DE69432098D1 - Elektronenstrahl-Lithographie-System - Google Patents

Elektronenstrahl-Lithographie-System

Info

Publication number
DE69432098D1
DE69432098D1 DE69432098T DE69432098T DE69432098D1 DE 69432098 D1 DE69432098 D1 DE 69432098D1 DE 69432098 T DE69432098 T DE 69432098T DE 69432098 T DE69432098 T DE 69432098T DE 69432098 D1 DE69432098 D1 DE 69432098D1
Authority
DE
Germany
Prior art keywords
electron beam
lithography system
beam lithography
electron
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69432098T
Other languages
English (en)
Other versions
DE69432098T2 (de
Inventor
Hans Christian Pfeiffer
Werner Stickel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE69432098D1 publication Critical patent/DE69432098D1/de
Application granted granted Critical
Publication of DE69432098T2 publication Critical patent/DE69432098T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30455—Correction during exposure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31776—Shaped beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31788—Lithography by projection through mask

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69432098T 1993-12-23 1994-11-24 Elektronenstrahl-Lithographie-System Expired - Lifetime DE69432098T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/173,305 US5466904A (en) 1993-12-23 1993-12-23 Electron beam lithography system

Publications (2)

Publication Number Publication Date
DE69432098D1 true DE69432098D1 (de) 2003-03-13
DE69432098T2 DE69432098T2 (de) 2003-10-23

Family

ID=22631417

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69432098T Expired - Lifetime DE69432098T2 (de) 1993-12-23 1994-11-24 Elektronenstrahl-Lithographie-System

Country Status (7)

Country Link
US (2) US5466904A (de)
EP (1) EP0660370B1 (de)
JP (1) JP2829942B2 (de)
KR (1) KR0160167B1 (de)
CA (1) CA2131670C (de)
DE (1) DE69432098T2 (de)
TW (1) TW332309B (de)

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JPH09129543A (ja) * 1995-11-01 1997-05-16 Nikon Corp 荷電粒子線転写装置
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US5635719A (en) * 1996-07-23 1997-06-03 International Business Machines Corporation Variable curvilinear axis deflection means for particle optical lenses
JPH10144583A (ja) * 1996-11-07 1998-05-29 Nikon Corp 荷電粒子線投影方法および荷電粒子線投影装置
JPH10303118A (ja) * 1997-04-30 1998-11-13 Nikon Corp 電子線投影光学系
JPH10303119A (ja) * 1997-04-30 1998-11-13 Nikon Corp 電子線転写露光方法
US6124596A (en) * 1997-08-28 2000-09-26 Nikon Corporation Charged-particle-beam projection apparatus and transfer methods
US6069684A (en) * 1998-02-04 2000-05-30 International Business Machines Corporation Electron beam projection lithography system (EBPS)
US6014200A (en) * 1998-02-24 2000-01-11 Nikon Corporation High throughput electron beam lithography system
US6180947B1 (en) * 1998-08-07 2001-01-30 Nikon Corporation Multi-element deflection aberration correction for electron beam lithography
JP2000100715A (ja) * 1998-09-17 2000-04-07 Nikon Corp 電子ビーム露光装置の調整方法
US6222577B1 (en) * 1999-01-26 2001-04-24 Presstek, Inc. Multiple-beam, diode-pumped imaging system
US6455863B1 (en) 1999-06-09 2002-09-24 Applied Materials, Inc. Apparatus and method for forming a charged particle beam of arbitrary shape
DE19926927A1 (de) * 1999-06-14 2000-12-21 Ceos Gmbh Elektrostatischer Korrektor zur Beseitigung des Farbfehlers von Teilchenlinsen
JP3706527B2 (ja) 1999-06-30 2005-10-12 Ｈｏｙａ株式会社 電子線描画用マスクブランクス、電子線描画用マスクおよび電子線描画用マスクの製造方法
DE19944857A1 (de) * 1999-09-18 2001-03-22 Ceos Gmbh Elektronenoptische Linsenanordnung mit weit verschiebbarer Achse
JP2001126651A (ja) 1999-10-22 2001-05-11 Hitachi Ltd 電子ビーム描画装置
US6476400B1 (en) 1999-12-21 2002-11-05 International Business Machines Corporation Method of adjusting a lithography system to enhance image quality
JP2001185477A (ja) * 1999-12-27 2001-07-06 Nikon Corp 荷電粒子線露光方法、荷電粒子線露光装置及び半導体デバイスの製造方法
US6617585B1 (en) 2000-05-24 2003-09-09 Nikon Corporation Optimized curvilinear variable axis lens doublet for charged particle beam projection system
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JP4741115B2 (ja) 2000-08-14 2011-08-03 イーリス エルエルシー リソグラフィ投影装置およびデバイス製造方法
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JP2002217088A (ja) * 2001-01-17 2002-08-02 Nikon Corp 荷電粒子線露光装置、荷電粒子線露光方法及び半導体デバイスの製造方法
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US6529260B2 (en) 2001-05-03 2003-03-04 Nikon Corporation Lifting support assembly for an exposure apparatus
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DE10131931A1 (de) * 2001-07-02 2003-01-16 Zeiss Carl Untersuchungssystem zum teilchenoptischen Abbilden eines Objekts, Ablenkvorrichtung für geladene Teilchen sowie Verfahren zum Betrieb derselben
TW579536B (en) * 2001-07-02 2004-03-11 Zeiss Carl Semiconductor Mfg Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same
JP2005533159A (ja) * 2002-07-19 2005-11-04 シエル・インターナシヨネイル・リサーチ・マーチヤツピイ・ベー・ウイ 発熱方法
JP4245900B2 (ja) 2002-11-05 2009-04-02 Ｈｏｙａ株式会社 転写用マスクの製造方法、及び転写用マスク基板
US7098468B2 (en) * 2002-11-07 2006-08-29 Applied Materials, Inc. Raster frame beam system for electron beam lithography
US7232631B2 (en) * 2003-05-08 2007-06-19 Dai Nippon Prinitng Co., Ltd. Mask for charged particle beam exposure, and method of forming the same
EP1526563B1 (de) 2003-10-20 2018-12-05 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Aperturblende für Teilchenstrahlapparat
JP4383950B2 (ja) * 2004-04-23 2009-12-16 株式会社日立ハイテクノロジーズ 荷電粒子線調整方法、及び荷電粒子線装置
JP2005340835A (ja) * 2004-05-28 2005-12-08 Hoya Corp 電子線露光用マスクブランクおよびマスク
KR100675882B1 (ko) * 2004-12-22 2007-02-02 주식회사 하이닉스반도체 다중투과 위상 마스크 및 이를 이용한 노광 방법
JP2006260713A (ja) * 2005-03-18 2006-09-28 Toshiba Corp 記録媒体、記録再生装置及び記録再生方法
JP2006276266A (ja) * 2005-03-28 2006-10-12 Toshiba Corp レティクルおよびそれを用いた磁気ディスク媒体の製造方法ならびに磁気ディスク媒体
JP2006277869A (ja) * 2005-03-30 2006-10-12 Toshiba Corp 磁気記録媒体、電子線縮小投影描画用レチクルおよび磁気記録媒体の製造方法
JP4945763B2 (ja) * 2005-05-17 2012-06-06 国立大学法人京都大学 電子ビーム露光装置
JP4542953B2 (ja) * 2005-06-10 2010-09-15 株式会社東芝 磁気ディスク媒体および磁気記録再生装置
JP4533854B2 (ja) * 2006-03-06 2010-09-01 株式会社東芝 磁気記録再生装置、磁気記録方法、及び磁気記録再生方法
JP2007273042A (ja) * 2006-03-31 2007-10-18 Toshiba Corp 磁気記録媒体及び磁気記録再生装置
JP4987554B2 (ja) * 2007-04-26 2012-07-25 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
US8003965B2 (en) 2007-05-18 2011-08-23 The Regents Of The University Of Michigan Apparatus for sub-wavelength near-field focusing of electromagnetic waves
GB0809003D0 (en) * 2008-05-17 2008-06-25 Rumsby Philip T Method and apparatus for laser process improvement
US8490035B2 (en) 2009-11-12 2013-07-16 The Regents Of The University Of Michigan Tensor transmission-line metamaterials
US8933425B1 (en) 2011-11-02 2015-01-13 Kla-Tencor Corporation Apparatus and methods for aberration correction in electron beam based system
US9047658B2 (en) * 2013-11-05 2015-06-02 United Microelectronics Corp. Method of optical proximity correction
US9430817B2 (en) * 2013-11-12 2016-08-30 Microsoft Technology Licensing, Llc Blind image deblurring with cascade architecture
US9793720B2 (en) 2014-04-16 2017-10-17 The Regents Of The University Of Michigan Wireless power transfer using multiple near-field plates
US10114120B2 (en) 2014-04-16 2018-10-30 The Regents Of The University Of Michigan Unidirectional near-field focusing using near-field plates
US11448524B2 (en) 2016-04-07 2022-09-20 Phoenix America Inc. Multipole magnet for use with a pitched magnetic sensor
WO2019025188A1 (en) * 2017-08-02 2019-02-07 Asml Netherlands B.V. SYSTEMS AND METHODS FOR INFLATION OF CHARGED PARTICLES FOR ENHANCEMENT OF A VOLTAGE CONTRAST DEFECT SIGNAL
CN112748644B (zh) * 2020-12-31 2022-09-23 合肥芯碁微电子装备股份有限公司 镜头畸变补偿方法、存储介质以及直写式光刻机
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Also Published As

Publication number Publication date
KR0160167B1 (ko) 1998-12-01
US5466904A (en) 1995-11-14
CA2131670C (en) 1999-01-12
JPH07201726A (ja) 1995-08-04
DE69432098T2 (de) 2003-10-23
EP0660370A3 (de) 1997-02-26
US5545902A (en) 1996-08-13
EP0660370B1 (de) 2003-02-05
JP2829942B2 (ja) 1998-12-02
CA2131670A1 (en) 1995-06-24
KR950019946A (ko) 1995-07-24
EP0660370A2 (de) 1995-06-28
TW332309B (en) 1998-05-21

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Legal Events

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8320 Willingness to grant licences declared (paragraph 23)
8328 Change in the person/name/address of the agent

Representative=s name: DUSCHER, R., DIPL.-PHYS. DR.RER.NAT., PAT.-ANW., 7