DE3485769T2 - Chemische dampfabscheidung von ueberzuegen aus metallischen verbindungen unter verwendung von metallischen subhalogeniden. - Google Patents

Chemische dampfabscheidung von ueberzuegen aus metallischen verbindungen unter verwendung von metallischen subhalogeniden.

Info

Publication number
DE3485769T2
DE3485769T2 DE19843485769 DE3485769T DE3485769T2 DE 3485769 T2 DE3485769 T2 DE 3485769T2 DE 19843485769 DE19843485769 DE 19843485769 DE 3485769 T DE3485769 T DE 3485769T DE 3485769 T2 DE3485769 T2 DE 3485769T2
Authority
DE
Germany
Prior art keywords
subhalogenides
coats
metal
vapor deposition
chemical vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE19843485769
Other languages
English (en)
Other versions
DE3485769D1 (de
Inventor
Mohammed Javid Hakim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Liburdi Engineering Ltd
Original Assignee
Liburdi Engineering Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Liburdi Engineering Ltd filed Critical Liburdi Engineering Ltd
Application granted granted Critical
Publication of DE3485769D1 publication Critical patent/DE3485769D1/de
Publication of DE3485769T2 publication Critical patent/DE3485769T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
DE19843485769 1983-02-25 1984-02-23 Chemische dampfabscheidung von ueberzuegen aus metallischen verbindungen unter verwendung von metallischen subhalogeniden. Expired - Fee Related DE3485769T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46985783A 1983-02-25 1983-02-25
US57722584A 1984-02-06 1984-02-06

Publications (2)

Publication Number Publication Date
DE3485769D1 DE3485769D1 (de) 1992-07-23
DE3485769T2 true DE3485769T2 (de) 1992-12-24

Family

ID=27042876

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19843485769 Expired - Fee Related DE3485769T2 (de) 1983-02-25 1984-02-23 Chemische dampfabscheidung von ueberzuegen aus metallischen verbindungen unter verwendung von metallischen subhalogeniden.

Country Status (2)

Country Link
EP (1) EP0117542B1 (de)
DE (1) DE3485769T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3546113A1 (de) * 1985-12-24 1987-06-25 Santrade Ltd Verbundpulverteilchen, verbundkoerper und verfahren zu deren herstellung
FR2612946B1 (fr) * 1987-03-27 1993-02-19 Chimie Metal Procede et installation pour le depot chimique de revetements ultradurs a temperature moderee
EP0397131B1 (de) * 1989-05-09 1995-04-05 Fujitsu Limited Verfahren zur Herstellung von Kontakten in Halbleiterbauelementen
US5261963A (en) * 1991-12-04 1993-11-16 Howmet Corporation CVD apparatus comprising exhaust gas condensation means
US5264245A (en) * 1991-12-04 1993-11-23 Howmet Corporation CVD method for forming uniform coatings
FR2767841B1 (fr) * 1997-08-29 1999-10-01 Commissariat Energie Atomique PROCEDE DE PREPARATION PAR DEPOT CHIMIQUE EN PHASE VAPEUR (CVD) D'UN REVETEMENT MULTICOUCHE A BASE DE Ti-Al-N
US20070026205A1 (en) 2005-08-01 2007-02-01 Vapor Technologies Inc. Article having patterned decorative coating
IL182741A (en) 2007-04-23 2012-03-29 Iscar Ltd Improved coatings
CN115449745A (zh) * 2022-08-08 2022-12-09 张欣欣 物理气相沉积技术制备氮碳化锆膜层的制备方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH455856A (de) * 1966-06-27 1968-07-15 Suisse De Rech S Horlogeres La Verfahren zur Herstellung von harten Überzügen auf Uhrbestandteilen
US3721577A (en) * 1966-09-23 1973-03-20 Teeg Research Inc Process for the deposition of refractory metal and metalloid carbides on a base material
US3637422A (en) * 1968-01-03 1972-01-25 Atomic Energy Commission Dispersion-hardened tungsten alloy
US3654895A (en) * 1969-08-15 1972-04-11 Texas Instruments Inc Apparatus for forming a refractory coating on the inner periphery of a tubular object
US4196233A (en) * 1974-02-07 1980-04-01 Ciba-Geigy Corporation Process for coating inorganic substrates with carbides, nitrides and/or carbonitrides
CA1087041A (en) * 1975-09-15 1980-10-07 Mohammad J. Hakim Hafnium carbide and nitride coatings
JPS5547109A (en) * 1978-09-28 1980-04-03 Hitachi Metals Ltd Deodorization type carrying-out apparatus for settled sand
JPS58157139A (ja) * 1982-03-12 1983-09-19 Fujitsu Ltd 窒化モリブデン膜の気相成長方法

Also Published As

Publication number Publication date
DE3485769D1 (de) 1992-07-23
EP0117542A2 (de) 1984-09-05
EP0117542A3 (en) 1987-08-12
EP0117542B1 (de) 1992-06-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee