DE69426147D1 - Verfahren zur Herstellung eines Farbfilters - Google Patents

Verfahren zur Herstellung eines Farbfilters

Info

Publication number
DE69426147D1
DE69426147D1 DE69426147T DE69426147T DE69426147D1 DE 69426147 D1 DE69426147 D1 DE 69426147D1 DE 69426147 T DE69426147 T DE 69426147T DE 69426147 T DE69426147 T DE 69426147T DE 69426147 D1 DE69426147 D1 DE 69426147D1
Authority
DE
Germany
Prior art keywords
producing
color filter
color
filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69426147T
Other languages
English (en)
Other versions
DE69426147T2 (de
Inventor
Yutaka Otsuki
Hitoshi Yuasa
Hiroyoshi Omika
Masayuki Ando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Publication of DE69426147D1 publication Critical patent/DE69426147D1/de
Application granted granted Critical
Publication of DE69426147T2 publication Critical patent/DE69426147T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
DE69426147T 1993-12-28 1994-12-22 Verfahren zur Herstellung eines Farbfilters Expired - Fee Related DE69426147T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33730193A JP3304579B2 (ja) 1993-12-28 1993-12-28 カラーフィルターの製造法

Publications (2)

Publication Number Publication Date
DE69426147D1 true DE69426147D1 (de) 2000-11-23
DE69426147T2 DE69426147T2 (de) 2001-03-01

Family

ID=18307338

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69426147T Expired - Fee Related DE69426147T2 (de) 1993-12-28 1994-12-22 Verfahren zur Herstellung eines Farbfilters

Country Status (6)

Country Link
US (1) US5527648A (de)
EP (1) EP0661595B1 (de)
JP (1) JP3304579B2 (de)
KR (1) KR950019780A (de)
DE (1) DE69426147T2 (de)
TW (1) TW269734B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6057900A (en) * 1995-02-09 2000-05-02 Dai Nippon Printing Co., Ltd. Color liquid crystal display device and method for producing color filter substrate
US6472110B1 (en) * 1995-09-21 2002-10-29 Shipley Company, L.L.C. Process for manufacturing liquid crystal display element
US5756241A (en) * 1996-04-08 1998-05-26 Industrial Technology Research Institute Self-aligned method for forming a color display screen
US6319381B1 (en) 1998-06-11 2001-11-20 Micron Technology, Inc. Methods of forming a face plate assembly of a color display
US6503772B1 (en) * 1999-03-26 2003-01-07 Fuji Xerox Co., Ltd. Method of manufacturing a thin film transistor-integrated color filter
KR100877708B1 (ko) * 2001-03-29 2009-01-07 다이니폰 인사츠 가부시키가이샤 패턴 형성체의 제조 방법 및 그것에 사용하는 포토마스크
JP4622955B2 (ja) * 2005-08-25 2011-02-02 セイコーエプソン株式会社 カラーフィルタ基板の製造方法、カラーフィルタ基板、表示装置
CN105974653B (zh) * 2016-07-21 2019-05-07 京东方科技集团股份有限公司 彩膜基板及其制造方法、掩膜版及其制造方法、显示装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0727082B2 (ja) * 1985-05-28 1995-03-29 セイコー電子工業株式会社 カラ−フイルタ−の製造方法
JPS63210901A (ja) * 1987-02-27 1988-09-01 Nippon Paint Co Ltd カラ−表示装置の製法
JP2847321B2 (ja) * 1990-08-14 1999-01-20 日本石油株式会社 ポジ型フォトレジスト組成物
JPH0687084B2 (ja) * 1990-11-07 1994-11-02 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン カラーフイルタの製造方法
US5385795A (en) * 1991-03-08 1995-01-31 Nippon Oil Co., Ltd. Method for producing color filter
US5214542A (en) * 1991-03-08 1993-05-25 Nippon Oil Co., Ltd. Method for producing color filter
JPH04324801A (ja) * 1991-04-25 1992-11-13 Nippon Oil Co Ltd カラーフィルターの製造法
US5314770A (en) * 1991-04-26 1994-05-24 Nippon Oil Co., Ltd. Method for producing color filter
JP2717736B2 (ja) * 1991-06-10 1998-02-25 日本石油株式会社 カラーフィルターの製造法
US5214541A (en) * 1991-06-12 1993-05-25 Nippon Oil Co., Ltd. Method for producing color filter
US5334468A (en) * 1991-07-09 1994-08-02 Nippon Oil Co., Ltd. Method for producing color filter
US5368977A (en) * 1992-03-23 1994-11-29 Nippon Oil Co. Ltd. Positive type photosensitive quinone diazide phenolic resin composition
JP2949391B2 (ja) * 1992-08-04 1999-09-13 日石三菱株式会社 カラーフィルターの製造法
JPH0659453A (ja) * 1992-08-07 1994-03-04 Nippon Oil Co Ltd ポジ型感光性樹脂組成物
JP2949392B2 (ja) * 1992-09-07 1999-09-13 日石三菱株式会社 カラーフィルターの製造法

Also Published As

Publication number Publication date
KR950019780A (ko) 1995-07-24
DE69426147T2 (de) 2001-03-01
EP0661595A1 (de) 1995-07-05
US5527648A (en) 1996-06-18
JPH07198932A (ja) 1995-08-01
EP0661595B1 (de) 2000-10-18
TW269734B (de) 1996-02-01
JP3304579B2 (ja) 2002-07-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee