EP1100092B1 - Vorrichtung zur Führung von Röntgenstrahlen - Google Patents

Vorrichtung zur Führung von Röntgenstrahlen Download PDF

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Publication number
EP1100092B1
EP1100092B1 EP00123501A EP00123501A EP1100092B1 EP 1100092 B1 EP1100092 B1 EP 1100092B1 EP 00123501 A EP00123501 A EP 00123501A EP 00123501 A EP00123501 A EP 00123501A EP 1100092 B1 EP1100092 B1 EP 1100092B1
Authority
EP
European Patent Office
Prior art keywords
reflecting
measurement object
coating
slit
reflecting areas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP00123501A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1100092A3 (de
EP1100092A2 (de
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Helmut Fischer GmbH and Co
Original Assignee
Helmut Fischer GmbH and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Helmut Fischer GmbH and Co filed Critical Helmut Fischer GmbH and Co
Publication of EP1100092A2 publication Critical patent/EP1100092A2/de
Publication of EP1100092A3 publication Critical patent/EP1100092A3/de
Application granted granted Critical
Publication of EP1100092B1 publication Critical patent/EP1100092B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Definitions

  • the invention relates to a device for guiding X-rays from a radiation source to a measurement object.
  • the X-ray fluorescence method is used to measure thin layers or multiple layers.
  • the X-ray fluorescence radiation of the individual elements of a sample is detected and converted into layer thickness (s) and composition (s).
  • the stimulating X-radiation passes through a collimator system dimmed as a fine beam to the measuring surface. From here the X-ray fluorescence radiation is emitted. In a proportional counter or other detector, the radiation detected in an energy-dispersive manner.
  • EP 0 724 150 A1 discloses X-ray radiation conductors which enable the X-ray radiation to be focused on these small functional surfaces. These are so-called monocapillaries. These monocapillaries are cylindrical in the form of a glass tube. Total reflection on the walls of the glass tube makes it possible to guide the X-rays with sufficient intensity to the measurement object.
  • the designed as monocapillaries collimators have been further developed to the effect that the inner walls of the glass tube are parabolic, so that a focusing of the reflected rays is to be measured object.
  • polycapillaries are known. This is a monolith comprising a bundle of several monocapillaries, again arranged such that the targeted X-rays focus at a point outside the exit plane of the monolith.
  • the invention is therefore an object of the invention to provide a device for guiding the X-rays from a radiation source to a target, especially for small feature sizes with a functional area less than 100 microns x 100 microns, which are inexpensive to produce, adjustable to the measuring surface to be measured and a sufficient transmission of the radiation intensity to the measurement object allows.
  • the inventive design of at least two reflecting surfaces forming a tapered gap has the advantage that a simple arrangement has been created which allows the X-rays to be guided to the object of measurement with sufficient intensity and additionally focused to allow the detector to have a sufficient Can detect intensity of the emitted fluorescence radiation.
  • the at least two gap forming reflecting surfaces are easy to manufacture. Elaborate production engineering methods for producing the device for guiding X-rays are not given in comparison to the known from the prior art mono and / or polycapillaries.
  • the X-rays are guided by total reflection within a gap formed by at least two reflection surfaces to the measurement object.
  • the X-ray radiation emerging laterally from the column or columns is ineffective for the excitation of the fluorescence radiation, but by total reflection of the X-rays between the at least two reflection surfaces forming a gap, an at least sufficient intensity is introduced or transferred to the measurement object.
  • the gap formed by the at least two reflecting surfaces is adjustable in width. This makes it possible that the size of the measuring surface is adjustable on the measuring object.
  • the gap width is adapted at least to the size of the measurement surface of the measurement objects and advantageously to the exit opening of the x-ray tube, so that the greatest possible radiation intensity can be transferred to the measurement object.
  • At least one of the reflection surfaces fixed and at least one further reflection surface in the distance and / or angle is adjustable.
  • either distance / and / or angle can be set as a function of the application, wherein a reflection surface serves as a reference surface.
  • the reflection surfaces are made of a semiconductor material, in particular a silicon wafer.
  • a semiconductor material in particular a silicon wafer.
  • the industrial production of silicon wafers has meanwhile become cost-effective.
  • the silicon wafers due to the very flat configuration, have a surface which is suitable for the total reflection of the X-rays.
  • the critical angle of total reflection is, for example, a few mrad depending on the energy of the X-ray. Due to the high-quality planar surface of the silicon wafer, a sufficiently loss-free beam transmission can be provided.
  • the reflection surfaces are at least partially vaporized with a noble metal, preferably copper, silver, gold, platinum, palladium or the like.
  • a noble metal preferably copper, silver, gold, platinum, palladium or the like.
  • the coating is provided at least partially at an end facing the jet exit of the X-ray tube.
  • the reflection surfaces close to the measurement object have a region which has a total reflection-inhibiting coating or at least partially coated reflection surfaces has a region which is provided without coating or in which the total reflection-inhibiting coating ,
  • At least one reflection surface can be adjusted by at least one adjustment unit.
  • This setting unit can be advantageously designed as a precision mechanical adjustment, as an electrical, hydraulic, pneumatic or piezoelectric actuator.
  • This adjustment unit must enable adjustments at least in the micrometer range, so that an exact alignment and adjustment of the at least two mutually arranged reflection surfaces is provided.
  • the gap width of the collimator is adjustable. This additionally provides a possibility for setting and limiting the exit surfaces in order to adapt the focusing to the measurement task.
  • FIG. 1 schematically shows the essential components of a layer thickness measuring device 11, wherein the illustration of an evaluation unit, a screen for visualizing a video camera recorded by a video camera
  • This layer thickness measuring device 11 is used, for example, for measuring bonding pads, contacts, which are provided in part with selective coating, conductor tracks and functional coatings on small areas.
  • 12 layer thicknesses are preferably determined or tested by a Schichtdickenmeß réelle 11 with the device according to the invention, the measuring surface and the functional surfaces are smaller than 100 microns x 100 microns, especially smaller than 50 microns x 50 microns.
  • an X-ray tube 13 an X-ray radiation is generated, which is directed via an anode 14 to a DUT 16.
  • the X-radiation excites fluorescence radiation in a layer of the test object 16.
  • the intensity of this fluorescence radiation as a function of the energy (spectrum) is a function of the layer thickness. This or the parameter of the layer system is exploited by registering the system of emitted radiation with the aid of a detector 17.
  • the device 12 which consists of two opposing reflection surfaces 18 according to the embodiment. These reflection surfaces 18 are used for beam focusing and beam transmission, so that the X-radiation reaches the measuring surface of the test object 16.
  • the reflection surfaces 18 are preferably arranged directly to the anode 14 or to an outlet flange 21 near the anode 14.
  • a collimator 23 is furthermore provided, as a result of which a measuring region 24 according to FIG. 3 can be imaged on a measurement object.
  • the collimator 23 is advantageously a slit collimator whose slit width is adjustable.
  • the reflection surfaces 18 are formed as elongated, rectangular surfaces, as can be seen from Figure 1 and Figure 2.
  • the length of the reflection surfaces 18 is determined essentially by the structure and by the degree of total reflection. X-rays that are not parallel between an axis of the measuring area 24 and the anode 14 are deflected at least once by total reflection.
  • the width of the reflection surfaces 18 are at least one and a half times as large as the maximum functional surface to be tested.
  • Advantageously used for the reflection surfaces 18 silicon wafer. This inexpensive base material can be easily adapted to the appropriate size of the device 12 according to the invention.
  • the reflecting surfaces 18 produced from a silicon wafer are advantageously applied to holding elements 26, 27 according to FIG.
  • these are glued without tension, so that the flatness of the reflection surface 18 can be maintained.
  • the reflection surfaces 18 can also be fixed stress-free on the holding elements 26, 27 by a clamp or the like.
  • an adjustment unit 28 engages on one of the two retaining elements 27, by means of which a retaining element 27 can be adjusted to the stationary element 26.
  • the holding element 26 advantageously accommodates the reflection surface 18 parallel to the central axis 29 of the device 12. By setting unit 28, the gap width can be adjusted. It is also possible that the angularity of the holding member 27 is adjustable to the element 26. Alternatively, a mirror-image arrangement may also be provided.
  • an adjusting unit 28 is provided on each of the holding elements 26, 27, whereby the holding elements 26, 27 can be arranged either parallel to one another and / or at an angle to each other, so that a uniform or tapered gap to the test object 16 is formed.
  • the setting unit 28 is formed such that gap widths can be set optionally in a range of 10 to 100 ⁇ m, for example.
  • fine mechanical adjustment mechanisms, piezoelectric actuators, as well as electrically, hydraulically, pneumatically operated actuators can be provided.
  • a flattening 31 is provided on the holding element 26. This flattening makes it possible for the emitted fluorescence radiation to have a sufficient opening width 32 in order to detect the emitted fluorescence radiation.
  • the reflection surface 18 may, for example, be vapor-deposited with a noble metal.
  • the critical angle for total reflection which is 1.5 mrad for silicon, can be increased to 4.5 mrad by a platinum coating.
  • This in turn is advantageously reflected in the transmission of the X-radiation low.
  • coated reflective surfaces of the base material may consist of a quartz surface or a plastic material that meets the requirement for flatness and has a coating.
  • the coating may be provided at least at the entrance of the reflection surfaces 18, so that the number of captured and reflected rays is as large as possible. Over the course along the reflection surfaces 18, the coating can be completely continued or even provided only partially.
  • the coating or the material of the coating may also change depending on the applications. For example, by reducing the critical angle for the total reflection, the divergence at the exit of the reflection surfaces 18 can be reduced, whereby a focusing of the radiation and thereby an increase in intensity on the measuring region 24 of the test object 16 can be achieved.
  • a coating is not provided or a total reflection preventing coating is provided, whereby the emerging below the reflection surface 18 radiation just on the size of the measuring range 24 of the measurement object 16th is focused. The irradiation of edge regions outside the measuring range 24 can thereby be considerably reduced.
  • the measuring range can be adjusted depending on the measurement task.
  • the collimator 23 can also be adapted to this measuring range, so that an intensity increase to a predetermined measuring range is made possible by the focusing of the radiation.
  • the reflection surfaces 18 are at least slightly concave.
  • the concave formation can taper towards the lower end 22, so that a kind of voice tube-shaped configuration of the reflection surfaces 18 is given.
  • the dimensions must be taken into account, which can also be in the micrometer range.
  • the opening width of the reflection surfaces 18 at the input of the device 12 substantially corresponds to the outlet opening of the X-ray radiation emitted via the anode. Similarly, a slightly larger or smaller opening width be given to the diameter of the primary spot of the X-radiation.
  • the device 12 may further include openings and receptacles which serve to arrange an optic to visualize the measurement subject 16 by a video camera.
  • the device 12 is provided according to the embodiment by two mutually arranged reflection surfaces 18, which are arranged parallel or at an acute angle to each other. It can also be provided that instead of these two reflection surfaces 18, three or more reflection surfaces are arranged in a suitable manner to each other to allow the transmission of X-rays to the measuring range 24 of a DUT 16, so that by focusing the X-ray radiation, an increase in intensity is possible , However, it is not necessary, as known in the art, for a closed tubular arrangement to be used to focus the X-rays toward the measurement area by total reflection. Further geometric configurations of the reflection surfaces 18 are also conceivable, which enable the total reflection of the X-ray radiation.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Radiation-Therapy Devices (AREA)
  • X-Ray Techniques (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
EP00123501A 1999-11-12 2000-10-27 Vorrichtung zur Führung von Röntgenstrahlen Expired - Lifetime EP1100092B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19954520 1999-11-12
DE19954520A DE19954520A1 (de) 1999-11-12 1999-11-12 Vorrichtung zur Führung von Röntgenstrahlen

Publications (3)

Publication Number Publication Date
EP1100092A2 EP1100092A2 (de) 2001-05-16
EP1100092A3 EP1100092A3 (de) 2003-03-26
EP1100092B1 true EP1100092B1 (de) 2006-07-19

Family

ID=7928847

Family Applications (1)

Application Number Title Priority Date Filing Date
EP00123501A Expired - Lifetime EP1100092B1 (de) 1999-11-12 2000-10-27 Vorrichtung zur Führung von Röntgenstrahlen

Country Status (7)

Country Link
US (1) US6438209B1 (ja)
EP (1) EP1100092B1 (ja)
JP (1) JP2001201599A (ja)
CN (1) CN1202416C (ja)
AT (1) ATE333702T1 (ja)
DE (2) DE19954520A1 (ja)
HK (1) HK1035400A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102022105838B3 (de) 2022-03-14 2023-08-17 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Justiereinheit für eine Röntgenoptik in einem Röntgenfluoreszenzgerät sowie Röntgenfluoreszenzgerät

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60035876T2 (de) 2000-09-27 2008-05-08 Euratom Mikrostrahl-Kollimator für Hochauflösungs-Röntgenstrahl-Beugungsanalyse mittels konventionellen Diffraktometern
JP2007304063A (ja) * 2006-05-15 2007-11-22 Shimadzu Corp ソーラスリット
JP2013528804A (ja) * 2010-05-19 2013-07-11 シルヴァー，エリック，エイチ ハイブリッドｘ線光学機器および方法
EP3115809B1 (en) * 2015-07-06 2021-04-28 Exruptive A/S A method of security scanning of carry-on items, and a security scanning system of carry-on items
US10765383B2 (en) * 2015-07-14 2020-09-08 Koninklijke Philips N.V. Imaging with enhanced x-ray radiation

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02501338A (ja) * 1986-08-15 1990-05-10 コモンウェルス　サイエンティフィック　アンド　インダストリアル　リサーチ　オーガナイゼイション Ｘ線ビームもしくは中性子ビーム調節用計装装置
US4958363A (en) * 1986-08-15 1990-09-18 Nelson Robert S Apparatus for narrow bandwidth and multiple energy x-ray imaging
GB2217036B (en) * 1988-03-11 1992-08-12 Rosser Roy J Saddle toroid mirrors
US5001737A (en) * 1988-10-24 1991-03-19 Aaron Lewis Focusing and guiding X-rays with tapered capillaries
US5101422A (en) * 1990-10-31 1992-03-31 Cornell Research Foundation, Inc. Mounting for X-ray capillary
JPH0727946B2 (ja) * 1993-03-25 1995-03-29 東和科学株式会社 表面異物分析用ウエハ及びウエハ表面の金属不純物の評価方法
US5744813A (en) * 1994-07-08 1998-04-28 Kumakhov; Muradin Abubekirovich Method and device for controlling beams of neutral and charged particles
DE59700582D1 (de) * 1996-01-10 1999-11-25 Bastian Niemann Kondensor-monochromator-anordnung für röntgenstrahlung
JPH10221500A (ja) * 1997-02-03 1998-08-21 Olympus Optical Co Ltd 軟ｘ線検査装置
JP3771697B2 (ja) * 1997-11-01 2006-04-26 株式会社堀場製作所 螢光ｘ線分析装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102022105838B3 (de) 2022-03-14 2023-08-17 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Justiereinheit für eine Röntgenoptik in einem Röntgenfluoreszenzgerät sowie Röntgenfluoreszenzgerät
WO2023174596A1 (de) 2022-03-14 2023-09-21 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Justiereinheit für eine röntgenoptik in einem röntgenfluoreszenzgerät sowie röntgenfluoreszenzgerät

Also Published As

Publication number Publication date
JP2001201599A (ja) 2001-07-27
ATE333702T1 (de) 2006-08-15
DE19954520A1 (de) 2001-05-17
HK1035400A1 (en) 2001-11-23
EP1100092A3 (de) 2003-03-26
EP1100092A2 (de) 2001-05-16
CN1202416C (zh) 2005-05-18
CN1296178A (zh) 2001-05-23
DE50013184D1 (de) 2006-08-31
US6438209B1 (en) 2002-08-20

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