JP2002509367A - ウエハ処理装置に用いられる洗浄／バフ研磨装置 - Google Patents

ウエハ処理装置に用いられる洗浄／バフ研磨装置

Info

Publication number
JP2002509367A
JP2002509367A JP2000539949A JP2000539949A JP2002509367A JP 2002509367 A JP2002509367 A JP 2002509367A JP 2000539949 A JP2000539949 A JP 2000539949A JP 2000539949 A JP2000539949 A JP 2000539949A JP 2002509367 A JP2002509367 A JP 2002509367A
Authority
JP
Japan
Prior art keywords
wafer
buffing
station
brush
assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000539949A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002509367A5 (https=
Inventor
ラヴキン・ミカエル
デラリオス・ジョン・エム．
ジャン・シオウフア
ゴッケル・トーマス・アール．
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of JP2002509367A publication Critical patent/JP2002509367A/ja
Publication of JP2002509367A5 publication Critical patent/JP2002509367A5/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/34—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis parallel to the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Magnetic Heads (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Lead Frames For Integrated Circuits (AREA)
JP2000539949A 1998-01-20 1999-01-19 ウエハ処理装置に用いられる洗浄／バフ研磨装置 Pending JP2002509367A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/009,583 US6200201B1 (en) 1996-08-29 1998-01-20 Cleaning/buffer apparatus for use in a wafer processing device
US09/009,583 1998-01-20
PCT/US1999/001106 WO1999036196A1 (en) 1998-01-20 1999-01-19 A cleaning/buffing apparatus for use in a wafer processing device

Publications (2)

Publication Number Publication Date
JP2002509367A true JP2002509367A (ja) 2002-03-26
JP2002509367A5 JP2002509367A5 (https=) 2006-03-02

Family

ID=21738550

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000539949A Pending JP2002509367A (ja) 1998-01-20 1999-01-19 ウエハ処理装置に用いられる洗浄／バフ研磨装置

Country Status (8)

Country Link
US (1) US6200201B1 (https=)
EP (1) EP1056549B1 (https=)
JP (1) JP2002509367A (https=)
KR (1) KR100583999B1 (https=)
AT (1) ATE255473T1 (https=)
DE (1) DE69913317T2 (https=)
TW (1) TW412460B (https=)
WO (1) WO1999036196A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160042786A (ko) * 2014-10-10 2016-04-20 가부시키가이샤 에바라 세이사꾸쇼 버프 처리 장치 및 기판 처리 장치
JP2016081960A (ja) * 2014-10-10 2016-05-16 株式会社荏原製作所 バフ処理装置、および、基板処理装置

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6368183B1 (en) * 1999-02-03 2002-04-09 Speedfam-Ipec Corporation Wafer cleaning apparatus and associated wafer processing methods
WO2002088683A1 (en) * 2001-04-30 2002-11-07 The Board Of Trustees Of The University Of Illinois Method and apparatus for characterization of ultrathin silicon oxide films using mirror-enhanced polarized reflectance fourier transform infrared spectroscopy
WO2003071592A1 (en) * 2002-02-20 2003-08-28 Ebara Corporation Method and device for polishing
KR100995900B1 (ko) * 2002-04-10 2010-11-22 에바라 간쿄 플랜트 가부시키가이샤 폐기물의 가스화 용융시스템
US6916233B2 (en) * 2002-11-28 2005-07-12 Tsc Corporation Polishing and cleaning compound device
US7077731B1 (en) * 2003-12-22 2006-07-18 Lam Research Corporation Chemical mechanical planarization (CMP) system and method for preparing a wafer in a cleaning module
TWI372661B (en) * 2007-11-21 2012-09-21 Tokyo Electron Ltd Cleaning apparatus and cleaning method
US8468637B2 (en) * 2009-02-06 2013-06-25 Endoclear Llc Mechanically-actuated endotracheal tube cleaning device
CN111854428B (zh) * 2019-04-29 2024-12-06 伊利诺斯工具制品有限公司 网带用清洁装置及具有网带用清洁装置的烧结炉
KR20200130545A (ko) 2019-05-08 2020-11-19 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조방법
JP7491774B2 (ja) * 2020-08-24 2024-05-28 株式会社荏原製作所 基板保持回転機構、基板処理装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59110550A (ja) * 1982-12-17 1984-06-26 Himejima Dousen Kk 電気めつき線の研磨装置
JPS59117061A (ja) * 1982-12-23 1984-07-06 Matsushita Electric Ind Co Ltd 電池用極板のバフ研磨機
JPH01226167A (ja) * 1988-03-07 1989-09-08 Seiko Epson Corp 半導体装置基板の製造方法
JPH08150559A (ja) * 1994-11-29 1996-06-11 Ebara Corp 半導体ウエハ研磨装置
JPH08150377A (ja) * 1994-11-29 1996-06-11 M Setetsuku Kk スクラビング用円筒ブラシ
JPH08187475A (ja) * 1994-07-15 1996-07-23 Ontrak Syst Inc スクラバ中の金属を除去する方法
JPH09270397A (ja) * 1996-03-29 1997-10-14 Komatsu Electron Metals Co Ltd 半導体ウェハの製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4141180A (en) * 1977-09-21 1979-02-27 Kayex Corporation Polishing apparatus
US4586296A (en) * 1984-07-03 1986-05-06 Charlton Associates Method of finishing the surface of a disc
US4680893A (en) * 1985-09-23 1987-07-21 Motorola, Inc. Apparatus for polishing semiconductor wafers
US5121572A (en) * 1990-11-06 1992-06-16 Timesavers, Inc. Opposed disc deburring system
US5140774A (en) * 1991-10-31 1992-08-25 System Seiko Co., Ltd. Apparatus for polishing hard disk substrates
JPH07211677A (ja) 1993-11-30 1995-08-11 M Setetsuku Kk 基板のスクラビング方法とその装置
US5555177A (en) 1994-05-27 1996-09-10 Ontrak Systems, Inc. Method and apparatus for resetting individual processes in a control system
US5551986A (en) 1995-02-15 1996-09-03 Taxas Instruments Incorporated Mechanical scrubbing for particle removal
US5704987A (en) 1996-01-19 1998-01-06 International Business Machines Corporation Process for removing residue from a semiconductor wafer after chemical-mechanical polishing
US5809832A (en) 1996-08-29 1998-09-22 Ontrak Systems, Inc. Roller positioning apparatus
US5794299A (en) 1996-08-29 1998-08-18 Ontrak Systems, Inc. Containment apparatus
DE19917064A1 (de) * 1999-04-15 2000-08-24 Wacker Siltronic Halbleitermat Verfahren zur Herstellung einer Schichtstruktur

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59110550A (ja) * 1982-12-17 1984-06-26 Himejima Dousen Kk 電気めつき線の研磨装置
JPS59117061A (ja) * 1982-12-23 1984-07-06 Matsushita Electric Ind Co Ltd 電池用極板のバフ研磨機
JPH01226167A (ja) * 1988-03-07 1989-09-08 Seiko Epson Corp 半導体装置基板の製造方法
JPH08187475A (ja) * 1994-07-15 1996-07-23 Ontrak Syst Inc スクラバ中の金属を除去する方法
JPH08150559A (ja) * 1994-11-29 1996-06-11 Ebara Corp 半導体ウエハ研磨装置
JPH08150377A (ja) * 1994-11-29 1996-06-11 M Setetsuku Kk スクラビング用円筒ブラシ
JPH09270397A (ja) * 1996-03-29 1997-10-14 Komatsu Electron Metals Co Ltd 半導体ウェハの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160042786A (ko) * 2014-10-10 2016-04-20 가부시키가이샤 에바라 세이사꾸쇼 버프 처리 장치 및 기판 처리 장치
JP2016081960A (ja) * 2014-10-10 2016-05-16 株式会社荏原製作所 バフ処理装置、および、基板処理装置
KR102265229B1 (ko) 2014-10-10 2021-06-15 가부시키가이샤 에바라 세이사꾸쇼 버프 처리 장치 및 기판 처리 장치

Also Published As

Publication number Publication date
DE69913317D1 (de) 2004-01-15
US6200201B1 (en) 2001-03-13
ATE255473T1 (de) 2003-12-15
EP1056549B1 (en) 2003-12-03
DE69913317T2 (de) 2004-09-30
KR100583999B1 (ko) 2006-05-29
KR20010040352A (ko) 2001-05-15
WO1999036196A1 (en) 1999-07-22
EP1056549A1 (en) 2000-12-06
TW412460B (en) 2000-11-21

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