DE69223870D1 - Methode zur Bildung eines Photomaskenmusters - Google Patents

Methode zur Bildung eines Photomaskenmusters

Info

Publication number
DE69223870D1
DE69223870D1 DE69223870T DE69223870T DE69223870D1 DE 69223870 D1 DE69223870 D1 DE 69223870D1 DE 69223870 T DE69223870 T DE 69223870T DE 69223870 T DE69223870 T DE 69223870T DE 69223870 D1 DE69223870 D1 DE 69223870D1
Authority
DE
Germany
Prior art keywords
forming
photomask pattern
photomask
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69223870T
Other languages
English (en)
Other versions
DE69223870T2 (de
Inventor
Yashiro Sekine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69223870D1 publication Critical patent/DE69223870D1/de
Application granted granted Critical
Publication of DE69223870T2 publication Critical patent/DE69223870T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
    • H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
DE69223870T 1991-07-11 1992-07-09 Methode zur Bildung eines Photomaskenmusters Expired - Lifetime DE69223870T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17120191A JPH0521310A (ja) 1991-07-11 1991-07-11 微細パタン形成方法

Publications (2)

Publication Number Publication Date
DE69223870D1 true DE69223870D1 (de) 1998-02-12
DE69223870T2 DE69223870T2 (de) 1998-06-04

Family

ID=15918898

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69223870T Expired - Lifetime DE69223870T2 (de) 1991-07-11 1992-07-09 Methode zur Bildung eines Photomaskenmusters

Country Status (4)

Country Link
US (1) US5472812A (de)
EP (1) EP0524499B1 (de)
JP (1) JPH0521310A (de)
DE (1) DE69223870T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100298610B1 (ko) * 1992-09-01 2001-11-30 기타지마 요시토시 위상쉬프트포토마스크,위상쉬프트포토마스크블랭크및이들의제조방법
KR0166837B1 (ko) * 1996-06-27 1999-01-15 문정환 위상반전 마스크 및 그 제조방법
US5786114A (en) * 1997-01-10 1998-07-28 Kabushiki Kaisha Toshiba Attenuated phase shift mask with halftone boundary regions
US8397177B2 (en) * 1999-07-22 2013-03-12 Tavusi Data Solutions Llc Graphic-information flow method and system for visually analyzing patterns and relationships
US6338921B1 (en) 2000-01-07 2002-01-15 International Business Machines Corporation Mask with linewidth compensation and method of making same
US6927172B2 (en) * 2003-02-24 2005-08-09 International Business Machines Corporation Process to suppress lithography at a wafer edge
JP5002207B2 (ja) * 2006-07-26 2012-08-15 キヤノン株式会社 パターンを有する構造体の製造方法
US8741417B2 (en) * 2010-04-16 2014-06-03 Korea University Research And Business Foundation Films having switchable reflectivity
US10622214B2 (en) 2017-05-25 2020-04-14 Applied Materials, Inc. Tungsten defluorination by high pressure treatment
JP6947914B2 (ja) 2017-08-18 2021-10-13 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 高圧高温下のアニールチャンバ
US10276411B2 (en) 2017-08-18 2019-04-30 Applied Materials, Inc. High pressure and high temperature anneal chamber
CN111095524B (zh) 2017-09-12 2023-10-03 应用材料公司 用于使用保护阻挡物层制造半导体结构的设备和方法
CN117936420A (zh) 2017-11-11 2024-04-26 微材料有限责任公司 用于高压处理腔室的气体输送系统
JP2021503714A (ja) 2017-11-17 2021-02-12 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 高圧処理システムのためのコンデンサシステム
KR20230079236A (ko) 2018-03-09 2023-06-05 어플라이드 머티어리얼스, 인코포레이티드 금속 함유 재료들을 위한 고압 어닐링 프로세스
US10950429B2 (en) 2018-05-08 2021-03-16 Applied Materials, Inc. Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom
US10748783B2 (en) 2018-07-25 2020-08-18 Applied Materials, Inc. Gas delivery module
US10675581B2 (en) 2018-08-06 2020-06-09 Applied Materials, Inc. Gas abatement apparatus
JP2022507390A (ja) 2018-11-16 2022-01-18 アプライド マテリアルズ インコーポレイテッド 強化拡散プロセスを使用する膜の堆積
WO2020117462A1 (en) 2018-12-07 2020-06-11 Applied Materials, Inc. Semiconductor processing system
CN111367142A (zh) * 2018-12-26 2020-07-03 聚灿光电科技（宿迁）有限公司 一种包含不同透光性的新型光学掩膜版
US11901222B2 (en) 2020-02-17 2024-02-13 Applied Materials, Inc. Multi-step process for flowable gap-fill film

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2066487B (en) * 1979-12-18 1983-11-23 Philips Electronic Associated Alignment of exposure masks
GB2172743B (en) * 1985-03-23 1988-11-16 Stc Plc Improvements in integrated circuits
US4649638A (en) * 1985-04-17 1987-03-17 International Business Machines Corp. Construction of short-length electrode in semiconductor device
DE3707130A1 (de) * 1987-03-03 1988-09-15 Fraunhofer Ges Forschung Verfahren zur herstellung von silizium-roentgenmasken

Also Published As

Publication number Publication date
EP0524499B1 (de) 1998-01-07
US5472812A (en) 1995-12-05
JPH0521310A (ja) 1993-01-29
DE69223870T2 (de) 1998-06-04
EP0524499A1 (de) 1993-01-27

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