EP1145290A1 - Vorrichtung und verfahren zum behandeln von substraten - Google Patents
Vorrichtung und verfahren zum behandeln von substratenInfo
- Publication number
- EP1145290A1 EP1145290A1 EP99957315A EP99957315A EP1145290A1 EP 1145290 A1 EP1145290 A1 EP 1145290A1 EP 99957315 A EP99957315 A EP 99957315A EP 99957315 A EP99957315 A EP 99957315A EP 1145290 A1 EP1145290 A1 EP 1145290A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- nozzle
- substrate
- nozzles
- fluid
- onto
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/906—Cleaning of wafer as interim step
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19859466A DE19859466C2 (de) | 1998-12-22 | 1998-12-22 | Vorrichtung und Verfahren zum Behandeln von Substraten |
DE19859466 | 1998-12-22 | ||
PCT/EP1999/008862 WO2000038220A1 (de) | 1998-12-22 | 1999-11-18 | Vorrichtung und verfahren zum behandeln von substraten |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1145290A1 true EP1145290A1 (de) | 2001-10-17 |
Family
ID=7892262
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99957315A Withdrawn EP1145290A1 (de) | 1998-12-22 | 1999-11-18 | Vorrichtung und verfahren zum behandeln von substraten |
Country Status (7)
Country | Link |
---|---|
US (1) | US6805754B1 (ja) |
EP (1) | EP1145290A1 (ja) |
JP (1) | JP2002533920A (ja) |
KR (1) | KR20010092757A (ja) |
DE (1) | DE19859466C2 (ja) |
TW (1) | TW449774B (ja) |
WO (1) | WO2000038220A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110424032A (zh) * | 2019-09-10 | 2019-11-08 | 江苏师范大学 | 一种用于压力机主轴修复的射流电沉积装置及其方法 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19911084C2 (de) * | 1999-03-12 | 2002-01-31 | Steag Micro Tech Gmbh | Vorrichtung zum Behandeln von Substraten |
DE10162191A1 (de) * | 2001-12-17 | 2003-06-18 | Wolfgang Coenen | Automatisches Vielkanalätzsystem |
DE10235020B4 (de) * | 2002-07-31 | 2004-08-26 | Christian-Albrechts-Universität Zu Kiel | Vorrichtung und Verfahren zum Ätzen großflächiger Halbleiterscheiben |
JP4747691B2 (ja) * | 2005-06-24 | 2011-08-17 | 東京エレクトロン株式会社 | 半導体装置の製造方法 |
US7470638B2 (en) * | 2006-02-22 | 2008-12-30 | Micron Technology, Inc. | Systems and methods for manipulating liquid films on semiconductor substrates |
US8572891B2 (en) * | 2009-10-02 | 2013-11-05 | Magna Closures Inc. | Vehicular anti-pinch system with rain compensation |
JP5671261B2 (ja) * | 2010-06-04 | 2015-02-18 | 東京応化工業株式会社 | 被処理体の処理方法 |
JP5646354B2 (ja) * | 2011-01-25 | 2014-12-24 | 東京エレクトロン株式会社 | 液処理装置および液処理方法 |
JP2014128776A (ja) * | 2012-12-28 | 2014-07-10 | Hoei Service Co Ltd | タイルカーペット洗浄装置、及び、タイルカーペット洗浄方法 |
KR101880232B1 (ko) * | 2015-07-13 | 2018-07-19 | 주식회사 제우스 | 기판 액처리 장치 및 방법 |
CN105565240B (zh) * | 2016-02-16 | 2018-07-03 | 苏州市冯氏实验动物设备有限公司 | 洗瓶灌装一体机 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3902513A (en) * | 1971-07-06 | 1975-09-02 | Ppg Industries Inc | Angled crossfire rinses |
US4118303A (en) * | 1976-08-30 | 1978-10-03 | Burroughs Corporation | Apparatus for chemically treating a single side of a workpiece |
JPS62133097A (ja) * | 1985-12-04 | 1987-06-16 | Nippon Denso Co Ltd | 半導体ウエハのめつき装置 |
DE3820591A1 (de) * | 1988-06-16 | 1989-12-21 | Texas Instruments Deutschland | Vorrichtung zum nassaetzen von duennen filmen |
JP3112700B2 (ja) * | 1991-05-08 | 2000-11-27 | 啓一郎 菅沼 | 半導体製造方法並びにその装置 |
JPH04363022A (ja) * | 1991-06-06 | 1992-12-15 | Enya Syst:Kk | 貼付板洗浄装置 |
JPH05109690A (ja) * | 1991-10-18 | 1993-04-30 | Fujitsu Ltd | 半導体ウエーハエツチング装置 |
US5372652A (en) | 1993-06-14 | 1994-12-13 | International Business Machines Corporation | Aerosol cleaning method |
JP3289459B2 (ja) * | 1993-12-29 | 2002-06-04 | カシオ計算機株式会社 | メッキ方法及びメッキ装置 |
DE19522525A1 (de) * | 1994-10-04 | 1996-04-11 | Kunze Concewitz Horst Dipl Phy | Verfahren und Vorrichtung zum Feinstreinigen von Oberflächen |
JP3452676B2 (ja) | 1995-02-15 | 2003-09-29 | 宮崎沖電気株式会社 | 半導体ウエハ面のパーティクルの除去装置及びそれを用いた半導体ウエハ面のパーティクルの除去方法 |
US5807469A (en) * | 1995-09-27 | 1998-09-15 | Intel Corporation | Flexible continuous cathode contact circuit for electrolytic plating of C4, tab microbumps, and ultra large scale interconnects |
US5879576A (en) | 1996-05-07 | 1999-03-09 | Hitachi Electronics Engineering Co., Ltd. | Method and apparatus for processing substrates |
JPH1057877A (ja) | 1996-05-07 | 1998-03-03 | Hitachi Electron Eng Co Ltd | 基板処理装置及び基板処理方法 |
-
1998
- 1998-12-22 DE DE19859466A patent/DE19859466C2/de not_active Expired - Fee Related
-
1999
- 1999-05-18 US US09/869,213 patent/US6805754B1/en not_active Expired - Fee Related
- 1999-11-18 EP EP99957315A patent/EP1145290A1/de not_active Withdrawn
- 1999-11-18 WO PCT/EP1999/008862 patent/WO2000038220A1/de not_active Application Discontinuation
- 1999-11-18 JP JP2000590199A patent/JP2002533920A/ja active Pending
- 1999-11-18 KR KR1020017008057A patent/KR20010092757A/ko not_active Application Discontinuation
- 1999-12-04 TW TW088121243A patent/TW449774B/zh active
Non-Patent Citations (1)
Title |
---|
See references of WO0038220A1 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110424032A (zh) * | 2019-09-10 | 2019-11-08 | 江苏师范大学 | 一种用于压力机主轴修复的射流电沉积装置及其方法 |
Also Published As
Publication number | Publication date |
---|---|
DE19859466A1 (de) | 2000-07-06 |
TW449774B (en) | 2001-08-11 |
US6805754B1 (en) | 2004-10-19 |
WO2000038220A1 (de) | 2000-06-29 |
DE19859466C2 (de) | 2002-04-25 |
JP2002533920A (ja) | 2002-10-08 |
KR20010092757A (ko) | 2001-10-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20010602 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
|
18W | Application withdrawn |
Effective date: 20030930 |
|
RBV | Designated contracting states (corrected) |
Designated state(s): AT BE DE FR GB IT |