DE69702830T2 - Projektionsgerät mit ausrichtvorrichtung zur herstellung integrierter schaltungen - Google Patents

Projektionsgerät mit ausrichtvorrichtung zur herstellung integrierter schaltungen

Info

Publication number
DE69702830T2
DE69702830T2 DE69702830T DE69702830T DE69702830T2 DE 69702830 T2 DE69702830 T2 DE 69702830T2 DE 69702830 T DE69702830 T DE 69702830T DE 69702830 T DE69702830 T DE 69702830T DE 69702830 T2 DE69702830 T2 DE 69702830T2
Authority
DE
Germany
Prior art keywords
integrated circuits
producing integrated
projection device
alignment
alignment device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69702830T
Other languages
English (en)
Other versions
DE69702830D1 (de
Inventor
Akira Fujinoki
Hiroyuki Nishimura
Toshiki Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Original Assignee
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP19148396A external-priority patent/JP3641766B2/ja
Priority claimed from JP19151596A external-priority patent/JP3641767B2/ja
Priority claimed from JP19149396A external-priority patent/JP3607006B2/ja
Application filed by Heraeus Quarzglas GmbH and Co KG, Shin Etsu Quartz Products Co Ltd filed Critical Heraeus Quarzglas GmbH and Co KG
Publication of DE69702830D1 publication Critical patent/DE69702830D1/de
Application granted granted Critical
Publication of DE69702830T2 publication Critical patent/DE69702830T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69702830T 1996-07-02 1997-06-30 Projektionsgerät mit ausrichtvorrichtung zur herstellung integrierter schaltungen Expired - Fee Related DE69702830T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP19148396A JP3641766B2 (ja) 1996-07-02 1996-07-02 集積回路製造用露光装置
JP19151596A JP3641767B2 (ja) 1996-07-02 1996-07-02 集積回路製造用露光装置
JP19149396A JP3607006B2 (ja) 1996-07-02 1996-07-02 集積回路製造用露光装置
PCT/EP1997/003406 WO1998000761A1 (en) 1996-07-02 1997-06-30 Projection aligner for integrated circuit fabrication

Publications (2)

Publication Number Publication Date
DE69702830D1 DE69702830D1 (de) 2000-09-21
DE69702830T2 true DE69702830T2 (de) 2001-03-29

Family

ID=27326489

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69702830T Expired - Fee Related DE69702830T2 (de) 1996-07-02 1997-06-30 Projektionsgerät mit ausrichtvorrichtung zur herstellung integrierter schaltungen

Country Status (4)

Country Link
US (1) US6031238A (de)
EP (1) EP0852742B1 (de)
DE (1) DE69702830T2 (de)
WO (1) WO1998000761A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998043135A1 (en) * 1997-03-25 1998-10-01 Heraeus Quarzglas Gmbh Optical system for integrated circuit fabrication
JP4207389B2 (ja) 1999-01-06 2009-01-14 株式会社ニコン 投影光学系、その製造方法、及びそれを用いた投影露光装置
JP4601022B2 (ja) * 1999-03-04 2010-12-22 信越石英株式会社 ＡｒＦエキシマレーザーリソグラフィー用合成石英ガラス部材
US6396567B1 (en) * 1999-06-02 2002-05-28 Taiwan Semiconductor Manufacturing Company, Ltd Method and apparatus for controlling the dose of radiations applied to a semiconductor wafer during photolithography
WO2001002311A1 (fr) 1999-07-05 2001-01-11 Nikon Corporation Procede de production d'un element de verre de quartz, et element en verre de quartz ainsi produit
KR20040004389A (ko) * 2000-10-03 2004-01-13 코닝 인코포레이티드 포토리소그라피 방법 및 시스템

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2153543B (en) * 1983-12-28 1988-09-01 Canon Kk A projection exposure apparatus
ATE116448T1 (de) * 1989-06-09 1995-01-15 Heraeus Quarzglas Optische teile und rohlinge aus synthetischem siliziumdioxidglas und verfahren zu ihrer herstellung.
US5699183A (en) * 1993-02-10 1997-12-16 Nikon Corporation Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
US5488229A (en) * 1994-10-04 1996-01-30 Excimer Laser Systems, Inc. Deep ultraviolet microlithography system
US5707908A (en) * 1995-01-06 1998-01-13 Nikon Corporation Silica glass

Also Published As

Publication number Publication date
US6031238A (en) 2000-02-29
WO1998000761A1 (en) 1998-01-08
DE69702830D1 (de) 2000-09-21
EP0852742B1 (de) 2000-08-16
EP0852742A1 (de) 1998-07-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee