DE69115999D1 - Verfahren zur Herstellung eines Maskenmusters - Google Patents

Verfahren zur Herstellung eines Maskenmusters

Info

Publication number
DE69115999D1
DE69115999D1 DE69115999T DE69115999T DE69115999D1 DE 69115999 D1 DE69115999 D1 DE 69115999D1 DE 69115999 T DE69115999 T DE 69115999T DE 69115999 T DE69115999 T DE 69115999T DE 69115999 D1 DE69115999 D1 DE 69115999D1
Authority
DE
Germany
Prior art keywords
making
mask pattern
mask
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69115999T
Other languages
English (en)
Other versions
DE69115999T2 (de
Inventor
Hiroyuki Minami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of DE69115999D1 publication Critical patent/DE69115999D1/de
Application granted granted Critical
Publication of DE69115999T2 publication Critical patent/DE69115999T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69115999T 1990-06-15 1991-05-28 Verfahren zur Herstellung eines Maskenmusters Expired - Fee Related DE69115999T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2158420A JPH0450943A (ja) 1990-06-15 1990-06-15 マスクパターンとその製造方法

Publications (2)

Publication Number Publication Date
DE69115999D1 true DE69115999D1 (de) 1996-02-15
DE69115999T2 DE69115999T2 (de) 1996-05-23

Family

ID=15671369

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69115999T Expired - Fee Related DE69115999T2 (de) 1990-06-15 1991-05-28 Verfahren zur Herstellung eines Maskenmusters

Country Status (4)

Country Link
US (1) US5300378A (de)
EP (1) EP0461778B1 (de)
JP (1) JPH0450943A (de)
DE (1) DE69115999T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3194155B2 (ja) * 1992-01-31 2001-07-30 キヤノン株式会社 半導体デバイスの製造方法及びそれを用いた投影露光装置
EP0553543B1 (de) * 1992-01-31 1997-12-29 Mitsubishi Denki Kabushiki Kaisha Phasenverschiebungsmaske und Verfahren zur Erzeugung eines Fotolackmusters unter Verwendung dieser Maske
JP3210123B2 (ja) * 1992-03-27 2001-09-17 キヤノン株式会社 結像方法及び該方法を用いたデバイス製造方法
JPH06266094A (ja) * 1992-09-29 1994-09-22 Texas Instr Inc <Ti> 半導体製造のためのフォトマスク
US5300786A (en) * 1992-10-28 1994-04-05 International Business Machines Corporation Optical focus phase shift test pattern, monitoring system and process
KR0128827B1 (ko) * 1993-12-31 1998-04-07 김주용 위상반전마스크 제조방법
US5414580A (en) * 1994-05-13 1995-05-09 International Business Machines Corporation Magnetic storage system using thin film magnetic recording heads using phase-shifting mask
KR100195333B1 (ko) * 1996-09-02 1999-06-15 구본준 위상반전마스크 및 그 제조방법
US5786114A (en) * 1997-01-10 1998-07-28 Kabushiki Kaisha Toshiba Attenuated phase shift mask with halftone boundary regions
US5908718A (en) * 1997-03-31 1999-06-01 Nec Corporation Phase shifting photomask with two different transparent regions
JP4053263B2 (ja) * 2001-08-17 2008-02-27 株式会社ルネサステクノロジ 半導体装置の製造方法
JP2004144975A (ja) * 2002-10-24 2004-05-20 Renesas Technology Corp パターン転写マスク、半導体装置の製造方法、及び、マスクパターン作成用コンピュータプログラム
DE102005008478B3 (de) * 2005-02-24 2006-10-26 Infineon Technologies Ag Verfahren zur Herstellung von sublithographischen Strukturen

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0690506B2 (ja) * 1985-09-20 1994-11-14 株式会社日立製作所 ホトマスク
FR2590376A1 (fr) * 1985-11-21 1987-05-22 Dumant Jean Marc Procede de masquage et masque utilise
CA1313792C (en) * 1986-02-28 1993-02-23 Junji Hirokane Method of manufacturing photo-mask and photo-mask manufactured thereby
US4948706A (en) * 1987-12-30 1990-08-14 Hoya Corporation Process for producing transparent substrate having thereon transparent conductive pattern elements separated by light-shielding insulating film, and process for producing surface-colored material
JP2710967B2 (ja) * 1988-11-22 1998-02-10 株式会社日立製作所 集積回路装置の製造方法
EP0437376B1 (de) * 1990-01-12 1997-03-19 Sony Corporation Phasenverschiebungsmaske und Verfahren zur Herstellung

Also Published As

Publication number Publication date
EP0461778A1 (de) 1991-12-18
JPH0450943A (ja) 1992-02-19
US5300378A (en) 1994-04-05
DE69115999T2 (de) 1996-05-23
EP0461778B1 (de) 1996-01-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee