DE69523165D1 - Phasenschiebermasken-rohling und verfahren zu seiner herstellung - Google Patents
Phasenschiebermasken-rohling und verfahren zu seiner herstellungInfo
- Publication number
- DE69523165D1 DE69523165D1 DE69523165T DE69523165T DE69523165D1 DE 69523165 D1 DE69523165 D1 DE 69523165D1 DE 69523165 T DE69523165 T DE 69523165T DE 69523165 T DE69523165 T DE 69523165T DE 69523165 D1 DE69523165 D1 DE 69523165D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- phase slider
- rolling
- mask rolling
- slider mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3492—Variation of parameters during sputtering
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP1995/001432 WO1997004360A1 (fr) | 1995-07-19 | 1995-07-19 | Ebauche de masque de decalage de phase et procede de production |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69523165D1 true DE69523165D1 (de) | 2001-11-15 |
DE69523165T2 DE69523165T2 (de) | 2002-05-29 |
Family
ID=14126112
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69523165T Expired - Lifetime DE69523165T2 (de) | 1995-07-19 | 1995-07-19 | Phasenschiebermasken-rohling und verfahren zu seiner herstellung |
Country Status (7)
Country | Link |
---|---|
US (1) | US5955223A (de) |
EP (1) | EP0788027B1 (de) |
JP (2) | JP2911610B2 (de) |
KR (1) | KR100225661B1 (de) |
DE (1) | DE69523165T2 (de) |
TW (1) | TW317641B (de) |
WO (1) | WO1997004360A1 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100322537B1 (ko) | 1999-07-02 | 2002-03-25 | 윤종용 | 블랭크 마스크 및 이를 이용한 위상 반전 마스크 제조방법 |
JP4163331B2 (ja) | 1999-07-14 | 2008-10-08 | アルバック成膜株式会社 | 位相シフタ膜の製造方法、位相シフトマスク用ブランクスの製造方法、および、位相シフトマスクの製造方法 |
JP3608654B2 (ja) * | 2000-09-12 | 2005-01-12 | Hoya株式会社 | 位相シフトマスクブランク、位相シフトマスク |
JP2002090978A (ja) * | 2000-09-12 | 2002-03-27 | Hoya Corp | 位相シフトマスクブランクの製造方法、及び位相シフトマスクブランクの製造装置 |
JP3722029B2 (ja) * | 2000-09-12 | 2005-11-30 | Hoya株式会社 | 位相シフトマスクブランクの製造方法、及び位相シフトマスクの製造方法 |
JP2002141512A (ja) * | 2000-11-06 | 2002-05-17 | Advanced Display Inc | 薄膜のパターニング方法およびそれを用いたtftアレイ基板およびその製造方法 |
JP4088742B2 (ja) * | 2000-12-26 | 2008-05-21 | 信越化学工業株式会社 | フォトマスクブランクス、フォトマスク及びフォトマスクブランクスの製造方法 |
US6653027B2 (en) * | 2001-02-26 | 2003-11-25 | International Business Machines Corporation | Attenuated embedded phase shift photomask blanks |
JP2006011434A (ja) * | 2002-03-29 | 2006-01-12 | Hoya Corp | マスクブランク用基板、マスクブランクおよび転写用マスクの製造方法 |
US6730445B2 (en) * | 2002-04-12 | 2004-05-04 | International Business Machines Corporation | Attenuated embedded phase shift photomask blanks |
JP2004145065A (ja) * | 2002-10-25 | 2004-05-20 | Toppan Printing Co Ltd | ハーフトーン型位相シフトマスク用ブランク及びその位相シフトマスク及びそのマスクを用いた半導体装置の製造方法 |
US20050100798A1 (en) * | 2003-10-15 | 2005-05-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Device and method for providing wavelength reduction with a photomask |
JP2007279214A (ja) * | 2006-04-04 | 2007-10-25 | Shin Etsu Chem Co Ltd | フォトマスクブランク及びその製造方法、並びにフォトマスク及びその製造方法 |
US8258070B2 (en) | 2006-11-27 | 2012-09-04 | WGCH Technology Limited | Engine exhaust catalysts containing palladium-gold |
JP4910828B2 (ja) * | 2007-03-28 | 2012-04-04 | 大日本印刷株式会社 | 階調マスク |
JP5403040B2 (ja) * | 2011-12-02 | 2014-01-29 | 大日本印刷株式会社 | 階調マスク |
JP6396118B2 (ja) * | 2014-08-20 | 2018-09-26 | Hoya株式会社 | 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスクの製造方法 |
JP6499440B2 (ja) | 2014-12-24 | 2019-04-10 | Hoya株式会社 | 反射型マスクブランク及び反射型マスク |
JP6728919B2 (ja) * | 2015-04-14 | 2020-07-22 | 大日本印刷株式会社 | フォトマスクおよびフォトマスクの製造方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3381933B2 (ja) * | 1990-11-29 | 2003-03-04 | 株式会社東芝 | 露光用マスク |
JP3083551B2 (ja) * | 1990-11-30 | 2000-09-04 | 株式会社東芝 | 露光用マスクおよびその製造方法 |
JP3160332B2 (ja) * | 1991-11-01 | 2001-04-25 | 大日本印刷株式会社 | ハーフトーン位相シフトフォトマスク |
JPH0661183A (ja) * | 1992-08-05 | 1994-03-04 | Mitsubishi Electric Corp | スパッタエッチング装置 |
JP3064769B2 (ja) * | 1992-11-21 | 2000-07-12 | アルバック成膜株式会社 | 位相シフトマスクおよびその製造方法ならびにその位相シフトマスクを用いた露光方法 |
JP2837803B2 (ja) * | 1993-03-26 | 1998-12-16 | ホーヤ株式会社 | 位相シフトマスク及び位相シフトマスクブランク |
JP3312702B2 (ja) * | 1993-04-09 | 2002-08-12 | 大日本印刷株式会社 | 位相シフトフォトマスク及び位相シフトフォトマスク用ブランクス |
KR100295385B1 (ko) * | 1993-04-09 | 2001-09-17 | 기타지마 요시토시 | 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및이들의제조방법 |
JP3453435B2 (ja) * | 1993-10-08 | 2003-10-06 | 大日本印刷株式会社 | 位相シフトマスクおよびその製造方法 |
DE4435773C2 (de) * | 1993-10-08 | 1999-08-19 | Dainippon Printing Co Ltd | Absorptions-Phasenverschiebungsmaske und Herstellungsverfahren dafür |
US5415953A (en) * | 1994-02-14 | 1995-05-16 | E. I. Du Pont De Nemours And Company | Photomask blanks comprising transmissive embedded phase shifter |
JP3397933B2 (ja) * | 1995-03-24 | 2003-04-21 | アルバック成膜株式会社 | 位相シフトフォトマスクブランクス、位相シフトフォトマスク、及びそれらの製造方法。 |
-
1995
- 1995-07-19 WO PCT/JP1995/001432 patent/WO1997004360A1/ja active IP Right Grant
- 1995-07-19 EP EP95925991A patent/EP0788027B1/de not_active Expired - Lifetime
- 1995-07-19 DE DE69523165T patent/DE69523165T2/de not_active Expired - Lifetime
- 1995-07-19 JP JP9506522A patent/JP2911610B2/ja not_active Expired - Lifetime
- 1995-07-19 KR KR1019970701761A patent/KR100225661B1/ko not_active IP Right Cessation
- 1995-07-20 TW TW084107517A patent/TW317641B/zh not_active IP Right Cessation
-
1997
- 1997-03-14 US US08/816,942 patent/US5955223A/en not_active Expired - Lifetime
-
1998
- 1998-12-07 JP JP34743598A patent/JP3249948B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0788027A4 (de) | 1997-12-10 |
TW317641B (de) | 1997-10-11 |
EP0788027B1 (de) | 2001-10-10 |
WO1997004360A1 (fr) | 1997-02-06 |
JPH11237727A (ja) | 1999-08-31 |
EP0788027A1 (de) | 1997-08-06 |
JP2911610B2 (ja) | 1999-06-23 |
JP3249948B2 (ja) | 2002-01-28 |
US5955223A (en) | 1999-09-21 |
KR100225661B1 (ko) | 1999-10-15 |
KR970706524A (ko) | 1997-11-03 |
DE69523165T2 (de) | 2002-05-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATA102392A (de) | Topisches terbinafinpräparat und verfahren zu seiner herstellung | |
DE69513421T2 (de) | Poröser polytetrafluoroethylenfilm und verfahren zu seiner herstellung | |
DE69523165D1 (de) | Phasenschiebermasken-rohling und verfahren zu seiner herstellung | |
DE69407149D1 (de) | Poröser Film und Verfahren zu seiner Herstellung | |
DE69530312D1 (de) | Stabiles lycopin konzentrat und verfahren zu seiner herstellung | |
DE69524599D1 (de) | Antiblockmittel und verfahren zu seiner herstellung | |
DE69509312D1 (de) | Beschleunigungsmesser sowie Verfahren zu seiner Herstellung | |
DE69628237D1 (de) | Polyestergegenstand und verfahren zu seiner herstellung | |
DE59603734D1 (de) | Integrales plattenförmiges bauteil und verfahren zu seiner herstellung | |
ATE239723T1 (de) | Eprosartandihydrat und ein verfahren zu seiner herstellung und formulierung | |
DE69402688D1 (de) | Luftfilter und verfahren zu seiner herstellung | |
DE59405448D1 (de) | Mikromechanisches Bauteil und Verfahren zu seiner Herstellung | |
DE69625492D1 (de) | Anorganisch-organischer verbundschaumstoff und verfahren zu seiner herstellung | |
DE69613323D1 (de) | Gleitwerkstoff und Verfahren zu seiner Herstellung | |
DE69622456D1 (de) | Aufzeichnungsmaterial und Verfahren zu seiner Herstellung | |
DE69620017D1 (de) | Mehrlagiges gewebe und verfahren zu seiner herstellung | |
DE69510526T2 (de) | Gleitbauteil und Verfahren zu seiner Herstellung | |
ATA75297A (de) | Dekorlaminat und verfahren zu seiner herstellung | |
DE69208317D1 (de) | Oxidischer supraleiter und verfahren zu seiner herstellung | |
DE69634530D1 (de) | Antivirales mittel und verfahren zu dessen herstellung | |
DE69636067D1 (de) | Verbundbauteil und verfahren zu seiner herstellung | |
DE69303127D1 (de) | Harter, mehrlagiger Film und Verfahren zu seiner Herstellung | |
DE69634603D1 (de) | Elektromagnetischer betätiger und verfahren zu seiner herstellung | |
DE69625174D1 (de) | Gleitteil und verfahren zu dessen herstellung | |
DE69511319D1 (de) | Clinoptilolit und Verfahren zu seiner Herstellung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |