DE888191C - Bad und Verfahren zur galvanischen Vernicklung - Google Patents
Bad und Verfahren zur galvanischen VernicklungInfo
- Publication number
- DE888191C DE888191C DEU621A DEU0000621A DE888191C DE 888191 C DE888191 C DE 888191C DE U621 A DEU621 A DE U621A DE U0000621 A DEU0000621 A DE U0000621A DE 888191 C DE888191 C DE 888191C
- Authority
- DE
- Germany
- Prior art keywords
- bath
- quinoline
- nickel
- soluble
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 32
- 229910052759 nickel Inorganic materials 0.000 title claims description 16
- 238000007747 plating Methods 0.000 title claims description 9
- 238000000034 method Methods 0.000 title claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 46
- SMUQFGGVLNAIOZ-UHFFFAOYSA-N quinaldine Chemical compound C1=CC=CC2=NC(C)=CC=C21 SMUQFGGVLNAIOZ-UHFFFAOYSA-N 0.000 claims description 34
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims description 30
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 claims description 19
- 239000003795 chemical substances by application Substances 0.000 claims description 13
- 150000003839 salts Chemical class 0.000 claims description 13
- 150000002815 nickel Chemical class 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 11
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims description 10
- FVVXWRGARUACNW-UHFFFAOYSA-N 3-methylisoquinoline Chemical compound C1=CC=C2C=NC(C)=CC2=C1 FVVXWRGARUACNW-UHFFFAOYSA-N 0.000 claims description 8
- DEVUYWTZRXOMSI-UHFFFAOYSA-N (sulfamoylamino)benzene Chemical compound NS(=O)(=O)NC1=CC=CC=C1 DEVUYWTZRXOMSI-UHFFFAOYSA-N 0.000 claims description 7
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 7
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 7
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 7
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 7
- 229910052794 bromium Inorganic materials 0.000 claims description 7
- 229910052801 chlorine Inorganic materials 0.000 claims description 7
- 239000000460 chlorine Substances 0.000 claims description 7
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 7
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 7
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 7
- 239000000654 additive Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 5
- 230000002378 acidificating effect Effects 0.000 claims description 5
- -1 isoquinoline compound Chemical class 0.000 claims description 5
- DTBDAFLSBDGPEA-UHFFFAOYSA-N 3-Methylquinoline Natural products C1=CC=CC2=CC(C)=CN=C21 DTBDAFLSBDGPEA-UHFFFAOYSA-N 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- NVBFHJWHLNUMCV-UHFFFAOYSA-N sulfamide Chemical class NS(N)(=O)=O NVBFHJWHLNUMCV-UHFFFAOYSA-N 0.000 claims description 3
- 150000003460 sulfonic acids Chemical class 0.000 claims description 3
- 150000007513 acids Chemical class 0.000 claims description 2
- 239000002932 luster Substances 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims 7
- 230000000996 additive effect Effects 0.000 claims 5
- 238000005868 electrolysis reaction Methods 0.000 claims 5
- VREVKZLUMZQJRI-UHFFFAOYSA-N [SH2]=N Chemical class [SH2]=N VREVKZLUMZQJRI-UHFFFAOYSA-N 0.000 claims 1
- 239000003929 acidic solution Substances 0.000 claims 1
- 230000005518 electrochemistry Effects 0.000 claims 1
- 238000009713 electroplating Methods 0.000 claims 1
- 239000012266 salt solution Substances 0.000 claims 1
- 239000000243 solution Substances 0.000 claims 1
- JJPSZKIOGBRMHK-UHFFFAOYSA-N 2,6-dimethylquinoline Chemical compound N1=C(C)C=CC2=CC(C)=CC=C21 JJPSZKIOGBRMHK-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 5
- 239000004327 boric acid Substances 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 3
- ZXGXGZGKWSUMJK-UHFFFAOYSA-N 2,4,6-trimethylquinoline Chemical compound N1=C(C)C=C(C)C2=CC(C)=CC=C21 ZXGXGZGKWSUMJK-UHFFFAOYSA-N 0.000 description 2
- ZTNANFDSJRRZRJ-UHFFFAOYSA-N 2,4-dimethylquinoline Chemical compound C1=CC=CC2=NC(C)=CC(C)=C21 ZTNANFDSJRRZRJ-UHFFFAOYSA-N 0.000 description 2
- BELFSAVWJLQIBB-UHFFFAOYSA-N 2,8-dimethylquinoline Chemical compound C1=CC=C(C)C2=NC(C)=CC=C21 BELFSAVWJLQIBB-UHFFFAOYSA-N 0.000 description 2
- OFUFXTHGZWIDDB-UHFFFAOYSA-N 2-chloroquinoline Chemical compound C1=CC=CC2=NC(Cl)=CC=C21 OFUFXTHGZWIDDB-UHFFFAOYSA-N 0.000 description 2
- PPEJLOXOMBAXES-UHFFFAOYSA-N 6-methylisoquinoline Chemical compound C1=NC=CC2=CC(C)=CC=C21 PPEJLOXOMBAXES-UHFFFAOYSA-N 0.000 description 2
- JRLTTZUODKEYDH-UHFFFAOYSA-N 8-methylquinoline Chemical compound C1=CN=C2C(C)=CC=CC2=C1 JRLTTZUODKEYDH-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- JHXGTIXTWZPIKQ-UHFFFAOYSA-N (sulfamoylamino)ethene Chemical compound NS(=O)(=O)NC=C JHXGTIXTWZPIKQ-UHFFFAOYSA-N 0.000 description 1
- CGLHFJGXOBNMGI-UHFFFAOYSA-N 1,5-diphenylcyclohexa-2,4-diene-1-sulfonic acid Chemical compound C1(=CC=CC=C1)C1(CC(=CC=C1)C1=CC=CC=C1)S(=O)(=O)O CGLHFJGXOBNMGI-UHFFFAOYSA-N 0.000 description 1
- CYRONKIISXPXER-UHFFFAOYSA-N 2,4-dibromoquinoline Chemical compound C1=CC=CC2=NC(Br)=CC(Br)=C21 CYRONKIISXPXER-UHFFFAOYSA-N 0.000 description 1
- QNBJYUUUYZVIJP-UHFFFAOYSA-N 2,4-dichloroquinoline Chemical compound C1=CC=CC2=NC(Cl)=CC(Cl)=C21 QNBJYUUUYZVIJP-UHFFFAOYSA-N 0.000 description 1
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 1
- WVDARQFRSJYGOH-UHFFFAOYSA-N 2-bromo-1h-isoquinoline Chemical compound C1=CC=C2C=CN(Br)CC2=C1 WVDARQFRSJYGOH-UHFFFAOYSA-N 0.000 description 1
- QKJAZPHKNWSXDF-UHFFFAOYSA-N 2-bromoquinoline Chemical compound C1=CC=CC2=NC(Br)=CC=C21 QKJAZPHKNWSXDF-UHFFFAOYSA-N 0.000 description 1
- XCIZVKSCLVSDHN-UHFFFAOYSA-N 2-ethylquinoline Chemical compound C1=CC=CC2=NC(CC)=CC=C21 XCIZVKSCLVSDHN-UHFFFAOYSA-N 0.000 description 1
- WYZCPUGQKXYGRV-UHFFFAOYSA-N 3-(sulfamoylamino)prop-1-ene Chemical compound NS(=O)(=O)NCC=C WYZCPUGQKXYGRV-UHFFFAOYSA-N 0.000 description 1
- HPFGRHQVLBAAFX-UHFFFAOYSA-N 3-bromo-2-methylquinoline Chemical compound C1=CC=C2C=C(Br)C(C)=NC2=C1 HPFGRHQVLBAAFX-UHFFFAOYSA-N 0.000 description 1
- VKQLIAGIUZPMER-UHFFFAOYSA-N 3-chloro-2-methylquinoline Chemical compound C1=CC=C2C=C(Cl)C(C)=NC2=C1 VKQLIAGIUZPMER-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- PXACTUVBBMDKRW-UHFFFAOYSA-N 4-bromobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(Br)C=C1 PXACTUVBBMDKRW-UHFFFAOYSA-N 0.000 description 1
- FKBTZADMCXPVSF-UHFFFAOYSA-N 4-chloro-3-formylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(Cl)C(C=O)=C1 FKBTZADMCXPVSF-UHFFFAOYSA-N 0.000 description 1
- RJWBTWIBUIGANW-UHFFFAOYSA-N 4-chlorobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(Cl)C=C1 RJWBTWIBUIGANW-UHFFFAOYSA-N 0.000 description 1
- ZTEATMVVGQUULZ-UHFFFAOYSA-N 6-bromoisoquinoline Chemical compound C1=NC=CC2=CC(Br)=CC=C21 ZTEATMVVGQUULZ-UHFFFAOYSA-N 0.000 description 1
- IFIHYLCUKYCKRH-UHFFFAOYSA-N 6-bromoquinoline Chemical compound N1=CC=CC2=CC(Br)=CC=C21 IFIHYLCUKYCKRH-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- GQPRZSFQSOEDNV-UHFFFAOYSA-N 8-bromo-2-methylquinoline Chemical compound C1=CC=C(Br)C2=NC(C)=CC=C21 GQPRZSFQSOEDNV-UHFFFAOYSA-N 0.000 description 1
- VVLYDFPOGMTMFJ-UHFFFAOYSA-N 8-chloro-2-methylquinoline Chemical compound C1=CC=C(Cl)C2=NC(C)=CC=C21 VVLYDFPOGMTMFJ-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- CQZLNHAZDZPANH-UHFFFAOYSA-N [Ni].[K].[Na] Chemical compound [Ni].[K].[Na] CQZLNHAZDZPANH-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzenecarboxaldehyde Natural products O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- ADGHZDTUDUGYOU-UHFFFAOYSA-N bromobenzene;sulfamide Chemical compound NS(N)(=O)=O.BrC1=CC=CC=C1 ADGHZDTUDUGYOU-UHFFFAOYSA-N 0.000 description 1
- OGQPUOLFKIMRMF-UHFFFAOYSA-N chlorosulfamic acid Chemical compound OS(=O)(=O)NCl OGQPUOLFKIMRMF-UHFFFAOYSA-N 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- RCFKEIREOSXLET-UHFFFAOYSA-N disulfamide Chemical compound CC1=CC(Cl)=C(S(N)(=O)=O)C=C1S(N)(=O)=O RCFKEIREOSXLET-UHFFFAOYSA-N 0.000 description 1
- 229950008177 disulfamide Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 150000002537 isoquinolines Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- 125000001741 organic sulfur group Chemical group 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- CGEXUOTXYSGBLV-UHFFFAOYSA-N phenyl benzenesulfonate Chemical compound C=1C=CC=CC=1S(=O)(=O)OC1=CC=CC=C1 CGEXUOTXYSGBLV-UHFFFAOYSA-N 0.000 description 1
- 230000003389 potentiating effect Effects 0.000 description 1
- 230000037390 scarring Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- IHRQVOBHLWHVSE-UHFFFAOYSA-N sulfamide;toluene Chemical compound NS(N)(=O)=O.CC1=CC=CC=C1 IHRQVOBHLWHVSE-UHFFFAOYSA-N 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US174375A US2648628A (en) | 1950-07-17 | 1950-07-17 | Electroplating of nickel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE888191C true DE888191C (de) | 1953-08-31 |
Family
ID=22635933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DEU621A Expired DE888191C (de) | 1950-07-17 | 1950-09-24 | Bad und Verfahren zur galvanischen Vernicklung |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US2648628A (en:Method) |
| BE (1) | BE504701A (en:Method) |
| DE (1) | DE888191C (en:Method) |
| FR (1) | FR1130462A (en:Method) |
| NL (1) | NL82355C (en:Method) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE940860C (de) * | 1952-07-05 | 1956-03-29 | Metallic Industry Nv | Saures Elektrolytbad zur Herstellung elektrolytischer Kupferueberzuege |
| DE1001078B (de) * | 1953-08-13 | 1957-01-17 | Dehydag Gmbh | Galvanische Baeder zur Herstellung von Metallueberzuegen |
| DE1004011B (de) * | 1955-03-16 | 1957-03-07 | Dehydag Gmbh | Saures galvanisches Nickelbad |
| DE1023647B (de) * | 1954-10-30 | 1958-01-30 | Dehydag Gmbh | Galvanische Baeder zur Herstellung hochglaenzender Metallueberzuege |
| DE1032056B (de) * | 1954-08-09 | 1958-06-12 | Metal & Thermit Corp | Glanzvernickelungsbad |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4990226A (en) * | 1989-11-06 | 1991-02-05 | Gte Products Corporation | Electroplating wires with nickel at high-speed and a nickel fluoborate bath therefor |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE676075C (de) * | 1936-04-14 | 1939-05-25 | Harshaw Chem Corp | Verfahren zur elektrolytischen Herstellung von glaenzenden Nickelueberzuegen |
| US2191813A (en) * | 1939-12-01 | 1940-02-27 | Udylite Corp | Electrodeposition of nickel from an acid bath |
| DE692766C (de) * | 1939-03-02 | 1940-06-27 | Udylite Corp | Verfahren zur Herstellung galvanischer Niederschlaege von Nickel |
| DE699021C (de) * | 1934-09-05 | 1940-11-21 | Ly Blasberg Geb Hillebrand | Verfahren zur Herstellung von glaenzenden Nickelueberzuegen |
| US2466677A (en) * | 1945-08-27 | 1949-04-12 | Udylite Corp | Electrodeposition of nickel from an acid bath |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2238861A (en) * | 1938-07-06 | 1941-04-15 | Harshaw Chem Corp | Electrodeposition of metals |
| US2315802A (en) * | 1940-04-20 | 1943-04-06 | Harshaw Chem Corp | Nickel plating |
-
0
- BE BE504701D patent/BE504701A/xx unknown
-
1950
- 1950-07-17 US US174375A patent/US2648628A/en not_active Expired - Lifetime
- 1950-09-24 DE DEU621A patent/DE888191C/de not_active Expired
-
1951
- 1951-07-14 NL NL162654A patent/NL82355C/xx active
- 1951-07-16 FR FR1130462D patent/FR1130462A/fr not_active Expired
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE699021C (de) * | 1934-09-05 | 1940-11-21 | Ly Blasberg Geb Hillebrand | Verfahren zur Herstellung von glaenzenden Nickelueberzuegen |
| DE676075C (de) * | 1936-04-14 | 1939-05-25 | Harshaw Chem Corp | Verfahren zur elektrolytischen Herstellung von glaenzenden Nickelueberzuegen |
| DE692766C (de) * | 1939-03-02 | 1940-06-27 | Udylite Corp | Verfahren zur Herstellung galvanischer Niederschlaege von Nickel |
| US2191813A (en) * | 1939-12-01 | 1940-02-27 | Udylite Corp | Electrodeposition of nickel from an acid bath |
| US2466677A (en) * | 1945-08-27 | 1949-04-12 | Udylite Corp | Electrodeposition of nickel from an acid bath |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE940860C (de) * | 1952-07-05 | 1956-03-29 | Metallic Industry Nv | Saures Elektrolytbad zur Herstellung elektrolytischer Kupferueberzuege |
| DE1001078B (de) * | 1953-08-13 | 1957-01-17 | Dehydag Gmbh | Galvanische Baeder zur Herstellung von Metallueberzuegen |
| DE1032056B (de) * | 1954-08-09 | 1958-06-12 | Metal & Thermit Corp | Glanzvernickelungsbad |
| DE1023647B (de) * | 1954-10-30 | 1958-01-30 | Dehydag Gmbh | Galvanische Baeder zur Herstellung hochglaenzender Metallueberzuege |
| DE1004011B (de) * | 1955-03-16 | 1957-03-07 | Dehydag Gmbh | Saures galvanisches Nickelbad |
Also Published As
| Publication number | Publication date |
|---|---|
| BE504701A (en:Method) | |
| FR1130462A (fr) | 1957-02-06 |
| NL82355C (en:Method) | 1956-03-15 |
| US2648628A (en) | 1953-08-11 |
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