DE60238871D1 - Waferpositionierungsverfahren - Google Patents

Waferpositionierungsverfahren

Info

Publication number
DE60238871D1
DE60238871D1 DE60238871T DE60238871T DE60238871D1 DE 60238871 D1 DE60238871 D1 DE 60238871D1 DE 60238871 T DE60238871 T DE 60238871T DE 60238871 T DE60238871 T DE 60238871T DE 60238871 D1 DE60238871 D1 DE 60238871D1
Authority
DE
Germany
Prior art keywords
positioning method
wafer positioning
wafer
positioning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60238871T
Other languages
English (en)
Inventor
Yoshiki Fukuzaki
Tomoyuki Shintaku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rorze Corp
Original Assignee
Rorze Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2001348767A external-priority patent/JP4063526B2/ja
Priority claimed from JP2001349237A external-priority patent/JP4226241B2/ja
Application filed by Rorze Corp filed Critical Rorze Corp
Application granted granted Critical
Publication of DE60238871D1 publication Critical patent/DE60238871D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE60238871T 2001-11-14 2002-11-13 Waferpositionierungsverfahren Expired - Lifetime DE60238871D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001348767A JP4063526B2 (ja) 2001-11-14 2001-11-14 ウエハ位置決め装置のウエハ座回転軸線位置決め方法およびその方法を用いたウエハ位置決め装置
JP2001349237A JP4226241B2 (ja) 2001-11-14 2001-11-14 ウエハの位置決め方法、位置決め装置並びに処理システム
PCT/JP2002/011847 WO2003043077A1 (fr) 2001-11-14 2002-11-13 Procede et appareil de positionnement de plaquette, systeme de traitement et procede de positionnement de l'axe du siege de plaquette d'un appareil de positionnement de plaquette

Publications (1)

Publication Number Publication Date
DE60238871D1 true DE60238871D1 (de) 2011-02-17

Family

ID=26624511

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60238871T Expired - Lifetime DE60238871D1 (de) 2001-11-14 2002-11-13 Waferpositionierungsverfahren

Country Status (6)

Country Link
US (1) US7315373B2 (de)
EP (1) EP1463106B1 (de)
KR (1) KR100649926B1 (de)
CN (1) CN100499060C (de)
DE (1) DE60238871D1 (de)
WO (1) WO2003043077A1 (de)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4260423B2 (ja) * 2002-05-30 2009-04-30 ローツェ株式会社 円盤状物の基準位置教示方法、位置決め方法および搬送方法並びに、それらの方法を使用する円盤状物の基準位置教示装置、位置決め装置、搬送装置および半導体製造設備
US20080017613A1 (en) * 2004-07-09 2008-01-24 Sekisui Chemical Co., Ltd. Method for processing outer periphery of substrate and apparatus thereof
KR101022616B1 (ko) * 2004-07-09 2011-03-16 세키스이가가쿠 고교가부시키가이샤 베이스 외주 처리 방법 및 장치
JP5155517B2 (ja) * 2005-04-21 2013-03-06 株式会社荏原製作所 ウエハ受渡装置及びポリッシング装置
CN100336194C (zh) * 2005-12-30 2007-09-05 清华大学 片盒中硅片状态检测及其圆心重定位方法
WO2008018537A1 (fr) * 2006-08-10 2008-02-14 Shibaura Mechatronics Corporation Dispositif d'inspection de plaquette en disque et procédé d'inspection
US7946800B2 (en) 2007-04-06 2011-05-24 Brooks Automation, Inc. Substrate transport apparatus with multiple independently movable articulated arms
US8752449B2 (en) 2007-05-08 2014-06-17 Brooks Automation, Inc. Substrate transport apparatus with multiple movable arms utilizing a mechanical switch mechanism
JP2011507309A (ja) * 2007-12-18 2011-03-03 エンテグリス・インコーポレーテッド 基板の汚染を抑制するための方法および装置
CN101472394B (zh) * 2007-12-25 2011-06-08 富葵精密组件(深圳)有限公司 对位装置
CN101377403B (zh) * 2008-09-28 2010-06-02 大连理工大学 一种零件直线边缘位置精度测量的装置与方法
US8060330B2 (en) * 2008-12-12 2011-11-15 Lam Research Corporation Method and system for centering wafer on chuck
EP2891173B1 (de) 2012-08-31 2019-03-27 Semiconductor Technologies & Instruments Pte Ltd. Multifunktionssystem zur handhabung von wafern und folienrahmen
JP6071611B2 (ja) * 2013-02-13 2017-02-01 Ｍｉｐｏｘ株式会社 オリエンテーションフラット等切り欠き部を有する、結晶材料から成るウエハの周縁を、研磨テープを使用して研磨することにより円形ウエハを製造する方法
WO2014149340A1 (en) * 2013-03-15 2014-09-25 Applied Materials, Inc. Substrate position aligner
JP6285275B2 (ja) * 2014-04-30 2018-02-28 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
CN105655266A (zh) * 2014-11-12 2016-06-08 沈阳新松机器人自动化股份有限公司 一种基于dsp的晶圆偏心在线检测装置及方法
CN105762089B (zh) * 2014-12-18 2019-02-19 北京北方华创微电子装备有限公司 晶片位置偏差的检测和调整方法以及半导体加工设备
US10134624B2 (en) 2015-03-26 2018-11-20 Doug Carson & Associates, Inc. Substrate alignment detection using circumferentially extending timing pattern
US9953806B1 (en) * 2015-03-26 2018-04-24 Doug Carson & Associates, Inc. Substrate alignment detection using circumferentially extending timing pattern
KR102330017B1 (ko) * 2015-04-14 2021-11-24 가부시키가이샤 에바라 세이사꾸쇼 기판 처리 장치 및 기판 처리 방법
JP6523991B2 (ja) * 2015-04-14 2019-06-05 株式会社荏原製作所 基板処理装置および基板処理方法
EP3317651A1 (de) * 2015-06-30 2018-05-09 Corning Incorporated Interferometrische abrollmessung mit statischem streifenmuster
CN105071520A (zh) * 2015-09-01 2015-11-18 常州诚联电源制造有限公司 一种显示屏供电装置
US10515834B2 (en) 2015-10-12 2019-12-24 Lam Research Corporation Multi-station tool with wafer transfer microclimate systems
JP6532800B2 (ja) * 2015-10-21 2019-06-19 東芝メモリ株式会社 反射防止部材及びオリエンタ装置
JP2017084975A (ja) * 2015-10-28 2017-05-18 オムロン株式会社 位置検出装置、位置検出方法、情報処理プログラム、および記録媒体
CN106597812B (zh) * 2016-11-29 2018-03-30 苏州晋宇达实业股份有限公司 一种光刻机的硅片进料校准装置及其进料校准方法
CN107634153B (zh) * 2017-09-08 2019-07-23 武汉华星光电半导体显示技术有限公司 一种双半基板间隙的校正器件及校正方法
TWI794530B (zh) * 2018-07-20 2023-03-01 美商應用材料股份有限公司 基板定位設備及方法
US10636693B2 (en) * 2018-09-11 2020-04-28 Kawasaki Jukogyo Kabushiki Kaisha Substrate transfer device and control method therefor
CN109346543B (zh) * 2018-09-29 2023-11-17 苏州腾晖光伏技术有限公司 一种用于光伏组件的层压辅助装置
US11929277B2 (en) 2019-09-06 2024-03-12 Kabushiki Kaisha Yaskawa Denki Wafer pre-aligner and method of pre-aligning wafer
CN110779443B (zh) * 2019-11-04 2021-04-02 中国科学院国家天文台南京天文光学技术研究所 基于干涉原理的拼接镜面用边缘传感器及其工作方法
JP7291663B2 (ja) * 2020-04-24 2023-06-15 Ｔｏｗａ株式会社 位置決め装置、位置決め方法、樹脂成形システムおよび樹脂成形品の製造方法
KR102235042B1 (ko) * 2020-06-16 2021-03-31 에스케이씨솔믹스 주식회사 엔드 이펙터 변위 측정 방법 및 장치
CN112539714B (zh) * 2020-06-30 2022-07-26 深圳中科飞测科技股份有限公司 一种偏心检测方法、检测方法、处理方法及检测设备
TWI735315B (zh) * 2020-08-21 2021-08-01 上銀科技股份有限公司 偵測晶圓位置的方法及設備
US12002695B2 (en) * 2021-06-10 2024-06-04 Kawasaki Jukogyo Kabushiki Kaisha Transport system and determination method
CN113658901B (zh) * 2021-10-21 2022-01-21 西安奕斯伟材料科技有限公司 晶圆v型缺口中心的定位方法、系统及计算机存储介质
CN113793826B (zh) * 2021-11-16 2022-03-08 西安奕斯伟材料科技有限公司 硅片方位调准装置及硅片缺陷检测设备

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59147444A (ja) 1983-02-14 1984-08-23 Hitachi Ltd 板状物体の位置合わせ方法およびその装置
US4887904A (en) * 1985-08-23 1989-12-19 Canon Kabushiki Kaisha Device for positioning a semi-conductor wafer
JPH0626232B2 (ja) 1988-07-21 1994-04-06 株式会社日立製作所 ウエハ位置整合方法
JP2642216B2 (ja) * 1989-05-23 1997-08-20 サイベック システムズ 半導体物品の予備位置決め方法及び装置
JPH0350752A (ja) * 1989-07-19 1991-03-05 Hitachi Ltd ウェハアライメント方法、及びその装置
JP2559076B2 (ja) * 1990-06-28 1996-11-27 キヤノン株式会社 プリアライメント装置
JP3223584B2 (ja) 1992-06-10 2001-10-29 株式会社ダイヘン 半導体ウエハのセンタ合せ装置及び方法
JP3074313B2 (ja) 1993-01-26 2000-08-07 株式会社メックス ウエハーの位置決め装置
US6225012B1 (en) * 1994-02-22 2001-05-01 Nikon Corporation Method for positioning substrate
JPH07260445A (ja) 1994-03-17 1995-10-13 Nomura Seimitsu Denshi Kk リードフレームの自動検査方法及び装置
JPH07260455A (ja) * 1994-03-23 1995-10-13 Kokusai Electric Co Ltd 基板位置決め方法及び装置
TW315504B (de) * 1995-03-20 1997-09-11 Tokyo Electron Co Ltd
JPH1089904A (ja) * 1996-09-17 1998-04-10 Hitachi Electron Eng Co Ltd Ｖノッチウェハ位置決め装置
JPH11326229A (ja) * 1998-05-21 1999-11-26 Hitachi Electron Eng Co Ltd 異物検査装置

Also Published As

Publication number Publication date
EP1463106A1 (de) 2004-09-29
EP1463106B1 (de) 2011-01-05
EP1463106A4 (de) 2008-07-09
US7315373B2 (en) 2008-01-01
WO2003043077A1 (fr) 2003-05-22
US20050078312A1 (en) 2005-04-14
CN1613145A (zh) 2005-05-04
KR20050044433A (ko) 2005-05-12
KR100649926B1 (ko) 2006-11-27
CN100499060C (zh) 2009-06-10

Similar Documents

Publication Publication Date Title
DE60238871D1 (de) Waferpositionierungsverfahren
DE60238291D1 (de) Wafer-Haltevorrichtung
DE60229591D1 (de) Trägerplattenvorrichtung
DE60233731D1 (de) Werkstück-positioniervorrichtung
ATA10432001A (de) Magnetsetzroboter
DE60230934D1 (de) Fab-i-inhibitoren
DE60227475D1 (de) Halbleiterbauelement
NL1022018A1 (nl) Belichtingswerkwijze.
NO20034154D0 (no) Posisjoneringssystem
DE60211244D1 (de) Halbleiterbauelement
ATE502118T1 (de) Amplifizierungsverfahren
FI20010668A (fi) Paikannuslaite
DE60225790D1 (de) Halbleiterbauelement
DE60233109D1 (de) Radidentifikator- ortungsverfahren
ITMI20010954A0 (it) Procedimento di iodurazione
DE60201464D1 (de) Halbleiterlaser
DE60226093D1 (de) Urmedium-Reinigungsmethode
DE50208514D1 (de) Spannvorrichtung
DE50212755D1 (de) Bohrfutter
FI20011252A0 (fi) Rakennusmenetelmä
DE50115802D1 (de) Dafür
SE0104471D0 (sv) New method
DE50201507D1 (de) Positioniereinrichtung für Halbleiterobjekte
SE0100899D0 (sv) Method
DOP2001000312A (es) Metodo