ZA901151B - Deposition process of a coating of the ceramic type on a metallic substrate and element comprising a coating obtained by this procedure - Google Patents

Deposition process of a coating of the ceramic type on a metallic substrate and element comprising a coating obtained by this procedure

Info

Publication number
ZA901151B
ZA901151B ZA901151A ZA901151A ZA901151B ZA 901151 B ZA901151 B ZA 901151B ZA 901151 A ZA901151 A ZA 901151A ZA 901151 A ZA901151 A ZA 901151A ZA 901151 B ZA901151 B ZA 901151B
Authority
ZA
South Africa
Prior art keywords
coating
ceramic type
procedure
deposition process
metallic substrate
Prior art date
Application number
ZA901151A
Other languages
English (en)
Inventor
Jean-Francois Nowak
Nowak Jean-Francois
Francis Maury
Maury Francis
Djarollah Oquab
Oquab Djarollah
Roland Morancho
Morancho Roland
Original Assignee
Nitruvid
C3F Comp Franc Forges Fond
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitruvid, C3F Comp Franc Forges Fond filed Critical Nitruvid
Publication of ZA901151B publication Critical patent/ZA901151B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemically Coating (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Ceramic Capacitors (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
ZA901151A 1989-02-16 1990-02-15 Deposition process of a coating of the ceramic type on a metallic substrate and element comprising a coating obtained by this procedure ZA901151B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8902048A FR2643087B1 (fr) 1989-02-16 1989-02-16 Procede de depot d'un revetement de type ceramique sur un substrat metallique et element comportant un revetement obtenu par ce procede

Publications (1)

Publication Number Publication Date
ZA901151B true ZA901151B (en) 1991-09-25

Family

ID=9378851

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA901151A ZA901151B (en) 1989-02-16 1990-02-15 Deposition process of a coating of the ceramic type on a metallic substrate and element comprising a coating obtained by this procedure

Country Status (10)

Country Link
US (1) US5302422A (de)
EP (1) EP0387113B1 (de)
JP (1) JPH032374A (de)
AT (1) ATE99001T1 (de)
CA (1) CA2010119A1 (de)
DE (1) DE69005331T2 (de)
FI (1) FI93556C (de)
FR (1) FR2643087B1 (de)
IL (1) IL93378A (de)
ZA (1) ZA901151B (de)

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US5830540A (en) * 1994-09-15 1998-11-03 Eltron Research, Inc. Method and apparatus for reactive plasma surfacing
WO1996031899A1 (en) * 1995-04-07 1996-10-10 Advanced Energy Industries, Inc. Adjustable energy quantum thin film plasma processing system
FR2738017A1 (fr) * 1995-08-25 1997-02-28 M3D Procede de revetement d'un carbure ou d'un carbonitrure mixte de ti et de zr par depot chimique en phase vapeur (cvd) et dispositif destine a former un revetement ceramique a partir d'au moins deux precurseurs metalliques
US6162513A (en) * 1996-04-19 2000-12-19 Korea Institute Of Science And Technology Method for modifying metal surface
JP4022048B2 (ja) * 2001-03-06 2007-12-12 株式会社神戸製鋼所 ダイヤモンドライクカーボン硬質多層膜成形体およびその製造方法
TWI343953B (en) * 2004-05-17 2011-06-21 Ring traveler and method for producing it
FR2904007B1 (fr) * 2006-07-21 2008-11-21 Toulouse Inst Nat Polytech Procede de depot de revetements ceramiques non oxydes.
WO2009140417A1 (en) * 2008-05-13 2009-11-19 Sub-One Technology, Inc. Method of coating inner and outer surfaces of pipes for thermal solar and other applications
KR101602517B1 (ko) 2008-08-04 2016-03-10 에이지씨 플랫 글래스 노스 아메리카, 인코퍼레이티드 Pecvd를 이용한 박막 코팅을 증착하기 위한 플라즈마 소스 및 방법
ES2900321T3 (es) 2014-12-05 2022-03-16 Agc Flat Glass Na Inc Fuente de plasma que utiliza un recubrimiento de reducción de macropartículas y procedimiento para usar una fuente de plasma que utiliza un recubrimiento de reducción de macropartículas para la deposición de recubrimientos de película delgada y modificación de superficies
MX2017007356A (es) 2014-12-05 2018-04-11 Agc Flat Glass Europe S A Fuente de plasma del catodo hueco.
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
WO2018060644A1 (fr) 2016-09-28 2018-04-05 Commissariat A L'energie Atomique Et Aux Energies Alternatives Composant nucléaire composite, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration
EP3519605B1 (de) * 2016-09-28 2020-08-05 Commissariat à l'Énergie Atomique et aux Énergies Alternatives Nukleare komponente mit amorpher crc-beschichtung, verfahren zur herstellung davon mittels dli-mocvd und verwendung davon zur kontrolle von oxidation/hydridation
FR3056816B1 (fr) * 2016-09-28 2021-03-05 Commissariat Energie Atomique Composant nucleaire avec revetement de crc amorphe, utilisations contre l'oxydation/hydruration.
WO2018060643A1 (fr) 2016-09-28 2018-04-05 Commissariat A L'energie Atomique Et Aux Energies Alternatives Composant nucléaire avec revetement de cr metastable, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration
FR3056815B1 (fr) * 2016-09-28 2021-01-29 Commissariat Energie Atomique Composant nucleaire a substrat metallique et utilisations contre l'oxydation/hydruration.
FR3056601B1 (fr) * 2016-09-28 2020-12-25 Commissariat Energie Atomique Procede de fabrication d'un composant nucleaire a substrat metallique par dli-mocvd
JP7198746B2 (ja) 2016-09-28 2023-01-04 コミサーリャ ア レナジー アトミック エー オー エナジー アルタナティブ 金属基材を有する原子炉コンポーネント、dli-mocvdによる製造方法および酸化/水素化に対する使用
FR3056602B1 (fr) * 2016-09-28 2021-01-01 Commissariat Energie Atomique Procede de fabrication par dli-mocvd d'un composant nucleaire avec revetement de crc amorphe
WO2019182967A1 (en) 2018-03-19 2019-09-26 Applied Materials, Inc. Methods for depositing coatings on aerospace components
SG11202008259UA (en) * 2018-03-19 2020-10-29 Applied Materials Inc Methods of protecting metallic components against corrosion using chromium-containing thin films
US11015252B2 (en) 2018-04-27 2021-05-25 Applied Materials, Inc. Protection of components from corrosion
US11009339B2 (en) 2018-08-23 2021-05-18 Applied Materials, Inc. Measurement of thickness of thermal barrier coatings using 3D imaging and surface subtraction methods for objects with complex geometries
EP3959356A4 (de) 2019-04-26 2023-01-18 Applied Materials, Inc. Verfahren zum schutz von luft- und raumfahrtkomponenten gegen korrosion und oxidation
US11794382B2 (en) 2019-05-16 2023-10-24 Applied Materials, Inc. Methods for depositing anti-coking protective coatings on aerospace components
US11697879B2 (en) 2019-06-14 2023-07-11 Applied Materials, Inc. Methods for depositing sacrificial coatings on aerospace components
US11466364B2 (en) 2019-09-06 2022-10-11 Applied Materials, Inc. Methods for forming protective coatings containing crystallized aluminum oxide
US11519066B2 (en) 2020-05-21 2022-12-06 Applied Materials, Inc. Nitride protective coatings on aerospace components and methods for making the same
CN115734826A (zh) 2020-07-03 2023-03-03 应用材料公司 用于翻新航空部件的方法

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GB1032828A (en) * 1962-07-06 1966-06-15 Ionic Plating Company Ltd Improved method for depositing chromium on non-metallic substrates
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FR2446326A1 (fr) * 1979-01-10 1980-08-08 Creusot Loire Perfectionnement a la nitruration ionique des corps creux allonges, en aciers
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FR2604188B1 (fr) * 1986-09-18 1992-11-27 Framatome Sa Element tubulaire en acier inoxydable presentant une resistance a l'usure amelioree
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JPS6465251A (en) * 1987-09-07 1989-03-10 Nippon Light Metal Co Surface treatment of aluminum member

Also Published As

Publication number Publication date
FR2643087B1 (fr) 1991-06-07
US5302422A (en) 1994-04-12
EP0387113B1 (de) 1993-12-22
FI93556C (fi) 1995-04-25
JPH032374A (ja) 1991-01-08
IL93378A0 (en) 1990-11-29
IL93378A (en) 1994-08-26
FI900758A0 (fi) 1990-02-15
DE69005331D1 (de) 1994-02-03
ATE99001T1 (de) 1994-01-15
EP0387113A1 (de) 1990-09-12
FI93556B (fi) 1995-01-13
FR2643087A1 (fr) 1990-08-17
DE69005331T2 (de) 1994-06-09
CA2010119A1 (en) 1990-08-16

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