DE69005331T2 - Verfahren zur Herstellung einer keramischen Beschichtung auf einem metallischen Substrat sowie mittels des Verfahrens beschichteter Gegenstand. - Google Patents

Verfahren zur Herstellung einer keramischen Beschichtung auf einem metallischen Substrat sowie mittels des Verfahrens beschichteter Gegenstand.

Info

Publication number
DE69005331T2
DE69005331T2 DE69005331T DE69005331T DE69005331T2 DE 69005331 T2 DE69005331 T2 DE 69005331T2 DE 69005331 T DE69005331 T DE 69005331T DE 69005331 T DE69005331 T DE 69005331T DE 69005331 T2 DE69005331 T2 DE 69005331T2
Authority
DE
Germany
Prior art keywords
producing
ceramic coating
metallic substrate
object coated
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69005331T
Other languages
English (en)
Other versions
DE69005331D1 (de
Inventor
Jean-Francois Nowak
Francis Maury
Djarollah Oquab
Roland Morancho
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FORTECH PUTEAUX
Nitruvid SA
Original Assignee
FORTECH PUTEAUX
Nitruvid SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FORTECH PUTEAUX, Nitruvid SA filed Critical FORTECH PUTEAUX
Publication of DE69005331D1 publication Critical patent/DE69005331D1/de
Application granted granted Critical
Publication of DE69005331T2 publication Critical patent/DE69005331T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemically Coating (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Ceramic Capacitors (AREA)
DE69005331T 1989-02-16 1990-02-12 Verfahren zur Herstellung einer keramischen Beschichtung auf einem metallischen Substrat sowie mittels des Verfahrens beschichteter Gegenstand. Expired - Fee Related DE69005331T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8902048A FR2643087B1 (fr) 1989-02-16 1989-02-16 Procede de depot d'un revetement de type ceramique sur un substrat metallique et element comportant un revetement obtenu par ce procede

Publications (2)

Publication Number Publication Date
DE69005331D1 DE69005331D1 (de) 1994-02-03
DE69005331T2 true DE69005331T2 (de) 1994-06-09

Family

ID=9378851

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69005331T Expired - Fee Related DE69005331T2 (de) 1989-02-16 1990-02-12 Verfahren zur Herstellung einer keramischen Beschichtung auf einem metallischen Substrat sowie mittels des Verfahrens beschichteter Gegenstand.

Country Status (10)

Country Link
US (1) US5302422A (de)
EP (1) EP0387113B1 (de)
JP (1) JPH032374A (de)
AT (1) ATE99001T1 (de)
CA (1) CA2010119A1 (de)
DE (1) DE69005331T2 (de)
FI (1) FI93556C (de)
FR (1) FR2643087B1 (de)
IL (1) IL93378A (de)
ZA (1) ZA901151B (de)

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US5830540A (en) * 1994-09-15 1998-11-03 Eltron Research, Inc. Method and apparatus for reactive plasma surfacing
WO1996031899A1 (en) * 1995-04-07 1996-10-10 Advanced Energy Industries, Inc. Adjustable energy quantum thin film plasma processing system
FR2738017A1 (fr) * 1995-08-25 1997-02-28 M3D Procede de revetement d'un carbure ou d'un carbonitrure mixte de ti et de zr par depot chimique en phase vapeur (cvd) et dispositif destine a former un revetement ceramique a partir d'au moins deux precurseurs metalliques
US6162513A (en) * 1996-04-19 2000-12-19 Korea Institute Of Science And Technology Method for modifying metal surface
JP4022048B2 (ja) * 2001-03-06 2007-12-12 株式会社神戸製鋼所 ダイヤモンドライクカーボン硬質多層膜成形体およびその製造方法
PT1598456E (pt) * 2004-05-17 2008-12-29 Braecker Ag Viajante e processo para a sua produção
FR2904007B1 (fr) * 2006-07-21 2008-11-21 Toulouse Inst Nat Polytech Procede de depot de revetements ceramiques non oxydes.
WO2009140417A1 (en) * 2008-05-13 2009-11-19 Sub-One Technology, Inc. Method of coating inner and outer surfaces of pipes for thermal solar and other applications
BRPI0916880B1 (pt) 2008-08-04 2019-12-10 Agc Flat Glass Na Inc fonte de plasma e método de formar revestimento que utiliza deposição química a vapor melhorada de plasma e revestimento
BR112017011770A2 (pt) 2014-12-05 2017-12-26 Agc Flat Glass Na Inc fonte de plasma que utiliza um revestimento de redução de macro partícula e método de usar a fonte de plasma que utiliza um revestimento de redução de macro partícula para a deposição de revestimentos de filme fino e modificação de superfícies
CN107852805B (zh) 2014-12-05 2020-10-16 Agc玻璃欧洲公司 空心阴极等离子体源
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US11104994B2 (en) 2016-09-28 2021-08-31 Commissariat A L'energie Atomique Et Aux Energies Alternatives Nuclear component with metastable Cr coating, DLI-MOCVD method for producing same, and uses for controlling oxidation/hydridation
FR3056815B1 (fr) * 2016-09-28 2021-01-29 Commissariat Energie Atomique Composant nucleaire a substrat metallique et utilisations contre l'oxydation/hydruration.
JP7198746B2 (ja) 2016-09-28 2023-01-04 コミサーリャ ア レナジー アトミック エー オー エナジー アルタナティブ 金属基材を有する原子炉コンポーネント、ｄｌｉ－ｍｏｃｖｄによる製造方法および酸化／水素化に対する使用
WO2018060642A1 (fr) * 2016-09-28 2018-04-05 Commissariat A L'energie Atomique Et Aux Energies Alternatives Composant nucléaire avec revetement de crc amorphe, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration
WO2018060644A1 (fr) 2016-09-28 2018-04-05 Commissariat A L'energie Atomique Et Aux Energies Alternatives Composant nucléaire composite, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration
FR3056816B1 (fr) * 2016-09-28 2021-03-05 Commissariat Energie Atomique Composant nucleaire avec revetement de crc amorphe, utilisations contre l'oxydation/hydruration.
FR3056602B1 (fr) * 2016-09-28 2021-01-01 Commissariat Energie Atomique Procede de fabrication par dli-mocvd d'un composant nucleaire avec revetement de crc amorphe
FR3056601B1 (fr) * 2016-09-28 2020-12-25 Commissariat Energie Atomique Procede de fabrication d'un composant nucleaire a substrat metallique par dli-mocvd
WO2019182954A1 (en) * 2018-03-19 2019-09-26 Applied Materials, Inc. Methods of protecting metallic components against corrosion using chromium-containing thin films
CN111936664A (zh) 2018-03-19 2020-11-13 应用材料公司 在航空航天部件上沉积涂层的方法
EP3784815A4 (de) 2018-04-27 2021-11-03 Applied Materials, Inc. Schutz von komponenten vor korrosion
US11009339B2 (en) 2018-08-23 2021-05-18 Applied Materials, Inc. Measurement of thickness of thermal barrier coatings using 3D imaging and surface subtraction methods for objects with complex geometries
WO2020219332A1 (en) 2019-04-26 2020-10-29 Applied Materials, Inc. Methods of protecting aerospace components against corrosion and oxidation
US11794382B2 (en) 2019-05-16 2023-10-24 Applied Materials, Inc. Methods for depositing anti-coking protective coatings on aerospace components
US11697879B2 (en) 2019-06-14 2023-07-11 Applied Materials, Inc. Methods for depositing sacrificial coatings on aerospace components
US11466364B2 (en) 2019-09-06 2022-10-11 Applied Materials, Inc. Methods for forming protective coatings containing crystallized aluminum oxide
US11519066B2 (en) 2020-05-21 2022-12-06 Applied Materials, Inc. Nitride protective coatings on aerospace components and methods for making the same
US11739429B2 (en) 2020-07-03 2023-08-29 Applied Materials, Inc. Methods for refurbishing aerospace components

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DE1446272A1 (de) * 1959-05-11 1969-01-23 Union Carbide Corp Verfahren zum Gasplattieren
GB1032828A (en) * 1962-07-06 1966-06-15 Ionic Plating Company Ltd Improved method for depositing chromium on non-metallic substrates
US3474017A (en) * 1966-05-23 1969-10-21 Ethyl Corp Preparation of cyclopentadienyl metal olefin compounds
SE397370B (sv) * 1977-03-01 1977-10-31 Sandvik Ab Sett att framstella ett notningsbestendigt ytskikt pa legerat stal
FR2446326A1 (fr) * 1979-01-10 1980-08-08 Creusot Loire Perfectionnement a la nitruration ionique des corps creux allonges, en aciers
EP0055459A1 (de) * 1980-12-29 1982-07-07 Rikuun Electric co. Verfahren zur Herstellung von Oxiden durch chemische Dampf-Abscheidung (CVD)
US4605566A (en) * 1983-08-22 1986-08-12 Nec Corporation Method for forming thin films by absorption
US4810530A (en) * 1986-08-25 1989-03-07 Gte Laboratories Incorporated Method of coating metal carbide nitride, and carbonitride whiskers with metal carbides, nitrides, carbonitrides, or oxides
FR2604188B1 (fr) * 1986-09-18 1992-11-27 Framatome Sa Element tubulaire en acier inoxydable presentant une resistance a l'usure amelioree
CN1019513B (zh) * 1986-10-29 1992-12-16 三菱电机株式会社 化合物薄膜形成装置
JPS6465251A (en) * 1987-09-07 1989-03-10 Nippon Light Metal Co Surface treatment of aluminum member

Also Published As

Publication number Publication date
EP0387113B1 (de) 1993-12-22
IL93378A (en) 1994-08-26
ATE99001T1 (de) 1994-01-15
US5302422A (en) 1994-04-12
IL93378A0 (en) 1990-11-29
ZA901151B (en) 1991-09-25
FR2643087A1 (fr) 1990-08-17
FI93556B (fi) 1995-01-13
FI900758A0 (fi) 1990-02-15
DE69005331D1 (de) 1994-02-03
FR2643087B1 (fr) 1991-06-07
CA2010119A1 (en) 1990-08-16
EP0387113A1 (de) 1990-09-12
FI93556C (fi) 1995-04-25
JPH032374A (ja) 1991-01-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee