DE69913317T2 - Reinigungs-/schwabbeleinheit für halbleiterbearbeitungsvorrichtung - Google Patents

Reinigungs-/schwabbeleinheit für halbleiterbearbeitungsvorrichtung Download PDF

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Publication number
DE69913317T2
DE69913317T2 DE69913317T DE69913317T DE69913317T2 DE 69913317 T2 DE69913317 T2 DE 69913317T2 DE 69913317 T DE69913317 T DE 69913317T DE 69913317 T DE69913317 T DE 69913317T DE 69913317 T2 DE69913317 T2 DE 69913317T2
Authority
DE
Germany
Prior art keywords
wafer
brush
buffing
cleaning
station
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69913317T
Other languages
German (de)
English (en)
Other versions
DE69913317D1 (de
Inventor
Mikhael Ravkin
M. John DELARIOS
Xiuhua Zhang
R. Thomas GOCKEL
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of DE69913317D1 publication Critical patent/DE69913317D1/de
Application granted granted Critical
Publication of DE69913317T2 publication Critical patent/DE69913317T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/34—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis parallel to the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Magnetic Heads (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Lead Frames For Integrated Circuits (AREA)
DE69913317T 1998-01-20 1999-01-19 Reinigungs-/schwabbeleinheit für halbleiterbearbeitungsvorrichtung Expired - Lifetime DE69913317T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/009,583 US6200201B1 (en) 1996-08-29 1998-01-20 Cleaning/buffer apparatus for use in a wafer processing device
US9583 1998-01-20
PCT/US1999/001106 WO1999036196A1 (en) 1998-01-20 1999-01-19 A cleaning/buffing apparatus for use in a wafer processing device

Publications (2)

Publication Number Publication Date
DE69913317D1 DE69913317D1 (de) 2004-01-15
DE69913317T2 true DE69913317T2 (de) 2004-09-30

Family

ID=21738550

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69913317T Expired - Lifetime DE69913317T2 (de) 1998-01-20 1999-01-19 Reinigungs-/schwabbeleinheit für halbleiterbearbeitungsvorrichtung

Country Status (8)

Country Link
US (1) US6200201B1 (https=)
EP (1) EP1056549B1 (https=)
JP (1) JP2002509367A (https=)
KR (1) KR100583999B1 (https=)
AT (1) ATE255473T1 (https=)
DE (1) DE69913317T2 (https=)
TW (1) TW412460B (https=)
WO (1) WO1999036196A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6368183B1 (en) * 1999-02-03 2002-04-09 Speedfam-Ipec Corporation Wafer cleaning apparatus and associated wafer processing methods
WO2002088683A1 (en) * 2001-04-30 2002-11-07 The Board Of Trustees Of The University Of Illinois Method and apparatus for characterization of ultrathin silicon oxide films using mirror-enhanced polarized reflectance fourier transform infrared spectroscopy
WO2003071592A1 (en) * 2002-02-20 2003-08-28 Ebara Corporation Method and device for polishing
KR100995900B1 (ko) * 2002-04-10 2010-11-22 에바라 간쿄 플랜트 가부시키가이샤 폐기물의 가스화 용융시스템
US6916233B2 (en) * 2002-11-28 2005-07-12 Tsc Corporation Polishing and cleaning compound device
US7077731B1 (en) * 2003-12-22 2006-07-18 Lam Research Corporation Chemical mechanical planarization (CMP) system and method for preparing a wafer in a cleaning module
TWI372661B (en) * 2007-11-21 2012-09-21 Tokyo Electron Ltd Cleaning apparatus and cleaning method
US8468637B2 (en) * 2009-02-06 2013-06-25 Endoclear Llc Mechanically-actuated endotracheal tube cleaning device
SG10201508329UA (en) * 2014-10-10 2016-05-30 Ebara Corp Buffing apparatus and substrate processing apparatus
JP6346541B2 (ja) * 2014-10-10 2018-06-20 株式会社荏原製作所 バフ処理装置、および、基板処理装置
CN111854428B (zh) * 2019-04-29 2024-12-06 伊利诺斯工具制品有限公司 网带用清洁装置及具有网带用清洁装置的烧结炉
KR20200130545A (ko) 2019-05-08 2020-11-19 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조방법
JP7491774B2 (ja) * 2020-08-24 2024-05-28 株式会社荏原製作所 基板保持回転機構、基板処理装置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4141180A (en) * 1977-09-21 1979-02-27 Kayex Corporation Polishing apparatus
JPS59110550A (ja) * 1982-12-17 1984-06-26 Himejima Dousen Kk 電気めつき線の研磨装置
JPH06101329B2 (ja) * 1982-12-23 1994-12-12 松下電器産業株式会社 電池用極板のバフ研磨機
US4586296A (en) * 1984-07-03 1986-05-06 Charlton Associates Method of finishing the surface of a disc
US4680893A (en) * 1985-09-23 1987-07-21 Motorola, Inc. Apparatus for polishing semiconductor wafers
JPH01226167A (ja) * 1988-03-07 1989-09-08 Seiko Epson Corp 半導体装置基板の製造方法
US5121572A (en) * 1990-11-06 1992-06-16 Timesavers, Inc. Opposed disc deburring system
US5140774A (en) * 1991-10-31 1992-08-25 System Seiko Co., Ltd. Apparatus for polishing hard disk substrates
JP3315544B2 (ja) * 1994-11-29 2002-08-19 株式会社荏原製作所 半導体ウエハ研磨装置および方法
JPH07211677A (ja) 1993-11-30 1995-08-11 M Setetsuku Kk 基板のスクラビング方法とその装置
US5555177A (en) 1994-05-27 1996-09-10 Ontrak Systems, Inc. Method and apparatus for resetting individual processes in a control system
FR2722511B1 (fr) * 1994-07-15 1999-04-02 Ontrak Systems Inc Procede pour enlever les metaux dans un dispositif de recurage
JPH08150377A (ja) * 1994-11-29 1996-06-11 M Setetsuku Kk スクラビング用円筒ブラシ
US5551986A (en) 1995-02-15 1996-09-03 Taxas Instruments Incorporated Mechanical scrubbing for particle removal
US5704987A (en) 1996-01-19 1998-01-06 International Business Machines Corporation Process for removing residue from a semiconductor wafer after chemical-mechanical polishing
JP3658454B2 (ja) * 1996-03-29 2005-06-08 コマツ電子金属株式会社 半導体ウェハの製造方法
US5809832A (en) 1996-08-29 1998-09-22 Ontrak Systems, Inc. Roller positioning apparatus
US5794299A (en) 1996-08-29 1998-08-18 Ontrak Systems, Inc. Containment apparatus
DE19917064A1 (de) * 1999-04-15 2000-08-24 Wacker Siltronic Halbleitermat Verfahren zur Herstellung einer Schichtstruktur

Also Published As

Publication number Publication date
DE69913317D1 (de) 2004-01-15
JP2002509367A (ja) 2002-03-26
US6200201B1 (en) 2001-03-13
ATE255473T1 (de) 2003-12-15
EP1056549B1 (en) 2003-12-03
KR100583999B1 (ko) 2006-05-29
KR20010040352A (ko) 2001-05-15
WO1999036196A1 (en) 1999-07-22
EP1056549A1 (en) 2000-12-06
TW412460B (en) 2000-11-21

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