DE69406103T2 - Verfahren zur Oxidation der Oberflächen eines Gegenstandes - Google Patents

Verfahren zur Oxidation der Oberflächen eines Gegenstandes

Info

Publication number
DE69406103T2
DE69406103T2 DE69406103T DE69406103T DE69406103T2 DE 69406103 T2 DE69406103 T2 DE 69406103T2 DE 69406103 T DE69406103 T DE 69406103T DE 69406103 T DE69406103 T DE 69406103T DE 69406103 T2 DE69406103 T2 DE 69406103T2
Authority
DE
Germany
Prior art keywords
oxidation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69406103T
Other languages
English (en)
Other versions
DE69406103D1 (de
DE69406103T4 (de
Inventor
Tatsumi Hiramoto
Tatsushi Igarashi
Hiromitsu Matsuno
Takeo Matsushima
Shinichi Iso
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=18107959&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69406103(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of DE69406103T2 publication Critical patent/DE69406103T2/de
Application granted granted Critical
Publication of DE69406103T4 publication Critical patent/DE69406103T4/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31127—Etching organic layers
    • H01L21/31133—Etching organic layers by chemical means
    • H01L21/31138—Etching organic layers by chemical means by dry-etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Metallurgy (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
DE69406103T 1993-11-26 1994-11-28 Verfahren zur Oxidation der Oberflächen eines Gegenstandes Expired - Lifetime DE69406103T4 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31923893 1993-11-26

Publications (2)

Publication Number Publication Date
DE69406103T2 true DE69406103T2 (de) 1998-05-20
DE69406103T4 DE69406103T4 (de) 2000-07-27

Family

ID=18107959

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69406103T Expired - Lifetime DE69406103T4 (de) 1993-11-26 1994-11-28 Verfahren zur Oxidation der Oberflächen eines Gegenstandes
DE69406103A Expired - Lifetime DE69406103D1 (de) 1993-11-26 1994-11-28 Verfahren zur Oxidation der Oberflächen eines Gegenstandes

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69406103A Expired - Lifetime DE69406103D1 (de) 1993-11-26 1994-11-28 Verfahren zur Oxidation der Oberflächen eines Gegenstandes

Country Status (5)

Country Link
US (1) US5510158A (de)
EP (1) EP0661110B1 (de)
KR (1) KR100189794B1 (de)
DE (2) DE69406103T4 (de)
TW (1) TW260806B (de)

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US20030104171A1 (en) * 2001-11-29 2003-06-05 Maclachlan Julia Method of using short wavelength UV light to selectively remove a coating from a substrate and article produced thereby
FR2835205B1 (fr) * 2002-01-25 2007-02-16 Saint Gobain Traitement de pollution organique sur un substrat inorganique
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JP4038557B2 (ja) * 2002-04-16 2008-01-30 リアライズ・アドバンストテクノロジ株式会社 レジスト除去装置及びレジスト除去方法
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CN102476110A (zh) * 2010-11-30 2012-05-30 中国科学院大连化学物理研究所 一种紫外灯灯头透镜外表面清洗装置
JP5348156B2 (ja) * 2011-03-01 2013-11-20 ウシオ電機株式会社 光照射装置
CN103406302B (zh) * 2013-08-23 2015-08-12 深圳市华星光电技术有限公司 基于紫外线的清洗方法及清洗装置
JP6764665B2 (ja) 2016-03-17 2020-10-07 東京応化工業株式会社 表面処理方法、帯電防止剤及び親水化処理剤
CN106975329B (zh) * 2017-04-13 2019-11-15 上海大学 真空等离子体叠式管状空气净化装置
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TWI756761B (zh) * 2020-04-06 2022-03-01 香港商正揚科技有限公司 紫外光固化裝置
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Also Published As

Publication number Publication date
US5510158A (en) 1996-04-23
TW260806B (de) 1995-10-21
DE69406103D1 (de) 1997-11-13
EP0661110A1 (de) 1995-07-05
KR100189794B1 (ko) 1999-06-01
DE69406103T4 (de) 2000-07-27
EP0661110B1 (de) 1997-10-08
KR950014015A (ko) 1995-06-15

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