DE69130084D1 - Photolackzusammensetzung und Verfahren zur Herstellung eines Photolackbildes - Google Patents

Photolackzusammensetzung und Verfahren zur Herstellung eines Photolackbildes

Info

Publication number
DE69130084D1
DE69130084D1 DE69130084T DE69130084T DE69130084D1 DE 69130084 D1 DE69130084 D1 DE 69130084D1 DE 69130084 T DE69130084 T DE 69130084T DE 69130084 T DE69130084 T DE 69130084T DE 69130084 D1 DE69130084 D1 DE 69130084D1
Authority
DE
Germany
Prior art keywords
photoresist
producing
image
composition
photoresist composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69130084T
Other languages
English (en)
Other versions
DE69130084T2 (de
Inventor
Akiko Kotachi
Satoshi Takechi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE69130084D1 publication Critical patent/DE69130084D1/de
Application granted granted Critical
Publication of DE69130084T2 publication Critical patent/DE69130084T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69130084T 1990-06-08 1991-06-05 Photolackzusammensetzung und Verfahren zur Herstellung eines Photolackbildes Expired - Fee Related DE69130084T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2150820A JPH0442229A (ja) 1990-06-08 1990-06-08 レジスト材料およびパターンの形成方法

Publications (2)

Publication Number Publication Date
DE69130084D1 true DE69130084D1 (de) 1998-10-08
DE69130084T2 DE69130084T2 (de) 1999-01-21

Family

ID=15505125

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69130084T Expired - Fee Related DE69130084T2 (de) 1990-06-08 1991-06-05 Photolackzusammensetzung und Verfahren zur Herstellung eines Photolackbildes

Country Status (4)

Country Link
US (1) US5326670A (de)
EP (1) EP0460941B1 (de)
JP (1) JPH0442229A (de)
DE (1) DE69130084T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06332196A (ja) * 1993-05-24 1994-12-02 Nippon Paint Co Ltd レジストパターンの形成方法
JP2980149B2 (ja) * 1993-09-24 1999-11-22 富士通株式会社 レジスト材料およびパターン形成方法
US5705309A (en) * 1996-09-24 1998-01-06 Eastman Kodak Company Photosensitive composition and element containing polyazide and an infrared absorber in a photocrosslinkable binder
US5985524A (en) * 1997-03-28 1999-11-16 International Business Machines Incorporated Process for using bilayer photoresist
US6358675B1 (en) 1998-10-02 2002-03-19 3M Innovative Properties Company Silicon-containing alcohols and polymers having silicon-containing tertiary ester groups made therefrom
US6835524B2 (en) * 2000-02-16 2004-12-28 Shin-Etsu Chemical Co., Ltd. Polymers, chemical amplification resist compositions and patterning process
US6683202B2 (en) 2001-02-22 2004-01-27 Tokyo Ohka, Kogyo Co., Ltd. Fluorine-containing monomeric ester compound for base resin in photoresist composition
FR2841900B1 (fr) * 2002-07-08 2007-03-02 Genfit S A Nouveaux derives de 1,3-diphenylprop-2-en-1-one substitues, preparation et utilisations
FR2841784B1 (fr) * 2002-07-08 2007-03-02 Composition a base de derives de 1,3-diphenylprop-2en-1-one substitues, preparation et utilisations

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7906932A (nl) * 1979-09-18 1981-03-20 Philips Nv Negatief resist-materiaal, drager met resist-materiaal en werkwijze voor het volgens een patroon aanbrengen van een laag.
JPS56139515A (en) * 1980-03-31 1981-10-31 Daikin Ind Ltd Polyfluoroalkyl acrylate copolymer
EP0064864B1 (de) * 1981-05-07 1989-12-13 Honeywell Inc. Verfahren zur Herstellung von empfindlichen positiven Elektronenstrahlresists
DE3279090D1 (en) * 1981-12-19 1988-11-10 Daikin Ind Ltd Resist material and process for forming fine resist pattern
US4476217A (en) * 1982-05-10 1984-10-09 Honeywell Inc. Sensitive positive electron beam resists
JPS59197036A (ja) * 1982-06-28 1984-11-08 Nissan Chem Ind Ltd パタ−ン形成用材料
JPS60138543A (ja) * 1983-12-27 1985-07-23 Fujitsu Ltd パタ−ン形成方法
JPS60254041A (ja) * 1984-05-30 1985-12-14 Fujitsu Ltd パタ−ン形成方法
US4788127A (en) * 1986-11-17 1988-11-29 Eastman Kodak Company Photoresist composition comprising an interpolymer of a silicon-containing monomer and an hydroxystyrene
JPS63307450A (ja) * 1987-06-09 1988-12-15 Fujitsu Ltd レジストパタ−ンの形成方法
JPH02115853A (ja) * 1988-10-26 1990-04-27 Fujitsu Ltd 半導体装置の製造方法
JP2653148B2 (ja) * 1989-01-20 1997-09-10 富士通株式会社 レジスト組成物
JP2737225B2 (ja) * 1989-03-27 1998-04-08 松下電器産業株式会社 微細パターン形成材料およびパターン形成方法
JP2659025B2 (ja) * 1990-01-24 1997-09-30 富士通株式会社 放射線用レジスト及びその製造方法及びパターン形成方法
JP2707785B2 (ja) * 1990-03-13 1998-02-04 富士通株式会社 レジスト組成物およびパターン形成方法

Also Published As

Publication number Publication date
EP0460941B1 (de) 1998-09-02
EP0460941A2 (de) 1991-12-11
EP0460941A3 (en) 1992-09-16
DE69130084T2 (de) 1999-01-21
US5326670A (en) 1994-07-05
JPH0442229A (ja) 1992-02-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee