DE69115999D1 - Verfahren zur Herstellung eines Maskenmusters - Google Patents
Verfahren zur Herstellung eines MaskenmustersInfo
- Publication number
- DE69115999D1 DE69115999D1 DE69115999T DE69115999T DE69115999D1 DE 69115999 D1 DE69115999 D1 DE 69115999D1 DE 69115999 T DE69115999 T DE 69115999T DE 69115999 T DE69115999 T DE 69115999T DE 69115999 D1 DE69115999 D1 DE 69115999D1
- Authority
- DE
- Germany
- Prior art keywords
- making
- mask pattern
- mask
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/29—Rim PSM or outrigger PSM; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2158420A JPH0450943A (ja) | 1990-06-15 | 1990-06-15 | マスクパターンとその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69115999D1 true DE69115999D1 (de) | 1996-02-15 |
DE69115999T2 DE69115999T2 (de) | 1996-05-23 |
Family
ID=15671369
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69115999T Expired - Fee Related DE69115999T2 (de) | 1990-06-15 | 1991-05-28 | Verfahren zur Herstellung eines Maskenmusters |
Country Status (4)
Country | Link |
---|---|
US (1) | US5300378A (de) |
EP (1) | EP0461778B1 (de) |
JP (1) | JPH0450943A (de) |
DE (1) | DE69115999T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0553543B1 (de) * | 1992-01-31 | 1997-12-29 | Mitsubishi Denki Kabushiki Kaisha | Phasenverschiebungsmaske und Verfahren zur Erzeugung eines Fotolackmusters unter Verwendung dieser Maske |
JP3194155B2 (ja) * | 1992-01-31 | 2001-07-30 | キヤノン株式会社 | 半導体デバイスの製造方法及びそれを用いた投影露光装置 |
JP3210123B2 (ja) * | 1992-03-27 | 2001-09-17 | キヤノン株式会社 | 結像方法及び該方法を用いたデバイス製造方法 |
JPH06266094A (ja) * | 1992-09-29 | 1994-09-22 | Texas Instr Inc <Ti> | 半導体製造のためのフォトマスク |
US5300786A (en) * | 1992-10-28 | 1994-04-05 | International Business Machines Corporation | Optical focus phase shift test pattern, monitoring system and process |
KR0128827B1 (ko) * | 1993-12-31 | 1998-04-07 | 김주용 | 위상반전마스크 제조방법 |
US5414580A (en) * | 1994-05-13 | 1995-05-09 | International Business Machines Corporation | Magnetic storage system using thin film magnetic recording heads using phase-shifting mask |
KR100195333B1 (ko) * | 1996-09-02 | 1999-06-15 | 구본준 | 위상반전마스크 및 그 제조방법 |
US5786114A (en) * | 1997-01-10 | 1998-07-28 | Kabushiki Kaisha Toshiba | Attenuated phase shift mask with halftone boundary regions |
US5908718A (en) * | 1997-03-31 | 1999-06-01 | Nec Corporation | Phase shifting photomask with two different transparent regions |
JP4053263B2 (ja) * | 2001-08-17 | 2008-02-27 | 株式会社ルネサステクノロジ | 半導体装置の製造方法 |
JP2004144975A (ja) * | 2002-10-24 | 2004-05-20 | Renesas Technology Corp | パターン転写マスク、半導体装置の製造方法、及び、マスクパターン作成用コンピュータプログラム |
DE102005008478B3 (de) * | 2005-02-24 | 2006-10-26 | Infineon Technologies Ag | Verfahren zur Herstellung von sublithographischen Strukturen |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0690506B2 (ja) * | 1985-09-20 | 1994-11-14 | 株式会社日立製作所 | ホトマスク |
FR2590376A1 (fr) * | 1985-11-21 | 1987-05-22 | Dumant Jean Marc | Procede de masquage et masque utilise |
CA1313792C (en) * | 1986-02-28 | 1993-02-23 | Junji Hirokane | Method of manufacturing photo-mask and photo-mask manufactured thereby |
US4948706A (en) * | 1987-12-30 | 1990-08-14 | Hoya Corporation | Process for producing transparent substrate having thereon transparent conductive pattern elements separated by light-shielding insulating film, and process for producing surface-colored material |
JP2710967B2 (ja) * | 1988-11-22 | 1998-02-10 | 株式会社日立製作所 | 集積回路装置の製造方法 |
EP0437376B1 (de) * | 1990-01-12 | 1997-03-19 | Sony Corporation | Phasenverschiebungsmaske und Verfahren zur Herstellung |
-
1990
- 1990-06-15 JP JP2158420A patent/JPH0450943A/ja active Pending
-
1991
- 1991-05-28 DE DE69115999T patent/DE69115999T2/de not_active Expired - Fee Related
- 1991-05-28 EP EP91304793A patent/EP0461778B1/de not_active Expired - Lifetime
-
1992
- 1992-08-14 US US07/928,639 patent/US5300378A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0450943A (ja) | 1992-02-19 |
EP0461778A1 (de) | 1991-12-18 |
DE69115999T2 (de) | 1996-05-23 |
US5300378A (en) | 1994-04-05 |
EP0461778B1 (de) | 1996-01-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |