DE60201464D1 - Halbleiterlaser - Google Patents
HalbleiterlaserInfo
- Publication number
- DE60201464D1 DE60201464D1 DE60201464T DE60201464T DE60201464D1 DE 60201464 D1 DE60201464 D1 DE 60201464D1 DE 60201464 T DE60201464 T DE 60201464T DE 60201464 T DE60201464 T DE 60201464T DE 60201464 D1 DE60201464 D1 DE 60201464D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor laser
- laser
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06226—Modulation at ultra-high frequencies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1053—Comprising an active region having a varying composition or cross-section in a specific direction
- H01S5/1064—Comprising an active region having a varying composition or cross-section in a specific direction varying width along the optical axis
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2077—Methods of obtaining the confinement using lateral bandgap control during growth, e.g. selective growth, mask induced
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001147391 | 2001-05-17 | ||
JP2001147391 | 2001-05-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60201464D1 true DE60201464D1 (de) | 2004-11-11 |
DE60201464T2 DE60201464T2 (de) | 2005-02-03 |
Family
ID=18992888
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60201464T Expired - Fee Related DE60201464T2 (de) | 2001-05-17 | 2002-05-17 | Halbleiterlaser |
Country Status (3)
Country | Link |
---|---|
US (1) | US6865205B2 (de) |
EP (1) | EP1263099B1 (de) |
DE (1) | DE60201464T2 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100361593B1 (ko) * | 2000-11-23 | 2002-11-22 | 주식회사일진 | 볼록 요철을 갖는 광학집적회로 소자, 그 제조방법, 그광학집적 회로 소자를 이용하여 제조한 광통신용 송수신장치의 모듈 |
JP3878868B2 (ja) * | 2002-03-01 | 2007-02-07 | シャープ株式会社 | GaN系レーザ素子 |
DE102008014093B4 (de) * | 2007-12-27 | 2020-02-06 | Osram Opto Semiconductors Gmbh | Kantenemittierender Halbleiterlaserchip mit zumindest einer Strombarriere |
US7995263B1 (en) * | 2008-01-17 | 2011-08-09 | Ju-Ai Ruan | Transmission and reflection dual operational mode light processing device |
JP6390485B2 (ja) * | 2015-03-26 | 2018-09-19 | 三菱電機株式会社 | 半導体レーザ装置、半導体レーザ装置の製造方法 |
JP6654468B2 (ja) * | 2016-02-29 | 2020-02-26 | 日本ルメンタム株式会社 | 光送信モジュール |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4468850A (en) | 1982-03-29 | 1984-09-04 | Massachusetts Institute Of Technology | GaInAsP/InP Double-heterostructure lasers |
US5255281A (en) * | 1990-04-26 | 1993-10-19 | Fujitsu Limited | Semiconductor laser having double heterostructure |
US5260822A (en) | 1992-01-31 | 1993-11-09 | Massachusetts Institute Of Technology | Tapered semiconductor laser gain structure with cavity spoiling grooves |
JPH06283802A (ja) | 1993-03-25 | 1994-10-07 | Nippon Telegr & Teleph Corp <Ntt> | 半導体レーザ装置及びその製造方法 |
US5585957A (en) * | 1993-03-25 | 1996-12-17 | Nippon Telegraph And Telephone Corporation | Method for producing various semiconductor optical devices of differing optical characteristics |
JP2746131B2 (ja) | 1993-10-07 | 1998-04-28 | 松下電器産業株式会社 | 半導体レーザおよびその製造方法 |
JP2937751B2 (ja) | 1994-04-28 | 1999-08-23 | 日本電気株式会社 | 光半導体装置の製造方法 |
JP2865000B2 (ja) | 1994-10-27 | 1999-03-08 | 日本電気株式会社 | 出力導波路集積半導体レーザとその製造方法 |
DE69635410T2 (de) * | 1995-12-28 | 2006-07-27 | Matsushita Electric Industrial Co., Ltd., Kadoma | Halbleiterlaser und dessen herstellungsverfahren |
JP2000036638A (ja) | 1998-07-21 | 2000-02-02 | Fujitsu Ltd | 半導体発光装置 |
JP2000193921A (ja) | 1998-12-28 | 2000-07-14 | Nec Corp | 変調器集積化レ―ザモジュ―ル |
JP3225942B2 (ja) * | 1999-01-21 | 2001-11-05 | 日本電気株式会社 | 半導体光素子、その製造方法及び半導体光学装置 |
JP2000244059A (ja) * | 1999-02-23 | 2000-09-08 | Matsushita Electric Ind Co Ltd | 半導体レーザ装置 |
-
2002
- 2002-05-15 US US10/145,145 patent/US6865205B2/en not_active Expired - Fee Related
- 2002-05-17 EP EP02011087A patent/EP1263099B1/de not_active Expired - Fee Related
- 2002-05-17 DE DE60201464T patent/DE60201464T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1263099B1 (de) | 2004-10-06 |
US6865205B2 (en) | 2005-03-08 |
DE60201464T2 (de) | 2005-02-03 |
US20020172248A1 (en) | 2002-11-21 |
EP1263099A3 (de) | 2003-01-15 |
EP1263099A2 (de) | 2002-12-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |