DE602006008017D1 - Hochleistungsfähiger mosfet mit einer verspannten gate-metallsilizidschicht und herstellungsverfahren dafür - Google Patents

Hochleistungsfähiger mosfet mit einer verspannten gate-metallsilizidschicht und herstellungsverfahren dafür

Info

Publication number
DE602006008017D1
DE602006008017D1 DE602006008017T DE602006008017T DE602006008017D1 DE 602006008017 D1 DE602006008017 D1 DE 602006008017D1 DE 602006008017 T DE602006008017 T DE 602006008017T DE 602006008017 T DE602006008017 T DE 602006008017T DE 602006008017 D1 DE602006008017 D1 DE 602006008017D1
Authority
DE
Germany
Prior art keywords
fet
gate
metal silicide
channel
gate metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006008017T
Other languages
English (en)
Inventor
Haining S Yang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE602006008017D1 publication Critical patent/DE602006008017D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/28008—Making conductor-insulator-semiconductor electrodes
    • H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
    • H01L21/28035—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities
    • H01L21/28044—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer
    • H01L21/28052—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer the conductor comprising a silicide layer formed by the silicidation reaction of silicon with a metal layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/027—Manufacture or treatment of FETs having insulated gates [IGFET] of lateral single-gate IGFETs
    • H10D30/0275—Manufacture or treatment of FETs having insulated gates [IGFET] of lateral single-gate IGFETs forming single crystalline semiconductor source or drain regions resulting in recessed gates, e.g. forming raised source or drain regions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/791—Arrangements for exerting mechanical stress on the crystal lattice of the channel regions
    • H10D30/794—Arrangements for exerting mechanical stress on the crystal lattice of the channel regions comprising conductive materials, e.g. silicided source, drain or gate electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/791—Arrangements for exerting mechanical stress on the crystal lattice of the channel regions
    • H10D30/797—Arrangements for exerting mechanical stress on the crystal lattice of the channel regions being in source or drain regions, e.g. SiGe source or drain
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/01—Manufacture or treatment
    • H10D62/021—Forming source or drain recesses by etching e.g. recessing by etching and then refilling
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/017—Manufacture or treatment using dummy gates in processes wherein at least parts of the final gates are self-aligned to the dummy gates, i.e. replacement gate processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/021—Manufacture or treatment using multiple gate spacer layers, e.g. bilayered sidewall spacers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/661—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of silicon contacting the insulator, e.g. polysilicon having vertical doping variation
    • H10D64/662—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of silicon contacting the insulator, e.g. polysilicon having vertical doping variation the conductor further comprising additional layers, e.g. multiple silicon layers having different crystal structures
    • H10D64/663—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of silicon contacting the insulator, e.g. polysilicon having vertical doping variation the conductor further comprising additional layers, e.g. multiple silicon layers having different crystal structures the additional layers comprising a silicide layer contacting the layer of silicon, e.g. polycide gates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
    • H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
    • H10D84/0165—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
    • H10D84/0167—Manufacturing their channels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
    • H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
    • H10D84/0165—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
    • H10D84/0172—Manufacturing their gate conductors
    • H10D84/0174—Manufacturing their gate conductors the gate conductors being silicided
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/02—Manufacture or treatment characterised by using material-based technologies
    • H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0212—Manufacture or treatment of FETs having insulated gates [IGFET] using self-aligned silicidation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/68—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator
    • H10D64/691—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator comprising metallic compounds, e.g. metal oxides or metal silicates 

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Thin Film Transistor (AREA)
DE602006008017T 2005-08-22 2006-08-22 Hochleistungsfähiger mosfet mit einer verspannten gate-metallsilizidschicht und herstellungsverfahren dafür Active DE602006008017D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/208,985 US7470943B2 (en) 2005-08-22 2005-08-22 High performance MOSFET comprising a stressed gate metal silicide layer and method of fabricating the same
PCT/US2006/032974 WO2007024984A2 (en) 2005-08-22 2006-08-22 High performance mosfet comprising a stressed gate metal silicide layer and method of fabricating the same

Publications (1)

Publication Number Publication Date
DE602006008017D1 true DE602006008017D1 (de) 2009-09-03

Family

ID=37766665

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006008017T Active DE602006008017D1 (de) 2005-08-22 2006-08-22 Hochleistungsfähiger mosfet mit einer verspannten gate-metallsilizidschicht und herstellungsverfahren dafür

Country Status (9)

Country Link
US (2) US7470943B2 (de)
EP (1) EP1929537B1 (de)
JP (1) JP5305907B2 (de)
KR (1) KR100992036B1 (de)
CN (1) CN101243556B (de)
AT (1) ATE437449T1 (de)
DE (1) DE602006008017D1 (de)
TW (1) TWI412129B (de)
WO (1) WO2007024984A2 (de)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1684246B (zh) * 2004-03-30 2010-05-12 三星电子株式会社 低噪声和高性能电路以及制造方法
JP4880958B2 (ja) * 2005-09-16 2012-02-22 株式会社東芝 半導体装置及びその製造方法
US7785950B2 (en) * 2005-11-10 2010-08-31 International Business Machines Corporation Dual stress memory technique method and related structure
DE102005057073B4 (de) * 2005-11-30 2011-02-03 Advanced Micro Devices, Inc., Sunnyvale Herstellungsverfahren zur Verbesserung der mechanischen Spannungsübertragung in Kanalgebieten von NMOS- und PMOS-Transistoren und entsprechendes Halbleiterbauelement
US8294224B2 (en) * 2006-04-06 2012-10-23 Micron Technology, Inc. Devices and methods to improve carrier mobility
US7585720B2 (en) * 2006-07-05 2009-09-08 Toshiba America Electronic Components, Inc. Dual stress liner device and method
KR100840661B1 (ko) * 2006-09-13 2008-06-24 동부일렉트로닉스 주식회사 반도체 소자 및 그의 제조방법
KR100773352B1 (ko) * 2006-09-25 2007-11-05 삼성전자주식회사 스트레스 인가 모스 트랜지스터를 갖는 반도체소자의제조방법 및 그에 의해 제조된 반도체소자
KR100827443B1 (ko) 2006-10-11 2008-05-06 삼성전자주식회사 손상되지 않은 액티브 영역을 가진 반도체 소자 및 그 제조방법
US20080116525A1 (en) * 2006-11-16 2008-05-22 United Microelectronics Corp. Complementary metal-oxide-semiconductor device
US8558278B2 (en) * 2007-01-16 2013-10-15 Taiwan Semiconductor Manufacturing Company, Ltd. Strained transistor with optimized drive current and method of forming
WO2008126264A1 (ja) * 2007-03-30 2008-10-23 Fujitsu Microelectronics Limited 半導体集積回路装置
US7718475B2 (en) * 2007-04-13 2010-05-18 Qimonda Ag Method for manufacturing an integrated circuit including a transistor
US20080290380A1 (en) * 2007-05-24 2008-11-27 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device with raised spacers
TW200910526A (en) * 2007-07-03 2009-03-01 Renesas Tech Corp Method of manufacturing semiconductor device
US7911008B2 (en) * 2007-10-25 2011-03-22 International Business Machines Corporation SRAM cell having a rectangular combined active area for planar pass gate and planar pull-down NFETS
US7741217B2 (en) * 2007-10-25 2010-06-22 International Business Machines Corporation Dual workfunction silicide diode
US7732872B2 (en) * 2007-10-25 2010-06-08 International Business Machines Corporation Integration scheme for multiple metal gate work function structures
KR101408782B1 (ko) * 2008-02-15 2014-06-19 삼성전자주식회사 반도체 소자 제조 방법
FR2928029B1 (fr) * 2008-02-27 2011-04-08 St Microelectronics Crolles 2 Procede de fabrication d'un dispositif semi-conducteur a grille enterree et circuit integre correspondant.
US7943961B2 (en) * 2008-03-13 2011-05-17 Taiwan Semiconductor Manufacturing Company, Ltd. Strain bars in stressed layers of MOS devices
US20090309163A1 (en) * 2008-06-11 2009-12-17 International Business Machines Corporation Method and structure for enhancing both nmosfet and pmosfet performance with a stressed film and discontinuity extending to underlying layer
US20110175168A1 (en) * 2008-08-08 2011-07-21 Texas Instruments Incorporated Nmos transistor with enhanced stress gate
US7808051B2 (en) 2008-09-29 2010-10-05 Taiwan Semiconductor Manufacturing Company, Ltd. Standard cell without OD space effect in Y-direction
US8895426B2 (en) * 2009-06-12 2014-11-25 Taiwan Semiconductor Manufacturing Company, Ltd. Metal gate transistor, integrated circuits, systems, and fabrication methods thereof
JP2011054740A (ja) * 2009-09-01 2011-03-17 Toshiba Corp 半導体装置及びその製造方法
US8304841B2 (en) * 2009-09-14 2012-11-06 Taiwan Semiconductor Manufacturing Company, Ltd. Metal gate transistor, integrated circuits, systems, and fabrication methods thereof
CN102117808B (zh) * 2009-12-31 2013-03-13 中国科学院微电子研究所 具有改善的载流子迁移率的场效应晶体管器件及制造方法
US8330227B2 (en) * 2010-02-17 2012-12-11 Taiwan Semiconductor Manufacturing Company, Ltd. Integrated semiconductor structure for SRAM and fabrication methods thereof
US8367508B2 (en) * 2010-04-09 2013-02-05 International Business Machines Corporation Self-aligned contacts for field effect transistor devices
CN102299154B (zh) * 2010-06-22 2013-06-12 中国科学院微电子研究所 半导体结构及其制作方法
JP5569243B2 (ja) 2010-08-09 2014-08-13 ソニー株式会社 半導体装置及びその製造方法
JP5614184B2 (ja) * 2010-09-06 2014-10-29 富士通セミコンダクター株式会社 半導体装置の製造方法
US8952429B2 (en) * 2010-09-15 2015-02-10 Institute of Microelectronics, Chinese Academy of Sciences Transistor and method for forming the same
US9117843B2 (en) 2011-09-14 2015-08-25 Taiwan Semiconductor Manufacturing Company, Ltd. Device with engineered epitaxial region and methods of making same
US8546204B2 (en) * 2011-10-03 2013-10-01 International Business Machines Corporation Method for growing conformal epi layers and structure thereof
CN103094113B (zh) * 2011-10-31 2015-12-16 中芯国际集成电路制造(上海)有限公司 Nmos形成方法、cmos形成方法
US8772159B2 (en) * 2012-02-01 2014-07-08 United Microelectronics Corp. Method of fabricating electrical contact
CN103456691B (zh) * 2012-05-29 2015-07-29 中芯国际集成电路制造(上海)有限公司 Cmos的制造方法
US9076818B2 (en) * 2012-06-20 2015-07-07 GlobalFoundries, Inc. Semiconductor device fabrication methods
US9117930B2 (en) * 2013-08-06 2015-08-25 Globalfoundries Inc. Methods of forming stressed fin channel structures for FinFET semiconductor devices
US20160035891A1 (en) * 2014-07-31 2016-02-04 Qualcomm Incorporated Stress in n-channel field effect transistors
US9754935B2 (en) 2014-08-07 2017-09-05 International Business Machines Corporation Raised metal semiconductor alloy for self-aligned middle-of-line contact
US9947755B2 (en) 2015-09-30 2018-04-17 International Business Machines Corporation III-V MOSFET with self-aligned diffusion barrier
US9653602B1 (en) 2016-03-21 2017-05-16 International Business Machines Corporation Tensile and compressive fins for vertical field effect transistors
US9904758B2 (en) * 2016-05-18 2018-02-27 Samsung Electronics Co., Ltd. Using deep sub-micron stress effects and proximity effects to create a high performance standard cell
US10854591B2 (en) * 2016-11-04 2020-12-01 Samsung Electronics Co., Ltd. Semiconductor device including a repeater/buffer at upper metal routing layers and methods of manufacturing the same
CN107706097B (zh) * 2017-09-14 2019-03-22 长鑫存储技术有限公司 半导体器件结构及其制备方法
US11094795B2 (en) * 2018-11-20 2021-08-17 Nanya Technology Corporation Semiconductor device and method for manufacturing the same
KR20210028578A (ko) * 2019-09-03 2021-03-12 에이에스엠 아이피 홀딩 비.브이. 칼코지나이드 막 및 상기 막을 포함한 구조체를 증착하기 위한 방법 및 장치
US20220102506A1 (en) * 2020-09-25 2022-03-31 Intel Corporation Dual contact process with selective deposition
CN114864735B (zh) * 2022-05-11 2024-03-15 中南大学 基于飞秒激光的光电晶体管制备方法及晶体管阵列

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4908327A (en) * 1988-05-02 1990-03-13 Texas Instruments, Incorporated Counter-doped transistor
JPH07211903A (ja) * 1993-12-02 1995-08-11 Fujitsu Ltd 半導体装置の製造方法
US5710450A (en) * 1994-12-23 1998-01-20 Intel Corporation Transistor with ultra shallow tip and method of fabrication
JPH0923554A (ja) 1995-07-06 1997-01-21 Sumitomo Wiring Syst Ltd 電線用管状ゴム栓
JPH09232254A (ja) * 1996-02-23 1997-09-05 Sumitomo Metal Ind Ltd 電極材料及びその製造方法
KR19980024663A (ko) * 1996-09-18 1998-07-06 윌리엄 비. 켐플러 규화물 영역 형성 방법
US5908313A (en) * 1996-12-31 1999-06-01 Intel Corporation Method of forming a transistor
US5731239A (en) * 1997-01-22 1998-03-24 Chartered Semiconductor Manufacturing Pte Ltd. Method of making self-aligned silicide narrow gate electrodes for field effect transistors having low sheet resistance
TW406374B (en) 1997-07-17 2000-09-21 Ibm Method for forming transistors with raised source and drains and device formed thereby
US5952701A (en) * 1997-08-18 1999-09-14 National Semiconductor Corporation Design and fabrication of semiconductor structure having complementary channel-junction insulated-gate field-effect transistors whose gate electrodes have work functions close to mid-gap semiconductor value
US5994191A (en) * 1998-07-09 1999-11-30 Advanced Micro Devices, Inc. Elevated source/drain salicide CMOS technology
US6074915A (en) * 1998-08-17 2000-06-13 Taiwan Semiconductor Manufacturing Company Method of making embedded flash memory with salicide and sac structure
US6235598B1 (en) * 1998-11-13 2001-05-22 Intel Corporation Method of using thick first spacers to improve salicide resistance on polysilicon gates
JP2002043151A (ja) 2000-07-25 2002-02-08 Matsushita Electric Works Ltd 非接触充電用トランス及び充電式電動機器セットの製造方法
US6555437B1 (en) * 2001-04-27 2003-04-29 Advanced Micro Devices, Inc. Multiple halo implant in a MOSFET with raised source/drain structure
JP2003060076A (ja) 2001-08-21 2003-02-28 Nec Corp 半導体装置及びその製造方法
JP2004235426A (ja) * 2003-01-30 2004-08-19 Seiko Epson Corp シリサイド膜の形成方法および半導体装置の製造方法
WO2004070803A1 (en) 2003-02-06 2004-08-19 Eugene Technology Co., Ltd. Heater of chemical vapor deposition apparatus for manufacturing a thin film
JP4509026B2 (ja) * 2003-02-07 2010-07-21 日本電気株式会社 ニッケルシリサイド膜の形成方法、半導体装置の製造方法およびニッケルシリサイド膜のエッチング方法
US20040262683A1 (en) * 2003-06-27 2004-12-30 Bohr Mark T. PMOS transistor strain optimization with raised junction regions
US7112495B2 (en) 2003-08-15 2006-09-26 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method of a strained channel transistor and a second semiconductor component in an integrated circuit
US6987061B2 (en) * 2003-08-19 2006-01-17 Texas Instruments Incorporated Dual salicide process for optimum performance
US6914303B2 (en) 2003-08-28 2005-07-05 International Business Machines Corporation Ultra thin channel MOSFET
JP2005085949A (ja) * 2003-09-08 2005-03-31 Semiconductor Leading Edge Technologies Inc 半導体装置およびその製造方法
JP2005123604A (ja) * 2003-09-25 2005-05-12 Matsushita Electric Ind Co Ltd 半導体装置及びその製造方法
US7303949B2 (en) * 2003-10-20 2007-12-04 International Business Machines Corporation High performance stress-enhanced MOSFETs using Si:C and SiGe epitaxial source/drain and method of manufacture
US6977194B2 (en) 2003-10-30 2005-12-20 International Business Machines Corporation Structure and method to improve channel mobility by gate electrode stress modification
US7057216B2 (en) * 2003-10-31 2006-06-06 International Business Machines Corporation High mobility heterojunction complementary field effect transistors and methods thereof
US7138320B2 (en) * 2003-10-31 2006-11-21 Advanced Micro Devices, Inc. Advanced technique for forming a transistor having raised drain and source regions
US7122849B2 (en) * 2003-11-14 2006-10-17 International Business Machines Corporation Stressed semiconductor device structures having granular semiconductor material
CN1684246B (zh) * 2004-03-30 2010-05-12 三星电子株式会社 低噪声和高性能电路以及制造方法
DE102004026142B3 (de) * 2004-05-28 2006-02-09 Advanced Micro Devices, Inc., Sunnyvale Verfahren zum Steuern der mechanischen Spannung in einem Kanalgebiet durch das Entfernen von Abstandselementen und ein gemäß dem Verfahren gefertigtes Halbleiterbauelement
US20070018252A1 (en) * 2005-07-21 2007-01-25 International Business Machines Corporation Semiconductor device containing high performance p-mosfet and/or n-mosfet and method of fabricating the same
JP5236676B2 (ja) * 2010-03-18 2013-07-17 ルネサスエレクトロニクス株式会社 スタティック・ランダム・アクセス・メモリ

Also Published As

Publication number Publication date
US8405131B2 (en) 2013-03-26
ATE437449T1 (de) 2009-08-15
US7470943B2 (en) 2008-12-30
EP1929537A4 (de) 2008-10-08
KR20080037666A (ko) 2008-04-30
WO2007024984A2 (en) 2007-03-01
CN101243556A (zh) 2008-08-13
WO2007024984A3 (en) 2008-01-17
TW200729496A (en) 2007-08-01
EP1929537A2 (de) 2008-06-11
CN101243556B (zh) 2011-03-30
JP2009506549A (ja) 2009-02-12
EP1929537B1 (de) 2009-07-22
US20090134470A1 (en) 2009-05-28
KR100992036B1 (ko) 2010-11-05
TWI412129B (zh) 2013-10-11
US20070040225A1 (en) 2007-02-22
JP5305907B2 (ja) 2013-10-02

Similar Documents

Publication Publication Date Title
DE602006008017D1 (de) Hochleistungsfähiger mosfet mit einer verspannten gate-metallsilizidschicht und herstellungsverfahren dafür
TW200638463A (en) Method of forming locally strained transistor
ATE461526T1 (de) Hochdichtes finfet-integrationsverfahren
TW200715562A (en) Thin film transistor substrate and fabrication thereof
TW200511583A (en) Strained-channel fin field effect transistor (FET) with a uniform channel thickness and separate gates
SG156621A1 (en) Ldmos using a combination of enhanced dielectric stress layer and dummy gates
JP2009506549A5 (de)
TW200739819A (en) Semiconductor device, and method for manufacturing the same
TW200733384A (en) Structure and method to increase strain enhancement with spacerless FET and dual liner process
TWI257145B (en) Offset spacer formation for strained channel CMOS transistor
TW200644224A (en) Semiconductor device and method for manufacturing the same
GB2455669A (en) Stressed field effect transistor and methods for its fabrication
WO2009055173A3 (en) Floating body field-effect transistors, and methods of forming floating body field-effect transistors
WO2007140130A3 (en) N-channel mosfets comprising dual stressors, and methods for forming the same
TW200802803A (en) Technique for providing stress sources in transistors in close proximity to a channel region by recessing drain and source regions
TW200723533A (en) Electronic device including a transistor structure having an active region adjacent to a stressor layer and a process for forming the electronic device
WO2007082266A3 (en) Semiconductor transistors with expanded top portions of gates
TW200631065A (en) Strained transistor with hybrid-strain inducing layer
WO2008099528A1 (ja) 表示装置、表示装置の製造方法
TW200705668A (en) Thin film transistor substrate and manufacturing method thereof
GB2454135A (en) A field effect transistor having a stressed contact etch stop layer with reduced conformality
TW200638543A (en) Hybrid-strained sidewall spacer for CMOS process
SG165354A1 (en) Integrated circuit system employing stress memorization transfer
SG152165A1 (en) Methods of forming field effect transistors having stress-inducing sidewall insulating spacers thereon and devices formed thereby
TW200705661A (en) Semiconductor device and method for fabricating the same

Legal Events

Date Code Title Description
8320 Willingness to grant licences declared (paragraph 23)
8364 No opposition during term of opposition