DE60302959D1 - Methode zur Propfpolymerisation, Materialien enthaltend die Propfpolymere und Methode zu deren Herstellung - Google Patents
Methode zur Propfpolymerisation, Materialien enthaltend die Propfpolymere und Methode zu deren HerstellungInfo
- Publication number
- DE60302959D1 DE60302959D1 DE60302959T DE60302959T DE60302959D1 DE 60302959 D1 DE60302959 D1 DE 60302959D1 DE 60302959 T DE60302959 T DE 60302959T DE 60302959 T DE60302959 T DE 60302959T DE 60302959 D1 DE60302959 D1 DE 60302959D1
- Authority
- DE
- Germany
- Prior art keywords
- graft
- preparation
- materials containing
- polymers
- graft polymerization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
- B41N3/036—Chemical or electrical pretreatment characterised by the presence of a polymeric hydrophilic coating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/04—Intermediate layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/14—Multiple imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Thermal Sciences (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (18)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002271578 | 2002-09-18 | ||
JP2002271578 | 2002-09-18 | ||
JP2002287814 | 2002-09-30 | ||
JP2002287821A JP4111794B2 (ja) | 2002-09-30 | 2002-09-30 | 親水性部材 |
JP2002287821 | 2002-09-30 | ||
JP2002287814A JP2004126046A (ja) | 2002-09-30 | 2002-09-30 | 平版印刷版原版 |
JP2002287816 | 2002-09-30 | ||
JP2002287816 | 2002-09-30 | ||
JP2002287815 | 2002-09-30 | ||
JP2002287815A JP2004126047A (ja) | 2002-09-30 | 2002-09-30 | 平版印刷版原版 |
JP2003094690 | 2003-03-31 | ||
JP2003093867 | 2003-03-31 | ||
JP2003093867A JP2004300251A (ja) | 2003-03-31 | 2003-03-31 | 微粒子吸着材料作製方法、及び、微粒子吸着材料 |
JP2003094690A JP2004300282A (ja) | 2003-03-31 | 2003-03-31 | 薄層金属微粒子分散膜作製方法、及び、薄層金属微粒子分散膜 |
JP2003122061A JP4689152B2 (ja) | 2002-09-30 | 2003-04-25 | パターン形成材料及びパターン形成方法、並びに、平版印刷版原版 |
JP2003122061 | 2003-04-25 | ||
JP2003154551A JP4303522B2 (ja) | 2002-09-18 | 2003-05-30 | グラフト重合法 |
JP2003154551 | 2003-05-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60302959D1 true DE60302959D1 (de) | 2006-02-02 |
DE60302959T2 DE60302959T2 (de) | 2006-08-24 |
Family
ID=31950989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60302959T Expired - Lifetime DE60302959T2 (de) | 2002-09-18 | 2003-09-17 | Methode zur Pfropfpolymerisation, Materialien enthaltend die Pfropfpolymere und Methode zu deren Herstellung |
Country Status (3)
Country | Link |
---|---|
US (1) | US7056642B2 (de) |
EP (1) | EP1400544B1 (de) |
DE (1) | DE60302959T2 (de) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7045276B2 (en) * | 2001-10-11 | 2006-05-16 | Fuji Photo Film Co., Ltd. | Hydrophilic member precursor and pattern forming material that utilizes it, support for planographic printing plate, and planographic printing plate precursor |
JP3866579B2 (ja) * | 2002-01-25 | 2007-01-10 | 富士フイルムホールディングス株式会社 | 薄層金属膜 |
US7056642B2 (en) * | 2002-09-18 | 2006-06-06 | Fuji Photo Film Co., Ltd. | Method of graft polymerization and variety of materials utilizing the same as well as producing method thereof |
JP2005037881A (ja) * | 2003-04-21 | 2005-02-10 | Fuji Photo Film Co Ltd | パターン形成方法、画像形成方法、微粒子吸着パターン形成方法、導電性パターン形成方法、パターン形成材料、及び平版印刷版 |
KR101020164B1 (ko) | 2003-07-17 | 2011-03-08 | 허니웰 인터내셔날 인코포레이티드 | 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법 |
JP4348253B2 (ja) * | 2003-08-20 | 2009-10-21 | 富士フイルム株式会社 | 導電性パターン材料及び導電性パターンの形成方法 |
JP4248345B2 (ja) * | 2003-09-01 | 2009-04-02 | 富士フイルム株式会社 | 感光性組成物 |
TWI318173B (en) * | 2004-03-01 | 2009-12-11 | Sumitomo Electric Industries | Metallic colloidal solution and inkjet-use metallic ink |
EP1581031B1 (de) * | 2004-03-25 | 2010-10-06 | FUJIFILM Corporation | Verfahren zur Herstellung eines Musters und eines leitfähigen Musters |
EP1767989A4 (de) * | 2004-05-31 | 2010-05-05 | Fujifilm Corp | Verfahren zur bildung eines pfropfmusters, pfropfmustermaterial, lithographieverfahren, verfahren zur herstellung einer leitfähigen struktur, leitfähige struktur, prozess zur herstellung eines farbfilters, farbfilter und prozess zur herstellung einer mikrolinse |
JP2005343975A (ja) * | 2004-06-01 | 2005-12-15 | Fuji Photo Film Co Ltd | 導電膜の形成方法、及び導電性材料 |
US20060008737A1 (en) * | 2004-07-09 | 2006-01-12 | Cole Carol L | Method of using a formed body |
KR100887251B1 (ko) * | 2004-08-26 | 2009-03-06 | 후지필름 가부시키가이샤 | 도전성 패턴재료의 제조방법 |
JP4528634B2 (ja) * | 2005-01-13 | 2010-08-18 | 富士フイルム株式会社 | 金属膜の形成方法 |
WO2006104279A1 (en) * | 2005-03-31 | 2006-10-05 | Fujifilm Corporation | Surface graft material and its manufacturing method, electrically conductive material and its manufacturing method, and electrically conductive pattern material |
US20060238870A1 (en) * | 2005-04-26 | 2006-10-26 | Brian Sneek | Gauge lens with embedded anti-fog film and method of making the same |
EP1720072B1 (de) * | 2005-05-01 | 2019-06-05 | Rohm and Haas Electronic Materials, L.L.C. | Zusammensetzungen und Verfahren für Immersionslithografie |
WO2006123834A2 (en) * | 2005-05-20 | 2006-11-23 | Fujifilm Corporation | Graft pattern forming method and conductive pattern forming method |
WO2007007780A1 (ja) * | 2005-07-12 | 2007-01-18 | Tokyo Ohka Kogyo Co., Ltd. | 保護膜形成用材料およびこれを用いたホトレジストパターン形成方法 |
US20100224317A1 (en) * | 2005-07-29 | 2010-09-09 | Fujifilm Corporation | Method for forming graft polymer pattern and method for forming electrically conductive pattern |
EP1752480A1 (de) * | 2005-08-12 | 2007-02-14 | Merck Patent GmbH | Polymerisierbares dielektrisches Material |
US20070034842A1 (en) * | 2005-08-12 | 2007-02-15 | Merck Patent Gesellschaft Mit Beschrankter Haftung | Polymerizable dielectric material |
JP4850487B2 (ja) * | 2005-11-07 | 2012-01-11 | 富士フイルム株式会社 | プリント配線板用積層体、それを用いたプリント配線板、プリント配線基板の作製方法、電気部品、電子部品、および、電気機器 |
JP5013723B2 (ja) * | 2006-03-09 | 2012-08-29 | キヤノン株式会社 | 微粒子パターン形成方法及びデバイスの製造方法 |
JP4903479B2 (ja) * | 2006-04-18 | 2012-03-28 | 富士フイルム株式会社 | 金属パターン形成方法、金属パターン、及びプリント配線板 |
US7927664B2 (en) * | 2006-08-28 | 2011-04-19 | International Business Machines Corporation | Method of step-and-flash imprint lithography |
US7883826B2 (en) * | 2006-12-07 | 2011-02-08 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
WO2008085713A1 (en) * | 2007-01-05 | 2008-07-17 | Xo Armor, Lp | Chemical composition and method of applying same to enhance the adhesive bonding of glass laminates |
US7892524B2 (en) * | 2008-06-30 | 2011-02-22 | Conopco, Inc. | Sunscreen composite particles |
JP5367738B2 (ja) * | 2011-02-03 | 2013-12-11 | シャープ株式会社 | 定着装置及びそれを備えた画像形成装置 |
WO2014185361A1 (ja) * | 2013-05-13 | 2014-11-20 | 独立行政法人科学技術振興機構 | 新規複合材料およびそれを用いるポリマー被覆材前駆体 |
JPWO2014203668A1 (ja) * | 2013-06-20 | 2017-02-23 | 住友ゴム工業株式会社 | 表面改質方法及び表面改質体 |
WO2017034871A1 (en) | 2015-08-21 | 2017-03-02 | G&P Holding, Inc. | Silver and copper itaconates and poly itaconates |
KR102143261B1 (ko) * | 2016-04-01 | 2020-08-10 | 주식회사 엘지화학 | 잉크 조성물, 이로 제조된 경화 패턴, 이를 포함하는 발열체 및 이의 제조방법 |
CN111095044B (zh) * | 2017-09-25 | 2022-08-12 | 东丽株式会社 | 着色树脂组合物、着色膜、滤色器及液晶显示装置 |
CN114044961B (zh) * | 2021-12-16 | 2023-03-28 | 郑州市彦峰塑料包装有限公司 | 一种光降解环保塑料包装袋及其生产工艺 |
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GB2325467B (en) * | 1997-05-21 | 2000-11-01 | Dainippon Ink & Chemicals | Process for producing material with hydrophilic surface |
JPH1143614A (ja) | 1997-07-29 | 1999-02-16 | Nof Corp | 防曇膜及びその製造方法 |
JP3779446B2 (ja) | 1997-09-12 | 2006-05-31 | 富士写真フイルム株式会社 | 輻射線感応性平版印刷版 |
JPH11119413A (ja) | 1997-10-09 | 1999-04-30 | Mitsubishi Chemical Corp | ダイレクト感光性平版印刷版 |
JP2000080189A (ja) | 1998-09-04 | 2000-03-21 | Dainippon Ink & Chem Inc | 表面親水性成形物及びその製造方法 |
JP3566122B2 (ja) | 1999-02-24 | 2004-09-15 | シャープ株式会社 | 高密度有機分子薄膜の製造方法 |
EP1088679B1 (de) | 1999-09-29 | 2006-05-24 | Fuji Photo Film Co., Ltd. | Träger einer Flachdruckplatte sowie Flachdruckplattenausgangsprodukt |
JP2001166491A (ja) | 1999-09-29 | 2001-06-22 | Fuji Photo Film Co Ltd | 平版印刷版用支持体及びそれを用いた平版印刷版用原版 |
US6607866B1 (en) * | 1999-09-29 | 2003-08-19 | Fuji Photo Film Co., Ltd. | Lithographic printing plate support and lithographic printing plate precursor using the same |
US6672210B2 (en) | 2000-07-13 | 2004-01-06 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor with a graft polymerized hydrophilic layer |
EP1211096A1 (de) | 2000-12-01 | 2002-06-05 | Fuji Photo Film Co., Ltd. | Trägermaterial für lithographische Druckplatte und dieses verwendende lithographische Druckplatte |
ATE252981T1 (de) * | 2000-12-13 | 2003-11-15 | Fuji Photo Film Co Ltd | Flachdruckplattenvorläufer |
JP2002240450A (ja) * | 2001-02-15 | 2002-08-28 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP4152600B2 (ja) | 2001-03-19 | 2008-09-17 | 株式会社リコー | 微粒子の配列方法 |
JP2002283530A (ja) | 2001-03-28 | 2002-10-03 | Masamichi Fujihira | 微細パターン複製物の作製方法及び微細パターン複製物 |
JP3774638B2 (ja) | 2001-04-24 | 2006-05-17 | ハリマ化成株式会社 | インクジェット印刷法を利用する回路パターンの形成方法 |
US7045276B2 (en) * | 2001-10-11 | 2006-05-16 | Fuji Photo Film Co., Ltd. | Hydrophilic member precursor and pattern forming material that utilizes it, support for planographic printing plate, and planographic printing plate precursor |
US7056642B2 (en) * | 2002-09-18 | 2006-06-06 | Fuji Photo Film Co., Ltd. | Method of graft polymerization and variety of materials utilizing the same as well as producing method thereof |
JP2005037881A (ja) * | 2003-04-21 | 2005-02-10 | Fuji Photo Film Co Ltd | パターン形成方法、画像形成方法、微粒子吸着パターン形成方法、導電性パターン形成方法、パターン形成材料、及び平版印刷版 |
-
2003
- 2003-09-16 US US10/662,458 patent/US7056642B2/en not_active Expired - Fee Related
- 2003-09-17 DE DE60302959T patent/DE60302959T2/de not_active Expired - Lifetime
- 2003-09-17 EP EP03020552A patent/EP1400544B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US20040067434A1 (en) | 2004-04-08 |
EP1400544A1 (de) | 2004-03-24 |
US7056642B2 (en) | 2006-06-06 |
DE60302959T2 (de) | 2006-08-24 |
EP1400544B1 (de) | 2005-12-28 |
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Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |