DE69130003D1 - Negative lichtempfindliche Zusammensetzung und Verfahren zur Bildung eines Photolackmusters - Google Patents

Negative lichtempfindliche Zusammensetzung und Verfahren zur Bildung eines Photolackmusters

Info

Publication number
DE69130003D1
DE69130003D1 DE69130003T DE69130003T DE69130003D1 DE 69130003 D1 DE69130003 D1 DE 69130003D1 DE 69130003 T DE69130003 T DE 69130003T DE 69130003 T DE69130003 T DE 69130003T DE 69130003 D1 DE69130003 D1 DE 69130003D1
Authority
DE
Germany
Prior art keywords
forming
photoresist pattern
photosensitive composition
negative photosensitive
negative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69130003T
Other languages
English (en)
Other versions
DE69130003T2 (de
Inventor
Tameichi Ochiai
Noriaki Takahashi
Tomoyo Ishiguro
Mika Yoshizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Electronic Materials LLC
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2155649A external-priority patent/JPH0446344A/ja
Priority claimed from JP2184648A external-priority patent/JP2861309B2/ja
Priority claimed from JP2231453A external-priority patent/JPH04110945A/ja
Priority claimed from JP2249255A external-priority patent/JP2861344B2/ja
Priority claimed from JP2260156A external-priority patent/JP2982266B2/ja
Priority claimed from JP2404434A external-priority patent/JPH04219755A/ja
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Publication of DE69130003D1 publication Critical patent/DE69130003D1/de
Application granted granted Critical
Publication of DE69130003T2 publication Critical patent/DE69130003T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
DE69130003T 1990-05-25 1991-05-23 Negative lichtempfindliche Zusammensetzung und Verfahren zur Bildung eines Photolackmusters Expired - Fee Related DE69130003T2 (de)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP13684390 1990-05-25
JP2155649A JPH0446344A (ja) 1990-06-14 1990-06-14 ネガ型感光性組成物
JP15714690 1990-06-15
JP2184648A JP2861309B2 (ja) 1990-07-12 1990-07-12 ネガ型感光性組成物
JP2231453A JPH04110945A (ja) 1990-08-31 1990-08-31 ネガ型感光性組成物
JP2249255A JP2861344B2 (ja) 1990-09-19 1990-09-19 ネガ型感光性組成物
JP2260156A JP2982266B2 (ja) 1990-09-28 1990-09-28 ネガ型感光性組成物
JP2404434A JPH04219755A (ja) 1990-12-20 1990-12-20 ネガ型感光性組成物

Publications (2)

Publication Number Publication Date
DE69130003D1 true DE69130003D1 (de) 1998-09-24
DE69130003T2 DE69130003T2 (de) 1999-02-11

Family

ID=27573161

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69130003T Expired - Fee Related DE69130003T2 (de) 1990-05-25 1991-05-23 Negative lichtempfindliche Zusammensetzung und Verfahren zur Bildung eines Photolackmusters

Country Status (3)

Country Link
EP (1) EP0458325B1 (de)
KR (1) KR0184602B1 (de)
DE (1) DE69130003T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4125042A1 (de) * 1991-07-29 1993-02-04 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JPH06308729A (ja) * 1993-04-19 1994-11-04 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
DE69400595T2 (de) * 1993-04-20 1997-04-30 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche Harzzusammensetzung
US5691101A (en) * 1994-03-15 1997-11-25 Kabushiki Kaisha Toshiba Photosensitive composition
JPH08152716A (ja) * 1994-11-28 1996-06-11 Mitsubishi Electric Corp ネガ型レジスト及びレジストパターンの形成方法
US5910394A (en) 1997-06-18 1999-06-08 Shipley Company, L.L.C. I-line photoresist compositions
JP2002341536A (ja) 2001-05-21 2002-11-27 Kodak Polychrome Graphics Japan Ltd ネガ型感光性組成物およびネガ型感光性平版印刷版
KR100846085B1 (ko) * 2001-10-31 2008-07-14 주식회사 동진쎄미켐 액정표시장치 회로용 포토레지스트 조성물
JP2004002288A (ja) 2001-12-13 2004-01-08 Merck Patent Gmbh オキサジアゾール誘導体並びに電荷移動および発光材料としてのこの使用
JP5858987B2 (ja) 2010-05-04 2016-02-10 エルジー・ケム・リミテッド ネガティブフォトレジスト組成物および素子のパターニング方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2718259C2 (de) * 1977-04-25 1982-11-25 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliches Gemisch
JPS5577742A (en) * 1978-12-08 1980-06-11 Fuji Photo Film Co Ltd Photosensitive composition
CA1307695C (en) * 1986-01-13 1992-09-22 Wayne Edmund Feely Photosensitive compounds and thermally stable and aqueous developablenegative images
US4985337A (en) * 1988-11-15 1991-01-15 Konica Corporation Image forming method and element, in which the element contains a release layer and a photosensitive o-quinone diaziode layer
JPH062767B2 (ja) * 1989-02-10 1994-01-12 日本ペイント株式会社 光硬化性組成物
US5128232A (en) * 1989-05-22 1992-07-07 Shiply Company Inc. Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
JP2660352B2 (ja) * 1989-09-20 1997-10-08 日本ゼオン株式会社 レジスト組成物

Also Published As

Publication number Publication date
EP0458325B1 (de) 1998-08-19
EP0458325A1 (de) 1991-11-27
KR0184602B1 (ko) 1999-04-01
DE69130003T2 (de) 1999-02-11
KR910020503A (ko) 1991-12-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SHIPLEY COMPANY, L.L.C., MARLBOROUGH, MASS., US

8339 Ceased/non-payment of the annual fee