DE60034611D1 - Vertikale Sicherung und deren Herstellungsverfahren - Google Patents

Vertikale Sicherung und deren Herstellungsverfahren

Info

Publication number
DE60034611D1
DE60034611D1 DE60034611T DE60034611T DE60034611D1 DE 60034611 D1 DE60034611 D1 DE 60034611D1 DE 60034611 T DE60034611 T DE 60034611T DE 60034611 T DE60034611 T DE 60034611T DE 60034611 D1 DE60034611 D1 DE 60034611D1
Authority
DE
Germany
Prior art keywords
manufacturing process
vertical fuse
fuse
vertical
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60034611T
Other languages
English (en)
Other versions
DE60034611T2 (de
Inventor
Stefan J Weber
Roy Iggulden
Chandrasekhar Narayan
Axel Christoph Brintzinger
Mark Hoinkis
Den Berg Robert Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qimonda AG
International Business Machines Corp
Original Assignee
Infineon Technologies AG
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG, International Business Machines Corp filed Critical Infineon Technologies AG
Application granted granted Critical
Publication of DE60034611D1 publication Critical patent/DE60034611D1/de
Publication of DE60034611T2 publication Critical patent/DE60034611T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/525—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections
    • H01L23/5256—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections comprising fuses, i.e. connections having their state changed from conductive to non-conductive
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Fuses (AREA)
DE60034611T 1999-02-23 2000-02-04 Vertikale Sicherung und deren Herstellungsverfahren Expired - Fee Related DE60034611T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/255,767 US6242789B1 (en) 1999-02-23 1999-02-23 Vertical fuse and method of fabrication
US255767 1999-02-23

Publications (2)

Publication Number Publication Date
DE60034611D1 true DE60034611D1 (de) 2007-06-14
DE60034611T2 DE60034611T2 (de) 2008-01-31

Family

ID=22969768

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60034611T Expired - Fee Related DE60034611T2 (de) 1999-02-23 2000-02-04 Vertikale Sicherung und deren Herstellungsverfahren

Country Status (7)

Country Link
US (2) US6242789B1 (de)
EP (1) EP1032039B1 (de)
JP (1) JP2000243213A (de)
KR (1) KR100374214B1 (de)
CN (1) CN1188912C (de)
DE (1) DE60034611T2 (de)
TW (1) TW448561B (de)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19926107C1 (de) * 1999-06-08 2000-11-16 Siemens Ag Halbleiteranordnung mit einer Fuse und ihr Herstellungsverfahren
KR100340906B1 (ko) * 1999-08-23 2002-06-20 박종섭 반도체 장치의 퓨즈 구조
KR100359158B1 (ko) * 1999-12-30 2002-10-31 주식회사 하이닉스반도체 반도체소자의 퓨즈 형성방법
DE10030444A1 (de) * 2000-06-22 2002-01-10 Infineon Technologies Ag Verfahren zur Herstellung einer dielektrischen Antifuse-Struktur
US6584029B2 (en) * 2001-08-09 2003-06-24 Hewlett-Packard Development Company, L.P. One-time programmable memory using fuse/anti-fuse and vertically oriented fuse unit memory cells
US6580144B2 (en) * 2001-09-28 2003-06-17 Hewlett-Packard Development Company, L.P. One time programmable fuse/anti-fuse combination based memory cell
US6611039B2 (en) * 2001-09-28 2003-08-26 Hewlett-Packard Development Company, L.P. Vertically oriented nano-fuse and nano-resistor circuit elements
US6927472B2 (en) * 2001-11-14 2005-08-09 International Business Machines Corporation Fuse structure and method to form the same
US6444503B1 (en) 2002-02-07 2002-09-03 Taiwan Semiconductor Manufacturing Company Fabricating electrical metal fuses without additional masking
US7535078B2 (en) * 2002-02-14 2009-05-19 Freescale Semiconductor, Inc. Semiconductor device having a fuse and method of forming thereof
US7067897B2 (en) * 2002-02-19 2006-06-27 Kabushiki Kaisha Toshiba Semiconductor device
KR100449029B1 (ko) * 2002-04-04 2004-09-16 삼성전자주식회사 패드영역에 퓨즈박스를 구비한 반도체 장치 및 그의제조방법
US6828652B2 (en) 2002-05-07 2004-12-07 Infineon Technologies Ag Fuse structure for semiconductor device
JP2005109116A (ja) * 2003-09-30 2005-04-21 Oki Electric Ind Co Ltd 半導体装置及びその製造方法
KR100621773B1 (ko) * 2005-02-07 2006-09-14 삼성전자주식회사 전기적 퓨즈 회로 및 레이아웃 방법
KR100735529B1 (ko) * 2006-02-09 2007-07-04 삼성전자주식회사 반도체 메모리 소자 및 그 제조 방법
JP2007258371A (ja) * 2006-03-22 2007-10-04 Elpida Memory Inc ヒューズ素子を有する半導体装置及びヒューズ素子の切断方法
US20070252238A1 (en) * 2006-04-27 2007-11-01 Charles Lin Tungstein plug as fuse for IC device
JP4861051B2 (ja) * 2006-05-09 2012-01-25 ルネサスエレクトロニクス株式会社 半導体装置および電気ヒューズの切断方法
JP4861060B2 (ja) * 2006-06-01 2012-01-25 ルネサスエレクトロニクス株式会社 半導体装置および電気ヒューズの切断方法
US7470929B2 (en) * 2006-07-24 2008-12-30 International Business Machines Corporation Fuse/anti-fuse structure and methods of making and programming same
DE102006043484B4 (de) * 2006-09-15 2019-11-28 Infineon Technologies Ag Fuse-Struktur und Verfahren zum Herstellen derselben
US7785934B2 (en) 2007-02-28 2010-08-31 International Business Machines Corporation Electronic fuses in semiconductor integrated circuits
JP5283975B2 (ja) * 2007-06-07 2013-09-04 ルネサスエレクトロニクス株式会社 半導体記憶装置ならびにそのデータ書込方法およびデータ読出方法
US7671444B2 (en) * 2007-06-25 2010-03-02 International Business Machines Corporation Empty vias for electromigration during electronic-fuse re-programming
US8232190B2 (en) * 2007-10-01 2012-07-31 International Business Machines Corporation Three dimensional vertical E-fuse structures and methods of manufacturing the same
US10600902B2 (en) * 2008-02-13 2020-03-24 Vishay SIliconix, LLC Self-repairing field effect transisitor
US8609534B2 (en) 2010-09-27 2013-12-17 International Business Machines Corporation Electrical fuse structure and method of fabricating same
US8299567B2 (en) * 2010-11-23 2012-10-30 International Business Machines Corporation Structure of metal e-fuse
US8633707B2 (en) * 2011-03-29 2014-01-21 International Business Machines Corporation Stacked via structure for metal fuse applications
US8922328B2 (en) * 2011-08-16 2014-12-30 United Microelectronics Corp. Electrical fuse structure
US8962467B2 (en) 2012-02-17 2015-02-24 International Business Machines Corporation Metal fuse structure for improved programming capability
US8916461B2 (en) 2012-09-20 2014-12-23 International Business Machines Corporation Electronic fuse vias in interconnect structures
US8921167B2 (en) 2013-01-02 2014-12-30 International Business Machines Corporation Modified via bottom for BEOL via efuse
US9059170B2 (en) * 2013-02-06 2015-06-16 International Business Machines Corporation Electronic fuse having a damaged region
US8896090B2 (en) 2013-02-22 2014-11-25 International Business Machines Corporation Electrical fuses and methods of making electrical fuses
CN104103460B (zh) * 2013-04-03 2016-04-27 功得电子工业股份有限公司 垂直绕线中空保险丝的制法
US9646929B2 (en) 2013-06-13 2017-05-09 GlobalFoundries, Inc. Making an efuse
US9666528B1 (en) 2016-02-23 2017-05-30 International Business Machines Corporation BEOL vertical fuse formed over air gap
US9728542B1 (en) * 2016-05-25 2017-08-08 International Business Machines Corporation High density programmable e-fuse co-integrated with vertical FETs
US10483201B1 (en) 2018-10-26 2019-11-19 Nanya Technology Corporation Semiconductor structure and method for manufacturing the same
CN111223839A (zh) * 2020-01-17 2020-06-02 上海华力微电子有限公司 一种efuse熔丝的版图结构
US11239160B2 (en) 2020-06-16 2022-02-01 International Business Machines Corporation E-fuse with dielectric zipping

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5833865A (ja) * 1981-08-24 1983-02-28 Toshiba Corp 半導体記憶装置及びその製造方法
JP2593471B2 (ja) * 1987-03-11 1997-03-26 株式会社東芝 半導体装置
US5451811A (en) * 1991-10-08 1995-09-19 Aptix Corporation Electrically programmable interconnect element for integrated circuits
US5264725A (en) * 1992-12-07 1993-11-23 Micron Semiconductor, Inc. Low-current polysilicon fuse
KR100297222B1 (ko) * 1997-01-14 2001-08-07 가네꼬 히사시 반도체장치및그제조방법
US6100118A (en) * 1998-06-11 2000-08-08 Taiwan Semiconductor Manufacturing Company, Ltd. Fabrication of metal fuse design for redundancy technology having a guard ring

Also Published As

Publication number Publication date
JP2000243213A (ja) 2000-09-08
DE60034611T2 (de) 2008-01-31
KR20000058155A (ko) 2000-09-25
CN1275807A (zh) 2000-12-06
US6218279B1 (en) 2001-04-17
KR100374214B1 (ko) 2003-03-03
TW448561B (en) 2001-08-01
EP1032039B1 (de) 2007-05-02
EP1032039A3 (de) 2000-12-20
CN1188912C (zh) 2005-02-09
US6242789B1 (en) 2001-06-05
EP1032039A2 (de) 2000-08-30

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: QIMONDA AG, 81739 MUENCHEN, DE

Owner name: INTERNATIONAL BUSINESS MACHINES CORP., ARMONK,, US

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee