DE60035934D1 - ArF-Excimer-Laservorrichtung - Google Patents

ArF-Excimer-Laservorrichtung

Info

Publication number
DE60035934D1
DE60035934D1 DE60035934T DE60035934T DE60035934D1 DE 60035934 D1 DE60035934 D1 DE 60035934D1 DE 60035934 T DE60035934 T DE 60035934T DE 60035934 T DE60035934 T DE 60035934T DE 60035934 D1 DE60035934 D1 DE 60035934D1
Authority
DE
Germany
Prior art keywords
arf excimer
excimer lasers
lasers device
arf
lasers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60035934T
Other languages
English (en)
Other versions
DE60035934T2 (de
Inventor
Koji Kakizaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Application granted granted Critical
Publication of DE60035934D1 publication Critical patent/DE60035934D1/de
Publication of DE60035934T2 publication Critical patent/DE60035934T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60035934T 1999-10-08 2000-10-05 ArF-Excimer-Laservorrichtung Expired - Lifetime DE60035934T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP28815299 1999-10-08
JP28815299A JP3296430B2 (ja) 1999-10-08 1999-10-08 露光用ＡｒＦエキシマレーザ装置

Publications (2)

Publication Number Publication Date
DE60035934D1 true DE60035934D1 (de) 2007-09-27
DE60035934T2 DE60035934T2 (de) 2008-04-30

Family

ID=17726487

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60035934T Expired - Lifetime DE60035934T2 (de) 1999-10-08 2000-10-05 ArF-Excimer-Laservorrichtung

Country Status (5)

Country Link
US (1) US6584131B1 (de)
EP (1) EP1091462B1 (de)
JP (1) JP3296430B2 (de)
KR (1) KR100505081B1 (de)
DE (1) DE60035934T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6490307B1 (en) 1999-03-17 2002-12-03 Lambda Physik Ag Method and procedure to automatically stabilize excimer laser output parameters
US6389052B2 (en) 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
US6727731B1 (en) 1999-03-12 2004-04-27 Lambda Physik Ag Energy control for an excimer or molecular fluorine laser
US6714577B1 (en) 1999-03-17 2004-03-30 Lambda Physik Ag Energy stabilized gas discharge laser
US6882674B2 (en) * 1999-12-27 2005-04-19 Cymer, Inc. Four KHz gas discharge laser system
JP3552979B2 (ja) * 1999-09-16 2004-08-11 ウシオ電機株式会社 ＡｒＦエキシマレーザ装置
JP3296430B2 (ja) * 1999-10-08 2002-07-02 株式会社ウシオ総合技術研究所 露光用ＡｒＦエキシマレーザ装置
JP3427889B2 (ja) 1999-12-21 2003-07-22 ウシオ電機株式会社 ＡｒＦエキシマレーザ装置及びフッ素レーザ装置
JP3775469B2 (ja) 2000-03-15 2006-05-17 ウシオ電機株式会社 ＡｒＦエキシマレーザ装置、ＫｒＦエキシマレーザ装置及びフッ素レーザ装置
JP3755577B2 (ja) 2000-10-10 2006-03-15 ウシオ電機株式会社 露光用ＡｒＦ、ＫｒＦエキシマレーザ装置及びフッ素レーザ装置
US20020122449A1 (en) * 2001-03-02 2002-09-05 Satoshi Tanaka Gas laser apparatus for lithography
US20070030876A1 (en) * 2005-08-05 2007-02-08 Levatter Jeffrey I Apparatus and method for purging and recharging excimer laser gases
TW200903935A (en) * 2007-03-27 2009-01-16 Photomedex Method and apparatus for efficiently operating a gas discharge excimer laser
WO2019207643A1 (ja) * 2018-04-24 2019-10-31 ギガフォトン株式会社 レーザガス再生装置及び電子デバイスの製造方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63110780A (ja) 1986-10-29 1988-05-16 Toshiba Corp ガスレ−ザ発振装置
JP2610271B2 (ja) 1987-08-31 1997-05-14 株式会社東芝 空気調和機
US4977573A (en) * 1989-03-09 1990-12-11 Questek, Inc. Excimer laser output control device
US5260961A (en) * 1990-11-01 1993-11-09 Florod Corporation Sealed excimer laser with longitudinal discharge and transverse preionization for low-average-power uses
JPH0582879A (ja) 1991-09-24 1993-04-02 Toshiba Corp ガスレ−ザ装置
JPH0697550A (ja) 1992-09-17 1994-04-08 Toshiba Corp ガスレーザ発振方法及びその装置
JPH06334241A (ja) * 1993-05-19 1994-12-02 Sumitomo Heavy Ind Ltd エキシマーレーザーのガス調整方法およびその装置
JP3818405B2 (ja) * 1996-07-19 2006-09-06 忠弘 大見 レーザ発振装置
US6014398A (en) 1997-10-10 2000-01-11 Cymer, Inc. Narrow band excimer laser with gas additive
US6240112B1 (en) * 1997-12-15 2001-05-29 Cymer, Inc. High pulse rate pulse power system with liquid cooling
JP4117694B2 (ja) * 1998-01-19 2008-07-16 忠弘 大見 エキシマレーザ発振装置及び露光装置
US20020186741A1 (en) * 1998-06-04 2002-12-12 Lambda Physik Ag Very narrow band excimer or molecular fluorine laser
US6466599B1 (en) * 1999-04-07 2002-10-15 Lambda Physik Ag Discharge unit for a high repetition rate excimer or molecular fluorine laser
US6157662A (en) * 1999-02-12 2000-12-05 Lambda Physik Gmbh F2 (157nm) laser employing neon as the buffer gas
JP3552979B2 (ja) 1999-09-16 2004-08-11 ウシオ電機株式会社 ＡｒＦエキシマレーザ装置
US6496527B1 (en) * 1999-09-27 2002-12-17 Komatsu, Ltd. Ultraviolet laser apparatus and gas for ultraviolet laser
JP3296430B2 (ja) * 1999-10-08 2002-07-02 株式会社ウシオ総合技術研究所 露光用ＡｒＦエキシマレーザ装置
JP3365500B2 (ja) * 2000-01-19 2003-01-14 ウシオ電機株式会社 狭帯化ＡｒＦエキシマレーザ装置
DE10190427T1 (de) * 2000-01-25 2002-06-06 Lambda Physik Ag Energieüberwachungsvorrichtung für einen Fluormolekül-Laser
US20020105995A1 (en) * 2000-11-16 2002-08-08 Lambda Physik Ag Molecular fluorine laser with single spectral line and polarized output

Also Published As

Publication number Publication date
KR100505081B1 (ko) 2005-07-29
KR20010040028A (ko) 2001-05-15
EP1091462A3 (de) 2003-11-26
US6584131B1 (en) 2003-06-24
EP1091462B1 (de) 2007-08-15
JP2001111142A (ja) 2001-04-20
EP1091462A2 (de) 2001-04-11
DE60035934T2 (de) 2008-04-30
JP3296430B2 (ja) 2002-07-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition