DE3888666T2 - Polyimid-Harz und Isolationsschicht für elektrische oder elektronische Geräte. - Google Patents

Polyimid-Harz und Isolationsschicht für elektrische oder elektronische Geräte.

Info

Publication number
DE3888666T2
DE3888666T2 DE19883888666 DE3888666T DE3888666T2 DE 3888666 T2 DE3888666 T2 DE 3888666T2 DE 19883888666 DE19883888666 DE 19883888666 DE 3888666 T DE3888666 T DE 3888666T DE 3888666 T2 DE3888666 T2 DE 3888666T2
Authority
DE
Germany
Prior art keywords
electrical
electronic devices
insulation layer
polyimide resin
polyimide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE19883888666
Other languages
English (en)
Other versions
DE3888666D1 (de
Inventor
Noriaki Nissan Chemical Kohtoh
Takashi Nissan Chemi Kobayashi
Masahiko Nissan Chemica Yukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63001935A external-priority patent/JPH0682649B2/ja
Priority claimed from JP63172157A external-priority patent/JP2843333B2/ja
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Application granted granted Critical
Publication of DE3888666D1 publication Critical patent/DE3888666D1/de
Publication of DE3888666T2 publication Critical patent/DE3888666T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1046—Polyimides containing oxygen in the form of ether bonds in the main chain
    • C08G73/105—Polyimides containing oxygen in the form of ether bonds in the main chain with oxygen only in the diamino moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/1064—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/303—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups H01B3/38 or H01B3/302
    • H01B3/306—Polyimides or polyesterimides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293—Organic, e.g. plastic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
    • H01L23/556—Protection against radiation, e.g. light or electromagnetic waves against alpha rays
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/51—Insulating materials associated therewith
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31721—Of polyimide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Ceramic Engineering (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Organic Insulating Materials (AREA)
DE19883888666 1988-01-08 1988-12-29 Polyimid-Harz und Isolationsschicht für elektrische oder elektronische Geräte. Expired - Fee Related DE3888666T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63001935A JPH0682649B2 (ja) 1988-01-08 1988-01-08 電気・電子デバイス用絶縁膜
JP63172157A JP2843333B2 (ja) 1988-07-11 1988-07-11 低熱膨張性ポリイミド

Publications (2)

Publication Number Publication Date
DE3888666D1 DE3888666D1 (de) 1994-04-28
DE3888666T2 true DE3888666T2 (de) 1994-11-03

Family

ID=26335228

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19883888666 Expired - Fee Related DE3888666T2 (de) 1988-01-08 1988-12-29 Polyimid-Harz und Isolationsschicht für elektrische oder elektronische Geräte.
DE19883856028 Expired - Fee Related DE3856028T2 (de) 1988-01-08 1988-12-29 Elektrische und elektronische Geräte mit einer Polyimidharzisolationschicht

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE19883856028 Expired - Fee Related DE3856028T2 (de) 1988-01-08 1988-12-29 Elektrische und elektronische Geräte mit einer Polyimidharzisolationschicht

Country Status (4)

Country Link
US (2) US5059677A (de)
EP (2) EP0564009B1 (de)
KR (1) KR0136275B1 (de)
DE (2) DE3888666T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3941680A1 (de) * 1989-12-18 1991-06-20 Telefunken Electronic Gmbh Kunststoffgehaeuse fuer elektronische bauteile
US5260413A (en) * 1990-02-05 1993-11-09 E. I. Du Pont De Nemours And Company Coated, heat-sealable aromatic polyimide film having superior compressive strength
US5536584A (en) * 1992-01-31 1996-07-16 Hitachi, Ltd. Polyimide precursor, polyimide and metalization structure using said polyimide
JP3117103B2 (ja) * 1992-06-23 2000-12-11 日産化学工業株式会社 新規な垂直配向処理剤
JP3203626B2 (ja) * 1992-09-07 2001-08-27 日産化学工業株式会社 液晶セル用配向処理剤
US5711987A (en) * 1996-10-04 1998-01-27 Dow Corning Corporation Electronic coatings
US6982504B2 (en) * 2003-01-24 2006-01-03 Gsi Group Corporation Galvanometer motor with composite stator assembly
JP4375533B2 (ja) * 2003-06-26 2009-12-02 三菱瓦斯化学株式会社 溶媒可溶性ポリイミドの製造方法
CN101146848B (zh) * 2005-03-29 2011-07-06 日产化学工业株式会社 聚酰胺酸、聚酰亚胺及其制备方法
JP2007308676A (ja) * 2006-04-18 2007-11-29 Mitsubishi Gas Chem Co Inc 熱硬化性ポリイミド樹脂組成物及びその硬化物
JP2009019105A (ja) 2007-07-11 2009-01-29 Nitto Denko Corp ポリイミドからなる光半導体素子封止用樹脂
TW200923034A (en) * 2007-09-20 2009-06-01 Nippon Kayaku Kk Primer resin for semiconductor device and semiconductor device
KR20210084736A (ko) * 2019-12-27 2021-07-08 삼성전자주식회사 반도체 패키지

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2702121C3 (de) * 1977-01-20 1981-12-03 Dr. Beck & Co Ag, 2000 Hamburg Wäßrige Elektroisolierlacke, insbesondere Drahtlacke
US4358579A (en) * 1981-07-24 1982-11-09 Standard Oil Company (Indiana) Polyimides from tetramethylcyclobutane-1,2,3,4,-tetracarboxylic dianhydride and diamines
JPS606726A (ja) * 1983-06-25 1985-01-14 Nissan Chem Ind Ltd 新規ポリイミド樹脂及びその製造法
US4681928A (en) * 1984-06-01 1987-07-21 M&T Chemicals Inc. Poly(amide-amide acid), polyamide acid, poly(esteramide acid), poly(amide-imide), polyimide, poly(esterimide) from poly arylene diamine
JPH06100755B2 (ja) * 1986-06-18 1994-12-12 日産化学工業株式会社 液晶セル用配向処理剤

Also Published As

Publication number Publication date
US5070182A (en) 1991-12-03
EP0323644B1 (de) 1994-03-23
KR890011921A (ko) 1989-08-23
EP0564009A1 (de) 1993-10-06
DE3856028T2 (de) 1998-02-05
DE3856028D1 (de) 1997-10-23
US5059677A (en) 1991-10-22
EP0323644A1 (de) 1989-07-12
DE3888666D1 (de) 1994-04-28
KR0136275B1 (ko) 1998-04-25
EP0564009B1 (de) 1997-09-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee