DE60035142D1 - Künstlich hergestelltes Quarzglaselement zur Anwendung in ArF-excimer-Laserlithographie - Google Patents

Künstlich hergestelltes Quarzglaselement zur Anwendung in ArF-excimer-Laserlithographie

Info

Publication number
DE60035142D1
DE60035142D1 DE60035142T DE60035142T DE60035142D1 DE 60035142 D1 DE60035142 D1 DE 60035142D1 DE 60035142 T DE60035142 T DE 60035142T DE 60035142 T DE60035142 T DE 60035142T DE 60035142 D1 DE60035142 D1 DE 60035142D1
Authority
DE
Germany
Prior art keywords
quartz glass
excimer laser
arf excimer
glass element
artificially produced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60035142T
Other languages
English (en)
Other versions
DE60035142T2 (de
Inventor
Akira Fujinoki
Takayuki Oshima
Hiroyuki Nishimura
Yasuyuki Yaginuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Original Assignee
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzglas GmbH and Co KG, Shin Etsu Quartz Products Co Ltd filed Critical Heraeus Quarzglas GmbH and Co KG
Application granted granted Critical
Publication of DE60035142D1 publication Critical patent/DE60035142D1/de
Publication of DE60035142T2 publication Critical patent/DE60035142T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/002—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/50—Doped silica-based glasses containing metals containing alkali metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Compositions (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60035142T 1999-03-04 2000-03-06 Bauteil aus synthetischem Quarzglas zur Anwendung in der ArF-Excimerlaser-Lithographie Expired - Lifetime DE60035142T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5745799 1999-03-04
JP05745799A JP4601022B2 (ja) 1999-03-04 1999-03-04 ＡｒＦエキシマレーザーリソグラフィー用合成石英ガラス部材

Publications (2)

Publication Number Publication Date
DE60035142D1 true DE60035142D1 (de) 2007-07-26
DE60035142T2 DE60035142T2 (de) 2008-02-14

Family

ID=13056213

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60035142T Expired - Lifetime DE60035142T2 (de) 1999-03-04 2000-03-06 Bauteil aus synthetischem Quarzglas zur Anwendung in der ArF-Excimerlaser-Lithographie

Country Status (4)

Country Link
US (1) US6480518B1 (de)
EP (1) EP1033350B1 (de)
JP (1) JP4601022B2 (de)
DE (1) DE60035142T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1288169A1 (de) * 2001-08-30 2003-03-05 Schott Glas Verfahren zur Wasserstoffbeladung von Quarzglaskörpern zur Verbesserung der Brechzahlhomogenität und der Laserfestigkeit bei gleichzeitiger Einhaltung einer vorgegebenen Spannungsdoppelbrechung und danach hergestellte Quarzglaskörper
JP2003149479A (ja) 2001-11-14 2003-05-21 Hitachi Cable Ltd 石英系ガラス光導波路及びそれを用いた光モジュール
JP4158009B2 (ja) * 2001-12-11 2008-10-01 信越化学工業株式会社 合成石英ガラスインゴット及び合成石英ガラスの製造方法
US6761951B2 (en) 2001-12-11 2004-07-13 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass blank
JP4017863B2 (ja) 2001-12-18 2007-12-05 信越石英株式会社 アニール炉及び光学用合成石英ガラスの製造方法
US7053017B2 (en) * 2002-03-05 2006-05-30 Corning Incorporated Reduced striae extreme ultraviolet elements
JP2004269287A (ja) * 2003-03-06 2004-09-30 Shinetsu Quartz Prod Co Ltd 光学用合成石英ガラス部材及びその製造方法
US20050199484A1 (en) * 2004-02-10 2005-09-15 Franek Olstowski Ozone generator with dual dielectric barrier discharge and methods for using same
KR101153677B1 (ko) * 2005-02-09 2012-06-18 아사히 가라스 가부시키가이샤 마스크 블랭크
JP2006251781A (ja) * 2005-02-09 2006-09-21 Asahi Glass Co Ltd マスクブランクス
JP4826118B2 (ja) * 2005-03-29 2011-11-30 旭硝子株式会社 合成石英ガラスの製造方法及び光学部材用合成石英ガラス
JP4831328B2 (ja) * 2005-08-11 2011-12-07 信越化学工業株式会社 エキシマレーザ用合成石英ガラス基板の製造方法
US20070049482A1 (en) 2005-08-11 2007-03-01 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate for excimer lasers and making method
JP2008063181A (ja) * 2006-09-07 2008-03-21 Shin Etsu Chem Co Ltd エキシマレーザー用合成石英ガラス基板及びその製造方法
JP2009013048A (ja) * 2007-06-06 2009-01-22 Shin Etsu Chem Co Ltd ナノインプリントモールド用チタニアドープ石英ガラス
EP2463245B1 (de) * 2009-08-07 2016-04-20 Asahi Glass Company, Limited Sythetisches quarzglas für eine optische komponente
WO2015126802A1 (en) 2014-02-20 2015-08-27 Corning Incorporated Uv photobleaching of glass having uv-induced colorization
CN113443820A (zh) * 2021-07-03 2021-09-28 四川神光石英科技有限公司 用于石英玻璃渗氢工艺的料架、反应釜及装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3367936D1 (en) 1982-08-27 1987-01-15 Wako Pure Chem Ind Ltd Measurement of alpha-amylase activity
US5702495A (en) * 1993-02-10 1997-12-30 Nikon Corporation Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
JP3194667B2 (ja) 1994-03-26 2001-07-30 信越石英株式会社 光学用合成石英ガラス成形体及びその製造方法
KR100298167B1 (ko) 1994-07-07 2001-10-24 오노 시게오 진공자외선파장대광선용실리카유리의제조방법,및그에의해제조된실리카유리및광학부재
US6087283A (en) 1995-01-06 2000-07-11 Nikon Corporation Silica glass for photolithography
US5707908A (en) 1995-01-06 1998-01-13 Nikon Corporation Silica glass
JP3674793B2 (ja) 1995-10-31 2005-07-20 信越石英株式会社 紫外線レーザ用石英ガラス光学部材の製造方法
DE69702830T2 (de) * 1996-07-02 2001-03-29 Heraeus Quarzglas Gmbh & Co. Kg Projektionsgerät mit ausrichtvorrichtung zur herstellung integrierter schaltungen
JP3757476B2 (ja) * 1996-08-05 2006-03-22 株式会社ニコン 石英ガラス光学部材、その製造方法、及び投影露光装置
US5958809A (en) 1996-08-21 1999-09-28 Nikon Corporation Fluorine-containing silica glass
DE59800763D1 (de) 1997-03-07 2001-06-28 Schott Ml Gmbh Vorform aus synthetischem kieselglas und vorrichtung zu ihrer herstellung
DE69806672T2 (de) 1997-04-08 2003-03-20 Shin-Etsu Chemical Co., Ltd. Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas
DE69816758T2 (de) 1997-05-20 2004-06-03 Heraeus Quarzglas Gmbh & Co. Kg Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung

Also Published As

Publication number Publication date
EP1033350A1 (de) 2000-09-06
US6480518B1 (en) 2002-11-12
JP2000258601A (ja) 2000-09-22
DE60035142T2 (de) 2008-02-14
EP1033350B1 (de) 2007-06-13
JP4601022B2 (ja) 2010-12-22

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