DE60035710D1 - Zoom-beleuchtungssystem zur verwendung in der photolithographie - Google Patents
Zoom-beleuchtungssystem zur verwendung in der photolithographieInfo
- Publication number
- DE60035710D1 DE60035710D1 DE60035710T DE60035710T DE60035710D1 DE 60035710 D1 DE60035710 D1 DE 60035710D1 DE 60035710 T DE60035710 T DE 60035710T DE 60035710 T DE60035710 T DE 60035710T DE 60035710 D1 DE60035710 D1 DE 60035710D1
- Authority
- DE
- Germany
- Prior art keywords
- photolithography
- lighting system
- zoom lighting
- zoom
- lighting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70183—Zoom systems for adjusting beam diameter
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/04—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
- G02B7/10—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification by relative axial movement of several lenses, e.g. of varifocal objective lens
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2000/003896 WO2001061411A1 (en) | 2000-02-16 | 2000-02-16 | Zoom illumination system for use in photolithography |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60035710D1 true DE60035710D1 (de) | 2007-09-06 |
DE60035710T2 DE60035710T2 (de) | 2007-12-06 |
Family
ID=21741064
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60035710T Expired - Fee Related DE60035710T2 (de) | 2000-02-16 | 2000-02-16 | Zoom-beleuchtungssystem zur verwendung in der photolithographie |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1256033B1 (de) |
JP (1) | JP2003523641A (de) |
DE (1) | DE60035710T2 (de) |
WO (1) | WO2001061411A1 (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10040898A1 (de) * | 2000-08-18 | 2002-02-28 | Zeiss Carl | Beleuchtungssystem für die Mikrolithographie |
DE10144246A1 (de) * | 2001-09-05 | 2003-03-20 | Zeiss Carl | Zoom-System für eine Beleuchtungseinrichtung |
DE10144243A1 (de) * | 2001-09-05 | 2003-03-20 | Zeiss Carl | Zoom-System für eine Beleuchtungseinrichtung |
DE10144244A1 (de) | 2001-09-05 | 2003-03-20 | Zeiss Carl | Zoom-System, insbesondere für eine Beleuchtungseinrichtung |
US6775069B2 (en) * | 2001-10-18 | 2004-08-10 | Asml Holding N.V. | Advanced illumination system for use in microlithography |
US6813003B2 (en) | 2002-06-11 | 2004-11-02 | Mark Oskotsky | Advanced illumination system for use in microlithography |
US7006295B2 (en) | 2001-10-18 | 2006-02-28 | Asml Holding N.V. | Illumination system and method for efficiently illuminating a pattern generator |
US7079321B2 (en) | 2001-10-18 | 2006-07-18 | Asml Holding N.V. | Illumination system and method allowing for varying of both field height and pupil |
JP4207478B2 (ja) * | 2002-07-12 | 2009-01-14 | 株式会社ニコン | オプティカルインテグレータ、照明光学装置、露光装置および露光方法 |
JP4366163B2 (ja) * | 2003-09-25 | 2009-11-18 | キヤノン株式会社 | 照明装置及び露光装置 |
JP2005294840A (ja) * | 2004-03-31 | 2005-10-20 | Asml Holding Nv | フィールド高さ及び瞳の変更を許容する照明システム及び方法 |
EP1708008B1 (de) | 2005-04-01 | 2011-08-17 | Semiconductor Energy Laboratory Co., Ltd. | Strahlhomogenisator und Laserbestrahlungsvorrichtung |
US7532403B2 (en) * | 2006-02-06 | 2009-05-12 | Asml Holding N.V. | Optical system for transforming numerical aperture |
US20080013182A1 (en) * | 2006-07-17 | 2008-01-17 | Joerg Ferber | Two-stage laser-beam homogenizer |
JP4511502B2 (ja) | 2006-09-30 | 2010-07-28 | 日立ビアメカニクス株式会社 | 基板露光装置 |
DE102009045219A1 (de) * | 2009-09-30 | 2011-03-31 | Carl Zeiss Smt Gmbh | Beleuchtungssystem für die Mikrolithographie |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6461716A (en) * | 1987-08-31 | 1989-03-08 | Canon Kk | Illuminator |
JPH04369209A (ja) * | 1991-06-17 | 1992-12-22 | Nikon Corp | 露光用照明装置 |
US5631721A (en) * | 1995-05-24 | 1997-05-20 | Svg Lithography Systems, Inc. | Hybrid illumination system for use in photolithography |
JP3005203B2 (ja) * | 1997-03-24 | 2000-01-31 | キヤノン株式会社 | 照明装置、露光装置及びデバイス製造方法 |
JPH11176742A (ja) * | 1997-12-12 | 1999-07-02 | Nikon Corp | 照明光学系と露光装置及び半導体デバイスの製造方法 |
-
2000
- 2000-02-16 EP EP00911830A patent/EP1256033B1/de not_active Expired - Lifetime
- 2000-02-16 WO PCT/US2000/003896 patent/WO2001061411A1/en active IP Right Grant
- 2000-02-16 JP JP2001560739A patent/JP2003523641A/ja active Pending
- 2000-02-16 DE DE60035710T patent/DE60035710T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1256033A1 (de) | 2002-11-13 |
EP1256033B1 (de) | 2007-07-25 |
JP2003523641A (ja) | 2003-08-05 |
DE60035710T2 (de) | 2007-12-06 |
WO2001061411A1 (en) | 2001-08-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |