DE68915239D1 - Röntgenbelichtungssystem. - Google Patents

Röntgenbelichtungssystem.

Info

Publication number
DE68915239D1
DE68915239D1 DE68915239T DE68915239T DE68915239D1 DE 68915239 D1 DE68915239 D1 DE 68915239D1 DE 68915239 T DE68915239 T DE 68915239T DE 68915239 T DE68915239 T DE 68915239T DE 68915239 D1 DE68915239 D1 DE 68915239D1
Authority
DE
Germany
Prior art keywords
exposure system
ray exposure
ray
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68915239T
Other languages
English (en)
Other versions
DE68915239T2 (de
Inventor
Kazunori Iwamoto
Shunichi Uzawa
Takao Kariya
Ryuichi Ebinuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE68915239D1 publication Critical patent/DE68915239D1/de
Publication of DE68915239T2 publication Critical patent/DE68915239T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE68915239T 1988-10-05 1989-10-04 Röntgenbelichtungssystem. Expired - Fee Related DE68915239T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63252761A JP2728898B2 (ja) 1988-10-05 1988-10-05 露光装置

Publications (2)

Publication Number Publication Date
DE68915239D1 true DE68915239D1 (de) 1994-06-16
DE68915239T2 DE68915239T2 (de) 1994-09-08

Family

ID=17241926

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68915239T Expired - Fee Related DE68915239T2 (de) 1988-10-05 1989-10-04 Röntgenbelichtungssystem.

Country Status (4)

Country Link
US (1) US5128975A (de)
EP (1) EP0363164B1 (de)
JP (1) JP2728898B2 (de)
DE (1) DE68915239T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4133037C2 (de) * 1990-10-05 1999-07-22 Canon Kk Belichtungsvorrichtung
JPH0772318A (ja) * 1993-04-28 1995-03-17 Canon Inc 反射装置とこれを用いた照明装置や露光装置、並びにデバイス製造方法
KR0139039B1 (ko) * 1993-06-30 1998-06-01 미타라이 하지메 노광장치와 이것을 이용한 디바이스 제조방법
JP3167074B2 (ja) * 1993-06-30 2001-05-14 キヤノン株式会社 Ｓｏｒ露光システム及びこれを用いて製造されたマスク
JP3200282B2 (ja) 1993-07-21 2001-08-20 キヤノン株式会社 処理システム及びこれを用いたデバイス製造方法
US5593800A (en) * 1994-01-06 1997-01-14 Canon Kabushiki Kaisha Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus
JP3247554B2 (ja) * 1994-07-19 2002-01-15 キヤノン株式会社 基板搬送装置およびこれを用いた露光装置
EP1091256A1 (de) * 1994-11-29 2001-04-11 Canon Kabushiki Kaisha Ausrichtungsverfahren und Halbleiterbelichtungsverfahren
JP3261948B2 (ja) * 1995-03-28 2002-03-04 キヤノン株式会社 Ｘ線露光用マスク及びそれを用いた半導体素子の製造方法
TW318255B (de) * 1995-05-30 1997-10-21 Philips Electronics Nv
JP3894509B2 (ja) * 1995-08-07 2007-03-22 キヤノン株式会社 光学装置、露光装置およびデバイス製造方法
JP3221823B2 (ja) * 1995-11-24 2001-10-22 キヤノン株式会社 投影露光装置およびこれを用いた露光方法ならびに半導体製造方法
TW341719B (en) * 1996-03-01 1998-10-01 Canon Kk Surface position detecting method and scanning exposure method using the same
JP3659529B2 (ja) * 1996-06-06 2005-06-15 キヤノン株式会社 露光装置およびデバイス製造方法
JP3266515B2 (ja) * 1996-08-02 2002-03-18 キヤノン株式会社 露光装置、デバイス製造方法およびステージ装置
JP3283767B2 (ja) * 1996-10-02 2002-05-20 キヤノン株式会社 露光装置およびデバイス製造方法
JP2907159B2 (ja) * 1996-11-12 1999-06-21 日本電気株式会社 縮小投影露光装置及び露光方法
JP3689510B2 (ja) * 1996-11-15 2005-08-31 キヤノン株式会社 露光装置およびデバイス製造方法
JP3554186B2 (ja) 1998-04-08 2004-08-18 キヤノン株式会社 露光装置、デバイス製造方法および反力受け方法
JP3540174B2 (ja) * 1998-10-12 2004-07-07 ウシオ電機株式会社 斜めから光を照射するプロキシミティ露光方法
JP4809987B2 (ja) * 2000-03-30 2011-11-09 キヤノン株式会社 光学要素の支持構造、それを用いた露光装置及び半導体デバイスの製造方法
US10654216B2 (en) * 2016-03-30 2020-05-19 Canon Kabushiki Kaisha System and methods for nanoimprint lithography
US11803129B2 (en) * 2021-08-13 2023-10-31 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor processing tool and methods of operation

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0103188B1 (de) * 1979-10-11 1986-12-03 Eaton-Optimetrix Inc. Stoss- und Schwingungs-Isolierungssystem
US4631743A (en) * 1983-09-22 1986-12-23 Agency Of Industrial Science & Technology X-ray generating apparatus
JPS62222634A (ja) * 1986-03-18 1987-09-30 Fujitsu Ltd Ｘ線露光方法
EP0253283A3 (de) * 1986-07-15 1988-07-20 Siemens Aktiengesellschaft Anordnung zur Belichtung von Halbleiterscheiben mittels Synchrotronstrahlung in einem Lithographiegerät
JPS63116424A (ja) * 1986-11-05 1988-05-20 Nec Corp Ｘ線露光装置
US4803712A (en) * 1987-01-20 1989-02-07 Hitachi, Ltd. X-ray exposure system
JP2627543B2 (ja) * 1988-09-05 1997-07-09 キヤノン株式会社 Ｓｏｒ露光システム
US4979195A (en) * 1988-09-22 1990-12-18 Fujitsu Limited Vertical stepper
US4887283A (en) * 1988-09-27 1989-12-12 Mitsubishi Denki Kabushiki Kaisha X-ray mask and exposure method employing the same

Also Published As

Publication number Publication date
EP0363164B1 (de) 1994-05-11
EP0363164A3 (de) 1991-05-02
JPH0298918A (ja) 1990-04-11
US5128975A (en) 1992-07-07
JP2728898B2 (ja) 1998-03-18
DE68915239T2 (de) 1994-09-08
EP0363164A2 (de) 1990-04-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee