DE69523165T2 - Phasenschiebermasken-rohling und verfahren zu seiner herstellung - Google Patents

Phasenschiebermasken-rohling und verfahren zu seiner herstellung

Info

Publication number
DE69523165T2
DE69523165T2 DE69523165T DE69523165T DE69523165T2 DE 69523165 T2 DE69523165 T2 DE 69523165T2 DE 69523165 T DE69523165 T DE 69523165T DE 69523165 T DE69523165 T DE 69523165T DE 69523165 T2 DE69523165 T2 DE 69523165T2
Authority
DE
Germany
Prior art keywords
production
phase slider
rolling
mask rolling
slider mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69523165T
Other languages
English (en)
Other versions
DE69523165D1 (de
Inventor
Hideaki Mitsui
Kenji Matsumoto
Yoichi Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=14126112&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69523165(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of DE69523165D1 publication Critical patent/DE69523165D1/de
Application granted granted Critical
Publication of DE69523165T2 publication Critical patent/DE69523165T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3492—Variation of parameters during sputtering
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69523165T 1995-07-19 1995-07-19 Phasenschiebermasken-rohling und verfahren zu seiner herstellung Expired - Lifetime DE69523165T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP1995/001432 WO1997004360A1 (fr) 1995-07-19 1995-07-19 Ebauche de masque de decalage de phase et procede de production

Publications (2)

Publication Number Publication Date
DE69523165D1 DE69523165D1 (de) 2001-11-15
DE69523165T2 true DE69523165T2 (de) 2002-05-29

Family

ID=14126112

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69523165T Expired - Lifetime DE69523165T2 (de) 1995-07-19 1995-07-19 Phasenschiebermasken-rohling und verfahren zu seiner herstellung

Country Status (7)

Country Link
US (1) US5955223A (de)
EP (1) EP0788027B1 (de)
JP (2) JP2911610B2 (de)
KR (1) KR100225661B1 (de)
DE (1) DE69523165T2 (de)
TW (1) TW317641B (de)
WO (1) WO1997004360A1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100322537B1 (ko) 1999-07-02 2002-03-25 윤종용 블랭크 마스크 및 이를 이용한 위상 반전 마스크 제조방법
JP4163331B2 (ja) * 1999-07-14 2008-10-08 アルバック成膜株式会社 位相シフタ膜の製造方法、位相シフトマスク用ブランクスの製造方法、および、位相シフトマスクの製造方法
JP3722029B2 (ja) * 2000-09-12 2005-11-30 Ｈｏｙａ株式会社 位相シフトマスクブランクの製造方法、及び位相シフトマスクの製造方法
JP2002090978A (ja) * 2000-09-12 2002-03-27 Hoya Corp 位相シフトマスクブランクの製造方法、及び位相シフトマスクブランクの製造装置
JP3608654B2 (ja) * 2000-09-12 2005-01-12 Ｈｏｙａ株式会社 位相シフトマスクブランク、位相シフトマスク
JP2002141512A (ja) * 2000-11-06 2002-05-17 Advanced Display Inc 薄膜のパターニング方法およびそれを用いたｔｆｔアレイ基板およびその製造方法
JP4088742B2 (ja) * 2000-12-26 2008-05-21 信越化学工業株式会社 フォトマスクブランクス、フォトマスク及びフォトマスクブランクスの製造方法
US6653027B2 (en) * 2001-02-26 2003-11-25 International Business Machines Corporation Attenuated embedded phase shift photomask blanks
JP2006011434A (ja) * 2002-03-29 2006-01-12 Hoya Corp マスクブランク用基板、マスクブランクおよび転写用マスクの製造方法
US6730445B2 (en) * 2002-04-12 2004-05-04 International Business Machines Corporation Attenuated embedded phase shift photomask blanks
JP2004145065A (ja) * 2002-10-25 2004-05-20 Toppan Printing Co Ltd ハーフトーン型位相シフトマスク用ブランク及びその位相シフトマスク及びそのマスクを用いた半導体装置の製造方法
US20050100798A1 (en) * 2003-10-15 2005-05-12 Taiwan Semiconductor Manufacturing Company, Ltd. Device and method for providing wavelength reduction with a photomask
JP2007279214A (ja) * 2006-04-04 2007-10-25 Shin Etsu Chem Co Ltd フォトマスクブランク及びその製造方法、並びにフォトマスク及びその製造方法
US8258070B2 (en) 2006-11-27 2012-09-04 WGCH Technology Limited Engine exhaust catalysts containing palladium-gold
JP4910828B2 (ja) * 2007-03-28 2012-04-04 大日本印刷株式会社 階調マスク
JP5403040B2 (ja) * 2011-12-02 2014-01-29 大日本印刷株式会社 階調マスク
JP6396118B2 (ja) * 2014-08-20 2018-09-26 Hoya株式会社 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスクの製造方法
JP6499440B2 (ja) 2014-12-24 2019-04-10 Hoya株式会社 反射型マスクブランク及び反射型マスク
JP6728919B2 (ja) * 2015-04-14 2020-07-22 大日本印刷株式会社 フォトマスクおよびフォトマスクの製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3381933B2 (ja) * 1990-11-29 2003-03-04 株式会社東芝 露光用マスク
JP3083551B2 (ja) * 1990-11-30 2000-09-04 株式会社東芝 露光用マスクおよびその製造方法
JP3160332B2 (ja) * 1991-11-01 2001-04-25 大日本印刷株式会社 ハーフトーン位相シフトフォトマスク
JPH0661183A (ja) * 1992-08-05 1994-03-04 Mitsubishi Electric Corp スパッタエッチング装置
JP3064769B2 (ja) * 1992-11-21 2000-07-12 アルバック成膜株式会社 位相シフトマスクおよびその製造方法ならびにその位相シフトマスクを用いた露光方法
JP2837803B2 (ja) * 1993-03-26 1998-12-16 ホーヤ株式会社 位相シフトマスク及び位相シフトマスクブランク
KR100295385B1 (ko) * 1993-04-09 2001-09-17 기타지마 요시토시 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및이들의제조방법
JP3312702B2 (ja) * 1993-04-09 2002-08-12 大日本印刷株式会社 位相シフトフォトマスク及び位相シフトフォトマスク用ブランクス
DE4435773C2 (de) * 1993-10-08 1999-08-19 Dainippon Printing Co Ltd Absorptions-Phasenverschiebungsmaske und Herstellungsverfahren dafür
JP3453435B2 (ja) * 1993-10-08 2003-10-06 大日本印刷株式会社 位相シフトマスクおよびその製造方法
US5415953A (en) * 1994-02-14 1995-05-16 E. I. Du Pont De Nemours And Company Photomask blanks comprising transmissive embedded phase shifter
JP3397933B2 (ja) * 1995-03-24 2003-04-21 アルバック成膜株式会社 位相シフトフォトマスクブランクス、位相シフトフォトマスク、及びそれらの製造方法。

Also Published As

Publication number Publication date
JPH11237727A (ja) 1999-08-31
KR970706524A (ko) 1997-11-03
TW317641B (de) 1997-10-11
EP0788027A4 (de) 1997-12-10
DE69523165D1 (de) 2001-11-15
JP3249948B2 (ja) 2002-01-28
EP0788027A1 (de) 1997-08-06
EP0788027B1 (de) 2001-10-10
US5955223A (en) 1999-09-21
JP2911610B2 (ja) 1999-06-23
WO1997004360A1 (fr) 1997-02-06
KR100225661B1 (ko) 1999-10-15

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