KR100300618B1
(ko)
|
1992-12-25 |
2001-11-22 |
오노 시게오 |
노광방법,노광장치,및그장치를사용하는디바이스제조방법
|
US20010049589A1
(en)
|
1993-01-21 |
2001-12-06 |
Nikon Corporation |
Alignment method and apparatus therefor
|
JP3412704B2
(ja)
*
|
1993-02-26 |
2003-06-03 |
株式会社ニコン |
投影露光方法及び装置、並びに露光装置
|
JP3379200B2
(ja)
*
|
1994-03-25 |
2003-02-17 |
株式会社ニコン |
位置検出装置
|
US6018384A
(en)
*
|
1994-09-07 |
2000-01-25 |
Nikon Corporation |
Projection exposure system
|
US6151122A
(en)
|
1995-02-21 |
2000-11-21 |
Nikon Corporation |
Inspection method and apparatus for projection optical systems
|
JPH08293453A
(ja)
*
|
1995-04-25 |
1996-11-05 |
Canon Inc |
走査型露光装置及び該装置を用いた露光方法
|
JPH098103A
(ja)
*
|
1995-06-19 |
1997-01-10 |
Nikon Corp |
投影露光装置及び投影露光方法
|
US5907392A
(en)
*
|
1995-07-20 |
1999-05-25 |
Nikon Corporation |
Exposure apparatus
|
US5751404A
(en)
*
|
1995-07-24 |
1998-05-12 |
Canon Kabushiki Kaisha |
Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates
|
JPH0945604A
(ja)
*
|
1995-07-28 |
1997-02-14 |
Nec Corp |
露光方法及び露光装置
|
JPH11504770A
(ja)
*
|
1996-03-04 |
1999-04-27 |
アーエスエム リソグラフィ ベスローテン フェンノートシャップ |
マスクパターンをステップ及びスキャン結像するリソグラフィ装置
|
KR970072024A
(ko)
|
1996-04-09 |
1997-11-07 |
오노 시게오 |
투영노광장치
|
US5877845A
(en)
*
|
1996-05-28 |
1999-03-02 |
Nippon Kogaku Kk |
Scanning exposure apparatus and method
|
US5970310A
(en)
*
|
1996-06-12 |
1999-10-19 |
Hitachi, Ltd. |
Method for manufacturing multilayer wiring board and wiring pattern forming apparatus
|
JP3634558B2
(ja)
*
|
1996-06-13 |
2005-03-30 |
キヤノン株式会社 |
露光装置及びそれを用いたデバイスの製造方法
|
JP3337921B2
(ja)
*
|
1996-08-23 |
2002-10-28 |
キヤノン株式会社 |
投影露光装置および位置合せ方法
|
US5825043A
(en)
|
1996-10-07 |
1998-10-20 |
Nikon Precision Inc. |
Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
|
KR100525521B1
(ko)
*
|
1996-10-21 |
2006-01-27 |
가부시키가이샤 니콘 |
노광장치및노광방법
|
US6798516B1
(en)
|
1996-11-14 |
2004-09-28 |
Nikon Corporation |
Projection exposure apparatus having compact substrate stage
|
EP0843221B1
(de)
*
|
1996-11-14 |
2004-05-06 |
Nikon Corporation |
Projektionsbelichtungsapparat
|
SG88824A1
(en)
*
|
1996-11-28 |
2002-05-21 |
Nikon Corp |
Projection exposure method
|
JPH10172890A
(ja)
*
|
1996-12-12 |
1998-06-26 |
Nikon Corp |
投影露光方法
|
US5972567A
(en)
*
|
1996-12-20 |
1999-10-26 |
Intel Corporation |
Method and apparatus for performing a double shift print on a substrate
|
TW357396B
(en)
*
|
1997-01-17 |
1999-05-01 |
Nicon Corp |
Exposure device
|
JPH10209039A
(ja)
|
1997-01-27 |
1998-08-07 |
Nikon Corp |
投影露光方法及び投影露光装置
|
JP4029130B2
(ja)
*
|
1997-06-03 |
2008-01-09 |
株式会社ニコン |
露光装置及び露光方法
|
JPH1154407A
(ja)
|
1997-08-05 |
1999-02-26 |
Nikon Corp |
位置合わせ方法
|
US6563565B2
(en)
|
1997-08-27 |
2003-05-13 |
Nikon Corporation |
Apparatus and method for projection exposure
|
IL135139A0
(en)
|
1997-09-19 |
2001-05-20 |
Nikon Corp |
Stage apparatus, scanning type exposure apparatus, and device produced with the same
|
JPH11102851A
(ja)
*
|
1997-09-26 |
1999-04-13 |
Mitsubishi Electric Corp |
アライメント補正方法及び半導体装置の製造方法
|
US6407814B1
(en)
*
|
1997-09-26 |
2002-06-18 |
Mitsubishi Denki Kabushiki Kaisha |
Method for correcting alignment, method for manufacturing a semiconductor device and a semiconductor device
|
TW448487B
(en)
|
1997-11-22 |
2001-08-01 |
Nippon Kogaku Kk |
Exposure apparatus, exposure method and manufacturing method of device
|
US6509953B1
(en)
*
|
1998-02-09 |
2003-01-21 |
Nikon Corporation |
Apparatus for exposing a pattern onto an object with controlled scanning
|
AU2549899A
(en)
|
1998-03-02 |
1999-09-20 |
Nikon Corporation |
Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device
|
WO1999054922A1
(fr)
|
1998-04-22 |
1999-10-28 |
Nikon Corporation |
Methode et systeme d'exposition
|
JP3441966B2
(ja)
*
|
1998-06-02 |
2003-09-02 |
キヤノン株式会社 |
走査型露光装置および方法、デバイス製造方法
|
JP3548428B2
(ja)
*
|
1998-07-03 |
2004-07-28 |
キヤノン株式会社 |
位置計測装置及びそれを用いたデバイスの製造方法
|
JP3595707B2
(ja)
*
|
1998-10-23 |
2004-12-02 |
キヤノン株式会社 |
露光装置および露光方法
|
WO2000054407A1
(en)
*
|
1999-03-08 |
2000-09-14 |
Plumeria Investments, Inc. |
Offset eliminator circuit
|
JP2001257143A
(ja)
|
2000-03-09 |
2001-09-21 |
Nikon Corp |
ステージ装置及び露光装置、並びにデバイス製造方法
|
JP3413160B2
(ja)
*
|
2000-06-15 |
2003-06-03 |
キヤノン株式会社 |
照明装置及びそれを用いた走査型露光装置
|
US7289212B2
(en)
*
|
2000-08-24 |
2007-10-30 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufacturing thereby
|
TW527526B
(en)
*
|
2000-08-24 |
2003-04-11 |
Asml Netherlands Bv |
Lithographic apparatus, device manufacturing method, and device manufactured thereby
|
US7561270B2
(en)
*
|
2000-08-24 |
2009-07-14 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
JP4198877B2
(ja)
|
2000-12-25 |
2008-12-17 |
株式会社ルネサステクノロジ |
半導体デバイスの製造方法
|
US6788385B2
(en)
*
|
2001-06-21 |
2004-09-07 |
Nikon Corporation |
Stage device, exposure apparatus and method
|
US6443103B1
(en)
|
2001-08-17 |
2002-09-03 |
Srp 687 Pty. Ltd. |
Flammable vapor resistant water heater with low NOx emissions
|
JP2003133215A
(ja)
*
|
2001-10-26 |
2003-05-09 |
Oki Electric Ind Co Ltd |
露光装置及び露光方法
|
US6446581B1
(en)
|
2001-11-16 |
2002-09-10 |
Srp 687 Pty. Ltd. |
Flammable vapor resistant water heater with low NOx emissions
|
JP3872782B2
(ja)
*
|
2002-08-29 |
2007-01-24 |
Thk株式会社 |
保持対象の位置及び姿勢補正方法及び装置
|
JP4230196B2
(ja)
*
|
2002-10-30 |
2009-02-25 |
川崎重工業株式会社 |
位置決め演算方法および位置決め演算装置
|
SG121822A1
(en)
*
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
US7242455B2
(en)
*
|
2002-12-10 |
2007-07-10 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
DE10261775A1
(de)
|
2002-12-20 |
2004-07-01 |
Carl Zeiss Smt Ag |
Vorrichtung zur optischen Vermessung eines Abbildungssystems
|
WO2004077535A1
(ja)
*
|
2003-02-05 |
2004-09-10 |
Nikon Corporation |
投影露光方法及び装置、並びにデバイス製造方法
|
TWI338323B
(en)
|
2003-02-17 |
2011-03-01 |
Nikon Corp |
Stage device, exposure device and manufacguring method of devices
|
EP1612849B1
(de)
|
2003-04-09 |
2012-05-30 |
Nikon Corporation |
Belichtungsverfahren und vorrichtung sowie herstellungsverfahren für die vorrichtung
|
CN101002140B
(zh)
|
2003-04-11 |
2010-12-08 |
株式会社尼康 |
保持平板印刷投射透镜下面的浸没流体的设备和方法
|
EP2172809B1
(de)
|
2003-04-11 |
2018-11-07 |
Nikon Corporation |
Reinigungsverfahren für Optik in einer Immersionslithographievorrichtung, sowie entsprechende Immersionslithographievorrichtung
|
TWI424470B
(zh)
|
2003-05-23 |
2014-01-21 |
尼康股份有限公司 |
A method of manufacturing an exposure apparatus and an element
|
EP2937893B1
(de)
*
|
2003-06-13 |
2016-09-28 |
Nikon Corporation |
Belichtungsverfahren, substratstufe, belichtungsvorrichtung und verfahren zur herstellung einer vorrichtung
|
KR101148811B1
(ko)
|
2003-06-19 |
2012-05-24 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조방법
|
EP1491966A1
(de)
*
|
2003-06-26 |
2004-12-29 |
ASML Netherlands B.V. |
Eichverfahren für einen lithographischen Apparat
|
SG119224A1
(en)
|
2003-06-26 |
2006-02-28 |
Asml Netherlands Bv |
Calibration method for a lithographic apparatus and device manufacturing method
|
WO2005006417A1
(ja)
*
|
2003-07-09 |
2005-01-20 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
KR101343720B1
(ko)
|
2003-07-28 |
2013-12-20 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의제어 방법
|
CN101303536B
(zh)
|
2003-08-29 |
2011-02-09 |
株式会社尼康 |
曝光装置和器件加工方法
|
US8064730B2
(en)
*
|
2003-09-22 |
2011-11-22 |
Asml Netherlands B.V. |
Device manufacturing method, orientation determination method and lithographic apparatus
|
KR101441840B1
(ko)
*
|
2003-09-29 |
2014-11-04 |
가부시키가이샤 니콘 |
노광장치, 노광방법 및 디바이스 제조방법
|
KR101203028B1
(ko)
|
2003-10-08 |
2012-11-21 |
가부시키가이샤 자오 니콘 |
기판 반송 장치 및 기판 반송 방법, 노광 장치 및 노광 방법, 디바이스 제조 방법
|
TW200514138A
(en)
|
2003-10-09 |
2005-04-16 |
Nippon Kogaku Kk |
Exposure equipment and exposure method, manufacture method of component
|
TWI573175B
(zh)
|
2003-10-28 |
2017-03-01 |
尼康股份有限公司 |
照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
|
TW201809801A
(zh)
|
2003-11-20 |
2018-03-16 |
日商尼康股份有限公司 |
光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
|
TWI530762B
(zh)
|
2003-12-03 |
2016-04-21 |
尼康股份有限公司 |
Exposure apparatus, exposure method, and device manufacturing method
|
KR20180117228A
(ko)
|
2004-01-05 |
2018-10-26 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
US7053980B2
(en)
*
|
2004-01-23 |
2006-05-30 |
Asml Netherlands B.V. |
Lithographic alignment system
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
KR101377815B1
(ko)
|
2004-02-03 |
2014-03-26 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
KR101945638B1
(ko)
|
2004-02-04 |
2019-02-07 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
TWI366219B
(en)
|
2004-02-06 |
2012-06-11 |
Nikon Corp |
Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
|
US7557900B2
(en)
|
2004-02-10 |
2009-07-07 |
Nikon Corporation |
Exposure apparatus, device manufacturing method, maintenance method, and exposure method
|
US20070030467A1
(en)
*
|
2004-02-19 |
2007-02-08 |
Nikon Corporation |
Exposure apparatus, exposure method, and device fabricating method
|
US8023100B2
(en)
|
2004-02-20 |
2011-09-20 |
Nikon Corporation |
Exposure apparatus, supply method and recovery method, exposure method, and device producing method
|
US20070201010A1
(en)
*
|
2004-03-25 |
2007-08-30 |
Nikon Corporation |
Exposure Apparatus, Exposure Method, And Device Manufacturing Method
|
US7034917B2
(en)
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
WO2005098911A1
(ja)
|
2004-04-09 |
2005-10-20 |
Nikon Corporation |
移動体の駆動方法、ステージ装置及び露光装置
|
US7030365B2
(en)
*
|
2004-04-15 |
2006-04-18 |
Eaton Corporation |
Emitter-detector assembly for a reflex photoelectric object detection system
|
KR101162938B1
(ko)
|
2004-04-19 |
2012-07-05 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
KR101257960B1
(ko)
|
2004-06-04 |
2013-04-24 |
칼 짜이스 에스엠테 게엠베하 |
광학적 결상 시스템의 결상 품질을 측정하기 위한 시스템
|
KR101421915B1
(ko)
|
2004-06-09 |
2014-07-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
CN102290364B
(zh)
|
2004-06-09 |
2016-01-13 |
尼康股份有限公司 |
基板保持装置、具备其之曝光装置、元件制造方法
|
CN101685269B
(zh)
|
2004-06-10 |
2011-09-14 |
尼康股份有限公司 |
曝光装置及元件制造方法
|
KR101378688B1
(ko)
|
2004-06-21 |
2014-03-27 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
EP1783822A4
(de)
|
2004-06-21 |
2009-07-15 |
Nikon Corp |
Belichtungseinrichtung, belichtungseinrichtungs-elementreinigungsverfahren, belichtungseinrichtungs-wartungsverfahren, wartungseinrichtung und einrichtungsherstellungsverfahren
|
US8698998B2
(en)
|
2004-06-21 |
2014-04-15 |
Nikon Corporation |
Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
|
JP4678372B2
(ja)
|
2004-06-29 |
2011-04-27 |
株式会社ニコン |
管理方法及び管理システム、並びにプログラム
|
US7463330B2
(en)
|
2004-07-07 |
2008-12-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
WO2006006565A1
(ja)
|
2004-07-12 |
2006-01-19 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
TWI396225B
(zh)
|
2004-07-23 |
2013-05-11 |
尼康股份有限公司 |
成像面測量方法、曝光方法、元件製造方法以及曝光裝置
|
EP3048485B1
(de)
|
2004-08-03 |
2017-09-27 |
Nikon Corporation |
Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung einer vorrichtung
|
TW200615716A
(en)
*
|
2004-08-05 |
2006-05-16 |
Nikon Corp |
Stage device and exposure device
|
US7171319B2
(en)
*
|
2004-09-02 |
2007-01-30 |
International Business Machines Corporation |
Method and apparatus to separate field and grid parameters on first level wafers
|
JP4613910B2
(ja)
*
|
2004-10-08 |
2011-01-19 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
KR20070068343A
(ko)
*
|
2004-10-13 |
2007-06-29 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
KR101364347B1
(ko)
|
2004-10-15 |
2014-02-18 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
TWI416265B
(zh)
|
2004-11-01 |
2013-11-21 |
尼康股份有限公司 |
A method of manufacturing an exposure apparatus and an element
|
TWI654661B
(zh)
|
2004-11-18 |
2019-03-21 |
日商尼康股份有限公司 |
位置測量方法、位置控制方法、測量方法、裝載方法、曝光方法及曝光裝置、及元件製造方法
|
WO2006059634A1
(ja)
|
2004-12-01 |
2006-06-08 |
Nikon Corporation |
ステージ装置及び露光装置
|
JP4752473B2
(ja)
|
2004-12-09 |
2011-08-17 |
株式会社ニコン |
露光装置、露光方法及びデバイス製造方法
|
US7450217B2
(en)
|
2005-01-12 |
2008-11-11 |
Asml Netherlands B.V. |
Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
|
US20070258068A1
(en)
*
|
2005-02-17 |
2007-11-08 |
Hiroto Horikawa |
Exposure Apparatus, Exposure Method, and Device Fabricating Method
|
KR20070115860A
(ko)
*
|
2005-03-30 |
2007-12-06 |
가부시키가이샤 니콘 |
노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
|
JP4888388B2
(ja)
*
|
2005-03-31 |
2012-02-29 |
株式会社ニコン |
露光方法、露光装置、及びデバイス製造方法
|
USRE43576E1
(en)
|
2005-04-08 |
2012-08-14 |
Asml Netherlands B.V. |
Dual stage lithographic apparatus and device manufacturing method
|
US8089608B2
(en)
|
2005-04-18 |
2012-01-03 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
EP1876635A4
(de)
|
2005-04-25 |
2010-06-30 |
Nikon Corp |
Belichtungsverfahren, belichtungsvorrichtung sowie herstellungsverfahren für die vorrichtung
|
US20090046268A1
(en)
|
2005-05-12 |
2009-02-19 |
Yasuhiro Omura |
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|
EP1895570A4
(de)
|
2005-05-24 |
2011-03-09 |
Nikon Corp |
Belichtungsverfahren, belichtungsvorrichtung und bauelementeherstellungsverfahren
|
US7838858B2
(en)
*
|
2005-05-31 |
2010-11-23 |
Nikon Corporation |
Evaluation system and method of a search operation that detects a detection subject on an object
|
US8693006B2
(en)
|
2005-06-28 |
2014-04-08 |
Nikon Corporation |
Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
|
JPWO2007000995A1
(ja)
*
|
2005-06-28 |
2009-01-22 |
株式会社ニコン |
露光装置及び方法、並びにデバイス製造方法
|
KR101302244B1
(ko)
|
2005-07-01 |
2013-09-02 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법, 및 시스템
|
EP1909310A4
(de)
|
2005-07-11 |
2010-10-06 |
Nikon Corp |
Belichtungsvorrichtung und verfahren zur bauelementeherstellung
|
CN101138070B
(zh)
*
|
2005-08-05 |
2011-03-23 |
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|
KR20080059572A
(ko)
*
|
2005-10-07 |
2008-06-30 |
가부시키가이샤 니콘 |
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|
US8125610B2
(en)
|
2005-12-02 |
2012-02-28 |
ASML Metherlands B.V. |
Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
|
EP1965414A4
(de)
|
2005-12-06 |
2010-08-25 |
Nikon Corp |
Belichtungsverfahren, belichtungsvorrichtung und verfahren zur bauelementeherstellung
|
CN102636966B
(zh)
|
2005-12-28 |
2014-12-03 |
株式会社尼康 |
曝光方法及曝光装置、以及元件制造方法
|
US8411271B2
(en)
|
2005-12-28 |
2013-04-02 |
Nikon Corporation |
Pattern forming method, pattern forming apparatus, and device manufacturing method
|
CN102681368B
(zh)
|
2005-12-28 |
2015-09-30 |
株式会社尼康 |
图案形成方法及图案形成装置、以及元件制造方法
|
KR20180091963A
(ko)
|
2006-01-19 |
2018-08-16 |
가부시키가이샤 니콘 |
이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 패턴 형성 장치, 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법
|
WO2007094414A1
(ja)
|
2006-02-16 |
2007-08-23 |
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|
WO2007094407A1
(ja)
|
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露光装置、露光方法及びデバイス製造方法
|
EP1986224A4
(de)
|
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2012-01-25 |
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Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren
|
KR20080102390A
(ko)
*
|
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|
CN100590173C
(zh)
*
|
2006-03-24 |
2010-02-17 |
北京有色金属研究总院 |
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|
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(ja)
|
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|
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(ko)
|
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|
US7714981B2
(en)
*
|
2006-10-30 |
2010-05-11 |
Asml Netherlands B.V. |
Lithographic apparatus and method
|
JP5055971B2
(ja)
|
2006-11-16 |
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表面処理方法及び表面処理装置、露光方法及び露光装置、並びにデバイス製造方法
|
US20080212047A1
(en)
*
|
2006-12-28 |
2008-09-04 |
Nikon Corporation |
Exposure apparatus, exposing method, and device fabricating method
|
JP5454136B2
(ja)
|
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ペリクルフレーム装置、マスク、レチクル装置、露光方法及び露光装置並びにデバイスの製造方法
|
US7876452B2
(en)
*
|
2007-03-05 |
2011-01-25 |
Nikon Corporation |
Interferometric position-measuring devices and methods
|
TW200905157A
(en)
|
2007-04-12 |
2009-02-01 |
Nikon Corp |
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|
JP5489068B2
(ja)
|
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2014-05-14 |
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|
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(ja)
|
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2013-08-21 |
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|
US8379187B2
(en)
|
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2013-02-19 |
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|
US9116346B2
(en)
|
2007-11-06 |
2015-08-25 |
Nikon Corporation |
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|
US8115906B2
(en)
*
|
2007-12-14 |
2012-02-14 |
Nikon Corporation |
Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method
|
US8237916B2
(en)
*
|
2007-12-28 |
2012-08-07 |
Nikon Corporation |
Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
|
JP5369443B2
(ja)
|
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2013-12-18 |
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|
DE102008017645A1
(de)
*
|
2008-04-04 |
2009-10-08 |
Carl Zeiss Smt Ag |
Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats
|
KR101670624B1
(ko)
*
|
2008-04-30 |
2016-11-09 |
가부시키가이샤 니콘 |
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|
US8786829B2
(en)
*
|
2008-05-13 |
2014-07-22 |
Nikon Corporation |
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|
US8228482B2
(en)
*
|
2008-05-13 |
2012-07-24 |
Nikon Corporation |
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|
US8817236B2
(en)
|
2008-05-13 |
2014-08-26 |
Nikon Corporation |
Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
|
JP5097166B2
(ja)
|
2008-05-28 |
2012-12-12 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置及び装置の動作方法
|
US20100014097A1
(en)
*
|
2008-07-17 |
2010-01-21 |
Nikon Corporation |
Algorithm correcting for correction of interferometer fluctuation
|
NL2003363A
(en)
|
2008-09-10 |
2010-03-15 |
Asml Netherlands Bv |
Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method.
|
US8994923B2
(en)
*
|
2008-09-22 |
2015-03-31 |
Nikon Corporation |
Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
|
US8508735B2
(en)
|
2008-09-22 |
2013-08-13 |
Nikon Corporation |
Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
|
US8325325B2
(en)
*
|
2008-09-22 |
2012-12-04 |
Nikon Corporation |
Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
|
US8384875B2
(en)
*
|
2008-09-29 |
2013-02-26 |
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|
US8599359B2
(en)
|
2008-12-19 |
2013-12-03 |
Nikon Corporation |
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|
US8902402B2
(en)
|
2008-12-19 |
2014-12-02 |
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|
US8773635B2
(en)
|
2008-12-19 |
2014-07-08 |
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|
US8760629B2
(en)
|
2008-12-19 |
2014-06-24 |
Nikon Corporation |
Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
|
WO2010125813A1
(ja)
*
|
2009-04-30 |
2010-11-04 |
株式会社ニコン |
露光方法及びデバイス製造方法、並びに重ね合わせ誤差計測方法
|
US8553204B2
(en)
*
|
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2013-10-08 |
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|
US8792084B2
(en)
*
|
2009-05-20 |
2014-07-29 |
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|
US8970820B2
(en)
|
2009-05-20 |
2015-03-03 |
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|
US8472008B2
(en)
|
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2013-06-25 |
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|
US8355114B2
(en)
*
|
2009-06-19 |
2013-01-15 |
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|
US8446569B2
(en)
*
|
2009-06-19 |
2013-05-21 |
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|
US8294878B2
(en)
|
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|
US8355116B2
(en)
|
2009-06-19 |
2013-01-15 |
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|
US20110008734A1
(en)
*
|
2009-06-19 |
2011-01-13 |
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|
WO2011016255A1
(ja)
*
|
2009-08-07 |
2011-02-10 |
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|
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(ja)
|
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|
US8493547B2
(en)
|
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2013-07-23 |
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|
US8514395B2
(en)
|
2009-08-25 |
2013-08-20 |
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|
US20110096306A1
(en)
*
|
2009-09-28 |
2011-04-28 |
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|
US20110096312A1
(en)
|
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2011-04-28 |
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|
US20110096318A1
(en)
*
|
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2011-04-28 |
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|
US20110102761A1
(en)
*
|
2009-09-28 |
2011-05-05 |
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|
US20110085150A1
(en)
*
|
2009-09-30 |
2011-04-14 |
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|
US20110075120A1
(en)
*
|
2009-09-30 |
2011-03-31 |
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|
US20110086315A1
(en)
|
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|
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(en)
|
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2011-05-05 |
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|
US20110242520A1
(en)
|
2009-11-17 |
2011-10-06 |
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|
US20110128523A1
(en)
*
|
2009-11-19 |
2011-06-02 |
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|
US20110123913A1
(en)
|
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2011-05-26 |
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|
US20110164238A1
(en)
|
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2011-07-07 |
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|
US20110134400A1
(en)
|
2009-12-04 |
2011-06-09 |
Nikon Corporation |
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|
US8488106B2
(en)
*
|
2009-12-28 |
2013-07-16 |
Nikon Corporation |
Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
|
JP5842808B2
(ja)
|
2010-02-20 |
2016-01-13 |
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|
JP5783953B2
(ja)
|
2012-05-30 |
2015-09-24 |
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|
CN104838469B
(zh)
|
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|
KR102145884B1
(ko)
*
|
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삼성디스플레이 주식회사 |
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|
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(de)
|
2013-06-28 |
2019-10-30 |
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|
KR102411747B1
(ko)
|
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가부시키가이샤 니콘 |
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|
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(ko)
|
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2019-03-27 |
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|
KR101907864B1
(ko)
*
|
2014-03-28 |
2018-10-15 |
가부시키가이샤 니콘 |
이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 디바이스 제조 방법, 및 이동체 구동 방법
|
CN106164778B
(zh)
|
2014-04-28 |
2018-02-09 |
Asml荷兰有限公司 |
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|
KR102022785B1
(ko)
|
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2019-09-18 |
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|
KR102009098B1
(ko)
|
2014-12-24 |
2019-08-08 |
가부시키가이샤 니콘 |
이동체의 제어 방법, 노광 방법, 디바이스 제조 방법, 이동체 장치, 및 노광 장치
|
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(de)
|
2015-02-23 |
2020-01-08 |
Nikon Corporation |
Substratverarbeitungssystem und substratverarbeitungsverfahren und vorrichtungsherstellungsverfahren
|
JP6649636B2
(ja)
*
|
2015-02-23 |
2020-02-19 |
株式会社ニコン |
計測装置、リソグラフィシステム及び露光装置、並びにデバイス製造方法
|
TWI768342B
(zh)
|
2015-02-23 |
2022-06-21 |
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測量裝置、微影系統及曝光裝置、測量方法及曝光方法
|
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(de)
|
2015-05-14 |
2018-07-18 |
Samsung Electronics Co., Ltd. |
Verfahren und vorrichtung zur suche nach netzwerken
|
JP6740370B2
(ja)
*
|
2016-05-25 |
2020-08-12 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置
|
TWI630453B
(zh)
*
|
2017-11-22 |
2018-07-21 |
牧德科技股份有限公司 |
投影式複檢機及其校正方法
|
US11221562B2
(en)
*
|
2019-03-14 |
2022-01-11 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Reticle and method of detecting intactness of reticle stage using the same
|
WO2024020363A1
(en)
*
|
2022-07-18 |
2024-01-25 |
Syncell (Taiwan) Inc. |
Training ai model for a microscope-based pattern photoillumination system
|