FR39852E - Procédé de production de colorants solides pour cuve - Google Patents

Procédé de production de colorants solides pour cuve

Info

Publication number
FR39852E
FR39852E FR39852DA FR39852E FR 39852 E FR39852 E FR 39852E FR 39852D A FR39852D A FR 39852DA FR 39852 E FR39852 E FR 39852E
Authority
FR
France
Prior art keywords
vats
production
solid dyes
dyes
solid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IG Farbenindustrie AG
Original Assignee
IG Farbenindustrie AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IG Farbenindustrie AG filed Critical IG Farbenindustrie AG
Application granted granted Critical
Publication of FR39852E publication Critical patent/FR39852E/fr
Priority claimed from JP6208073A external-priority patent/JPS4964097A/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3005—Observing the objects or the point of impact on the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
FR39852D 1972-06-30 1931-03-09 Procédé de production de colorants solides pour cuve Expired FR39852E (fr)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US26784472A 1972-06-30 1972-06-30
GB1483473A GB1416077A (en) 1972-06-30 1973-03-28 Electron beam apparatus
JP6208073A JPS4964097A (fr) 1972-06-30 1973-06-04
FR7321785A FR2191263B1 (fr) 1972-06-30 1973-07-06
DE2332091A DE2332091C2 (de) 1972-06-30 1973-07-23 Verfahren zum Betrieb einer fokussierbaren und ausrichtbaren Elektronenstrahlprojektionsvorrichtung und dafür bestimmte Elektronenstrahlprojektionsvorrichtung
US429438A US3876883A (en) 1972-06-30 1973-12-28 Method and system for focusing and registration in electron beam projection microfabrication

Publications (1)

Publication Number Publication Date
FR39852E true FR39852E (fr) 1932-03-24

Family

ID=27544212

Family Applications (2)

Application Number Title Priority Date Filing Date
FR39852D Expired FR39852E (fr) 1972-06-30 1931-03-09 Procédé de production de colorants solides pour cuve
FR7321785A Expired FR2191263B1 (fr) 1972-06-30 1973-07-06

Family Applications After (1)

Application Number Title Priority Date Filing Date
FR7321785A Expired FR2191263B1 (fr) 1972-06-30 1973-07-06

Country Status (4)

Country Link
US (1) US3876883A (fr)
DE (1) DE2332091C2 (fr)
FR (2) FR39852E (fr)
GB (1) GB1416077A (fr)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2294489A1 (fr) * 1974-12-13 1976-07-09 Thomson Csf Dispositif pour le trace programme de dessins par bombardement de particules
JPS5818213Y2 (ja) * 1975-11-13 1983-04-13 日本ビクター株式会社 デンシジユウ
US4393312A (en) * 1976-02-05 1983-07-12 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
JPS6051261B2 (ja) * 1976-05-26 1985-11-13 株式会社東芝 荷電粒子ビ−ム描画装置
US4039810A (en) * 1976-06-30 1977-08-02 International Business Machines Corporation Electron projection microfabrication system
US4097745A (en) * 1976-10-13 1978-06-27 General Electric Company High resolution matrix lens electron optical system
JPS6038020B2 (ja) * 1976-11-08 1985-08-29 日本電子株式会社 電子線露光装置
SE403440B (sv) * 1977-01-05 1978-08-21 Svenska Flaektfabriken Ab Anordning for inspenning av ett kassettfilter i ett filterhus
DE2702448C2 (de) * 1977-01-20 1982-12-16 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Positionierung eines mit einer Marke versehenen Werkstückes relativ zu einem Abtastfeld bzw. zu einer Maske
DE2702444C3 (de) * 1977-01-20 1980-10-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Korpuskularstrahloptisches Gerät zur Abbildung einer Maske auf ein Präparat
DE2702445C3 (de) * 1977-01-20 1980-10-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Korpuskularstrahloptisches Gerät zur verkleinernden Abbildung einer Maske auf ein zu bestrahlendes Präparat
JPS53121574A (en) * 1977-03-31 1978-10-24 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam exposing device
JPS53146575A (en) * 1977-05-27 1978-12-20 Nippon Telegr & Teleph Corp <Ntt> Electron beam projection image forming device
US4182958A (en) * 1977-05-31 1980-01-08 Rikagaku Kenkyusho Method and apparatus for projecting a beam of electrically charged particles
US4218621A (en) * 1977-06-15 1980-08-19 Vlsi Technology Research Association Electron beam exposure apparatus
US4167676A (en) * 1978-02-21 1979-09-11 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
JPS588130B2 (ja) * 1978-05-08 1983-02-14 ロツクウエル インタ−ナシヨナル コ−ポレ−シヨン 高分解能の微細ラインリソグラフイ構造を作るための方法
DE2837590A1 (de) * 1978-08-29 1980-03-13 Ibm Deutschland Verfahren zur schattenwurfbelichtung
US4213053A (en) * 1978-11-13 1980-07-15 International Business Machines Corporation Electron beam system with character projection capability
JPS5572807A (en) * 1978-11-27 1980-06-02 Hitachi Ltd Electron-beam mask check unit
JPS5621321A (en) * 1979-07-27 1981-02-27 Fujitsu Ltd Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus
DE2939044A1 (de) * 1979-09-27 1981-04-09 Ibm Deutschland Gmbh, 7000 Stuttgart Einrichtung fuer elektronenstrahllithographie
JPS5968928A (ja) * 1982-10-13 1984-04-19 Pioneer Electronic Corp 半導体装置の製造方法
US4546260A (en) * 1983-06-30 1985-10-08 International Business Machines Corporation Alignment technique
JPS63166228A (ja) * 1986-12-27 1988-07-09 Canon Inc 位置検出装置
US5130547A (en) * 1989-11-30 1992-07-14 Fujitsu Limited Charged-particle beam exposure method and apparatus
DE4243489A1 (de) * 1992-12-22 1994-06-23 Zeiss Carl Fa Verfahren zur Beleuchtung mit einem fokussierten Elektronenstrahl und zugehöriges elektronen-optisches Beleuchtungssystem
US5466904A (en) * 1993-12-23 1995-11-14 International Business Machines Corporation Electron beam lithography system
US6060711A (en) * 1997-01-27 2000-05-09 Nikon Corporation Charged-particle optical systems and pattern transfer apparatus comprising same
US6146910A (en) * 1999-02-02 2000-11-14 The United States Of America, As Represented By The Secretary Of Commerce Target configuration and method for extraction of overlay vectors from targets having concealed features
DE10034412A1 (de) 2000-07-14 2002-01-24 Leo Elektronenmikroskopie Gmbh Verfahren zur Elektronenstrahl-Lithographie und elektronen-optisches Lithographiesystem
US6770867B2 (en) 2001-06-29 2004-08-03 Fei Company Method and apparatus for scanned instrument calibration
AU2002320188A1 (en) * 2001-01-26 2003-01-21 Fei Company Method and apparatus for scanned instrument calibration
US20040121069A1 (en) * 2002-08-08 2004-06-24 Ferranti David C. Repairing defects on photomasks using a charged particle beam and topographical data from a scanning probe microscope
US8828792B2 (en) * 2004-05-25 2014-09-09 The Trustees Of The University Of Pennsylvania Nanostructure assemblies, methods and devices thereof
US7332729B1 (en) * 2004-06-18 2008-02-19 Novelx, Inc. System and method for multiple electron, ion, and photon beam alignment
US7893697B2 (en) 2006-02-21 2011-02-22 Cyberoptics Semiconductor, Inc. Capacitive distance sensing in semiconductor processing tools
GB2455006A (en) 2006-09-29 2009-05-27 Cyberoptics Semiconductor Inc Substrate-like particle sensor

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3118050A (en) * 1960-04-06 1964-01-14 Alloyd Electronics Corp Electron beam devices and processes
US3326176A (en) * 1964-10-27 1967-06-20 Nat Res Corp Work-registration device including ionic beam probe
US3434894A (en) * 1965-10-06 1969-03-25 Ion Physics Corp Fabricating solid state devices by ion implantation
US3472997A (en) * 1966-08-26 1969-10-14 Us Navy Secondary electron collection system
US3519788A (en) * 1967-01-13 1970-07-07 Ibm Automatic registration of an electron beam
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns

Also Published As

Publication number Publication date
FR2191263B1 (fr) 1977-02-11
DE2332091A1 (de) 1974-01-03
DE2332091C2 (de) 1982-04-01
US3876883A (en) 1975-04-08
GB1416077A (en) 1975-12-03
FR2191263A1 (fr) 1974-02-01

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