DE3852987T2 - Silizium enthaltendes Polyimid-Prepolymer, davon abgeleitete ausgehärtete Produkte und Verfahren zu deren Herstellung. - Google Patents

Silizium enthaltendes Polyimid-Prepolymer, davon abgeleitete ausgehärtete Produkte und Verfahren zu deren Herstellung.

Info

Publication number
DE3852987T2
DE3852987T2 DE3852987T DE3852987T DE3852987T2 DE 3852987 T2 DE3852987 T2 DE 3852987T2 DE 3852987 T DE3852987 T DE 3852987T DE 3852987 T DE3852987 T DE 3852987T DE 3852987 T2 DE3852987 T2 DE 3852987T2
Authority
DE
Germany
Prior art keywords
silicon
processes
production
derived therefrom
products derived
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3852987T
Other languages
English (en)
Other versions
DE3852987D1 (de
Inventor
Koichi Kunimune
Haruo Kato
Yoshiya Kutsuzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JNC Corp
Original Assignee
Chisso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP62283728A external-priority patent/JP2628322B2/ja
Priority claimed from JP62285050A external-priority patent/JP2607104B2/ja
Application filed by Chisso Corp filed Critical Chisso Corp
Publication of DE3852987D1 publication Critical patent/DE3852987D1/de
Application granted granted Critical
Publication of DE3852987T2 publication Critical patent/DE3852987T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/106Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42Block-or graft-polymers containing polysiloxane sequences
    • C08G77/452Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
    • C08G77/455Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences containing polyamide, polyesteramide or polyimide sequences

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
DE3852987T 1987-11-10 1988-11-09 Silizium enthaltendes Polyimid-Prepolymer, davon abgeleitete ausgehärtete Produkte und Verfahren zu deren Herstellung. Expired - Fee Related DE3852987T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62283728A JP2628322B2 (ja) 1987-11-10 1987-11-10 シリコン含有可溶性ポリイミド前駆体及びその製造法
JP62285050A JP2607104B2 (ja) 1987-11-11 1987-11-11 シリコン含有ポリイミド硬化物及びその製造法

Publications (2)

Publication Number Publication Date
DE3852987D1 DE3852987D1 (de) 1995-03-23
DE3852987T2 true DE3852987T2 (de) 1995-06-01

Family

ID=26555170

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3852987T Expired - Fee Related DE3852987T2 (de) 1987-11-10 1988-11-09 Silizium enthaltendes Polyimid-Prepolymer, davon abgeleitete ausgehärtete Produkte und Verfahren zu deren Herstellung.

Country Status (4)

Country Link
US (1) US4970283A (de)
EP (1) EP0316154B1 (de)
KR (1) KR910008341B1 (de)
DE (1) DE3852987T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2619515B2 (ja) * 1989-02-02 1997-06-11 チッソ株式会社 シリコンポリイミド前駆体組成物
KR0159287B1 (ko) * 1991-01-24 1999-01-15 윤종용 실록산 변성 폴리이미드 수지의 제조방법
JPH04351667A (ja) * 1991-05-29 1992-12-07 Shin Etsu Chem Co Ltd 硬化性樹脂組成物及び電子部品用保護膜
US5300627A (en) * 1991-10-17 1994-04-05 Chisso Corporation Adhesive polyimide film
US5241041A (en) * 1991-12-16 1993-08-31 Occidental Chemical Corporation Photocrosslinkable polyimide ammonium salts
JP2722915B2 (ja) * 1992-01-17 1998-03-09 信越化学工業株式会社 硬化性樹脂及びその製造方法並びに電子部品用保護膜
SG52916A1 (en) * 1996-02-13 1998-09-28 Nitto Denko Corp Circuit substrate circuit-formed suspension substrate and production method thereof
KR101543478B1 (ko) * 2010-12-31 2015-08-10 코오롱인더스트리 주식회사 투명 폴리이미드 필름 및 그 제조방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3948835A (en) * 1973-06-07 1976-04-06 Ciba-Geigy Corporation Silicon-modified prepolymers
US3950308A (en) * 1973-06-07 1976-04-13 Ciba-Geigy Corporation Crosslinked polymers containing siloxane groups
US3926911A (en) * 1973-06-07 1975-12-16 Ciba Geigy Corp Crosslinked polymers containing siloxane groups
JPS61108627A (ja) * 1984-11-02 1986-05-27 Chisso Corp 可溶性ポリイミドシロキサン前駆体及びその製造方法
US4499252A (en) * 1984-03-28 1985-02-12 Nitto Electric Industrial Co., Ltd. Process for producing polyimide precursor
JPH0610260B2 (ja) * 1984-10-29 1994-02-09 チッソ株式会社 シリコ−ンポリイミド前駆体の製法
JPS61207438A (ja) * 1985-03-11 1986-09-13 Chisso Corp 可溶性ポリイミドシロキサン前駆体及びその製造方法
JPH0617474B2 (ja) * 1985-05-31 1994-03-09 チッソ株式会社 高接着性シリコン含有ポリアミド酸の製造法
US4609700A (en) * 1985-06-19 1986-09-02 Chisso Corporation Soluble imide oligomer and a method for producing the same
JPH0768347B2 (ja) * 1985-09-25 1995-07-26 株式会社日立製作所 有機ケイ素末端ポリイミド前駆体とポリイミドの製造方法
JPS62265326A (ja) * 1986-05-12 1987-11-18 Chisso Corp 塗膜性良好な可溶性ポリイミドシロキサン前駆体の製造法及び硬化物の製造法
JPS6315223A (ja) * 1986-07-08 1988-01-22 Chisso Corp 液晶配向膜用塗布液及び加熱により形成された液晶配向膜

Also Published As

Publication number Publication date
EP0316154A2 (de) 1989-05-17
EP0316154A3 (en) 1989-08-16
DE3852987D1 (de) 1995-03-23
EP0316154B1 (de) 1995-02-08
US4970283A (en) 1990-11-13
KR910008341B1 (ko) 1991-10-12
KR890008205A (ko) 1989-07-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee