DE60120000D1 - Lithographischer Apparat mit System zur Bestimmung des Abbe-Abstandes - Google Patents
Lithographischer Apparat mit System zur Bestimmung des Abbe-AbstandesInfo
- Publication number
- DE60120000D1 DE60120000D1 DE60120000T DE60120000T DE60120000D1 DE 60120000 D1 DE60120000 D1 DE 60120000D1 DE 60120000 T DE60120000 T DE 60120000T DE 60120000 T DE60120000 T DE 60120000T DE 60120000 D1 DE60120000 D1 DE 60120000D1
- Authority
- DE
- Germany
- Prior art keywords
- determining
- lithographic apparatus
- abbe distance
- abbe
- distance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/213—Exposing with the same light pattern different positions of the same surface at the same time
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7019—Calibration
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F41—WEAPONS
- F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
- F41H7/00—Armoured or armed vehicles
- F41H7/02—Land vehicles with enclosing armour, e.g. tanks
- F41H7/04—Armour construction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7007—Alignment other than original with workpiece
- G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7034—Leveling
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00300246 | 2000-01-14 | ||
EP00300246 | 2000-01-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60120000D1 true DE60120000D1 (de) | 2006-07-06 |
DE60120000T2 DE60120000T2 (de) | 2006-10-19 |
Family
ID=8172645
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60120000T Expired - Lifetime DE60120000T2 (de) | 2000-01-14 | 2001-01-12 | Lithographischer Apparat mit System zur Bestimmung des Abbe-Abstandes |
Country Status (5)
Country | Link |
---|---|
US (2) | US6730920B2 (de) |
JP (1) | JP3851780B2 (de) |
KR (1) | KR100606493B1 (de) |
DE (1) | DE60120000T2 (de) |
TW (1) | TW522287B (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW522287B (en) * | 2000-01-14 | 2003-03-01 | Asml Netherlands Bv | Lithographic projection apparatus, method of calibrating a lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured thereby |
EP1450211A3 (de) * | 2003-02-14 | 2009-04-15 | ASML Netherlands B.V. | Vorrichtung und Verfahren zum Ausrichten von Wafern mit verringerter Empfindlichkeit auf Knippneigung |
SG138445A1 (en) * | 2003-02-14 | 2008-01-28 | Asml Netherlands Bv | Device and method for wafer alignment with reduced tilt sensitivity |
TWI264620B (en) * | 2003-03-07 | 2006-10-21 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
SG147288A1 (en) | 2003-04-29 | 2008-11-28 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method and angular encoder |
US7265364B2 (en) * | 2004-06-10 | 2007-09-04 | Asml Netherlands B.V. | Level sensor for lithographic apparatus |
US7224431B2 (en) * | 2005-02-22 | 2007-05-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7518703B2 (en) * | 2005-06-28 | 2009-04-14 | Asml Netherlands B.V. | Lithographic apparatus and method |
US7710572B2 (en) * | 2006-11-30 | 2010-05-04 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
JP2009253209A (ja) * | 2008-04-10 | 2009-10-29 | Canon Inc | 露光装置及びデバイス製造方法 |
EP2228685B1 (de) * | 2009-03-13 | 2018-06-27 | ASML Netherlands B.V. | Niveausensor für ein lithografisches Gerät und Verfahren zur Herstellung einer Vorrichtung |
US8675210B2 (en) * | 2009-03-13 | 2014-03-18 | Asml Netherlands B.V. | Level sensor, lithographic apparatus, and substrate surface positioning method |
NL2006130A (en) * | 2010-03-12 | 2011-09-13 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
DE102012204674B4 (de) * | 2012-03-23 | 2014-11-27 | Carl Zeiss Smt Gmbh | Strahlregelungsvorrichtung für einen EUV-Beleuchtungsstrahl |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2694868B2 (ja) * | 1987-08-31 | 1997-12-24 | 株式会社ニコン | 位置検出方法及び装置 |
JP2606285B2 (ja) * | 1988-06-07 | 1997-04-30 | 株式会社ニコン | 露光装置および位置合わせ方法 |
JP2704734B2 (ja) * | 1988-09-05 | 1998-01-26 | キヤノン株式会社 | ステージ位置決め補正方法及び装置 |
US5053628A (en) * | 1989-07-13 | 1991-10-01 | Matsushita Electric Industrial Co., Ltd. | Position signal producing apparatus for water alignment |
KR100254024B1 (ko) * | 1990-07-23 | 2000-06-01 | 가나이 쓰도무 | 반도체 장치의 제조 방법 |
NL9100215A (nl) * | 1991-02-07 | 1992-09-01 | Asm Lithography Bv | Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat. |
JP3203719B2 (ja) * | 1991-12-26 | 2001-08-27 | 株式会社ニコン | 露光装置、その露光装置により製造されるデバイス、露光方法、およびその露光方法を用いたデバイス製造方法 |
JPH07211629A (ja) * | 1994-01-24 | 1995-08-11 | Canon Inc | 位置検出装置及びそれを用いた半導体デバイスの製造方法 |
JP3666051B2 (ja) * | 1995-04-13 | 2005-06-29 | 株式会社ニコン | 位置合わせ方法及び装置、並びに露光方法及び装置 |
JPH09199573A (ja) * | 1996-01-12 | 1997-07-31 | Canon Inc | 位置決めステージ装置およびこれを用いた露光装置 |
KR970062816A (ko) * | 1996-02-13 | 1997-09-12 | 박병재 | 헤드 램프를 이용한 엔진룸 조사 장치 |
DE69704998T2 (de) * | 1996-03-15 | 2001-09-27 | Asm Lithography Bv | Ausrichtungsvorrichtung und lithographischer apparat mit einer solchen vorrichtung |
WO1998048451A1 (fr) * | 1997-04-18 | 1998-10-29 | Nikon Corporation | Aligneur, procede d'exposition mettant en oeuvre ledit aligneur et procede de fabrication d'un dispositif de circuit |
WO1998057362A1 (fr) * | 1997-06-09 | 1998-12-17 | Nikon Corporation | Capteur et procede servant a detecter la position de la surface d'un objet, dispositif d'alignement comportant ce capteur et procede servant a fabriquer ce dispositif d'alignement et procede servant a fabriquer des dispositifs au moyen de ce dispositif d'alignement |
WO1999016113A1 (fr) * | 1997-09-19 | 1999-04-01 | Nikon Corporation | Platine, dispositif d'alignement de balayage et procede d'exposition de balayage, et dispositif fabrique par ce moyen |
TW522287B (en) * | 2000-01-14 | 2003-03-01 | Asml Netherlands Bv | Lithographic projection apparatus, method of calibrating a lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured thereby |
TW520469B (en) * | 2000-04-10 | 2003-02-11 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
-
2001
- 2001-01-09 TW TW090100449A patent/TW522287B/zh not_active IP Right Cessation
- 2001-01-12 DE DE60120000T patent/DE60120000T2/de not_active Expired - Lifetime
- 2001-01-12 KR KR1020010001862A patent/KR100606493B1/ko not_active IP Right Cessation
- 2001-01-12 JP JP2001004385A patent/JP3851780B2/ja not_active Expired - Fee Related
- 2001-01-12 US US09/758,172 patent/US6730920B2/en not_active Expired - Lifetime
-
2004
- 2004-04-02 US US10/815,651 patent/US20040184018A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP3851780B2 (ja) | 2006-11-29 |
JP2001244194A (ja) | 2001-09-07 |
TW522287B (en) | 2003-03-01 |
KR100606493B1 (ko) | 2006-08-01 |
US20010008273A1 (en) | 2001-07-19 |
DE60120000T2 (de) | 2006-10-19 |
US20040184018A1 (en) | 2004-09-23 |
KR20010088316A (ko) | 2001-09-26 |
US6730920B2 (en) | 2004-05-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |