DE69806672D1 - Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas - Google Patents
Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen QuarzglasInfo
- Publication number
- DE69806672D1 DE69806672D1 DE69806672T DE69806672T DE69806672D1 DE 69806672 D1 DE69806672 D1 DE 69806672D1 DE 69806672 T DE69806672 T DE 69806672T DE 69806672 T DE69806672 T DE 69806672T DE 69806672 D1 DE69806672 D1 DE 69806672D1
- Authority
- DE
- Germany
- Prior art keywords
- quartz glass
- synthetic quartz
- optical
- manufacturing
- excimer laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10521297 | 1997-04-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69806672D1 true DE69806672D1 (de) | 2002-08-29 |
DE69806672T2 DE69806672T2 (de) | 2003-03-20 |
Family
ID=14401370
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69806672T Expired - Fee Related DE69806672T2 (de) | 1997-04-08 | 1998-01-22 | Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas |
Country Status (3)
Country | Link |
---|---|
US (1) | US6499315B1 (de) |
EP (1) | EP0870737B1 (de) |
DE (1) | DE69806672T2 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100554091B1 (ko) | 1997-12-08 | 2006-05-16 | 가부시키가이샤 니콘 | 엑시머레이저내성을향상시킨석영글래스의제조방법및석영글래스부재 |
JP3794664B2 (ja) * | 1998-07-29 | 2006-07-05 | 信越化学工業株式会社 | 合成石英ガラス部材及びその製造方法、並びにエキシマレーザ用光学部品 |
JP2000143258A (ja) * | 1998-09-10 | 2000-05-23 | Shinetsu Quartz Prod Co Ltd | ArFエキシマレ―ザ―リソグラフィ―用合成石英ガラスの製造方法 |
US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
US6242136B1 (en) | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
US6319634B1 (en) | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
US6782716B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
US6682859B2 (en) | 1999-02-12 | 2004-01-27 | Corning Incorporated | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass |
US6783898B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Projection lithography photomask blanks, preforms and method of making |
TW581747B (en) * | 1999-02-16 | 2004-04-01 | Nikon Corp | Synthetic quartz glass optical member for ultraviolet light |
JP4601022B2 (ja) * | 1999-03-04 | 2010-12-22 | 信越石英株式会社 | ArFエキシマレーザーリソグラフィー用合成石英ガラス部材 |
US6649268B1 (en) * | 1999-03-10 | 2003-11-18 | Nikon Corporation | Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member |
US6672109B1 (en) * | 1999-04-21 | 2004-01-06 | Nikon Corporation | Silica glass member, method for producing the same, and projection aligners using the same |
WO2001002311A1 (fr) | 1999-07-05 | 2001-01-11 | Nikon Corporation | Procede de production d'un element de verre de quartz, et element en verre de quartz ainsi produit |
JP2001019465A (ja) | 1999-07-07 | 2001-01-23 | Shin Etsu Chem Co Ltd | エキシマレーザ用合成石英ガラス部材及びその製造方法 |
US7797966B2 (en) | 2000-12-29 | 2010-09-21 | Single Crystal Technologies, Inc. | Hot substrate deposition of fused silica |
EP1319637A3 (de) * | 2001-12-11 | 2004-01-28 | Shin-Etsu Chemical Co., Ltd. | Ein Rohling aus Quarzglas |
JP4158009B2 (ja) | 2001-12-11 | 2008-10-01 | 信越化学工業株式会社 | 合成石英ガラスインゴット及び合成石英ガラスの製造方法 |
JP4017863B2 (ja) * | 2001-12-18 | 2007-12-05 | 信越石英株式会社 | アニール炉及び光学用合成石英ガラスの製造方法 |
EP1340723B1 (de) * | 2002-03-01 | 2010-08-11 | Schott AG | Verfahren zu Herstellung von Quarzglas und einer Quarzglasvorform |
JP3531870B2 (ja) * | 2002-03-27 | 2004-05-31 | 独立行政法人 科学技術振興機構 | 合成石英ガラス |
AU2003284494A1 (en) * | 2002-11-29 | 2004-06-23 | Shin-Etsu Quartz Products Co., Ltd. | Method for producing synthetic quartz glass and synthetic quartz glass article |
JP5367204B2 (ja) * | 2003-04-03 | 2013-12-11 | 旭硝子株式会社 | TiO2を含有するシリカガラスおよびEUVリソグラフィ用光学部材 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ZA884511B (en) * | 1987-07-15 | 1989-03-29 | Boc Group Inc | Method of plasma enhanced silicon oxide deposition |
US5152819A (en) * | 1990-08-16 | 1992-10-06 | Corning Incorporated | Method of making fused silica |
JP2588447B2 (ja) | 1991-06-29 | 1997-03-05 | 信越石英株式会社 | エキシマレーザー用石英ガラス部材の製造方法 |
JP2821056B2 (ja) | 1992-03-31 | 1998-11-05 | 信越石英株式会社 | 耐レーザ用光学部材及びその製造方法 |
JP3919831B2 (ja) | 1992-12-29 | 2007-05-30 | 東ソー・クォーツ株式会社 | 光学用合成石英ガラス |
JP3519426B2 (ja) | 1993-03-30 | 2004-04-12 | 東ソー・クォーツ株式会社 | 光学用合成石英ガラスの安定化方法 |
JP3259460B2 (ja) | 1993-08-26 | 2002-02-25 | 株式会社ニコン | 耐紫外線性を有する石英ガラスの製造方法および石英ガラス光学部材 |
JP3336761B2 (ja) | 1994-09-09 | 2002-10-21 | 住友金属工業株式会社 | 光透過用合成石英ガラスの製造方法 |
JP2936138B2 (ja) | 1995-01-06 | 1999-08-23 | 株式会社ニコン | 石英ガラス、それを含む光学部材、並びにその製造方法 |
US5707908A (en) | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
US5616159A (en) | 1995-04-14 | 1997-04-01 | Corning Incorporated | Method of forming high purity fused silica having high resistance to optical damage |
EP0747327B2 (de) * | 1995-06-07 | 2003-08-27 | Corning Incorporated | Verfahren zur thermischen Behandlung und zum Konsolidieren von Vorformen aus Siliciumdioxid zur Verminderung von durch Laser hervorgerufenen optischen Defekten |
US5876683A (en) * | 1995-11-02 | 1999-03-02 | Glumac; Nicholas | Combustion flame synthesis of nanophase materials |
EP0780345A1 (de) | 1995-12-22 | 1997-06-25 | Corning Incorporated | Optisches Element für UV-Transmission |
EP0835848A3 (de) | 1996-08-21 | 1998-06-10 | Nikon Corporation | Fluor enthaltendes Silicaglas, sein Herstellungsverfahren und ein dieses Glas enthaltender Projektionsbelichtungsapparat |
US6309991B1 (en) * | 1996-08-29 | 2001-10-30 | Corning Incorporated | Silica with low compaction under high energy irradiation |
-
1998
- 1998-01-22 DE DE69806672T patent/DE69806672T2/de not_active Expired - Fee Related
- 1998-01-22 EP EP98101100A patent/EP0870737B1/de not_active Expired - Lifetime
-
2000
- 2000-09-28 US US09/671,202 patent/US6499315B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69806672T2 (de) | 2003-03-20 |
EP0870737B1 (de) | 2002-07-24 |
EP0870737A1 (de) | 1998-10-14 |
US6499315B1 (en) | 2002-12-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |