution is dried and forms an anti-reflection layer on the film support, it is processed in gas activation. Thereby, a gas leaves the coating layer, and the micro voids are formed in the coating layer.
  • JP-A 59-050401 discloses a multi-layer structure having a support, a high refractive index layer and a low refractive index layer overlaid on the former and formed from coating of polymer or inorganic micro particles.
  • the document suggests provision of a middle refractive index layer disposed between the support and the high refractive index layer.
  • JP-A 2-245702 discloses anti-reflection film in which micro particles of two or more compounds, such as MgF 2 and SiO 2 , are contained, and a proportion of mixture of those is changed in the thickness direction of the film.
  • the change in the proportion of the compounds for the particles is effective in changing the refraction index within the film, to obtain a similar optical effect to that of JP-A 59-050401 disclosing the high and low refractive index layers in the dual layer structure.
  • the micro particles are fixed to a support through SiO 2 produced in thermal decomposition of the ethyl silicate. In the thermal decomposition, carbon dioxide and gaseous water are generated from the low refractive index layer through the combustion of the ethyl group. Thereby, micro voids are formed between the micro particles in the low refractive index layer.
  • JP-A 5-013021 teaches the improvement of the anti-reflection film of JP-A 2-245702 .
  • the micro voids are filled with binder.
  • JP-A 7-048527 teaches anti-reflection film containing binder and inorganic particles of porous silica.
  • JP-A 11-006902 discloses a three-layer structure of film in which a low refractive index layer is overlaid on a support and includes plural inorganic micro particles together with micro voids, and coated with coatings in a wet manner. This is characterized in application of all the coatings in the wet manner at a reduced manufacturing cost, and has an intention of strengthening the film even with a lowered reflection.
  • JP-A 2000-275401 and 2000-275404 propose improvements of the anti-reflection films in JP-A 11-006902 . At first, a flat anti-reflection film is produced, and a surface thereof is embossed to form the protruding and retreating surface pattern.
  • the antiglare film or anti-reflection film is secured and positioned on the outermost side of an image display device.
  • incidental outer force is likely to be exerted to the film. So high resistance to force to scratch, depress or damage the film is required in the practical use.
  • To keep resistance to outer force high it is conceivable to raise smoothness of the surface by lowering friction or surface energy of the surface, or to raise force of bonds between the plural layers overlaid on one another for high resistance against being peeled.
  • the hard coat layer is directly adjacent to the support of polymer film, has a thickness from several microns to tens of microns, and is formed to have hardness which corresponds to pencil hardness of H or higher, preferably 2H or higher.
  • the plural documents disclose micro voids between micro particles in the anti-reflection film, no document discloses optical characteristic of the illustrated voids.
  • the micro voids are filled with the binder such that the anti-reflection film may be stronger.
  • the micro voids are filled with the binder, it becomes harder to decrease the refractive index of the anti-reflection film enough.
  • a partial protruding or retreating region on the surface is larger than a cell included in numerous image display cells, it is likely that transmitted light through a single cell is condensed by a lens effect of the partial region. Also, light components of red, green and blue transmitted light are unacceptably mixed in the color by the partial regions if passed through adjacent cells. Otherwise, not only the wide view angle and the high speed response but also the high definition are required so much to obtain a high image quality. The high definition is realized by decreasing a cell size.
  • the cell size is so smaller that the display has at least 133 ppi (pixel per inch)
  • the light transmits through the anti-reflection film, and the light perceived by a user has the nonuniform brightness, which cases the dazzling on the display. Therefore, the quality of the anti-reflection film becomes lower as a product.
  • a problem in providing the hard coat layer lies in the insufficiency of the embossed protruding and retreating pattern both in the depth direction and in the two-dimensional direction. This is because the embossing for imparting the antiglare properties is partially blocked by the hardness of the hard coat layer. Unwanted results occur in insufficiency in the antiglare effects, or low performance according to the dazzling appearance.
  • JP-A 2000-275401 relates to an antiglare film useful for an image display, such as LCD.
  • the antiglare film is produced by embossing a polymer film, which includes a support and an anti-reflection layer overlaid thereon.
  • EP 0 798 095 A1 relates to a method for manufacturing a mold includes the steps of machining at least a portion of a cavity surface (a) at a controlled roughness (Rz), and embossing the machined portion of the cavity surface (a) with a specified embossment having a specified depth (z), wherein the ratio of the roughness (Rz) to the depth (z) of the embossment is controlled to be a value smaller than 0.6, and preferably about 0.2.
  • US 5,993,702 describes an embossed substrate comprising a substrate of a plastic material and having a surface and an embossed surface carried by the surface of the substrate.
  • the embossed surface has a pattern with an average roughness of between 100 nm and 300 nm with the roughness being distributed substantially uniformly over the surface, the pattern has ridges and valleys with the horizontal distance between adjacent ridges and/or valleys being greater than the depth between the ridges and the valleys.
  • EP 0 256 803 A1 relates to wear- and corrosion-resistant ceramic, cermet or metallic patterned embossing surfaces, e.g., as a coating bonded to an embossing roll, containing an average of 50 to 2,000 peaks per inch covering said patterned embossing surface.
  • GB 1 303 971 A1 describes that a biaxially oriented polyester film is rendered suitable for winding into uniform stable rolls by producing on one surface a multiplicity of transverse ridges having a length-to-width ratio greater than 1 : 1 and a peak-to-valley height of at least 10 microinches.
  • EP 0 593 080 A1 describes that a film for lamination.
  • a sheet substrate (a) composed of a thermoplastic resin an adhesive layer (b) of an ethylene-based copolymer resin film containing 70 to 90% by weight of ethylene which melting point is lower than the substrate is laminated in a thickness of 8 to 40 ⁇ m or more.
  • the surface of the adhesive layer (b) has a regular jag embossing with little crests and valleys, in which the 10 points-mean roughness (Rz) of the embossing is from 4.0 to 8.5 ⁇ m, the surface ratio of the convex cross section (Sr) at neutral line of the surface roughness is smaller than 55 %, and the smoothness of the surface is 500 sec. or lower.
  • EP 0 884 165 A1 describes an embossed polyolefin film, suitable for producing personal hygiene products, which presents an improved pleasantness to the touch.
  • an object of the present invention is to provide a method of producing an antiglare film both with high performance and with great ease.
  • an antiglare film producing method of film production by surface embossing to polymer film includes a support and an anti-reflection layer overlaid thereon, and an embosser is used for surface embossing to a surface of the anti-reflection layer or a back surface of the support.
  • the antiglare film producing method includes a step of producing the embosser according to electrodischarge machining.
  • a surface of the embosser has an arithmetic average roughness Ra equal to or more than 0.3 micron and equal to or less than 1.0 micron, and has a protruding and retreating pattern with an average cycle length RSm equal to or more than 5 microns and equal to or less than 30 microns.
  • the electrodischarge machining is electrically negative electrodischarge machining in which liquid with kerosene is used, a discharging electrode produced from material containing copper or brass is used, and voltage is applied thereto and is equal to or more than 100 V and equal to or less than 400 V.
  • the liquid includes particles at an amount equal to or more than 1 gram per liter and equal to or less than 20 grams per liter, and the particles have an average grain diameter equal to or more than 1 micron and equal to or less than 10 microns.
  • the particles are formed from at least one of graphite, silicon, and molybdenum sulfide.
  • the embosser is produced from material having Vickers hardness equal to or more than 500 Hv and equal to or less than 1,500 Hv.
  • the embosser is produced from material plated with a selected one of a hard chrome plating, a nickel plating containing phosphorus or a combination of phosphorus and boron, and a chrome plating or nickel plating formed by simultaneous precipitation of particles of at least one compound selected from titanium carbide (TiC), tungsten carbide (WC), silicon carbide (SiC), boron carbide (B 4 C), and titanium boride (TiB 2 ).
  • TiC titanium carbide
  • WC tungsten carbide
  • SiC silicon carbide
  • B 4 C boron carbide
  • TiB 2 titanium boride
  • thermally hardening a plated layer formed by the plating.
  • the thermal hardening is effected at temperature equal to or more than 300°C and equal to or less than 1000°C, and for at least one hour.
  • the polymer film contains cellulose acylate.
  • the polymer film has a multi-layer structure, and further includes a hard coat layer disposed between the support and the anti-reflection layer.
  • the polymer film has a multi-layer structure, and further includes a primer layer disposed between the support and the anti-reflection layer.
  • a hard coat layer is disposed between the primer layer and the anti-reflection layer.
  • polymer film is provided according to the present invention.
  • the polymer includes a support, and an anti-reflection layer overlaid on the support.
  • a selected one of a surface of the anti-reflection layer and a back surface of the support is embossed by an embosser.
  • the embosser is produced according to negative electrodischarge machining, and includes a surface which has an arithmetic average roughness Ra equal to or more than 0.3 micron and equal to or less than 1.0 micron, and has a protruding and retreating pattern with an average cycle length RSm equal to or more than 5 microns and equal to or less than 30 microns.
  • antiglare film can be produced both with high performance and with great ease.
  • a system for imparting of antiglare properties to polymer film is schematically illustrated.
  • the polymer film before having the antiglare properties is herein referred to anti-reflection film 11a.
  • the polymer film after imparting of the antiglare properties is referred to antiglare anti-reflection film 11b.
  • the imparting system includes a jacket roller 12 for application of heat, and a one-surface embossing calender device 13 as an embossing device.
  • a gas fan or blower 16 is disposed downstream from the one-surface embossing calender device 13.
  • the one-surface embossing calender device 13 includes an embossing roller 22 and a backup roller 23.
  • the embossing roller 22 is provided with a rotational control unit 26 and a temperature adjuster 28.
  • the backup roller 23 is provided with a rotational control unit 27 and a temperature adjuster 29.
  • feed rollers are used as required for various purposes. Such feed rollers are not depicted in Fig. 1 .
  • the anti-reflection film 11a is constituted by a support layer group 31 and an anti-reflection layer 32.
  • the support layer group 31 includes a transparent support, and if required, has a multi-layer structure.
  • the anti-reflection layer 32 is overlaid on the support layer group 31, and consists of one or more coatings having inorganic micro particles.
  • the jacket roller 12 applies heat to the anti-reflection film 11a coated with the coating solution before the embossing. This operation of the jacket roller 12 is herein referred to as a preheating step.
  • the jacket roller 12 is a double jacket roller, with which a temperature adjuster 12a is connected, and adjusts temperature of heat exchange medium contained in a jacket. The heat is transmitted to the anti-reflection film 11a, which is heated to a predetermined temperature.
  • the embossing roller 22 is formed from metal, and has an embossing surface to operate as an embosser.
  • the backup roller 23 is formed from metal, and has a smooth surface.
  • the embossing roller 22 is in a position opposed to the anti-reflection layer 32 of the anti-reflection film 11a.
  • the backup roller 23 is in a position opposed to the support layer group 31.
  • the embossing and backup rollers 22 and 23 squeeze the anti-reflection film 11a by applying pressure, and rotate and transport the anti-reflection film 11a.
  • the rotational control units 26 and 27 control the embossing pressure for the squeezing of the embossing and backup rollers 22 and 23 and their rotational speed.
  • the anti-reflection film 11a is embossed by cooperation of the embossing and backup rollers 22 and 23 to obtain the antiglare anti-reflection film 11b.
  • the temperature adjusters 28 and 29 control the peripheral surface temperature of the embossing and backup rollers 22 and 23 at a certain level optimized for embossing.
  • the gas fan or blower 16 sends a flow of gas toward the anti-reflection layer 32 with the embossed surface of the antiglare anti-reflection film 11b immediately downstream from the embosser, to lower the temperature of the antiglare anti-reflection film 11b.
  • the anti-reflection film 11a becomes the antiglare anti-reflection film 11b by the process of embossing on the surface having the anti-reflection layer 32.
  • the antiglare properties can be provided with a constant back-to-front thickness without the anti-reflection properties.
  • the uniformity of the thickness of the antiglare anti-reflection film 11b depends on the number and optical construction of optical interference layers constituting the anti-reflection layer 32.
  • the anti-reflection layer 32 may be a three-layer form including a low refractive index layer, a high refractive index layer and a middle refractive index layer disposed in a sequence from the outside of the anti-reflection film 11b.
  • Each of the low, high and middle refractive index layers is provided with a thickness of n ⁇ /4, where n is a refractive index.
  • the thickness of the each layer can fluctuate within a range of ⁇ 3% of the average thickness. When the thickness fluctuates over this range, then the anti-reflection properties become much poorer.
  • an average cycle length (RSm) of the protruding and retreating pattern of the surface is equal to or more than 5 microns and equal to or less than 100 microns, and preferably equal to or more than 5 microns and equal to or less than 50 microns, and desirably equal to or more than 5 microns and equal to or less than 30 microns.
  • the antiglare anti-reflection film 11b of the invention has an arithmetic average roughness (Ra) equal to or more than 0.01 micron and equal to or less than 2 microns, and preferably equal to or more than 0.05 micron and equal to or less than 2 microns, and desirably equal to or more than 0.05 micron and equal to or less than 1 micron.
  • an inclination angle of the profile of the protruding and retreating pattern should be sufficiently small according to the invention.
  • Values of the inclination angle are not single, but varies in a certain distribution owing to the irregularity. However, should great values of angles be included largely among all the values, external appearance of the antiglare anti-reflection film 11b may be whitish to an unwanted extent. Consequently, the inclination angle is in a range of 0.5-10 degrees inclusive, and preferably in a range of 0.5-5 degrees.
  • an average cycle length of a protruding and retreating pattern (RSm), an arithmetic average roughness (Ra), and an average inclination angle are measured by a two-dimensional roughness measuring device SJ-400 (trade name, produced by Mitsutoyo Corporation), or a micromap device produced by Ryoka Systems Inc.
  • SJ-400 trade name, produced by Mitsutoyo Corporation
  • micromap device produced by Ryoka Systems Inc.
  • other available devices can be used for two-dimensional roughness measurement.
  • a type of embossing process according to the preferred embodiment is a roll embosser pressing.
  • any suitable type of embossing can be used.
  • a flat panel embosser pressing and a continuous belt embosser pressing may be used.
  • preferable examples are the continuous belt embosser pressing and the roll embosser pressing in consideration of continuous machining of very long material.
  • a particularly preferable example is the roll embosser pressing, because of high degree of freedom in controlling the embossing pressure and the pressing temperature.
  • the embossing process according to the invention is hot embossing in the field of embossing.
  • An embosser is heated, pressed on an article to be embossed, and is provided with a pattern.
  • the hot embossing is different from thermal melting film casting, thermal melting lamination, and different from cold embossing in which an embosser is maintained at a temperature equal to or lower than that of the preheated film to provide the film with a pattern.
  • a heating device for applying an embosser may have any suitable structure for heating for 80°C or higher and having small changes in temperature distribution of the surface temperature. Preferable examples of such heating devices are an electric wire heater, electric induction heating, an infrared heater, and a jacket heater.
  • Heat exchange medium is contained in the jacket heater and circulated in a path inside the embosser, and may be hot water, oil, steam, and the like.
  • preferable examples among those are an electric wire heater, an electric induction heating device, for example, a heat roll produced by Tokuden Co., Ltd, and a jacket heater.
  • an electric induction heating device and a jacket heater are particularly preferable examples.
  • any suitable material can be used for the embossing roller 22 for the roll embosser pressing with sufficient rigidity for being resistant to embossing pressure, for example, metals, ceramic materials, synthetic resins, composite materials of synthetic resins and one of metal, glass, and the like.
  • at least the surface of the embossing roller 22 is preferably coated with alloy of iron containing carbon and chromium, and with Vickers hardness of 500 Hv or higher. The thickness of the coating, the materials for the embosser and the like will be described in detail.
  • the embossing roller 22 can have any suitable outer diameter for the purpose of the use in the roll embosser pressing.
  • the outer diameter may be 50-3,000 mm in view of practical possibility of the roll production.
  • a preferable outer diameter of the embossing roller 22 can be equal to or greater than 50 mm and equal to or smaller than 2,000 mm. This is because of high precision in view of the straight property of the anti-reflection film 11a of an order of several microns per meter in the width direction of the anti-reflection film 11a. Also, it is because the embossing roller 22 should be prevented from having an excessively great weight.
  • any suitable material can be used with sufficient rigidity for being resistant to embossing pressure, for example, metals, ceramic materials, synthetic resins, composite materials of synthetic resins and one of metal, glass and the like.
  • at least the surface of the embossing roller 22 is preferably coated with alloy of iron containing carbon and chromium, and with Vickers hardness of 500 Hv or higher.
  • a thickness of the coating is in a range from 10 microns to 500 microns, and preferably in a range from 50 microns to 500 microns.
  • a surface roughness of the backup roller 23 should be as small as possible for the purpose of maintaining smoothness of a surface of the anti-reflection film 11a on the side of the support layer group 31 as a product with antiglare properties.
  • an arithmetic average roughness (Ra) of the backup roller 23, which is a characteristic generally utilized for the mirror surface finish of metal surfaces, can be preferably equal to or less than 0.01 micron.
  • the backup roller 23 for use in the roll embosser pressing according to the invention may have any suitable outer diameter.
  • the outer diameter of the backup roller 23 may be 50-3,000 mm.
  • the diameter can be 50-2,000 mm, because of high precision in view of the straight property of the anti-reflection film 11a of an order of several microns per meter in the width direction of the anti-reflection film 11a.
  • the embossing roller 22 should be prevented from having an excessively great weight.
  • the backup roller 23 may be cooled.
  • the inside of the backup roller 23 may be hollow and have a jacket structure through which cool water or other suitable coolant can circulate.
  • a gas fan or blower may be used to blow the backup roller 23 with chilled gas.
  • the cooling of the backup roller 23 is effective in reducing volatilization or evaporation of additives such as plasticizers from the antiglare anti-reflection film 11b typically if the antiglare anti-reflection film 11b contains such additives.
  • the contact of the antiglare anti-reflection film 11b with the backup roller 23 directly after the pressing can have a fixed embossed pattern because of the immediate cooling.
  • Various conditions of pressing includes pressure to the anti-reflection film 11a, surface temperature of the embosser, and press time.
  • the embossing pressure to the anti-reflection film 11a is equal to or higher than 1x10 5 Pa, and preferably in a range from 1x10 5 Pa to 1x10 7 Pa, and desirably in a range from 5x10 5 Pa to 5x10 6 Pa.
  • the linear contact pressure of those is equal to or higher than 1,000 N/cm, and preferably in a range from 1,000 N/cm to 50,000 N/cm, and desirably in a range from 5,000 N/cm to 30,000 N/cm.
  • a surface temperature of a surface of the embossing roller is preferably 80°C or higher.
  • the surface temperature may be preferably in a range of 80-220°C, and desirably in a range of 100-200°C.
  • Types of pressing in which the press time can be precisely defined are a flat panel embosser pressing and a continuous belt embosser pressing.
  • the press time are in a range of 1-600 seconds inclusive, preferably in a range of 10-600 seconds, and desirably in a range of 10-300 seconds.
  • an effective press time is determined according to a length of the contact of a nipped portion between the embossing and backup rollers 22 and 23 with pressure, and a transporting speed of the anti-reflection film 11a.
  • a length of the contact of the nipped portion viewed in the transporting direction is changeable, and depends upon diameters, resiliency and other physical characteristics of the embossing and backup rollers 22 and 23, and upon pressure, temperature and other pressing conditions.
  • the transporting speed is preferably in a range of 1-50 m/min. inclusive, preferably in a range of 1-30 m/min., and desirably in a range of 5-30 m/min.
  • the embossing pressure by means of rotational shaft has a problem in that flexure occur in the roller to cause irregularity in the embossing pressure in the width direction.
  • a crown roll method an amount of flexing is predicted according to the embossing pressure, to adjust the roller diameter.
  • the bend adjusting method pressure is applied to the rotational shaft in reverse to the pressing direction.
  • at least one of the embossing and backup rollers 22 and 23 can have an inclined shape or curved shape with an outer diameter varying with a difference range per a unit width of the roller.
  • the difference range within which the roll outer diameter varies is 5-50 microns per one (1) meter of the width of the roll, preferably 5-30 microns, and desirably 10-30 microns.
  • the bend adjusting pressure depends on the physical characteristics including the diameter or elasticity of the embossing and backup rollers 22 and 23 and the pressing conditions including the embossing pressure and temperature.
  • the bend adjusting pressure as reaction is in a range of 3-20% of the embossing pressure, preferably in a range of 3-15% of the same, and desirably in a range of 5-10% of the same.
  • devices or element in the producing system for embossing and rewinding should be installed under a condition of a clean room environment of class 100 or higher, preferably class 10 or higher. Furthermore, it is preferable to use a dust eliminating device at a step before the embossing step.
  • U.S.P. No. 4,577,362 (corresponding to JP-A 59-150571 ) discloses contact of a non-woven fabric, blade or other material with a film surface.
  • JP-A 10-309553 discloses a method in which the film surface is blown with very clean air free from dust at high flow rate, to remove dust from the film surface, and the dust with the air is ejected through an ejection port.
  • An available example of machine for blowing compressed air with ultrasonic vibration and for sucking deposited dust is known as New Ultra Cleaner (trade name) produced by Shinko Co., Ltd.
  • JP-A 10-290964 discloses a method of removing foreign material deposited with static charge. In this document, positive and negative ions of air are injected to neutralize the charge to separate foreign material, which is ejected by a flow of air sent by a separate structure.
  • JP-A 62-131500 discloses a widely used charge eliminating method which can be used in the present embodiment.
  • JP-A 2-043157 also discloses a usable dust eliminating method.
  • wet types of dust elimination distinct from the dry types are suggested and known.
  • a film is introduced into a washing bath, in which an ultrasonic oscillator applies ultrasonic waves thereto to remove dust.
  • U.S.P. No. 3,956,790 (corresponding to JP-B 49-013020 ) discloses a method in which film is supplied with washing liquid, and subjected to blow and suction of dust eliminating gas at a high flow rate.
  • U.S.P. No. 6,503,332 (corresponding to JP-A 2001- 038306 ), JP-A 2002-079200 and U.S. Pub. No. 2002/0027628 (corresponding to JP-A 2002-040245 ) disclose a wiping method in which a resilient material is moistened with liquid, and rubs and wipes a surface of film.
  • the degree of the dust elimination for the present embodiment should be sufficiently high.
  • surfaces of the anti-reflection film 11a or the antiglare anti-reflection film 11b after being subjected to the above-described dust elimination in a clean room can have foreign material or particles with a diameter of 10 microns or more at an amount of 10 particles or less per m 2 , preferably 1 particle or less per m 2 , and desirably 0.1 particle or less per m 2 .
  • a preheating step of preheating the anti-reflection film 11a before the embossing is preferably constructed to raise the temperature of the anti-reflection film 11a gradually from the room temperature to the embossing temperature.
  • the addition of the preheating step is effective in preventing various problems, which are abrupt softening and changes in the volume of the anti-reflection film 11a upon access of the anti-reflection film 11a at the room temperature to the embossing roller 22 at 80°C or higher, and preventing occurrence of wrinkles according to friction between the anti-reflection film 11a and the embossing roller 22.
  • a heating device for preheating may have any suitable structure.
  • heating devices are a device for blowing hot gas, a heating roller for heating in contact, an induction heating by means of microwave, and an infrared heater for heating with radiation heat.
  • the heating roller is preferable because of high efficiency in thermal conductivity in relation to the anti-reflection film 11a, a small space for installation, and a quick rise of the temperature upon the startup of the heating.
  • Examples of heating rollers are a general-use double type of the jacket roller 12, and an electric induction heat roll produced by Tokuden Co., Ltd.
  • the film temperature after the preheating is in a range of 25-220°C inclusive, preferably in a range of 25-150°C, and desirably in a range of 40-100°C.
  • a feedback control may be effected by adding a feedback control unit (not shown) for monitoring heat and for adjusting the heating temperature of the heating device.
  • the film after hot embossing has high temperature. If the film receives tension during the transport or is contacted by various rollers without sufficient drop of the temperature or without sufficient drop in the compression modulus of elasticity, then deformation or disappearance of the patterning of the film is likely to occur.
  • the forcible cooling step is added immediately after the hot embossing, to prevent such problems.
  • the features of the invention do not depend upon the existence or lack of the forcible cooling directly after the embossing, or upon any of methods of the forcible cooling.
  • Examples of forcible cooling methods are blowing of the gas fan or blower 16 with cold gas to the antiglare anti-reflection film 11b as illustrated in Fig. 1 , or heat dissipation by contact of a chill roll.
  • the cooling is so effective that the antiglare anti-reflection film 11b after being cooled has the temperature of 80°C or lower, preferably in a range of 10-80°C, and desirably in a range of 15-70°C.
  • a non-contact type of infrared thermometer can be preferably used.
  • a feedback control may be effected by adding a feedback control unit for monitoring the cooling and for adjusting the low temperature used in the cooling device.
  • a process of moisture conditioning can be used before the winding process in the present embodiment for roll embossing of the long material.
  • the moisture conditioning is a process to adjust an amount of moisture contained in the long material.
  • the feature of the invention does not depend upon the existence or lack of the process of the moisture conditioning, or on how the moisture conditioning is effected.
  • a preferred example of a humidistat for the moisture conditioning can include devices for controlling the temperature and the humidity, a fan or blower for blowing gas, or the like. According to the addition of the moisture conditioning, it is possible to adjust moisture content in the film before winding the antiglare anti-reflection film 11b in a roll form by means of thermal drying for the purpose of obtaining the moisture content at an acceptable level, or by means of blow of gas with suitable humidity.
  • the heating temperature should be determined by considering a glass transition temperature Tg or thermal deformation temperature of the transparent polymer film to be processed, or considering resin modification at the start of the resin flow.
  • embosser or the embossing roller 22 having an embossing surface mainly operable for the embossing is now described in detail.
  • the embossing roller 22 according to any of various known methods suitable for forming a pattern on a surface of metal, such as electrodischarge machining, shot machining, etching, laser machining and the like.
  • the electrodischarge machining is used in particular according to the present invention.
  • machining methods which enables forming of a highly regularized protruding and retreating pattern is unacceptable for embossers because of inevitable problem of optical interference.
  • the electrodischarge machining is preferable because of automated forming of an irregularly protruding and retreating pattern.
  • the etching and laser machining are available only on the condition of very suitably adapting a design of a resist pattern or adapting operation of a laser beam.
  • An electrodischarge machining (EDM) device 33 is a commercially available type.
  • the electrodischarge machining device 33 includes an electrodischarge machining head 34, a liquid supply tank 35 for containing machining liquid 35a, a power source 37, and a discharging electrode 38.
  • the discharging electrode 38 is positioned close to an embossing roller to be machined.
  • a pump is operated to send the machining liquid 35a through the electrodischarge machining head 34 to the discharging electrode 38, so the machining liquid 35a reaches a portion of the surface of the embossing roller 22 to be machined.
  • Opposing surfaces of the discharging electrode 38 and the embossing roller 22 are not completely smooth.
  • spark discharge because a peak of the electric field strength occurs at one certain point of one of the two surfaces at a level sufficient for local ionization of the machining liquid 35a.
  • Each single shot of the discharge forms a small crater in the surface of the embossing roller 22. Numerous craters are formed to produce an embossed pattern. Note that it is possible to add a machining liquid bath with the machining liquid 35a, and to effect the electrodischarge by dipping the embossing roller 22 and the discharging electrode 38 in the machining liquid 35a in the liquid bath.
  • the temperature of the sparks is as high as thousands of degrees centigrade or more. In small regions with occurrence of sparks, the surface material of the embossing roller 22 is likely to be melted or volatilized.
  • the machining liquid 35a consists of kerosene. Upon sparks, the kerosene is also heated locally, gasified quickly, to expand the volume. At this time, an enclosing operation occurs according to inertia of surrounding part of the kerosene. Locally high pressure occurs at the positions of the spark. However, this high pressure is effective in removing the partially fluidized material of the embossing roller 22 from its surface in a sufficiently quick manner.
  • the embossing roller 22 is driven in the width direction and driven for rotation, to continue the electrodischarge machining on the entire peripheral surface.
  • various methods can be used in addition to the continuous machining by the driving the embossing roller 22 in the width direction and in the rotational direction.
  • the discharging electrode can be supported with a movable structure.
  • a system can operate for machining for each of predetermined regular size of an area.
  • the metal for the embosser preferably should be iron alloy containing carbon and chromium, and with Vickers hardness of 500 Hv or more, and desirably with Vickers hardness equal to or more than 500 Hv and equal to or less than 1,500 Hv. Examples with such a characteristic include high carbon steel, chromium-molybdenum steel, and stainless steel. Note that in order to obtain the Vickers hardness, the Vickers test method has a step of using a 136-degree pyramidal diamond indenter which forms a square indent. Any sample is pressed by the indenter with test force. An indent is left on the sample and has a square shape on the surface.
  • a length of a diagonal of the square indent is evaluated in relation to the test force, to obtain the Vickers hardness number.
  • the preferable hardness may not be determined according to the Vickers hardness, but can be determined by other units and measuring methods at a level corresponding to the hardness described herein.
  • a nitriding process In order to harden the surface, a nitriding process, a plating process and the like can be used.
  • the nitriding process is reaction of iron alloy such as stainless steel in a vacuum space by use of nitride such as ammonium.
  • Examples of the plating processes are hard chrome plating, and nickel plating in combination of either phosphorus or phosphorus and boron, which is according to Kanigen plating or Kaniboron plating (trade name, a plating system suggested by Japan Kanigen Co., Ltd.).
  • chrome plating or nickel plating formed by simultaneous precipitation of micro particles of at least one compound selected from the following group: titanium carbide (TiC), tungsten carbide (WC), silicon carbide (SiC), boron carbide (B 4 C), and titanium boride (TiB 2 ).
  • the plating is formed on the material surface before finishing the embosser. It is further preferable to harden the plated layer thermally at temperature equal to or more than 300°C and equal to or less than 1000°C, and for at least one (1) hour after the plating operation.
  • simultaneous precipitation is precipitation of two or more solids at the same time from the material in the course of cooling.
  • a layer thickness of those hardened coatings is in a range of 5-300 microns inclusive, and preferably in a range of 20-100 microns.
  • Important parameters of the material for the embossing roller 22 are hardness, melting point and thermal conductive coefficient. Those influence an embossed surface form, embossing speed and the like due to heat created by the electrodischarge. If the hardness or melting point differs, the embossed surface form or amount will be different after heating and melting of the surface material for the embosser even though the heat quantity is equal. Furthermore, the conductive coefficient influences the speed of flow of the heat applied locally by the spark discharge. This results in changes in a protruding and retreating cycle length of the pattern or its depth.
  • surface hardening process causes changes in the irregularity in the corrugated form or arrangement of protrusions or recesses as a result of overlapping of great and small protrusions or recesses in the embosser produced by the electrodischarge machining.
  • the optical characteristics of the film provided with the embossed pattern are influenced, such as antiglare properties and dazzling appearance.
  • panel surface properties of the film is also influenced by the changes in the surface irregularity, for example granular properties, glossy or subdued properties, or the like.
  • an example of device for electrodischarge machining can be a die-sinker electrodischarge machining (EDM) device of general-purpose types, such as products of Mitsubishi Electric Corporation, Sodick Inc. and the like.
  • EDM die-sinker electrodischarge machining
  • a preferable type of electrodischarge machining device can include a CAD/CAM structure controllable at a smallest unit of one micron in the position in order to producing extremely fine protruding or retreating shapes.
  • positive electrodischarge machining methods Two types of electrodischarge machining methods are known, including positive electrodischarge and negative electrodischarge.
  • positive electrodischarge positive voltage is applied to the discharging electrode.
  • negative electrodischarge negative voltage is applied to the discharging electrode.
  • the negative electrodischarge is employed according to the invention. If the positive electrodischarge would be used, a quantity of heat generated on the surface of the workpiece is remarkably high, to produce a pattern in an unwanted irregular protruding and retreating form in spite of high speed of the machining.
  • the negative electrodischarge is advantageous in that the protruding and retreating pattern of the surface can be formed as intended initially on the workpiece in spite of quick wear of the discharging electrode.
  • the thickness of the flat electrode is 5 mm or less, preferably 3 mm or less, and desirably 2 mm or less. This is for the purpose of minimizing the local discharge for each of the points, reducing energy of the discharge, and finely forming the protruding and retreating pattern. Note that, in consideration of those ranges of the thickness, brass can be used preferably if copper should not be used with sufficient rigidity.
  • the voltage to be applied can be preferably at a high level to obtain high efficiency in emitting heat or melted particles, because a distance between the discharging electrode and a workpiece can be set great during the electrodischarge.
  • the voltage may be 100-500 V in a general use because of an upper voltage limit of a semiconductor power source, but preferably can be equal to or more than 100 V and-equal to or less than 400 V according to the invention.
  • Kerosene of any of suitable types can be used as the machining liquid 35a for use in the electrodischarge machining. Furthermore, it is possible to add micro particles of a certain compound with an average grain diameter equal to or more than 1 micron and equal to or less than 10 microns, to the kerosene at an amount equal to or more than 1 g/l and equal to or less than 20 g/l, for the purpose of providing more minute patterning. Examples of such compounds include graphite, silicon, molybdenum sulfide, alumina, silicon carbide and the like. Such micro particles may be used only as one compound, or may be used in combination of two or more compounds.
  • the shape of the embosser according to the invention can be determined by three parameters in a manner similar to the surface of the antiglare anti-reflection film 11b.
  • An average cycle length (RSm) of the protruding and retreating pattern of the surface of the embosser is in a range of 5-100 microns inclusive, preferably in a range of 5-50 microns, and desirably in a range of 5-30 microns.
  • An arithmetic average roughness (Ra) of the surface of the embosser is in a range of 0.05-20 microns inclusive, preferably in a range of 0.1-10 microns, and desirably in a range of 0.3-5 microns.
  • Distribution of angles defined by the protruding and retreating pattern is in a range of 0.5-10 degrees, and preferably in a range of 0.5-5 degrees.
  • Figs. 3-7 Various preferable paths for the polymer film in relation of the embossing and backup rollers 22 and 23 can be used in the embossing. Such paths are described by referring to Figs. 3-7 .
  • elements similar to those in Fig. 1 are designated with identical reference numerals.
  • Fig. 3 One of the best shapes for the path is illustrated in Fig. 3 .
  • the path directs the anti-reflection film 11a without determining an angular shape of entry or exit relative to the pressing direction of the embossing and backup rollers 22 and 23.
  • Fig. 4 a path is illustrated, which is effective in preheating the anti-reflection film 11a before the pressing.
  • the anti-reflection film 11a is wrapped on the embossing roller 22 before being directed toward the pressing zone.
  • Fig. 5 a path is illustrated, which is effective in previously cooling the anti-reflection film 11a before the pressing.
  • the anti-reflection film 11a is wrapped on the backup roller 23 in a cooled state before being directed toward the pressing zone.
  • a similar path can be conceived. If long heating time is desired, a path of Fig. 6 can be used, in which the film is wrapped on the embossing roller 22 on the exit side. If cooling of the film is desired immediately after the pressing, a path of Fig. 7 can be used, in which the film is wrapped on the backup roller 23 on the exit side.
  • a structure of Fig. 3 is preferable in that there is no wrapping at the entrance or the exit at the set of the embossing and backup rollers 22 and 23.
  • a structure of Fig. 4 is more preferable in that there is wrapping on the embossing roller 22 at the entrance, but no wrapping on the embossing roller 22 or the backup roller 23 at the exit.
  • a structure of Fig. 1 is a combination of those of Figs. 4 and 7 , is the most preferable in that there is wrapping on the embossing roller 22 at the entrance, but wrapping on the backup roller 23 at the exit while the backup roller 23 is kept cool.
  • a wrap angle on at least one of the embossing roller 22 and 23 is suitably determined according to characteristics of the polymer film and the embossing and backup rollers 22 and 23, and the transporting conditions.
  • the polymer film characteristics include the thickness, resiliency, thermal conductivity and surface roughness.
  • the roller characteristics include the roller diameter, temperature, thermal conductivity and surface roughness of the embossing and backup rollers 22 and 23.
  • the transporting conditions include transporting speed and tension.
  • the antiglare anti-reflection film 11b includes layers arranged in an upward sequence of a transparent support 41, a primer layer 42, a hard coat layer 43, and a low refractive index layer 44.
  • layers are arranged in an upward sequence of the transparent support 41, the primer layer 42, the hard coat layer 43, a high refractive index layer 50, and the low refractive index layer 44.
  • layers are arranged in an upward sequence of the transparent support 41, the primer layer 42, the hard coat layer 43, a middle refractive index layer 55, the high refractive index layer 50, and the low refractive index layer 44.
  • a combined layer including the transparent support 41, the primer layer 42 and the hard coat layer 43 of Figs. 8-10 corresponds to the support layer group 31 of Fig. 1 .
  • a single layer or plural layers constituted by one or more of the low, high and middle refractive index layers 44, 50 and 55 correspond to the anti-reflection layer 32.
  • the deformation due to the embossing occurs in a concentrated manner at the primer layer 42 in the antiglare anti-reflection film 11b having any of such structures.
  • the hard coat layer 43 and the anti-reflection layer 32 have an unchanged thickness. In the support, there is a small deformation.
  • the antiglare anti-reflection film 11b it is preferable according to the invention for the antiglare anti-reflection film 11b to satisfy a condition that an optical thickness of each of the middle, high and low refractive index layers 55, 50 and 44 is equal to approximately n ⁇ /4, or is equal to a multiple of this and an integer, where ⁇ is a designed wavelength.
  • the optical thickness consists of a product (n x d), where n is a refractive index, and d is a film thickness. This feature is suggested in JP-A 59-050401 .
  • n1, n2 and n3 herein represent the respective refractive indexes of the middle, high and low refractive index layers 55, 50 and 44.
  • Symbols d1, d2 and d3 (nm) represent the respective thickness of the middle, high and low refractive index layers 55, 50 and 44.
  • the transparent support 41 is formed from triacetyl cellulose (cellulose triacetate, TAC, refractive index: 1.49) or the like, and has the refractive index in the range of 1.45-1.55, then it is necessary that the refractive index n1 should be 1.60-1.65, n2 should be 1.8.5-1.95, and n3 should be 1.35-1.45.
  • the transparent support 41 is formed from polyethylene terephthalate (PET, refractive index: 1.66) or the like, and has the refractive index in the range of 1.55-1.65, then it is necessary that the refractive index n1 should be 1.65-1.75, n2 should be 1.85-2.05, and n3 should be 1.35-1.45.
  • PET polyethylene terephthalate
  • n1 should be 1.65-1.75
  • n2 should be 1.85-2.05
  • n3 should be 1.35-1.45.
  • the present invention may provide the anti-reflection layer 32 in a multi-layer form constructed of three or more layers with effects of the equivalent layer.
  • polymer film or plastic film As the transparent support 41.
  • polymer or plastic materials for this include the following. cellulose esters (for example, triacetyl cellulose, diacetyl cellulose, propionyl cellulose, butyryl cellulose, acetylpropionyl cellulose, nitro cellulose); polyamide; polycarbonate; polyesters (for example, polyethylene terephthalate, polyethylene naphthalate, poly-1,4-cyclohexane dimethylene terephthalate, polyethylene-1,2-diphenoxyethane-4,4'-dicarboxylate, polybutylene terephthalate); polystyrenes (for example, syndiotactic polystyrene); polyolefins (for example, polypropylene, polyethylene, polymethylpentene); polysulfones; polyethersulfones; polyarylate; polyetherimide; polymethylmethacrylate; and polyether keto
  • the antiglare anti-reflection film 11b can be used as a protection film for constructing one surface of a polarizing filter which is provided in an LCD, an organic electro luminescence (EL) display and the like.
  • EL organic electro luminescence
  • a preferable method of producing the triacetyl cellulose is taught in JIII Journal Of Technical Disclosure Monthly Vol. 2001-1745 .
  • the antiglare anti-reflection film 11b is attached on a glass plate so as to use for the flat CRT and the PDP, then it is preferable to form the transparent support of polyethylene terephthalate or polyethylene naphthalate.
  • the transparent support 41 has optical transmittance of 80% or higher, and preferably 86% or higher.
  • the transparent support 41 has haze of 2.0% or less, and preferably 1.0% or less.
  • the transparent support 41 has a refractive index in a preferable range of 1.4-1.7 inclusive.
  • the middle and high refractive index layers 55 and 50 are formed by coating application, drying and hardening or curing.
  • a coating composition is constituted by micro particles having a high refractive index, thermoset monomers or monomers curable with ionizing radiation, initiator, and solvent.
  • the drying step the solvent is dried.
  • the hardening or curing step the composition is hardened or cured with heat and/or ionizing radiation.
  • micro particles having a high refractive index are preferably inorganic, and can be at least one of the oxides of metals, Ti, Zr, In, Zn, Sn, and Sb.
  • the middle and high refractive index layers are remarkably excellent in scratch resistance and adhesion as compared with a polymer layer of a high refractive index that is formed by casting and drying a polymer solution.
  • the coating composition In order to keep stability of dispersion and strength of a formed layer after hardening or curing, it is preferable according to JP-A 11-153703 and U.S.P. No. 6,210,858 for the coating composition to have polyfunctional (meth)acrylate monomer, and (meth)acrylate dispersant containing an anionic group.
  • the average diameter of the above-described inorganic micro particles is preferably more than 1 nm and less than 100 nm according to the measurement of the coal tar counter method. If the diameter should be equal to or less than 1 nm, micro particles are unacceptably small and stability in the dispersion is too low due to too large an specific surface area. If the diameter should be equal to or more than 100 nm, particles are unacceptably large and scattering of visible light occurs due to a difference in the refractive index from the binder. Note that the high and middle refractive index layers 50 and 55 have haze of 3% or less, and preferably 1% or less.
  • the materials are a mixture of acrylic resin or epoxy resin and inorganic materials or micro particle thereof, whose refractive index is low.
  • fluorine organic materials and silicone organic materials there are fluorine organic materials and silicone organic materials. Among those, a particularly preferable example is fluorine containing compounds which are can be hardened with heat or ionizing radiation.
  • Kinetic friction of the curing materials for the low refractive index layer 44 is preferably in the range of 0.02-0.18, particularly of 0.03-0.15.
  • the front surface of the antiglare anti-reflection film 11b are likely to be damaged by rubbing.
  • Contact angle of the materials to pure water is preferably in the range of 90-130 degrees, particularly of 100-120 degrees.
  • the contact angle to pure water is too small, then the finger print and oil are likely to adhere easily. Therefore, stainproofness or antifouling is so small that it is hard to protect from pollution.
  • the low refractive index layer 44 may contain fillers, such as silica particles and the like, in order to have greater strength.
  • the fluorine containing compounds for the low refractive index layer 44 are, for example, silane containing perfluoroalkyl group, such as heptadecafluoro-1,1,2,2-tetrahydrodecyl)triethoxysilane, and the like, and also further fluorine containing polymers that are composed of fluorine containing monomer and crosslinkable elements.
  • fluorine-containing monomers examples include fluoro olefins, such as fluoro ethylene., vinylidene fluoride, tetrafluoro ethylene, hexafluoro ethylene, hexafluoro propylene, perfluoro-2,2-dimethyl-1,3-dioxol, and the like; partially or completely fluorinated alkyl ester derivatives of (meth)acrylic acid, such as BISCOAT 6FM (trade name, produced by Osaka Organic Chemical Industry Ltd.), M-2020 (trade name, produced by Daikin Industries, Ltd.) and the like; and completely or partially fluorinated vinylethers.
  • fluoro olefins such as fluoro ethylene., vinylidene fluoride, tetrafluoro ethylene, hexafluoro ethylene, hexafluoro propylene, perfluoro-2,2-dimethyl-1,3-dioxol, and the like
  • the units for performing curing reaction are obtained by polymerization of monomers.
  • Monomers may have a functional group for self-curing properties, and may be glycidyl (meth)acrylate, glycidyl vinylether, and the like.
  • monomers for curing reaction may have carboxyl group, hydroxyl group, amino group, sulfo group, and may be (meth)acrylic acid, methylol (meth)acrylate, hydroxyalkyl (meth)acrylate, allyl acrylate, hydroxyethyl vinylether, hydroxybutyl vinylether, maleic acid, crotonic acid, and the like.
  • polymerization of the units is made for the units to have a group for curing reaction, for example, such as (meth)acryloyl group and the like.
  • An example for use in the polymerization is acrylic chloride for reaction to hydroxyl group.
  • monomers containing no fluorine can be polymerized by copolymerization with fluorine containing monomers and units for providing curing reaction in view of solubility into a solvent and transparency of formed layers. Any suitable monomers can be used. Examples of the monomers containing no fluorine are the following.
  • olefins ethylene, propylene, isoprene, vinylchloride, vinylidene chloride, and the like
  • esters of acrylic acid methyl acrylate, ethyl acrylate, 2-ethylhexyl acrylate
  • esters of methacrylic acid methyl methacrylate, ethyl methacrylate, butyl methacrylate, ethylene glycol dimethacrylate, and the like
  • styrene derivatives styrene, divinylbenzene, vinyltoluene, alpha-methylstyrene, and the like
  • vinyl ethers methyl vinylether, ethyl vinylether, cyclohexyl vinylether, and the like
  • vinylesters vinyl acetate, vinyl propionate, vinyl cinnamate, and the like
  • acrylamides N-tert-butyl acrylamide, N-cyclohexyl acrylamide, and the like
  • JP-A 8-092323 , 10-025388 , 10-147739 , and 2000-017028 discloses curing agents or hardening agents, which may be added to any of the above-described polymers.
  • the use of the curing agents is necessary typically if groups for curing of the polymers are not reactive solely for curing, such groups being hydroxide group, carboxylic group, and the like.
  • Examples of curing agents are polyisocianates, aminoplast, polybasic acids, anhydrides thereof, and the like.
  • the curing agent can be added if suitable, such as polyfunctional (meth)acrylate compound, polyfunctional epoxy compounds and the like.
  • the fluorine containing polymers preferred for the low refractive index layer 44 are random copolymer of perfluoro olefin and vinylethers or vinylesters.
  • such polymers have the groups having a crosslinkable property, namely groups having a property of radical reactions, such as (meth)acryloyl groups, and groups having property of ring opening polymerization, such as epoxy group, oxetanyl groups.
  • the polymeric units having the crosslinkable group are contained in the range of 5-70 mol% in the total polymeric units of the polymer, especially of 30-60 mol%.
  • the fluorine containing polymer has polysiloxane structure in order to have stainproof or antifouling properties.
  • Any suitable method for constructing the polysiloxane structure can be used.
  • JP-A 11-189621 , 11-228631 , and 2000-313709 teach the use of silicone macroazo initiator to combine component for polysiloxane block copolymerization with the polymers.
  • JP-A 2-251555 and 2-308806 teach the use of silicone macromer to combine polysiloxane graft polymerization with the polymer.
  • a ratio of polysiloxane to the polymer is in a range of 0.5-10 wt.%, and preferably in a range of 1-5 wt.%.
  • a reactive group containing polysiloxane to the polymer.
  • this polysiloxane are KF-100T, X-22-169AS, KF-102, X-22-37011E, X-22-164B, X-22-5002, X-22-173B, X-22-174D, X-22-167B, X-22-161AS (trade names, produced by Shinetsu Chemical Co., Ltd.), AK-5, AK-30, AK-32 (trade names, produced by Toagosei Co., Ltd.), SILAPLANE FM0275, SILAPLANE FM0721 (trade names, produced by Chisso Corporation), and the like. It is preferable that such polysiloxane is contained preferably in the range of 0.5-10 wt.% inclusive for the entirety of the solid content of the low refractive index layer 44, and especially in the range of 1-5 wt.%.
  • Preferable materials for the primer layer 42 are (meth)acrylic polymers, styrene type polymers, and polyesters. Any suitable monomers can be used for producing such polymers. Examples of monomers for the (meth)acrylic polymers include (meth)acrylic acid, methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, (metha)allyl acrylate, (metha)urethane acrylate, 2-hydroxy ethyl (meth)acrylate, and the like. Monomers for the styrene type polymers include styrene, divinyl benzene, vinyl toluene, alpha-methylstyrene, and the like.
  • Monomers for the polyesters include condensation products of a selected one of ethylene glycol, propylene glycol, diethylene glycol, and other alcohols, and a selected one of phthalic acid, phthalic anhydride, terephthalic acid, maleic acid, maleic anhydride, and other carboxylic acids and anhydrides.
  • a molecular weight (or polymerization degree) of the polymer is set according to desired glass transition temperature Tg of the polymer.
  • the glass transition temperature of the polymer contained in the primer layer 42, and the glass transition temperature of the transparent support 41 are preferably lower than the temperature at which embossing is carried out, and can be desirably in the range of 60-130°C.
  • the thickness of the primer layer 42 is preferably in a range of 0.1-50 microns, especially in a range of 0.1-20 microns.
  • the primer layer 42 has higher compression modulus of elasticity in a room temperature than the transparent support 41.
  • the compression modulus of elasticity of the primer layer 42 is preferably in a range of 3-8 GPa inclusive, particularly in a range of 4-7 GPa.
  • the difference of the compression modulus of elasticity between the transparent support 41 and the primer layer 42 is preferably in a range of 0.1-5 GPa inclusive, particularly in a range of 0.2-4 GPa.
  • the compression modulus of elasticity of the primer layer 42 at the embossing temperature T°C should be preferably lower than that of the hard coat layer 43.
  • the difference of the compression modulus of elasticity at the embossing temperature T°C between the primer layer 42 and the hard coat layer 43 is in the range of 0.1-8 Gpa inclusive, and preferably 0.5-7.5 Gpa.
  • the primer layer 42 is effective in reducing brightness unevenness or dazzling properties, and raising the surface hardness in the liquid crystal display of the high definition mode.
  • the primer layer 42 may be constructed by a combination of the above-mentioned polymers and other polymers or particles. Also, the primer layer 42 may have a crosslinking structure.
  • the other polymers and particles include gelatin; polyvinyl alcohol; polyalginic acid and salts thereof; cellulose esters, such as triacetyl cellulose, diacetyl cellulose, propionyl cellulose, butyryl cellulose, acetylpropionyl cellulose, nitrocellulose, hydroxyethyl cellulose, hydroxypropyl cellulose; polyether ketones; polyhydric alcohols; silica particles; and alumina particles.
  • Monomers used for constructing the cross-linking structure can preferably have two or more ethylenically unsaturated groups.
  • examples of such monomers include esters of a polyhydric alcohol and a (meth)acrylic acid, such as: ethylene glycol di(meth)acrylate, 1,4-cyclohexane diacrylate, penta erythritol tetra(meth)acrylate, penta erythritol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimethylolethane tri(meth)acrylate, dipenta erythritol tetra(meth)acrylate, dipenta erythritol penta(meth)acrylate, penta erythritol hexa(meth)acrylate, 1,2,3-cyclohexane tetramethacrylate, polyurethane polyacrylate, polyester polyacrylate, and the like.
  • further preferred monomers include vinylbenzene, and derivatives thereof, such as 1,4-divinylbenzene, 4-vinylbenzoic acid-2-acryloyl ethylester, 1,4-divinylcyclohexanone, and the like; vinylsulfones, such as divinylsulfone, and the like; acrylamides, such as methylenebisacrylamide and the like; and methacrylamide.
  • the crosslinking structure may be constructed by crosslinkable functional groups.
  • crosslinkable functional groups are isocyanate groups, epoxy groups, adilidine groups, oxazoline groups, aldehyde groups, carbonyl groups, and the like.
  • monomers for constructing the crosslinking structure are hydrazine anoacrylate derivatives, melamine, etherized methylol, esters, urethanes, and the like.
  • block isocyanate groups for example, may be used because it can be decomposed to smaller crosslinkable groups. Other compounds may be used. Note that compounds which will have crosslinking property as a result of decomposition of compounds may be used.
  • the coating solution is prepared, in which polymerization initiators and polymers and/or monomers are dissolved in a solvent. It is preferable that a polymerization reaction (and cross-linking if required) is made in the solution after the coating operation.
  • polymerization initiators are benzophenone types and other hydrogen abstraction types, and a radical cleavage types, such as acetophenone type, triazine type and the like. Among those, a single compound may be used. Also, a combination of two or more may be used and added to coating solution with monomers.
  • the primer layer 42 has a characteristic for strengthening adhesion between the transparent support 41 and upper layers overlaid on the transparent support 41.
  • monomers can be preferably included in the primer layer 42.
  • a proportion in the weight of the polymer to the monomer in the primer layer 42 is preferably in a range from 75/25 to 25/75, and desirably in a range from 65/35 to 35/65.
  • the hard coat layer 43 is effective in maintaining scratch resistance.
  • the hard coat layer 43 also reinforces the transparent support 41 and layers overlaid thereon.
  • the hard coat layer 43 is formed of acrylic polymer, urethane type polymers, epoxy type polymers and silica type compounds. Pigments may be added to the coating solution for the hard coat layer 43.
  • the coating solution for the hard coat layer 43 contains polymers having main chain of saturated hydrocarbons or polyethers, particularly those having main chain of saturated hydrocarbons. Further, it is preferable that the polymers having cross-linking structure are obtained by polymerization of monomers having ethylenically unsaturated groups. It is especially preferable that the monomers have two or more ethylenically unsaturated groups.
  • Examples of the monomers having two or more ethylenically unsaturated groups include esters of a polyhydric alcohol and a (meth)acrylic acid, such as ethylene glycol di(meth)acrylate, 1,4-cyclohexane diacrylate, penta erythritol tetra(meth)acrylate, penta erythritol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimethylolethane tri(meth)acrylate, dipenta erythritol tetra(meth)acrylate, dipenta erythritol penta(meth)acrylate, penta erythritol hexa(meth)acrylate, 1,2,3-cyclohexane tetramethacrylate, polyurethane polyacrylate, polyester polyacrylate, and the like.
  • the monomers include vinylbenzene, and derivatives thereof (1,4-divinylbenzene, 4-vinylbenzoic acid-2-acryloyl ethylester, 1,4-divinylcyclohexanone and the like), vinylsulfone (divinylsulfone and the like), acrylamide (methylene-bisacrylamide and the like), and methacrylamide.
  • the crosslinking structure may be constructed by crosslinkable functional groups.
  • crosslinkable functional groups are isocyanate groups, epoxy groups, adilidine groups, oxazoline groups, aldehyde groups, carbonyl groups, and the like.
  • monomers for constructing the crosslinking structure are hydrazine anoacrylate derivatives, melamine, etherized methylol, esters, urethanes, and the like.
  • block isocyanate groups for example, may be used because it can be decomposed to smaller crosslinkable groups. Other compounds may be used. Note that compounds which will have crosslinking property as a result of decomposition of compounds may be used.
  • the coating solution is prepared, in which polymerization initiators and monomers are dissolved in a solvent. It is preferable that a polymerization reaction (and cross-linking if required) is made in the solution after the coating operation.
  • polymerization initiators are benzophenone types and other hydrogen abstraction types, and a radical cleavage types, such as acetophenone type, triazine type and the like. Among those, a single compound may be used. Also, a combination of two or more may be used and added to coating solution with monomers.
  • polymers for example, polymethylmethacrylate, polymethylacrylate, diacetyl cellulose, triacetyl cellulose, nitrocellulose, polyester, alkyd polymers, and the like.
  • the hard coat layer 43 has thickness in the range of 0.5-5 microns, preferably of 0.5-3 microns.
  • the thickness of the hard coat layer 43 has a large influence on the suitability to the embossing. Namely, when the thickness is too large, suitability of the anti-reflection film to embossing becomes lower. Even when the anti-reflection film is embossed, the surface cannot have as much unevenness as has been expected.
  • the small thickness of the hard coat layer 43 is compensated for with the primer layer 42 having high surface elasticity.
  • the antiglare anti-reflection film 11b may be provided with a moistureproof layer, antistatic layer and a protective layer.
  • Each layer in the anti-reflection film 11a can be formed in the dip coating method, air knife coating method, curtain coating method, roller coating method, wire coating method, gravure coating method, micro gravure coating method, extrusion coating method as disclosed in U.S.P. No. 2,681,294 , and the like.
  • the methods of micro gravure coating and gravure coating are preferable: In view of uniformity of thickness of the layer in a widthwise direction, the gravure coating method is preferable in particular.
  • two or more coatings may be applied simultaneously to form the plural layers on the transparent support 41. The methods of simultaneous application of the coating solutions are described in U.S.P. Nos. 2,761,791 , 2,941,898 , 3,508,947 , 3,526,528 , and an article in Yuji Harazaki, Coating Technology, Asakura Shoten Publishing Co., Ltd. (1973), page 253 .
  • the transparent support 41 after the anti-reflection layer 32 is formed thereon, is dipped for at least one time in an alkali solution to make saponification of the back surface.
  • the alkali solution is applied on a back surface of the transparent support 41 reverse to the anti-reflection layer 32. Then the layers are heated, and washed with water and/or neutralized, to saponify only the back surface of the film support 41.
  • the first of those methods has a merit in that saponification is made in the same process as that of the triacetyl cellulose film which is popularly used.
  • a problem of the first method is that each layer in the produced antiglare anti-reflection film 11b becomes weaker, because the saponification is made also in the anti-reflection layer 32. When the solution for saponification remains on the surface, then the surface becomes unclean.
  • the second of the methods is preferable to the first method, although it has not been a general-purpose type.
  • the anti-reflection film 11a produced according to the present invention can be used preferably in any of transmission type, reflection type, or semi-transmission type, as the protective film on the one surface of a polarizer. Any of various modes can be used, including Twisted nematic (TN) mode, Super twisted nematic (STN) mode, Vertical alignment (VA) mode, In-plane switching (IPS) mode, Optically compensated bend cell (OCB) mode, and the like. Furthermore, the antiglare anti-reflection film 11b is often used in combination with optical compensation films, an optical retardation filter, and the like. Examples of optical compensation films include a wide view film for enlarging a view angle of the liquid crystal display panel.
  • the polarizer is used in combination with a marketed brightness enhancement film (polarizing separation film having a selective layer of polarized light, for example, D-BEF (trade name) produced by Sumitomo 3M Ltd.).
  • a marketed brightness enhancement film polarizing separation film having a selective layer of polarized light, for example, D-BEF (trade name) produced by Sumitomo 3M Ltd.
  • the anti-reflection film 11a can be combined with a ⁇ /4 plate to reduce reflection light from a surface or inside of an organic electro luminescence (EL) display device, because of operation for protection.
  • the anti-reflection layer of the invention may be formed on a transparent support film of polyethylene terephthalate (PET), polyethylene naphthalate (PEN) or the like, for use in an image display device such as a plasma display panel (PDP), cathode ray tube (CRT) or the like.
  • titanium dioxide For dispersion of titanium dioxide, the following materials were mixed: 300 parts by weight of extreme micro particles of titanium dioxide (TTO-55B, trade name, produced by Ishihara Sangyo Co., Ltd.), 10 parts by weight of dimethylamino ethyl acrylate (DMAEA, trade name, produced by Kohjin Co., Ltd.), 60 parts by weight of cationic dispersant containing phosphate group (KAYARAD PM-21, trade name, produced by Nippon Kayaku Co., Ltd.), and 630 parts by weight of cyclohexanone. They were dispersed with a sand grinder to obtain the dispersion C of titanium dioxide having an average grain diameter of 42 nm according to measurement by the coal tar method.
  • TTO-55B extreme micro particles of titanium dioxide
  • DAEA dimethylamino ethyl acrylate
  • KAYARAD PM-21 trade name, produced by Nippon Kayaku Co., Ltd.
  • titanium dioxide For dispersion of titanium dioxide, the following materials were mixed: 250 grams of extreme micro particles of titanium dioxide (TTO-55B, trade name, produced by Ishihara Sangyo Co., Ltd.), 37.5 grams of anionic polymer indicated in Fig. 11 and containing crosslinkable group, 2.5 grams of cationic monomer (DMAEA, trade name, produced by Kohjin Co., Ltd.), and 710 grams of cyclohexanone. They were dispersed with a mill (DYNO-Mill, trade name, produced by WA Bachofen AG), to obtain the dispersion D of titanium dioxide having an average diameter of 65 nm per unit weight.
  • TTO-55B extreme micro particles of titanium dioxide
  • anionic polymer indicated in Fig. 11 and containing crosslinkable group 2.5 grams of cationic monomer (DMAEA, trade name, produced by Kohjin Co., Ltd.)
  • DAEA cationic monomer
  • cyclohexanone 710 grams
  • a fluorine containing copolymer material PF1 in Fig. 12 was previously produced, and then dissolved in methyisobutylketone to obtain a copolymer solution containing 18.4 wt.% of the fluorine containing copolymer PF1 in Fig. 12 . Further, 1.7 parts by weight of the photo polymerization initiator IRGACURE 907 (trade name, produced by Ciba Geigy Corp.) and 1.7 parts by weight of a reactive silicone X-22-164 (trade names, produced by Shinetsu Chemical Co., Ltd.) were added to 193 parts by weight of cyclohexanone and 623 parts by weight of methylethylketone.
  • IRGACURE 907 trade name, produced by Ciba Geigy Corp.
  • a reactive silicone X-22-164 trade names, produced by Shinetsu Chemical Co., Ltd.
  • the copolymer solution having the copolymer PF1 was added to the mixture. Thereafter, the solution was agitated and filtrated by the polypropylene filter (PPE-03) having porosities. The filter had a hole diameter of 3 microns. Thus, the filtrated solution was obtained as the coating solution E for the low refractive index layer 44.
  • PPE-03 polypropylene filter
  • the pressure in the autoclave was 5.4x10 5 Pa. This temperature was maintained continuously to perform chemical reaction for eight (8) hours. When the pressure became 3.2x10 5 Pa, the heating of the content was stopped and it was left and cooled by natural cooling. When the internal temperature drops and becomes equal to the room temperature, remaining monomers without reaction are removed. The reaction solution was taken out by opening the autoclave.
  • the reaction solution of polymer was added to an excess amount of hexane, and the solvent thereof was removed by decantation to obtain a precipitated polymer.
  • This polymer was dissolved in a small amount of ethyl acetate, and the precipitation of the polymer was further made twice, completely to remove all the remaining monomers. Thereafter, the polymer was dried. The weight thereof was 28 grams. Then the dried polymer at 20 grams was dissolved to 100 ml of N,N-dimethyl acetamide. This solution was cooled with ice. In the cooled state, acrylic acid chloride of 11.4 grams was dropped down to the produced solution, and the produced solution was agitated at the room temperature for 10 hours.
  • the fluorine containing copolymer PF1 had a number-average molecular weight of 31,000, and a refractive index of 1.421.
  • a fluorine containing copolymer material PF2 depicted in Fig. 13 was prepared by the method which will be described later.
  • the fluorine containing copolymer PF2 was dissolved at the ratio of 18.4 wt.% in methylisobutylketone to obtain a copolymer solution, and agitated.
  • 3.4 parts by weight of the photo polymerization initiator (UVI16990, trade name, produced by Union Carbide Corporation) and 3.4 parts by weight of the reactive silicone (X-22-169AS, trade name, produced by Shinetsu Chemical Co., Ltd.) were added to 193 parts by weight of cyclohexanone and 623 parts by weight of methylethylketone.
  • the reaction solution was taken out by opening the autoclave.
  • the polymer solution was added to an excess amount of hexane, and the solvent thereof was removed by decantation to obtain a precipitated polymer.
  • This polymer was dissolved in a small amount of ethyl acetate, and the precipitation of the polymer was further made twice, completely to remove all the remaining monomers.
  • the polymer was dried, to obtain fluorine containing copolymer PF2 of 21 grams.
  • the fluorine containing copolymer PF2 had a number-average molecular weight of 28,000, and a refractive index of 1.424.
  • a roll core of S45C steel after being hardened thermally had a diameter of 20 cm and a width of 12 cm, and was subjected to electrodischarge machining, so an embossing roller 22A was obtained, and had an arithmetic average roughness (Ra) of 0.3 micron, and an average cycle length of a protruding and retreating pattern (RSm) of 25 microns.
  • Kerosene liquid was prepared and provided with 3 g/l of graphite particles having an average grain diameter of 1.5 microns.
  • a die-sinker electrodischarge machining (EDM) device EA8 (trade name, produced by Mitsubishi Electric Corporation) was used.
  • the roll core was subjected in the kerosene liquid to electrodischarge machining with a capacitor in a negative state at a copper electrode having a thickness of 0.5 mm and at a voltage of 350 V.
  • the surface of the embossing roller 22A had Vickers hardness of 300 Hv.
  • a roll core of S45C steel after being hardened thermally had a diameter of 20 cm and a width of 12 cm, and was subjected to plating to form a hard chrome plating layer on the roll core at a thickness of 50 microns. Then the roll core was subjected to electrodischarge machining the same as that for the embossing roller 22A.
  • An embossing roller 22B was obtained, and had an arithmetic average roughness (Ra) of 0.6 micron, an average cycle length of a protruding and retreating pattern (RSm) of 13 microns, and a surface hardness of 900 Hv.
  • a roll core of S45C steel after being hardened thermally had a diameter of 20 cm and a width of 12 cm, and was subjected to plating according to Kanigen plating (trade name, a plating system suggested by Japan Kanigen Co., Ltd.), so a plated layer was formed on the roll core at a thickness of 30 microns.
  • Kerosene liquid was prepared and provided with 3 g/l of graphite particles having an average grain diameter of 1.5 microns.
  • the roll core was subjected in the kerosene liquid to electrodischarge machining with a capacitor in a negative state at a brass electrode having a thickness of 2 mm and at a voltage of 350 V.
  • an embossing roller 22C was obtained, and had an arithmetic average roughness (Ra) of 0.4 micron, an average cycle length of a protruding and retreating pattern (RSm) of 20 microns, and a surface hardness of 500 Hv.
  • a roll core of S45C steel after being hardened thermally had a diameter of 20 cm and a width of 12 cm, and was subjected to plating according to Kanigen plating (trade name, a plating system suggested by Japan Kanigen Co., Ltd.).
  • Kanigen plating trade name, a plating system suggested by Japan Kanigen Co., Ltd.
  • a plated layer was formed on the roll core at a thickness of 30 microns, before the roll core was thermally treated at 400°C.
  • Kerosene liquid was prepared and provided with 3 g/l of graphite particles having an average grain diameter of 1.5 microns.
  • the roll core was subjected in the kerosene liquid to electrodischarge machining with a capacitor in a negative state at a brass electrode having a thickness of 2 mm and at a voltage of 350 V.
  • an embossing roller 22D was obtained, and had an arithmetic average roughness (Ra) of 0.4 micron, an average cycle length of a protruding and retreating pattern (RSm) of 18 microns, and a surface hardness of 900 Hv.
  • a roll core of S45C steel after being hardened thermally had a diameter of 20 cm and a width of 12 cm, and was subjected to plating named Kaniboron plating (trade name, a plating system suggested by Japan Kanigen Co., Ltd.).
  • Kaniboron plating trade name, a plating system suggested by Japan Kanigen Co., Ltd.
  • a plated layer was formed on the roll core at a thickness of 30 microns, before the roll core was thermally treated at 400°C.
  • Kerosene liquid was prepared and provided with 3 g/l of graphite particles having an average grain diameter of 1.5 microns.
  • the roll core was subjected in the kerosene liquid to electrodischarge machining with a capacitor in a negative state at a brass electrode having a thickness of 2 mm and at a voltage of 350 V.
  • an embossing roller 22E was obtained, and had an arithmetic average roughness (Ra) of 0.5 micron, an average cycle length of a protruding and retreating pattern (RSm) of 15 microns, and a surface hardness of 950 Hv.
  • a roll core of S45C steel after being hardened thermally had a diameter of 20 cm and a width of 12 cm, and was subjected to plating to form a hard chrome plating layer with a thickness of 50 microns.
  • Conditions for the electrodischarge machining were basically the same as those for the embossing roller 22B, but with a difference in that an electrode of brass was used, and that electrodischarge was effected with pulses at a frequency of 2 ⁇ sec by periodical switching of a power source.
  • an embossing roller 22F was obtained, and had an arithmetic average roughness (Ra) of 0.3 micron, an average cycle length of a protruding and retreating pattern (RSm) of 35 microns, and a surface hardness of 900 Hv.
  • a roll core of S45C steel after being hardened thermally had a diameter of 20 cm and a width of 12 cm, and was subjected to plating to form a hard chrome plating layer with a thickness of 50 microns.
  • Conditions for the electrodischarge machining were basically the same as those for the embossing roller 22B, but with a difference in that an electrode of brass was used, and that electrodischarge was effected in a positive state.
  • an embossing roller 22G was obtained, and had an arithmetic average roughness (Ra) of 0.8 micron, an average cycle length of a protruding and retreating pattern (RSm) of 42 microns, and a surface hardness of 900 Hv.
  • a roll core of S45C steel after being hardened thermally had a diameter of 20 cm and a width of 12 cm, and was subjected to plating to form a hard chrome plating layer with a thickness of 50 microns.
  • Conditions for the electrodischarge machining were basically the same as those for the embossing roller 22B, but with a difference in that an electrode of brass was used and that no graphite particles were added.
  • an embossing roller 22H was obtained, and had an arithmetic average roughness (Ra) of 0.4 micron, an average cycle length of a protruding and retreating pattern (RSm) of 23 microns, and a surface hardness of 900 Hv.
  • a roll core of S45C steel after being hardened thermally had a diameter of 20 cm and a width of 12 cm, and was subjected to plating to form a hard chrome plating layer with a thickness of 50 microns.
  • Conditions for the electrodischarge machining were basically the same as those for the embossing roller 22B, but with a difference in that an electrode of brass was used and that silicon particles with an average grain diameter of 7 microns were added in place of graphite particles.
  • an embossing roller 22I was obtained, and had an arithmetic average roughness (Ra) of 0.6 micron, an average cycle length of a protruding and retreating pattern (RSm) of 15 microns, and a surface hardness of 900 Hv.
  • a roll core of S45C steel after being hardened thermally had a diameter of 20 cm and a width of 12 cm, and was subjected to plating to form a hard chrome plating layer with a thickness of 50 microns.
  • Conditions for the electrodischarge machining were basically the same as those for the embossing roller 22B, but with a difference in that an electrode of brass was used, and that the voltage was as low as 70 V.
  • an embossing roller 22J was obtained, and had an arithmetic average roughness (Ra) of 0.1 micron, an average cycle length of a protruding and retreating pattern (RSm) of 12 microns, and a surface hardness of 900 Hv.
  • Triacetyl cellulose film TAC-TD80U (trade name, produced by Fuji Photo Film Co., Ltd.) had a thickness of 80 microns.
  • One surface of the triacetyl cellulose film was embossed by the one-surface embossing calender device 13 (produced by Yuri Roll Co., Ltd.) including the embossing roller 22H, to obtain Film Sample 1 of the antiglare anti-reflection film 11b.
  • the backup roller 23 without machining for an embosser was combined with the embossing roller 22H.
  • the linear contact pressure was 5.00x10 3 N/cm.
  • the temperature of preheating was room temperature.
  • the temperature of the embossing roller 22 was 120°C.
  • the temperature of the backup roller 23 was room temperature. Transporting speed was 1 m/min.
  • the embossing roller 22H was exactly as described above.
  • Polycarbonate film (PURE ACE, trade name, produced by Teijin Co., Ltd.) was prepared, and was 100 microns thick. One surface of the polycarbonate film was embossed in the same manner as Example 1, No. 1, to obtain Film Sample 2.
  • Triacetyl cellulose film TAC-TD80U (trade name, produced by Fuji Photo Film Co., Ltd.) had a thickness of 80 microns, and was coated with the above-described coating solution for the hard coat layer 43 by a gravure coater, and was dried for two (2) minutes at 100°C. Then ultraviolet rays were applied to the coating solution to cure the same, to form the hard coat layer 43, which had a refractive index of 1.51 and a thickness of 7 microns.
  • the solution for the middle refractive index layer was applied to form a coating by use of a gravure coater, and dried at 100°C, and cured by applying ultraviolet rays.
  • the middle refractive index layer 55 was produced, and had a refractive index of 1.63 and a thickness of 67 nm.
  • the solution for the high refractive index layer was applied to form a coating by use of a gravure coater, and dried at 100°C, and cured by applying ultraviolet rays.
  • the high refractive index layer 50 was produced, and had a refractive index of 1.90 and a thickness of 107 nm.
  • the solution E for the low refractive index layer was applied to form a coating by use of a gravure coater, and dried at 120°C for eight (8) minutes, then cured by application of ultraviolet rays.
  • the low refractive index layer 44 was produced, and had a refractive index of 1.43 and a thickness of 86 nm. Thus, the anti-reflection film 11a was obtained.
  • the coated surface of the anti-reflection film 11a was embossed by the one-surface embossing calender device 13 (produced by Yuri Roll Co., Ltd.) including the embossing roller 22H, to obtain Sample 4 of the antiglare anti-reflection film 11b.
  • the backup roller 23 without machining for an embosser was combined with the embossing roller 22H.
  • the linear contact pressure was 5.00x10 3 N/cm.
  • the temperature of preheating was 90°C.
  • the temperature of the embossing roller 22 was 160°C.
  • the temperature of the backup roller 23 was a room temperature. Transporting speed was 1 m/min.
  • Example 1 This was basically the same as Example 1, No. 4, but had a difference in that the embossing roller 22A was used in place of the embossing roller 22H.
  • Film Sample 5 of the antiglare anti-reflection film 11b was produced.
  • Example 1 This was basically the same as Example 1, No. 4, but had a difference in that the embossing roller 22B was used in place of the embossing roller-22H.
  • Film Sample 6 of the antiglare anti-reflection film 11b was produced.
  • Example 1 This was basically the same as Example 1, No. 4, but had a difference in that the embossing roller 22C was used in place of the embossing roller 22H.
  • Film Sample 7 of the antiglare anti-reflection film 11b was produced.
  • Example 1 This was basically the same as Example 1, No. 4, but had a difference in that the embossing roller 22D was used in place of the embossing roller 22H.
  • Film Sample 8 of the antiglare anti-reflection film 11b was produced.
  • Example 1 This was basically the same as Example 1, No. 4, but had a difference in that the embossing roller 22E was used in place of the embossing roller 22H.
  • Film Sample 9 of the antiglare anti-reflection film 11b was produced.
  • Example 1 This was basically the same as Example 1, No. 4, but had a difference in that the embossing roller 22I was used in place of the embossing roller 22H.
  • Film Sample 10 of the antiglare anti-reflection film 11b was produced.
  • Example 1 This was basically the same as Example 1, No. 4, but had a difference in that the embossing roller 22G was used in place of the embossing roller 22H.
  • Film Sample 11 of the antiglare anti-reflection film 11b was produced.
  • Example 1 This was basically the same as Example 1, No. 4, but had a difference in that the embossing roller 22J was used in place of the embossing roller 22H.
  • Film Sample 12 of the antiglare anti-reflection film 11b was produced.
  • a spectrophotometer V-550 (trade name, produced by JASCO Corporation) was provided with an adapter ARV-474 (trade name) to measure the specular reflectance at an exiting angle of -5 degrees, according to the incident light of wavelength in the range of 380-780 nm at the incident angle of 5 degrees. Then the average of the specular reflectance of the reflected light in the range of 450-650 nm was calculated to evaluate anti-reflection property
  • the embossed surface of the film was subjected to measurement of the roughness by use of a micromap device produced by Ryoka Systems Inc.
  • the pencil hardness is used to represent a grade of resistance to scratches.
  • the evaluation of pencil hardness was according to JIS-K-5400.
  • the antiglare anti-reflection film 11b of Samples 1-12 was set in a controlled environment with the temperature of 25°C and the humidity of 60%RH for two (2) hours. After this, the film surface of the antiglare anti-reflection film 11b was scratched with H-5H test pencils determined by JIS-S-6006. Thereby, a force of 500 grams was applied to the test pencil and for five times.
  • two grades of OK and NG were used. Five hardness values were compared, so that one of the hardness values that is that highest among the OK values was determined as an evaluated pencil hardness. OK: Good, as no scratch or only one scratch remained on the film surface after the five tests. NG: Poor, as three or more scratches remained on the film surface after the five tests.
  • Film Samples 1-12 were placed on cells of 133 ppi (pixels per inch) at a distance of 1 mm. Dazzling appearance, namely deviations in brightness caused by protruding portions of the surface of the film, was evaluated by human eyes according to the following grades.
  • Triacetyl cellulose film (cellulose triacetate film) TAC-TD80U (trade name, produced by Fuji Photo Film Co., Ltd.) was prepared, and was 80 microns thick, and was coated with the above-described primer layer forming coating solution A by a gravure coater. The solution was dried for two (2) minutes at 100°C. Then the coating was cured by application of ultraviolet rays, to obtain the primer layer 42.
  • the primer layer 42 was 7 microns thick, and had a refractive index of 1.51.
  • the coating solution for the hard coat layer was applied by a gravure coater, and was dried for two (2) minutes at 100°C. Then the coating was cured by applying ultraviolet rays, to form the hard coat layer 43. This was 7 microns thick, and had a refractive index of 1.51.
  • the hard coat layer 43 was coated by a gravure coater with the above-described coating solution for forming the middle refractive index layer.
  • the solution was dried at 100°C, and was cured by application of ultraviolet rays, to obtain the middle refractive index layer 55.
  • the middle refractive index layer 55 was 67 nm thick, and had a refractive index of 1.63.
  • the middle refractive index layer 55 was coated by a gravure coater with the above-described coating solution for forming the high refractive index layer.
  • the solution was dried at 100°C, and was cured by application of ultraviolet rays, to obtain the high refractive index layer 50.
  • the high refractive index layer 50 was 107 nm thick, and had a refractive index of 1.90.
  • the solution F for the low refractive index was applied to form a coating by use of a gravure coater, and dried at 120°C for eight (8) minutes, and cured by applying ultraviolet rays, to form the low refractive index layer 44.
  • the anti-reflection film 11a was produced.
  • the low refractive index layer 44 had a thickness of 86 nm and a refractive index of 1.43.
  • the coated surface of the anti-reflection film was embossed by the one-surface embossing calender device 13 (produced by Yuri Roll Co., Ltd.) including the embossing roller 22A, to obtain Film Sample 13 of the antiglare anti-reflection film 11b.
  • the backup roller 23 without machining for an embosser was combined with the embossing roller 22A.
  • the linear contact pressure was 5.00x10 3 N/cm.
  • the temperature of preheating was 70°C.
  • the temperature of the embossing roller 22A was 140°C.
  • the temperature of the backup roller 23 was a room temperature. Transporting speed was 5 m/min.
  • Example 2 This was basically the same as Example 2, No. 1 but with a difference in that the embossing roller 22B was used in place of the embossing roller 22A.
  • Film Sample 14 of the antiglare anti-reflection film 11b was produced.
  • Example 2 This was basically the same as Example 2, No. 1 but with a difference in that the embossing roller 22F was used in place of the embossing roller 22A.
  • Film Sample 15 of the antiglare anti-reflection film 11b was produced.
  • Example 2 This was basically the same as Example 2, No. 1 but with a difference in that the embossing roller 22J was used in place of the embossing roller 22A.
  • Film Sample 16 of the antiglare anti-reflection film 11b was produced.
  • Triacetyl cellulose film (cellulose triacetate film) TAC-TD80U (trade name, produced by Fuji Photo Film Co., Ltd.) was prepared, and was 80 microns thick, and was coated with the above-described primer layer forming coating solution B by a gravure coater. The solution was' dried for two (2) minutes at 100°C. Then the coating was cured by application of ultraviolet rays, to obtain the primer layer 42.
  • the primer layer 42 had a refractive index of 1.51, and was 7 microns thick.
  • the above-described solution for the hard coat layer was applied to form a coating by use of a gravure coater, and dried for two (2) minutes at 100°C.
  • the coating was cured by applying ultraviolet rays, to form the hard coat layer 43.
  • the hard coat layer 43 had a refractive index of 1.51 and a thickness of 7 microns.
  • the middle refractive index layer 55 had a refractive index of 1.63 and a thickness of 67 nm.
  • the above-described solution for the high refractive index layer was applied to form a coating by use of a gravure coater, and dried at 100°C, and was cured by applying ultraviolet rays, to form the high refractive index layer 50.
  • the high refractive index layer 50 had a refractive index of 1.90 and a thickness of 107 nm.
  • the above-described solution F for the low refractive index layer was applied to form a coating by use of a gravure coater, and dried at 120°C for eight (8) minutes, and was cured by applying ultraviolet rays, to form the low refractive index layer 44. Then the anti-reflection film 11a was obtained.
  • the low refractive index layer 44 had a refractive index of 1.43 and a thickness of 86 nm.
  • the coated surface of the anti-reflection film was embossed by the one-surface embossing calender device 13 (produced by Yuri Roll Co., Ltd.) including the embossing roller 22C, to obtain Sample 17 of the antiglare anti-reflection film 11b.
  • the backup roller 23 without machining for an embosser was combined with the embossing roller 22C.
  • the linear contact pressure was 5.00x10 3 N/cm.
  • the temperature of preheating was 60°C.
  • the temperature of the embossing roller 22 was 140°C.
  • the temperature of the backup roller 23 was a room temperature. Transporting speed was 3 m/min.
  • Example 2 This was basically the same as Example 2, No. 5 but with a difference in that the embossing roller 22E was used in place of the embossing roller 22C.
  • Film Sample 18 of the antiglare anti-reflection film 11b was produced.
  • Example 2 This was basically the same as Example 2, No. 5 but with a difference in that the embossing roller 22H was used in place of the embossing roller 22C.
  • Film Sample 19 of the antiglare anti-reflection film 11b was produced.
  • Example 2 This was basically the same as Example 2, No. 5 but with a difference in that the embossing roller 22G was used in place of the embossing roller 22C.
  • Film Sample 20 of the antiglare anti-reflection film 11b was produced.
  • Example 2 The samples produced according to Example 2, Nos. 1-8 were subjected to evaluation in the same manner related to the items and methods as Example 1, Nos. 1-12. Results of the evaluation are indicated in the following table. The signs for grading are the same as the in the foregoing table.
  • Sample 7 produced according to Example 1, No. 7 was dipped in 2.0 N aqueous solution of NaOH at 55°C. A back surface of the sample formed from the triacetyl cellulose was saponified.
  • Triacetyl cellulose film TAC-TD80U (trade name, produced by Fuji Photo Film Co., Ltd.) was 80 microns thick, and saponified in the same condition.
  • a polarizer was prepared by a process in which iodine was adsorbed to polyvinyl alcohol, and the polyvinyl alcohol was stretched. Then the anti-reflection film and the triacetyl cellulose film were attached to respectively opposite surfaces of the polarizer, by way of protecting films, so that a test polarizing plate is obtained.
  • the polarizing plate was combined with the LCD display device.
  • the LCD display device was for a notebook personal computer including TN liquid crystal display of a transmission type, and had originally had a polarizing plate on a display surface.
  • the test polarizing plate was attached on the LCD display device in place of the original polarizing plate.
  • the LCD display device included the polarization separation film D-BEF disposed between a backlight and a liquid crystal cell, D-BEF (trade name) being produced by Sumitomo 3M Ltd. and having a polarized light selective layer.
  • the anti-reflection film was positioned on the viewing side of the display surface.
  • Example 3 Conditions were basically the same as Example 3 to produce a polarizing plate, but had two differences.
  • a first difference of the two was in that for saponification, the back surface of the antiglare anti-reflection film 11b was coated by the #3 bar with 1.0 N solution of KOH in water/isopropanol.
  • the second difference was in that the surface temperature was maintained at 40°C for 10 seconds, before the coating was washed with water, and dried. So the polarizing plate was obtained.
  • the solution included the water and isopropanol at the wt.% ratio of 75/25 for the water to isopropanol.
  • an image display device is obtained by use of the polarizing plate. As a result, resolution and quality of the display were very high in a similar manner to Example 3.
  • Example 3 This was basically the same as Example 3, but had two differences.
  • a first difference of the two was that a wide view film was used on the side of the liquid crystal cell of the polarizing filter on the viewing side of the transmission-type TN liquid crystal cell, in place of the protection film according to Example 3.
  • the second of the two was that a wide view film was used on the side of the liquid crystal cell of the polarizing filter on the backlight side of the same, in place of the protection film according to Example 3.
  • Both of the wide view films were Wide View Film SA-12B, trade name, produced by Fuji Photo Film Co., Ltd.
  • the contrast was excellent in a bright room, the view angle in every direction was considerably wide, and the image could be perceived with great ease. Accordingly, the quality of display was high.
  • the antiglare anti-reflection film 11b of Film Sample 7 according to Example 1, No. 7 was attached with pressure-sensitive adhesive agent to a glass panel in a front of an organic electro luminescence (EL) display device. As a result, it was observed that reflection on the glass surface was prevented in the display device, which had a high performance in easy recognition of images.
  • EL organic electro luminescence
  • the ⁇ /4 plate was attached to a glass panel in a front of an organic electro luminescence (EL) display device. As a result, it was observed that reflection outside and inside the glass panel was prevented in the display device, which had a high performance in easy recognition of images.
  • EL organic electro luminescence
  • Sample 14 produced according to Example 2 No. 2 was dipped in 2.0 N aqueous solution of NaOH at 55°C. A back surface of the sample formed from the triacetyl cellulose was saponified.
  • Triacetyl cellulose film TAC-TD80U (trade name, produced by Fuji Photo Film Co., Ltd.) was 80 microns thick, and saponified in the same condition.
  • a polarizer was prepared by a process in which iodine was adsorbed to polyvinyl alcohol, and the polyvinyl alcohol was stretched. Then the anti-reflection film and the triacetyl cellulose film were attached to respectively opposite surfaces of the polarizer, by way of protecting films, so that a test polarizing plate is obtained.
  • the polarizing plate was combined with the LCD display device.
  • the LCD display device was for a notebook personal computer including TN liquid crystal display of a transmission type, and had originally had a polarizing plate on a display surface.
  • the test polarizing plate was attached on the LCD display device in place of the original polarizing plate.
  • the LCD display device included the polarization separation film D-BEF between a backlight and a liquid crystal cell, D-BEF (trade name) being produced by Sumitomo 3M Ltd. and having a polarized light selective layer.
  • D-BEF trade name
  • the anti-reflection film was positioned on the viewing side of the display surface.
  • Example 8 Conditions were basically the same as Example 8 to produce a polarizing plate, but had two differences.
  • a first difference of the two was in that for saponification, the back surface of the antiglare anti-reflection film 11b was coated by the #3 bar with 1.0 N solution of KOH in water/isopropanol.
  • the second difference was in that the surface temperature was maintained at 40°C for 10 seconds, before the coating was washed with water, and dried, by which the polarizing plate was obtained.
  • the solution included the water and isopropanol at the wt.% ratio of 75/25 for the water to isopropanol.
  • an image display device is obtained by use of the polarizing plate. As a result, resolution and quality of the display were very high in a similar manner to Example 8.
  • Example 8 This was basically the same as Example 8, but had two differences.
  • a first difference of the two was that a wide view film was used on the side of the liquid crystal cell of the polarizing filter on the viewing side of the transmission-type TN liquid crystal cell, in place of the protection film according to Example 8.
  • the second of the two was that a wide view film was used on the side of the liquid crystal cell of the polarizing filter on the backlight side of the same, in place of the protection film according to Example 8.
  • Both of the wide view films were Wide View Film SA-12B, trade name, produced by Fuji Photo Film Co., Ltd.
  • the contrast was excellent in a bright room, the view angle in every direction was considerably wide, and the image could be perceived with great ease. Accordingly, the quality of display was high.
  • the antiglare anti-reflection film 11b of Film Sample 17 according to Example 2, No. 5 was attached with pressure-sensitive adhesive agent to a glass panel in a front of an organic electro luminescence (EL) display device. As a result, it was observed that reflection on the glass surface was prevented in the display device, which had a high performance in easy recognition of images.
  • EL organic electro luminescence
  • the ⁇ /4 plate was attached to a glass panel in a front of an organic electro luminescence (EL) display device. As a result, it was observed that reflection outside and inside the glass panel was prevented in the display device, which had a high performance in easy recognition of images.
  • EL organic electro luminescence

Claims (9)

  1. Procédé de production d'un film antiréfléchissant par gaufrage d'une surface d'un film polymère (11a 11b),
    ledit film polymère comprenant un support (31, 41) et une couche antiréfléchissante (32, 44, 50, 55),
    un gaufreur (22) étant utilisé pour gaufrer la surface de ladite couche antiréfléchissante ou une surface arrière dudit support,
    ledit procédé de production d'un film antiréfléchissant étant caractérisé en ce qu'il comprend l'étape qui consiste à :
    produire un gaufreur par usinage par décharges électriques négatives,
    une surface dudit gaufreur présentant une rugosité arithmétique moyenne Ra égale ou supérieure à 0,3 micromètre et égale ou inférieure à 1,0 micromètre et présentant un motif en saillies et en retraits dont la longueur cyclique moyenne RSm est égale ou supérieure à 5 micromètres et égale ou inférieure à 30 micromètres.
  2. Procédé de production d'un film antiréfléchissant selon la revendication 1, dans lequel au cours dudit usinage par décharges électriques négatives, on utilise un liquide (35a) contenant du kérosène et une électrode (38) de décharge réalisée en un matériau qui contient du cuivre ou du laiton et sur lequel on applique une tension électrique égale ou supérieure à 100 V et égale ou inférieure à 400 V.
  3. Procédé de production d'un film antiréfléchissant selon la revendication 2, dans lequel ledit liquide (35a) contient une quantité de particules égale ou supérieure à 1 gramme par litre et égale ou inférieure à 20 grammes par litre, les particules ayant un diamètre moyen de grain égal ou supérieur à 1 micromètre et égal ou inférieur à 10 micromètres, lesdites particules étant formées de graphite, de silicium et/ou de sulfure de molybdène.
  4. Procédé de production d'un film antiréfléchissant selon la revendication 3, dans lequel ledit gaufreur (22) est réalisé en un matériau dont la dureté Vickers est égale ou supérieure à 500 Hv et égale ou inférieure à 1 500 Hv.
  5. Procédé de production d'un film antiréfléchissant selon la revendication 2, dans lequel ledit gaufreur (22) est réalisé en un matériau sur lequel est plaqué un matériau sélectionné parmi :
    un chromage dur,
    un placage au nickel qui contient du phosphore ou une combinaison de phosphore et de bore,
    un chromage ou un placage au nickel formé par précipitation simultanée de particules d'au moins un composé sélectionné parmi le carbure de titane (TiC), le carbure de tungstène (WC), de carbure de silicium (SiC), le carbure de bore (B4C) et le borure de titane (TiB2).
  6. Procédé de production d'un film antiréfléchissant selon la revendication 5, comprenant de plus une étape de durcissement thermique d'une couche plaquée formée lors dudit placage, ledit durcissement thermique étant effectué pendant au moins une heure à une température égale ou supérieure à 300°C et égale ou inférieure à 1 000°C.
  7. Procédé de production d'un film antiréfléchissant selon la revendication 2, dans lequel ledit film polymère (11a, 11b) contient de l'acylate de cellulose.
  8. Procédé de production d'un film antiréfléchissant selon la revendication 2, dans lequel ledit film polymère (11a, 11b) présente une structure multicouche et comprend de plus une couche (43) de revêtement dur placée entre ledit support (41) et ladite couche antiréfléchissante (32, 44, 50, 55).
  9. Procédé de production d'un film antiréfléchissant selon la revendication 2, dans lequel ledit film polymère (11a, 11b) présente une structure multicouche et comprend de plus :
    une couche (42) d'amorce placée entre ledit support (41) et ladite couche antiréfléchissante (32, 44, 50, 55) et
    une couche (43) de revêtement dur placée entre ladite couche d'amorce et ladite couche antiréfléchissante.
EP04010814A 2003-05-08 2004-05-06 Traitement anti-brillant, sa méthode de fabrication, traitement anti-réfléchissant, lame polarisante et dispositif d'affichage d'images Expired - Lifetime EP1475217B1 (fr)

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US20040223220A1 (en) 2004-11-11
JP4213989B2 (ja) 2009-01-28
DE602004020418D1 (de) 2009-05-20
EP1475217A1 (fr) 2004-11-10
JP2004333936A (ja) 2004-11-25
KR101130629B1 (ko) 2012-08-01
KR20040095737A (ko) 2004-11-15
US7427371B2 (en) 2008-09-23

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