DE69319299D1 - Verfahren zur Herstellung eines transparenten Musters aus leitendem Film - Google Patents

Verfahren zur Herstellung eines transparenten Musters aus leitendem Film

Info

Publication number
DE69319299D1
DE69319299D1 DE69319299T DE69319299T DE69319299D1 DE 69319299 D1 DE69319299 D1 DE 69319299D1 DE 69319299 T DE69319299 T DE 69319299T DE 69319299 T DE69319299 T DE 69319299T DE 69319299 D1 DE69319299 D1 DE 69319299D1
Authority
DE
Germany
Prior art keywords
producing
conductive film
transparent pattern
transparent
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69319299T
Other languages
English (en)
Other versions
DE69319299T2 (de
Inventor
Akiyoshi Hattori
Yoshihiro Hori
Akihiko Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE69319299D1 publication Critical patent/DE69319299D1/de
Application granted granted Critical
Publication of DE69319299T2 publication Critical patent/DE69319299T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1258Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by using a substrate provided with a shape pattern, e.g. grooves, banks, resist pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/84Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/13439Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/017Manufacturing methods or apparatus for heaters
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0166Polymeric layer used for special processing, e.g. resist for etching insulating material or photoresist used as a mask during plasma etching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/032Materials
    • H05K2201/0326Inorganic, non-metallic conductor, e.g. indium-tin oxide [ITO]
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0562Details of resist
    • H05K2203/0568Resist used for applying paste, ink or powder
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12Using specific substances
    • H05K2203/121Metallo-organic compounds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Electroluminescent Light Sources (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Liquid Crystal (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemically Coating (AREA)
DE69319299T 1992-10-27 1993-03-18 Verfahren zur Herstellung eines transparenten Musters aus leitendem Film Expired - Fee Related DE69319299T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4289069A JPH06139845A (ja) 1992-10-27 1992-10-27 パターン化した透明導電膜の形成方法

Publications (2)

Publication Number Publication Date
DE69319299D1 true DE69319299D1 (de) 1998-07-30
DE69319299T2 DE69319299T2 (de) 1999-01-21

Family

ID=17738427

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69319299T Expired - Fee Related DE69319299T2 (de) 1992-10-27 1993-03-18 Verfahren zur Herstellung eines transparenten Musters aus leitendem Film

Country Status (4)

Country Link
US (1) US5403616A (de)
EP (1) EP0594932B1 (de)
JP (1) JPH06139845A (de)
DE (1) DE69319299T2 (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3724592B2 (ja) * 1993-07-26 2005-12-07 ハイニックス セミコンダクター アメリカ インコーポレイテッド 半導体基板の平坦化方法
FR2721788B1 (fr) * 1994-06-24 1996-09-06 Bernard Tavernier Film chauffant.
US5935717A (en) * 1996-06-28 1999-08-10 Hitachi, Ltd. Functional film having inorganic thin on surface of organic film article using the same and process for producing the same
JPH10237078A (ja) * 1996-10-14 1998-09-08 Dainippon Printing Co Ltd 金属錯体溶液、感光性金属錯体溶液及び金属酸化物膜の形成方法
US6327011B2 (en) * 1997-10-20 2001-12-04 Lg Electronics, Inc. Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same
KR100352892B1 (ko) * 2000-05-22 2002-09-16 주식회사 팍스텍 박막 발열체의 제조방법 및 이것을 이용한 발열장치
US6994261B2 (en) * 2000-08-10 2006-02-07 Novo Nirdisk A/S Support for a cartridge for transferring an electronically readable item of information from the cartridge to an electronic circuit
EP1309366B1 (de) * 2000-08-10 2007-02-21 Novo Nordisk A/S Vorrichtung zur verabreichung von medikamenten mit einem halter für eine kassette
KR100950133B1 (ko) * 2002-12-27 2010-03-30 엘지디스플레이 주식회사 인쇄방식에 의한 패턴형성방법
WO2004084795A1 (en) * 2003-03-24 2004-10-07 Novo Nordisk A/S Transparent electronic marking of a medication cartridge
US20060243804A1 (en) * 2003-10-03 2006-11-02 Novo Nordisk A/S Container comprising code information elements
US8053171B2 (en) 2004-01-16 2011-11-08 Semiconductor Energy Laboratory Co., Ltd. Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and EL television
EP1881859B1 (de) 2005-05-10 2011-01-19 Novo Nordisk A/S Injektionsvorrichtung mit optischem sensor
CA2623118A1 (en) * 2005-09-22 2007-04-12 Novo Nordisk A/S Device and method for contact free absolute position determination
PL1999691T3 (pl) * 2006-03-20 2011-02-28 Novo Nordisk As Bezkontaktowy odczyt kodów identyfikacyjnych wkładu
EP2011223B1 (de) 2006-04-12 2018-06-13 Novo Nordisk A/S Absolutpositions-bestimmung eines beweglich angeordneten elements in einer vorrichtung zur verabreichung von medikamenten
EP2013587B1 (de) * 2006-04-26 2018-04-04 Novo Nordisk A/S Kontaktlose absolute positionsbestimmung eines bewegenden bauteils in einer vorrichtung zur verabreichung von medikamenten
CN101641127B (zh) * 2007-03-21 2012-11-28 诺沃-诺迪斯克有限公司 具有容器识别的医药输送系统和用于医药输送系统的容器
WO2009015933A1 (en) * 2007-06-09 2009-02-05 Novo Nordisk A/S Contact free reading of reservoir identification codes
GB0720268D0 (en) * 2007-10-17 2007-11-28 Pilkington Group Ltd Glazing
KR101004912B1 (ko) * 2008-03-17 2010-12-28 주식회사 엘지화학 발열체 및 이의 제조방법
WO2009116786A2 (ko) * 2008-03-17 2009-09-24 주식회사 엘지화학 발열체 및 이의 제조방법
WO2009137648A1 (en) * 2008-05-09 2009-11-12 Aptapharma, Inc. Multilayer proton pump inhibitor tablets
KR20090129927A (ko) 2008-06-13 2009-12-17 주식회사 엘지화학 발열체 및 이의 제조방법
CN101983181B (zh) 2008-06-13 2015-10-14 Lg化学株式会社 加热件及其制备方法
US10412788B2 (en) 2008-06-13 2019-09-10 Lg Chem, Ltd. Heating element and manufacturing method thereof
DK2352536T3 (en) 2008-11-06 2018-06-18 Novo Nordisk As Electronically assisted drug delivery device
JP5896747B2 (ja) 2009-02-13 2016-03-30 ノボ・ノルデイスク・エー/エス 医療用デバイス及びカートリッジ
DE102009053688A1 (de) 2009-11-19 2011-05-26 Ferro Gmbh Siebdruckfähige Zusammensetzung und Verfahren zur Herstellung einer leitfähigen und transparenten Schicht
KR101141688B1 (ko) * 2010-02-10 2012-05-04 김철하 케미컬 습식 식각을 통한 기판 절단 방법
US10575449B1 (en) * 2017-06-19 2020-02-25 Rockwell Collins, Inc. Combined high frequency EMI shield and substrate heater using a thin film
US11065642B2 (en) * 2018-01-06 2021-07-20 Kohler Co. Multicolor fixture finishes
CN108834322A (zh) * 2018-03-30 2018-11-16 广州大正新材料科技有限公司 一种印刷电路的方法
CN108684156A (zh) * 2018-03-30 2018-10-19 广州安檀科技有限公司 一种电路印制方法
WO2020099729A1 (fr) * 2018-11-14 2020-05-22 Saint-Gobain Glass France Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrier
US11602767B2 (en) * 2019-06-28 2023-03-14 Vitro Flat Glass Llc Substrate having a burnable coating mask
CN110769529A (zh) * 2019-11-12 2020-02-07 中国商用飞机有限责任公司 电加热膜结构以及电加热膜的成型方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4187340A (en) * 1973-05-14 1980-02-05 Asahi Glass Company, Ltd. Method of forming patterned transparent electro-conductive film on the substrate of liquid crystal display
US4113895A (en) * 1976-11-19 1978-09-12 American Can Company Method for producing multilayered coated substrate
GB2068834A (en) * 1980-01-25 1981-08-19 Bfg Glassgroup Coating vitreous or ceramic supports
US4344817A (en) * 1980-09-15 1982-08-17 Photon Power, Inc. Process for forming tin oxide conductive pattern
JPS57138708A (en) * 1981-02-20 1982-08-27 Hitachi Ltd Composition for forming transparent conductive film and method of forming transparent conductive film
EP0106628B1 (de) * 1982-10-08 1987-01-07 Johnson Matthey Public Limited Company Druckfarbe
JPS62129846A (ja) * 1985-12-02 1987-06-12 Dainippon Screen Mfg Co Ltd フオトレジストの塗布方法及び塗布装置
US4789620A (en) * 1986-03-03 1988-12-06 Mitsubishi Rayon Co. Ltd. Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates
US5059454A (en) * 1989-04-26 1991-10-22 Flex Products, Inc. Method for making patterned thin film

Also Published As

Publication number Publication date
US5403616A (en) 1995-04-04
EP0594932B1 (de) 1998-06-24
EP0594932A1 (de) 1994-05-04
DE69319299T2 (de) 1999-01-21
JPH06139845A (ja) 1994-05-20

Similar Documents

Publication Publication Date Title
DE69319299D1 (de) Verfahren zur Herstellung eines transparenten Musters aus leitendem Film
DE69126463D1 (de) Verfahren zur Herstellung eines leitenden Elements
DE69414079T2 (de) Verfahren zur Herstellung eines Farbfilters
DE69214213D1 (de) Verfahren zur Herstellung eines porösen Polysiloxan-Produkts
DE69130351D1 (de) Verfahren zur Herstellung eines GMR Gegenstandes
DE68926313D1 (de) Verfahren zur Herstellung eines Filterelements
DE69118043T2 (de) Verfahren zur Herstellung eines kupferkaschierten Laminats
DE69308755T2 (de) Verfahren zur Herstellung eines Musters durch Silylierung
DE69126165D1 (de) Verfahren zur Herstellung eines Farbfilters
DE69303585D1 (de) Verfahren zur Herstellung eines Motivs
DE69418549T2 (de) Verfahren zur Herstellung eines Partikelnfilmes
DE69305141D1 (de) Verfahren zur Bildung eines transparenten leitfähigen Filmes
DE69204538T2 (de) Verfahren zur Herstellung eines Beschichtungsfilms.
DE68928115D1 (de) Verfahren zur Herstellung eines Farbbildes
DE69318380D1 (de) Verfahren zur Herstellung eines Orientierungsfilmes
DE69115999D1 (de) Verfahren zur Herstellung eines Maskenmusters
DE69414232T2 (de) Verfahren zur Herstellung eines Filterelements
DE69426147D1 (de) Verfahren zur Herstellung eines Farbfilters
DE69313573T2 (de) Verfahren zur Herstellung eines GaP lichtemittierenden Elementes
DE69103072D1 (de) Verfahren zur Herstellung eines funktionellen Dünnfilms.
DE69326561D1 (de) Verfahren zur herstellung eines trägermaterials
DE3480973D1 (de) Verfahren zur herstellung eines musters aus leitendem material.
DE69303054D1 (de) Verfahren zur Herstellung eines Farbbildes
DE69028308D1 (de) Verfahren zur Herstellung eines Silberbildes
DE69618501D1 (de) Verfahren zur Herstellung eines Musters

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee