EA024976B1 - Барьерный слой для щелочных металлов на основе sioc - Google Patents
Барьерный слой для щелочных металлов на основе sioc Download PDFInfo
- Publication number
- EA024976B1 EA024976B1 EA201490968A EA201490968A EA024976B1 EA 024976 B1 EA024976 B1 EA 024976B1 EA 201490968 A EA201490968 A EA 201490968A EA 201490968 A EA201490968 A EA 201490968A EA 024976 B1 EA024976 B1 EA 024976B1
- Authority
- EA
- Eurasian Patent Office
- Prior art keywords
- layer
- stage
- silicon oxycarbide
- depth
- total thickness
- Prior art date
Links
- 229910052783 alkali metal Inorganic materials 0.000 title claims abstract description 4
- 150000001340 alkali metals Chemical class 0.000 title claims abstract description 4
- 230000004888 barrier function Effects 0.000 title 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 11
- 239000010703 silicon Substances 0.000 claims abstract description 11
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000011521 glass Substances 0.000 claims abstract description 4
- 239000000758 substrate Substances 0.000 claims abstract description 4
- 150000002500 ions Chemical class 0.000 claims abstract description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 6
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims 6
- 239000005977 Ethylene Substances 0.000 claims 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 4
- 229910000077 silane Inorganic materials 0.000 claims 4
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 3
- 239000001569 carbon dioxide Substances 0.000 claims 3
- 238000005229 chemical vapour deposition Methods 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 239000007789 gas Substances 0.000 claims 2
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical compound [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000010304 firing Methods 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1160418A FR2982608B1 (fr) | 2011-11-16 | 2011-11-16 | Couche barriere aux metaux alcalins a base de sioc |
| PCT/FR2012/052622 WO2013072623A1 (fr) | 2011-11-16 | 2012-11-14 | Couche barriere aux metaux alcalins a base de sioc |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EA201490968A1 EA201490968A1 (ru) | 2014-08-29 |
| EA024976B1 true EA024976B1 (ru) | 2016-11-30 |
Family
ID=47291136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EA201490968A EA024976B1 (ru) | 2011-11-16 | 2012-11-14 | Барьерный слой для щелочных металлов на основе sioc |
Country Status (18)
| Country | Link |
|---|---|
| US (1) | US9012024B2 (enExample) |
| EP (1) | EP2780294B1 (enExample) |
| JP (1) | JP6050370B2 (enExample) |
| KR (1) | KR102000803B1 (enExample) |
| CN (1) | CN103974918B (enExample) |
| BR (1) | BR112014010220A8 (enExample) |
| CA (1) | CA2854052C (enExample) |
| DK (1) | DK2780294T3 (enExample) |
| EA (1) | EA024976B1 (enExample) |
| ES (1) | ES2736923T3 (enExample) |
| FR (1) | FR2982608B1 (enExample) |
| HU (1) | HUE045009T2 (enExample) |
| IN (1) | IN2014MN00825A (enExample) |
| MX (1) | MX336859B (enExample) |
| PL (1) | PL2780294T3 (enExample) |
| PT (1) | PT2780294T (enExample) |
| TR (1) | TR201909120T4 (enExample) |
| WO (1) | WO2013072623A1 (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106277818A (zh) * | 2015-05-11 | 2017-01-04 | 杭州合新科技有限公司 | 一种新型阳光控制镀膜玻璃及其制备工艺 |
| PL3319915T3 (pl) * | 2015-07-07 | 2020-06-15 | Agc Glass Europe | Szklane podłoże o podwyższonej odporności na warunki atmosferyczne i środki chemiczne |
| US10428421B2 (en) | 2015-08-03 | 2019-10-01 | Asm Ip Holding B.V. | Selective deposition on metal or metallic surfaces relative to dielectric surfaces |
| US9786492B2 (en) | 2015-11-12 | 2017-10-10 | Asm Ip Holding B.V. | Formation of SiOCN thin films |
| US9786491B2 (en) | 2015-11-12 | 2017-10-10 | Asm Ip Holding B.V. | Formation of SiOCN thin films |
| CN105669044B (zh) * | 2015-12-31 | 2018-05-29 | 株洲醴陵旗滨玻璃有限公司 | 一种在线易洁镀膜玻璃及其制备方法 |
| KR102378021B1 (ko) | 2016-05-06 | 2022-03-23 | 에이에스엠 아이피 홀딩 비.브이. | SiOC 박막의 형성 |
| US10373820B2 (en) | 2016-06-01 | 2019-08-06 | Asm Ip Holding B.V. | Deposition of organic films |
| US10453701B2 (en) | 2016-06-01 | 2019-10-22 | Asm Ip Holding B.V. | Deposition of organic films |
| JP7169072B2 (ja) | 2017-02-14 | 2022-11-10 | エーエスエム アイピー ホールディング ビー．ブイ． | 選択的パッシベーションおよび選択的堆積 |
| US10847529B2 (en) | 2017-04-13 | 2020-11-24 | Asm Ip Holding B.V. | Substrate processing method and device manufactured by the same |
| US10504901B2 (en) | 2017-04-26 | 2019-12-10 | Asm Ip Holding B.V. | Substrate processing method and device manufactured using the same |
| CN114875388A (zh) | 2017-05-05 | 2022-08-09 | Asm Ip 控股有限公司 | 用于受控形成含氧薄膜的等离子体增强沉积方法 |
| KR20190065962A (ko) | 2017-12-04 | 2019-06-12 | 에이에스엠 아이피 홀딩 비.브이. | 유전체와 금속 표면 상에 SiOC의 균일한 증착 |
| DE102018207101B4 (de) * | 2018-05-08 | 2024-06-13 | Robert Bosch Gmbh | Verfahren zum Herstellen eines Bodens einer Analysezelle zum Analysieren eines biochemischen Materials und Analysezelle |
| KR102655348B1 (ko) * | 2019-03-19 | 2024-04-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 소수성 및 아이스포빅 코팅 |
| JP7020458B2 (ja) * | 2019-07-12 | 2022-02-16 | Ａｇｃ株式会社 | 膜付きガラス基板及びその製造方法 |
| US12341005B2 (en) | 2020-01-17 | 2025-06-24 | Asm Ip Holding B.V. | Formation of SiCN thin films |
| US12142479B2 (en) | 2020-01-17 | 2024-11-12 | Asm Ip Holding B.V. | Formation of SiOCN thin films |
| DE112021004623T5 (de) * | 2020-09-04 | 2023-06-15 | AGC Inc. | Glasgegenstand |
| JPWO2022114027A1 (enExample) * | 2020-11-30 | 2022-06-02 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0518755A1 (fr) * | 1991-06-14 | 1992-12-16 | Saint-Gobain Vitrage International | Technique de formation par pyrolyse en voie gazeuse d'un revêtement essentiellement à base d'oxygène et de silicium |
| US20030162033A1 (en) * | 2002-02-22 | 2003-08-28 | Afg Industries, Inc. | Method of making self-cleaning substrates |
| WO2011101572A1 (fr) * | 2010-02-22 | 2011-08-25 | Saint-Gobain Glass France | Substrat verrier revetu de couches a tenue mecanique amelioree |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5958065A (ja) * | 1982-09-29 | 1984-04-03 | Toray Ind Inc | 防曇性被膜 |
| GB8630918D0 (en) | 1986-12-24 | 1987-02-04 | Pilkington Brothers Plc | Coatings on glass |
| US5723172A (en) * | 1994-03-11 | 1998-03-03 | Dan Sherman | Method for forming a protective coating on glass |
| FR2728559B1 (fr) * | 1994-12-23 | 1997-01-31 | Saint Gobain Vitrage | Substrats en verre revetus d'un empilement de couches minces a proprietes de reflexion dans l'infrarouge et/ou dans le domaine du rayonnement solaire |
| FR2736632B1 (fr) | 1995-07-12 | 1997-10-24 | Saint Gobain Vitrage | Vitrage muni d'une couche conductrice et/ou bas-emissive |
| FR2738813B1 (fr) * | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | Substrat a revetement photo-catalytique |
| FR2759362B1 (fr) * | 1997-02-10 | 1999-03-12 | Saint Gobain Vitrage | Substrat transparent muni d'au moins une couche mince a base de nitrure ou d'oxynitrure de silicium et son procede d'obtention |
| US7096692B2 (en) * | 1997-03-14 | 2006-08-29 | Ppg Industries Ohio, Inc. | Visible-light-responsive photoactive coating, coated article, and method of making same |
| US6379803B1 (en) * | 1997-06-03 | 2002-04-30 | Nippon Sheet Glass Co., Ltd. | Low-reflectance glass article and process for preparing the same |
| GB2355273A (en) | 1999-10-12 | 2001-04-18 | Pilkington Plc | Coating glass |
| FR2800731B1 (fr) | 1999-11-05 | 2002-01-18 | Saint Gobain Vitrage | Substrat transparent muni d'une couche en derive de silicium |
| JP2003221257A (ja) * | 2002-01-31 | 2003-08-05 | Nippon Sheet Glass Co Ltd | 透明薄膜の成形方法およびそれを備える透明基体 |
| US7943246B2 (en) * | 2003-07-11 | 2011-05-17 | Pilkington Group Limited | Solar control glazing |
| GB2403731A (en) * | 2003-07-11 | 2005-01-12 | Pilkington Plc | Solar control glazing |
| WO2005050675A1 (ja) | 2003-11-18 | 2005-06-02 | Nippon Sheet Glass Company, Limited | 透明導電膜付き透明基体とその製造方法、およびこの基体を含む光電変換素子 |
| FR2864844B1 (fr) | 2004-01-07 | 2015-01-16 | Saint Gobain | Dispositif d'eclairage autonettoyant |
| US7482060B2 (en) * | 2004-07-14 | 2009-01-27 | Agc Flat Glass North America, Inc. | Silicon oxycarbide coatings having durable hydrophilic properties |
| JP5740388B2 (ja) * | 2009-03-18 | 2015-06-24 | エージーシー フラット グラス ノース アメリカ，インコーポレイテッドＡｇｃ Ｆｌａｔ Ｇｌａｓｓ Ｎｏｒｔｈ Ａｍｅｒｉｃａ，Ｉｎｃ． | 薄膜コーティング及びその作製方法 |
-
2011
- 2011-11-16 FR FR1160418A patent/FR2982608B1/fr not_active Expired - Fee Related
-
2012
- 2012-11-14 EP EP12795542.5A patent/EP2780294B1/fr active Active
- 2012-11-14 PL PL12795542T patent/PL2780294T3/pl unknown
- 2012-11-14 MX MX2014005735A patent/MX336859B/es active IP Right Grant
- 2012-11-14 ES ES12795542T patent/ES2736923T3/es active Active
- 2012-11-14 PT PT12795542T patent/PT2780294T/pt unknown
- 2012-11-14 BR BR112014010220A patent/BR112014010220A8/pt active Search and Examination
- 2012-11-14 CN CN201280056372.5A patent/CN103974918B/zh not_active Expired - Fee Related
- 2012-11-14 TR TR2019/09120T patent/TR201909120T4/tr unknown
- 2012-11-14 JP JP2014541737A patent/JP6050370B2/ja not_active Expired - Fee Related
- 2012-11-14 WO PCT/FR2012/052622 patent/WO2013072623A1/fr not_active Ceased
- 2012-11-14 DK DK12795542.5T patent/DK2780294T3/da active
- 2012-11-14 KR KR1020147012790A patent/KR102000803B1/ko not_active Expired - Fee Related
- 2012-11-14 US US14/358,540 patent/US9012024B2/en not_active Expired - Fee Related
- 2012-11-14 EA EA201490968A patent/EA024976B1/ru not_active IP Right Cessation
- 2012-11-14 IN IN825MUN2014 patent/IN2014MN00825A/en unknown
- 2012-11-14 HU HUE12795542A patent/HUE045009T2/hu unknown
- 2012-11-14 CA CA2854052A patent/CA2854052C/fr not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0518755A1 (fr) * | 1991-06-14 | 1992-12-16 | Saint-Gobain Vitrage International | Technique de formation par pyrolyse en voie gazeuse d'un revêtement essentiellement à base d'oxygène et de silicium |
| US20030162033A1 (en) * | 2002-02-22 | 2003-08-28 | Afg Industries, Inc. | Method of making self-cleaning substrates |
| WO2011101572A1 (fr) * | 2010-02-22 | 2011-08-25 | Saint-Gobain Glass France | Substrat verrier revetu de couches a tenue mecanique amelioree |
Non-Patent Citations (1)
| Title |
|---|
| RYAN JOSEPH; PANTANO C.: "Synthesis and characterization of inorganic silicon oxycarbide glass thin films by reactive rf-magnetron sputtering", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART A., AVS /AIP, MELVILLE, NY., US, vol. 25, no. 1, 10.1116/, 3 January 2007 (2007-01-03), MELVILLE, NY., US, pages 153 - 159, XP012102547, ISSN: 0734-2101, DOI: 10.1116/1.2404688 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US9012024B2 (en) | 2015-04-21 |
| IN2014MN00825A (enExample) | 2015-04-17 |
| CA2854052C (fr) | 2020-01-07 |
| KR20140093235A (ko) | 2014-07-25 |
| HUE045009T2 (hu) | 2019-12-30 |
| CN103974918B (zh) | 2016-12-14 |
| EP2780294B1 (fr) | 2019-03-27 |
| KR102000803B1 (ko) | 2019-07-16 |
| EA201490968A1 (ru) | 2014-08-29 |
| US20140349107A1 (en) | 2014-11-27 |
| BR112014010220A2 (pt) | 2017-06-13 |
| CA2854052A1 (fr) | 2013-05-23 |
| WO2013072623A1 (fr) | 2013-05-23 |
| MX336859B (es) | 2016-02-04 |
| ES2736923T3 (es) | 2020-01-09 |
| PT2780294T (pt) | 2019-07-10 |
| TR201909120T4 (tr) | 2019-07-22 |
| FR2982608A1 (fr) | 2013-05-17 |
| EP2780294A1 (fr) | 2014-09-24 |
| DK2780294T3 (da) | 2019-07-08 |
| FR2982608B1 (fr) | 2013-11-22 |
| JP2015506890A (ja) | 2015-03-05 |
| MX2014005735A (es) | 2014-07-09 |
| PL2780294T3 (pl) | 2019-09-30 |
| JP6050370B2 (ja) | 2016-12-21 |
| CN103974918A (zh) | 2014-08-06 |
| BR112014010220A8 (pt) | 2017-06-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EA024976B1 (ru) | Барьерный слой для щелочных металлов на основе sioc | |
| MX2011007156A (es) | Sustrato hidrofobo comprendiendo una capa de cebador del tipo oxicarburo de silicio activado por plasma. | |
| WO2008073926A3 (en) | Formation of epitaxial layers containing silicon | |
| WO2012002995A3 (en) | Thin films and methods of making them using cyclohexasilane | |
| WO2009149167A3 (en) | Low temperature deposition of silicon-containing films | |
| GB201110117D0 (en) | method and device for manufacturing a barrie layer on a flexible substrate | |
| MX2014005761A (es) | Encristalado hidrofobico. | |
| WO2014116304A3 (en) | Method and hardware for cleaning uv chambers | |
| JP2013513235A5 (enExample) | ||
| WO2011084532A3 (en) | Dielectric film formation using inert gas excitation | |
| WO2004097063A3 (en) | Method for producing silicon oxide film and method for producing optical multilayer film | |
| WO2006078719A3 (en) | Interface engineering to improve adhesion between low k stacks | |
| WO2012071163A3 (en) | Composite removable hardmask | |
| GB201207448D0 (en) | Method of depositing silicon dioxide films | |
| EP2362003A3 (en) | Methods of depositing SiO2 films | |
| EP2376681A4 (en) | GENERATION OF A CRYSTAL DIAMOND BY CVD WITH FAST GROWTH RATE | |
| WO2007027350A3 (en) | Method of removing surface deposits and passivating interior surfaces of the interior of a chemical vapour deposition (cvd) chamber | |
| TW200715400A (en) | Etching method and etching device | |
| ATE427367T1 (de) | Verfahren zur herstellung einer dunnen schicht von stabilisiertem fluorhaltigen silika, so beschichtetes substrat und so erhaltene ophthalmische linse | |
| CN1754252A (zh) | 生产氢化碳氧化硅膜的方法 | |
| WO2005090638A8 (en) | Remote chamber methods for removing surface deposits | |
| JP2015106572A (ja) | シリコン窒化膜の形成方法及びシリコン窒化膜 | |
| WO2019232402A8 (en) | Carbon-doped silicon dioxide glass and methods of manufacturing thereof | |
| WO2010019946A4 (en) | Anti-reflective surfaces and methods for making the same | |
| CN105633010B (zh) | 互连结构及其形成方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s) |
Designated state(s): AM AZ BY KZ KG TJ TM |
|
| MM4A | Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s) |
Designated state(s): RU |