ATE427367T1 - Verfahren zur herstellung einer dunnen schicht von stabilisiertem fluorhaltigen silika, so beschichtetes substrat und so erhaltene ophthalmische linse - Google Patents

Verfahren zur herstellung einer dunnen schicht von stabilisiertem fluorhaltigen silika, so beschichtetes substrat und so erhaltene ophthalmische linse

Info

Publication number
ATE427367T1
ATE427367T1 AT03756536T AT03756536T ATE427367T1 AT E427367 T1 ATE427367 T1 AT E427367T1 AT 03756536 T AT03756536 T AT 03756536T AT 03756536 T AT03756536 T AT 03756536T AT E427367 T1 ATE427367 T1 AT E427367T1
Authority
AT
Austria
Prior art keywords
sub
producing
thin layer
coated substrate
ophthalmic lens
Prior art date
Application number
AT03756536T
Other languages
English (en)
Inventor
Karin Scherer
Pascale Lacan
Philippe Roisin
Richard Bosmans
Original Assignee
Essilor Int
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR0210112A external-priority patent/FR2843407B1/fr
Priority claimed from FR0210110A external-priority patent/FR2843406A1/fr
Application filed by Essilor Int filed Critical Essilor Int
Application granted granted Critical
Publication of ATE427367T1 publication Critical patent/ATE427367T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/105—
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
  • Silicon Compounds (AREA)
AT03756536T 2002-08-08 2003-08-07 Verfahren zur herstellung einer dunnen schicht von stabilisiertem fluorhaltigen silika, so beschichtetes substrat und so erhaltene ophthalmische linse ATE427367T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0210112A FR2843407B1 (fr) 2002-08-08 2002-08-08 Procede d'obtention d'une couche mince, stabilisee, de silice dopee au fluor, couche mince obtenue et leur application en optique ophtalmique
FR0210110A FR2843406A1 (fr) 2002-08-08 2002-08-08 Procede d'obtention d'une couche mince, stabilisee, de silice dopee au fluor, couche mince obtenue et leur application en optique ophtalmique

Publications (1)

Publication Number Publication Date
ATE427367T1 true ATE427367T1 (de) 2009-04-15

Family

ID=31889633

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03756536T ATE427367T1 (de) 2002-08-08 2003-08-07 Verfahren zur herstellung einer dunnen schicht von stabilisiertem fluorhaltigen silika, so beschichtetes substrat und so erhaltene ophthalmische linse

Country Status (7)

Country Link
US (1) US20060023311A1 (de)
EP (1) EP1529124B1 (de)
JP (1) JP4434949B2 (de)
KR (1) KR101151813B1 (de)
AT (1) ATE427367T1 (de)
DE (1) DE60326959D1 (de)
WO (1) WO2004016822A2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6355580B1 (en) 1998-09-03 2002-03-12 Micron Technology, Inc. Ion-assisted oxidation methods and the resulting structures
FR2859487B1 (fr) * 2003-09-04 2006-12-15 Essilor Int Procede de depot d'une couche amorphe contenant majoritairement du fluor et du carbone et dispositif convenant a sa mise en oeuvre
JP2007041292A (ja) * 2005-08-03 2007-02-15 Konica Minolta Opto Inc 光学素子
WO2007114188A1 (ja) * 2006-03-31 2007-10-11 Hoya Corporation イオン銃システム、蒸着装置、及びレンズの製造方法
FR2917510B1 (fr) 2007-06-13 2012-01-27 Essilor Int Article d'optique revetu d'un revetement antireflet comprenant une sous-couche partiellement formee sous assistance ionique et procede de fabrication
WO2009062140A2 (en) * 2007-11-08 2009-05-14 Sager Brian M Improved anti-reflective coating
EP2333132A4 (de) * 2008-09-05 2013-01-30 Shincron Co Ltd Filmbildungsverfahren und ölabweisende basis dafür
JP4688230B2 (ja) * 2008-10-09 2011-05-25 株式会社シンクロン 成膜方法
CA2793855A1 (en) * 2010-03-22 2011-09-29 Luxottica Us Holdings Corporation Ion beam assisted deposition of ophthalmic lens coatings
US8883935B2 (en) 2010-04-29 2014-11-11 Battelle Memorial Institute High refractive index composition
FR2965820B1 (fr) * 2010-10-12 2012-11-16 Essilor Int Article comprenant une couche mesoporeuse protegee par un revetement faisant barriere au sebum et procede de fabrication
FR2968774B1 (fr) * 2010-12-10 2013-02-08 Essilor Int Article d'optique comportant un revetement antireflet a faible reflexion dans le domaine ultraviolet et le domaine visible
WO2013152031A1 (en) * 2012-04-04 2013-10-10 Kla-Tencor Corporation Protective fluorine-doped silicon oxide film for optical components
US20140272295A1 (en) * 2013-03-14 2014-09-18 Sdc Technologies, Inc. Anti-fog nanotextured surfaces and articles containing the same
EP3017324B1 (de) * 2013-07-05 2021-11-10 Essilor International Optischer artikel mit einer antireflexionsbeschichtung mit sehr geringer reflexion im sichtbaren bereich
TWI559026B (zh) * 2015-06-24 2016-11-21 財團法人工業技術研究院 抗反射結構及其製造方法
FR3045672B1 (fr) * 2015-12-18 2018-03-16 Corporation De L'ecole Polytechnique De Montreal Article comprenant une couche organique-inorganique de bas indice de refraction
JP2019015764A (ja) * 2017-07-03 2019-01-31 東海光学株式会社 プラスチック光学製品並びにプラスチック眼鏡レンズ及び眼鏡
EP3693766B1 (de) 2019-02-05 2024-10-30 Corporation de L'Ecole Polytechnique de Montreal Mit einer schicht mit niedrigem brechungsindex auf basis von fluorierten organosiliciumverbindungen beschichteter artikel
EP3693765B1 (de) 2019-02-05 2023-04-19 Essilor International Mit einer antireflexionsschicht mit verbesserten optischen eigenschaften beschichteter artikel

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03202461A (ja) * 1989-12-29 1991-09-04 Nissin Electric Co Ltd 高絶縁酸化ケイ素薄膜の形成方法
JPH05215929A (ja) * 1992-02-03 1993-08-27 Hitachi Cable Ltd ガラス導波路の製造方法
US5719705A (en) * 1995-06-07 1998-02-17 Sola International, Inc. Anti-static anti-reflection coating
US6001728A (en) * 1996-03-15 1999-12-14 Applied Materials, Inc. Method and apparatus for improving film stability of halogen-doped silicon oxide films
JP3836214B2 (ja) * 1997-05-12 2006-10-25 凸版印刷株式会社 反射防止材及び光学部材
JPH11264903A (ja) * 1998-03-17 1999-09-28 Canon Inc 反射防止膜およびその製造方法
US6300672B1 (en) * 1998-07-22 2001-10-09 Siemens Aktiengesellschaft Silicon oxynitride cap for fluorinated silicate glass film in intermetal dielectric semiconductor fabrication
US6165915A (en) * 1999-08-11 2000-12-26 Taiwan Semiconductor Manufacturing Company Forming halogen doped glass dielectric layer with enhanced stability
US6511923B1 (en) * 2000-05-19 2003-01-28 Applied Materials, Inc. Deposition of stable dielectric films
FR2812664B1 (fr) * 2000-08-01 2002-11-08 Essilor Int Procede de depot d'une couche de silice dopee au fluor et son application en optique ophtalmique

Also Published As

Publication number Publication date
DE60326959D1 (de) 2009-05-14
WO2004016822A2 (fr) 2004-02-26
JP4434949B2 (ja) 2010-03-17
AU2003285355A1 (en) 2004-03-03
EP1529124A2 (de) 2005-05-11
KR20050062535A (ko) 2005-06-23
WO2004016822A3 (fr) 2004-04-08
EP1529124B1 (de) 2009-04-01
JP2005534995A (ja) 2005-11-17
US20060023311A1 (en) 2006-02-02
KR101151813B1 (ko) 2012-06-01

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