ZA901151B - Deposition process of a coating of the ceramic type on a metallic substrate and element comprising a coating obtained by this procedure - Google Patents
Deposition process of a coating of the ceramic type on a metallic substrate and element comprising a coating obtained by this procedureInfo
- Publication number
- ZA901151B ZA901151B ZA901151A ZA901151A ZA901151B ZA 901151 B ZA901151 B ZA 901151B ZA 901151 A ZA901151 A ZA 901151A ZA 901151 A ZA901151 A ZA 901151A ZA 901151 B ZA901151 B ZA 901151B
- Authority
- ZA
- South Africa
- Prior art keywords
- coating
- ceramic type
- procedure
- deposition process
- metallic substrate
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Chemically Coating (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Carbon And Carbon Compounds (AREA)
- Ceramic Capacitors (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8902048A FR2643087B1 (fr) | 1989-02-16 | 1989-02-16 | Procede de depot d'un revetement de type ceramique sur un substrat metallique et element comportant un revetement obtenu par ce procede |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA901151B true ZA901151B (en) | 1991-09-25 |
Family
ID=9378851
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA901151A ZA901151B (en) | 1989-02-16 | 1990-02-15 | Deposition process of a coating of the ceramic type on a metallic substrate and element comprising a coating obtained by this procedure |
Country Status (10)
Country | Link |
---|---|
US (1) | US5302422A (xx) |
EP (1) | EP0387113B1 (xx) |
JP (1) | JPH032374A (xx) |
AT (1) | ATE99001T1 (xx) |
CA (1) | CA2010119A1 (xx) |
DE (1) | DE69005331T2 (xx) |
FI (1) | FI93556C (xx) |
FR (1) | FR2643087B1 (xx) |
IL (1) | IL93378A (xx) |
ZA (1) | ZA901151B (xx) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5830540A (en) * | 1994-09-15 | 1998-11-03 | Eltron Research, Inc. | Method and apparatus for reactive plasma surfacing |
WO1996031899A1 (en) * | 1995-04-07 | 1996-10-10 | Advanced Energy Industries, Inc. | Adjustable energy quantum thin film plasma processing system |
FR2738017A1 (fr) * | 1995-08-25 | 1997-02-28 | M3D | Procede de revetement d'un carbure ou d'un carbonitrure mixte de ti et de zr par depot chimique en phase vapeur (cvd) et dispositif destine a former un revetement ceramique a partir d'au moins deux precurseurs metalliques |
US6162513A (en) * | 1996-04-19 | 2000-12-19 | Korea Institute Of Science And Technology | Method for modifying metal surface |
JP4022048B2 (ja) * | 2001-03-06 | 2007-12-12 | 株式会社神戸製鋼所 | ダイヤモンドライクカーボン硬質多層膜成形体およびその製造方法 |
ATE414191T1 (de) * | 2004-05-17 | 2008-11-15 | Braecker Ag | Ringläufer und verfahren zu dessen herstellung |
FR2904007B1 (fr) * | 2006-07-21 | 2008-11-21 | Toulouse Inst Nat Polytech | Procede de depot de revetements ceramiques non oxydes. |
JP2011521106A (ja) * | 2008-05-13 | 2011-07-21 | サブ−ワン・テクノロジー・インコーポレーテッド | 太陽熱およびその他の応用例におけるパイプの内面および外面のコーティング方法 |
WO2010017185A1 (en) | 2008-08-04 | 2010-02-11 | Agc Flat Glass North America, Inc. | Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition |
MX2017007357A (es) * | 2014-12-05 | 2018-04-24 | Agc Flat Glass Na Inc | Fuente de plasma utilizando un revestimiento de reduccion de macro-particulas y metodo de uso de una fuente de plasma utilizando un revestimiento de reduccion de macro-particulas para la deposicion de revestimientos de pelicula delgada y modificacion de superficies. |
EA201791234A1 (ru) | 2014-12-05 | 2017-11-30 | Эй-Джи-Си Гласс Юроуп, С.А. | Плазменный источник с полым катодом |
US9721765B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Plasma device driven by multiple-phase alternating or pulsed electrical current |
US10242846B2 (en) | 2015-12-18 | 2019-03-26 | Agc Flat Glass North America, Inc. | Hollow cathode ion source |
US10573499B2 (en) | 2015-12-18 | 2020-02-25 | Agc Flat Glass North America, Inc. | Method of extracting and accelerating ions |
JP6924824B2 (ja) * | 2016-09-28 | 2021-08-25 | コミサーリャ ア レナジー アトミック エー オー エナジー アルタナティブCommissariat A L’Energie Atomique Et Aux Energies Alternatives | アモルファスCrC被覆を有する原子炉コンポーネント、DLI−MOCVDによる製造方法および酸化/水素化に対する使用 |
FR3056816B1 (fr) * | 2016-09-28 | 2021-03-05 | Commissariat Energie Atomique | Composant nucleaire avec revetement de crc amorphe, utilisations contre l'oxydation/hydruration. |
EP3520118B1 (fr) | 2016-09-28 | 2020-08-05 | Commissariat à l'Énergie Atomique et aux Énergies Alternatives | Composant nucléaire avec revetement de cr metastable, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration |
US11715572B2 (en) | 2016-09-28 | 2023-08-01 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Composite nuclear component, DLI-MOCVD method for producing same, and uses for controlling oxidation/hydridation |
FR3056601B1 (fr) * | 2016-09-28 | 2020-12-25 | Commissariat Energie Atomique | Procede de fabrication d'un composant nucleaire a substrat metallique par dli-mocvd |
JP7198746B2 (ja) | 2016-09-28 | 2023-01-04 | コミサーリャ ア レナジー アトミック エー オー エナジー アルタナティブ | 金属基材を有する原子炉コンポーネント、dli-mocvdによる製造方法および酸化/水素化に対する使用 |
FR3056602B1 (fr) * | 2016-09-28 | 2021-01-01 | Commissariat Energie Atomique | Procede de fabrication par dli-mocvd d'un composant nucleaire avec revetement de crc amorphe |
FR3056815B1 (fr) * | 2016-09-28 | 2021-01-29 | Commissariat Energie Atomique | Composant nucleaire a substrat metallique et utilisations contre l'oxydation/hydruration. |
EP3768873A4 (en) * | 2018-03-19 | 2022-06-01 | Applied Materials, Inc. | METHOD OF PROTECTING METALLIC COMPONENTS AGAINST CORROSION USING CHROMIUM-CONTAINING THIN FILMS |
US11028480B2 (en) | 2018-03-19 | 2021-06-08 | Applied Materials, Inc. | Methods of protecting metallic components against corrosion using chromium-containing thin films |
US11015252B2 (en) | 2018-04-27 | 2021-05-25 | Applied Materials, Inc. | Protection of components from corrosion |
US11009339B2 (en) | 2018-08-23 | 2021-05-18 | Applied Materials, Inc. | Measurement of thickness of thermal barrier coatings using 3D imaging and surface subtraction methods for objects with complex geometries |
EP3959356A4 (en) | 2019-04-26 | 2023-01-18 | Applied Materials, Inc. | METHODS FOR PROTECTING AEROSPACE ELEMENTS AGAINST CORROSION AND OXIDATION |
US11794382B2 (en) | 2019-05-16 | 2023-10-24 | Applied Materials, Inc. | Methods for depositing anti-coking protective coatings on aerospace components |
US11697879B2 (en) | 2019-06-14 | 2023-07-11 | Applied Materials, Inc. | Methods for depositing sacrificial coatings on aerospace components |
US11466364B2 (en) | 2019-09-06 | 2022-10-11 | Applied Materials, Inc. | Methods for forming protective coatings containing crystallized aluminum oxide |
US11519066B2 (en) | 2020-05-21 | 2022-12-06 | Applied Materials, Inc. | Nitride protective coatings on aerospace components and methods for making the same |
CN115734826A (zh) | 2020-07-03 | 2023-03-03 | 应用材料公司 | 用于翻新航空部件的方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1446272A1 (de) * | 1959-05-11 | 1969-01-23 | Union Carbide Corp | Verfahren zum Gasplattieren |
GB1032828A (en) * | 1962-07-06 | 1966-06-15 | Ionic Plating Company Ltd | Improved method for depositing chromium on non-metallic substrates |
US3474017A (en) * | 1966-05-23 | 1969-10-21 | Ethyl Corp | Preparation of cyclopentadienyl metal olefin compounds |
SE397370B (sv) * | 1977-03-01 | 1977-10-31 | Sandvik Ab | Sett att framstella ett notningsbestendigt ytskikt pa legerat stal |
FR2446326A1 (fr) * | 1979-01-10 | 1980-08-08 | Creusot Loire | Perfectionnement a la nitruration ionique des corps creux allonges, en aciers |
EP0055459A1 (en) * | 1980-12-29 | 1982-07-07 | Rikuun Electric co. | Process for producing oxides using chemical vapour deposition |
US4605566A (en) * | 1983-08-22 | 1986-08-12 | Nec Corporation | Method for forming thin films by absorption |
US4810530A (en) * | 1986-08-25 | 1989-03-07 | Gte Laboratories Incorporated | Method of coating metal carbide nitride, and carbonitride whiskers with metal carbides, nitrides, carbonitrides, or oxides |
FR2604188B1 (fr) * | 1986-09-18 | 1992-11-27 | Framatome Sa | Element tubulaire en acier inoxydable presentant une resistance a l'usure amelioree |
CN1019513B (zh) * | 1986-10-29 | 1992-12-16 | 三菱电机株式会社 | 化合物薄膜形成装置 |
JPS6465251A (en) * | 1987-09-07 | 1989-03-10 | Nippon Light Metal Co | Surface treatment of aluminum member |
-
1989
- 1989-02-16 FR FR8902048A patent/FR2643087B1/fr not_active Expired - Fee Related
-
1990
- 1990-02-12 DE DE69005331T patent/DE69005331T2/de not_active Expired - Fee Related
- 1990-02-12 EP EP90400374A patent/EP0387113B1/fr not_active Expired - Lifetime
- 1990-02-12 AT AT90400374T patent/ATE99001T1/de not_active IP Right Cessation
- 1990-02-13 IL IL9337890A patent/IL93378A/en not_active IP Right Cessation
- 1990-02-15 ZA ZA901151A patent/ZA901151B/xx unknown
- 1990-02-15 CA CA002010119A patent/CA2010119A1/en not_active Abandoned
- 1990-02-15 FI FI900758A patent/FI93556C/fi not_active IP Right Cessation
- 1990-02-16 JP JP2035992A patent/JPH032374A/ja active Pending
-
1992
- 1992-11-13 US US07/975,999 patent/US5302422A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FI93556B (fi) | 1995-01-13 |
EP0387113B1 (fr) | 1993-12-22 |
FI93556C (fi) | 1995-04-25 |
IL93378A0 (en) | 1990-11-29 |
FR2643087B1 (fr) | 1991-06-07 |
FI900758A0 (fi) | 1990-02-15 |
EP0387113A1 (fr) | 1990-09-12 |
ATE99001T1 (de) | 1994-01-15 |
IL93378A (en) | 1994-08-26 |
DE69005331D1 (de) | 1994-02-03 |
US5302422A (en) | 1994-04-12 |
DE69005331T2 (de) | 1994-06-09 |
CA2010119A1 (en) | 1990-08-16 |
FR2643087A1 (fr) | 1990-08-17 |
JPH032374A (ja) | 1991-01-08 |
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