DE69432002T2 - Target für ein magnetooptisches Aufzeichnungsmedium und Verfahren zu seiner Herstellung - Google Patents

Target für ein magnetooptisches Aufzeichnungsmedium und Verfahren zu seiner Herstellung

Info

Publication number
DE69432002T2
DE69432002T2 DE69432002T DE69432002T DE69432002T2 DE 69432002 T2 DE69432002 T2 DE 69432002T2 DE 69432002 T DE69432002 T DE 69432002T DE 69432002 T DE69432002 T DE 69432002T DE 69432002 T2 DE69432002 T2 DE 69432002T2
Authority
DE
Germany
Prior art keywords
magneto
target
production
recording medium
optical recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69432002T
Other languages
English (en)
Other versions
DE69432002D1 (de
Inventor
Kaoru Masuda
Takashi Meguro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Application granted granted Critical
Publication of DE69432002D1 publication Critical patent/DE69432002D1/de
Publication of DE69432002T2 publication Critical patent/DE69432002T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
    • G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
    • G11B11/10586—Record carriers characterised by the selection of the material or by the structure or form characterised by the selection of the material
    • G11B11/10589—Details
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
DE69432002T 1993-07-30 1994-05-17 Target für ein magnetooptisches Aufzeichnungsmedium und Verfahren zu seiner Herstellung Expired - Fee Related DE69432002T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP20850793 1993-07-30
JP6055248A JPH0790567A (ja) 1993-07-30 1994-03-01 光磁気記録媒体用ターゲット材およびその製造方法

Publications (2)

Publication Number Publication Date
DE69432002D1 DE69432002D1 (de) 2003-02-20
DE69432002T2 true DE69432002T2 (de) 2003-10-23

Family

ID=26396129

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69432002T Expired - Fee Related DE69432002T2 (de) 1993-07-30 1994-05-17 Target für ein magnetooptisches Aufzeichnungsmedium und Verfahren zu seiner Herstellung

Country Status (5)

Country Link
US (1) US5607780A (de)
EP (1) EP0640964B1 (de)
JP (1) JPH0790567A (de)
KR (1) KR950004146A (de)
DE (1) DE69432002T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3098204B2 (ja) * 1997-03-07 2000-10-16 ティーディーケイ株式会社 光磁気記録用合金ターゲット、その製造方法およびその再生方法
US6592724B1 (en) 1999-09-22 2003-07-15 Delphi Technologies, Inc. Method for producing NiTiHf alloy films by sputtering
US6596132B1 (en) 1999-09-22 2003-07-22 Delphi Technologies, Inc. Production of ternary shape-memory alloy films by sputtering using a hot pressed target
US6454913B1 (en) 2001-07-12 2002-09-24 Delphi Technologies, Inc. Process for deposition of sputtered shape memory alloy films
JP2006307345A (ja) * 2006-05-08 2006-11-09 Mitsui Mining & Smelting Co Ltd スパッタリングターゲット
JP2007131941A (ja) * 2006-05-26 2007-05-31 Mitsubishi Materials Corp パーティクル発生の少ない相変化膜形成用スパッタリングターゲットの製造方法。
JP5403418B2 (ja) * 2008-09-22 2014-01-29 日立金属株式会社 Ｃｏ−Ｆｅ−Ｎｉ系合金スパッタリングターゲット材の製造方法
JP5376250B2 (ja) * 2010-03-28 2013-12-25 三菱マテリアル株式会社 スパッタリングターゲットの製造方法

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6195788A (ja) * 1984-10-17 1986-05-14 Mitsubishi Metal Corp 光磁気記録薄膜形成用複合ターゲット材
US4620872A (en) * 1984-10-18 1986-11-04 Mitsubishi Kinzoku Kabushiki Kaisha Composite target material and process for producing the same
JPS62274033A (ja) * 1986-05-22 1987-11-28 Hitachi Metals Ltd 希土類−遷移金属合金タ−ゲツトの製造方法
JPH0768611B2 (ja) * 1986-08-20 1995-07-26 日立金属株式会社 スパツタリング用合金タ−ゲツトの製造方法
JPS63143255A (ja) * 1986-12-04 1988-06-15 Mitsubishi Kasei Corp 合金タ−ゲツト材
JPH0768612B2 (ja) * 1987-04-20 1995-07-26 日立金属株式会社 希土類金属―鉄族金属ターゲット用合金粉末、希土類金属―鉄族金属ターゲット、およびそれらの製造方法
JPS63274763A (ja) * 1987-04-30 1988-11-11 Sumitomo Metal Mining Co Ltd 光磁気記録用合金タ−ゲツト
JPS648367A (en) * 1987-06-29 1989-01-12 Maruyama Mfg Co Reciprocating pump device
JPS648243A (en) * 1987-06-30 1989-01-12 Mitsui Shipbuilding Eng Rare earth metal-transition metal alloy and its production
JP2633572B2 (ja) * 1987-08-08 1997-07-23 三井石油化学工業株式会社 光磁気記録体
EP0308201B1 (de) * 1987-09-17 1993-11-18 Seiko Epson Corporation Verfahren zum Herstellen eines Zerstäubungstargets zur Verwendung bei der Herstellung eines magnetooptischen Aufzeichnungsmediums
US4824481A (en) * 1988-01-11 1989-04-25 Eaastman Kodak Company Sputtering targets for magneto-optic films and a method for making
JP2597380B2 (ja) * 1988-03-23 1997-04-02 日立金属株式会社 希土類金属−遷移金属ターゲット用合金粉末の製造方法および希土類金属−遷移金属ターゲットの製造方法
JP2894695B2 (ja) * 1988-03-30 1999-05-24 日立金属株式会社 希土類金属−鉄族金属ターゲットおよびその製造方法
JP2638988B2 (ja) * 1988-09-01 1997-08-06 大日本インキ化学工業株式会社 ジシアノ基を有する光学活性化合物
JPH0784658B2 (ja) * 1988-10-26 1995-09-13 住友金属鉱山株式会社 光磁気記録用合金ターゲット
US4992095A (en) * 1988-10-26 1991-02-12 Sumitomo Metal Mining Company, Ltd. Alloy target used for manufacturing magneto-optical recording medium
JPH0784657B2 (ja) * 1988-10-26 1995-09-13 住友金属鉱山株式会社 光磁気記録用合金ターゲット
JPH02138463A (ja) * 1988-11-16 1990-05-28 Hitachi Metals Ltd スパッタリング用ターゲット材
JPH04325670A (ja) * 1991-04-25 1992-11-16 Seiko Epson Corp スパッタリング用ターゲットの製造方法及びスパッタリング用ターゲット
JP2988021B2 (ja) * 1991-06-12 1999-12-06 三菱マテリアル株式会社 透磁率の低い光磁気記録薄膜形成用高強度ターゲット材
JPH05271915A (ja) * 1992-03-24 1993-10-19 Hitachi Metals Ltd 光磁気記録媒体用ターゲット材およびその製造方法
JP2986291B2 (ja) * 1992-06-15 1999-12-06 三井金属鉱業株式会社 光磁気記録媒体用スパッタリングターゲット及びその製造方法
JP2681737B2 (ja) * 1993-03-24 1997-11-26 日華化学株式会社 感熱記録材料
JPH06320896A (ja) * 1993-05-14 1994-11-22 Mimaki Eng:Kk プロッタのｘ―ｙ方向の直角度調整方法とそれに用いるプロッタ

Also Published As

Publication number Publication date
EP0640964A1 (de) 1995-03-01
DE69432002D1 (de) 2003-02-20
JPH0790567A (ja) 1995-04-04
US5607780A (en) 1997-03-04
KR950004146A (ko) 1995-02-17
EP0640964B1 (de) 2003-01-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee