DE3856054D1 - Reflexionsmaske - Google Patents

Reflexionsmaske

Info

Publication number
DE3856054D1
DE3856054D1 DE3856054T DE3856054T DE3856054D1 DE 3856054 D1 DE3856054 D1 DE 3856054D1 DE 3856054 T DE3856054 T DE 3856054T DE 3856054 T DE3856054 T DE 3856054T DE 3856054 D1 DE3856054 D1 DE 3856054D1
Authority
DE
Germany
Prior art keywords
reflection mask
mask
reflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3856054T
Other languages
English (en)
Other versions
DE3856054T2 (de
Inventor
Tsutomu Ikeda
Yutaka Watanabe
Masayuki Suzuki
Masami Hayashida
Yasuaki Fukuda
Shigetaro Ogura
Takashi Iizuka
Masahito Niibe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP3352387A external-priority patent/JPH0727198B2/ja
Priority claimed from JP33522287A external-priority patent/JP2545905B2/ja
Priority claimed from JP62335220A external-priority patent/JPH01175734A/ja
Priority claimed from JP33522387A external-priority patent/JP2546312B2/ja
Priority claimed from JP62335221A external-priority patent/JPH01175735A/ja
Priority claimed from JP1213688A external-priority patent/JP2615741B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE3856054D1 publication Critical patent/DE3856054D1/de
Publication of DE3856054T2 publication Critical patent/DE3856054T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE3856054T 1987-02-18 1988-02-18 Reflexionsmaske Expired - Lifetime DE3856054T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP3352387A JPH0727198B2 (ja) 1987-02-18 1987-02-18 多層膜反射型マスク
JP33522287A JP2545905B2 (ja) 1987-12-29 1987-12-29 反射型マスクならびにこれを用いた露光方法
JP62335220A JPH01175734A (ja) 1987-12-29 1987-12-29 反射型マスク及びその製造方法
JP33522387A JP2546312B2 (ja) 1987-12-29 1987-12-29 反射型マスクおよび該反射型マスクを用いた露光装置と露光方法
JP62335221A JPH01175735A (ja) 1987-12-29 1987-12-29 反射型マスク及びその製造方法
JP1213688A JP2615741B2 (ja) 1988-01-22 1988-01-22 反射型マスクならびにこれを用いた露光装置と露光方法

Publications (2)

Publication Number Publication Date
DE3856054D1 true DE3856054D1 (de) 1997-12-04
DE3856054T2 DE3856054T2 (de) 1998-03-19

Family

ID=27548393

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3856054T Expired - Lifetime DE3856054T2 (de) 1987-02-18 1988-02-18 Reflexionsmaske

Country Status (3)

Country Link
US (1) US5052033A (de)
EP (1) EP0279670B1 (de)
DE (1) DE3856054T2 (de)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0797216B2 (ja) * 1986-10-29 1995-10-18 インタ−ナショナル・ビジネス・マシ−ンズ・コ−ポレ−ション マスクの製造方法
US4923772A (en) * 1986-10-29 1990-05-08 Kirch Steven J High energy laser mask and method of making same
FR2653234A1 (fr) * 1989-10-13 1991-04-19 Philips Electronique Lab Dispositif du type miroir dans le domaine des rayons x-uv.
US5182763A (en) * 1989-12-28 1993-01-26 Canon Kabushiki Kaisha Reflection device
JPH03266842A (ja) * 1990-03-16 1991-11-27 Fujitsu Ltd 反射型ホトリソグラフィ方法、反射型ホトリソグラフィ装置および反射型ホトマスク
JP2599513B2 (ja) * 1990-06-25 1997-04-09 インターナショナル・ビジネス・マシーンズ・コーポレイション アブレーション・マスク
JP2979667B2 (ja) * 1991-01-23 1999-11-15 株式会社ニコン 反射型のｘ線露光用マスク
JP3025545B2 (ja) * 1991-03-18 2000-03-27 キヤノン株式会社 Ｘ線リソグラフィ用マスクおよびｘ線リソグラフィ露光装置
US5335256A (en) * 1991-03-18 1994-08-02 Canon Kabushiki Kaisha Semiconductor substrate including a single or multi-layer film having different densities in the thickness direction
JP3047541B2 (ja) * 1991-08-22 2000-05-29 株式会社日立製作所 反射型マスクおよび欠陥修正方法
CA2077572C (en) * 1991-09-07 1998-08-18 Masahito Niibe Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductr devices
US5485497A (en) * 1991-11-12 1996-01-16 Hitachi, Ltd. Optical element and projection exposure apparatus employing the same
JP3012069B2 (ja) * 1991-12-04 2000-02-21 キヤノン株式会社 Ｘ線露光用マスク構造体及びこれを用いたｘ線露光装置
JPH07117605B2 (ja) * 1992-03-13 1995-12-18 日本ピラー工業株式会社 回折格子
JPH05281704A (ja) * 1992-04-02 1993-10-29 Nec Corp 半導体集積回路用ホトマスク
US5304437A (en) * 1992-04-03 1994-04-19 At&T Bell Laboratories Mask for x-ray pattern delineation
JPH0689848A (ja) * 1992-07-20 1994-03-29 Canon Inc Ｘ線マスク構造体の作製方法及び該作製方法により作製されたｘ線マスク構造体、並びに該ｘ線マスク構造体を用い作製されたデバイス
US5307395A (en) * 1992-09-30 1994-04-26 The United States Of America As Represented By The Secretary Of The Navy Low-damage multilayer mirror for the soft X-ray region
JP3219502B2 (ja) * 1992-12-01 2001-10-15 キヤノン株式会社 反射型マスクとその製造方法、並びに露光装置と半導体デバイス製造方法
US5356662A (en) * 1993-01-05 1994-10-18 At&T Bell Laboratories Method for repairing an optical element which includes a multilayer coating
JPH0772318A (ja) * 1993-04-28 1995-03-17 Canon Inc 反射装置とこれを用いた照明装置や露光装置、並びにデバイス製造方法
JPH07240364A (ja) * 1994-03-02 1995-09-12 Canon Inc 反射型マスク、その製造方法及び該マスクを用いた露光装置
US5827622A (en) * 1995-11-02 1998-10-27 International Business Machines Corporation Reflective lithographic mask
WO1997033203A1 (en) * 1996-03-07 1997-09-12 Philips Electronics N.V. Imaging system and apparatus for ultraviolet lithography
JP3814359B2 (ja) 1996-03-12 2006-08-30 キヤノン株式会社 Ｘ線投影露光装置及びデバイス製造方法
US6317479B1 (en) * 1996-05-17 2001-11-13 Canon Kabushiki Kaisha X-ray mask, and exposure method and apparatus using the same
JP3774522B2 (ja) * 1996-12-24 2006-05-17 キヤノン株式会社 回折光学素子及びそれを有する光学機器
US5978441A (en) * 1997-12-01 1999-11-02 Advanced Micro Devices, Inc. Extreme ultraviolet lithography mask blank and manufacturing method therefor
WO2000003341A1 (en) * 1998-07-10 2000-01-20 Ball Semiconductor, Inc. A method and system for generating a flat mask onto a three-dimensional surface
US6316150B1 (en) * 1998-08-24 2001-11-13 Euv Llc Low thermal distortion extreme-UV lithography reticle
AU5932500A (en) 1999-07-22 2001-02-13 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method and mask devices
US6596465B1 (en) 1999-10-08 2003-07-22 Motorola, Inc. Method of manufacturing a semiconductor component
AU2807401A (en) * 1999-11-29 2001-06-12 Tohoku Techno Arch Co., Ltd. Optical element such as multilayer film reflection mirror, production method therefor and device using it
US7261957B2 (en) * 2000-03-31 2007-08-28 Carl Zeiss Smt Ag Multilayer system with protecting layer system and production method
DE10016008A1 (de) * 2000-03-31 2001-10-11 Zeiss Carl Villagensystem und dessen Herstellung
US20070281109A1 (en) * 2000-03-31 2007-12-06 Carl Zeiss Smt Ag Multilayer system with protecting layer system and production method
US6625251B2 (en) * 2000-09-22 2003-09-23 Ntt Advanced Technology Corporation Laser plasma x-ray generation apparatus
US6821682B1 (en) * 2000-09-26 2004-11-23 The Euv Llc Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography
US6776006B2 (en) 2000-10-13 2004-08-17 Corning Incorporated Method to avoid striae in EUV lithography mirrors
JP2002245947A (ja) * 2000-12-15 2002-08-30 Canon Inc 細線を有する基板及びその製造方法及び電子源基板及び画像表示装置
US6635391B2 (en) * 2000-12-28 2003-10-21 The Regents Of The University Of California Method for fabricating reticles for EUV lithography without the use of a patterned absorber
JP2002299228A (ja) * 2001-04-03 2002-10-11 Nikon Corp レチクル、それを用いた露光装置及び露光方法
DE10123768C2 (de) * 2001-05-16 2003-04-30 Infineon Technologies Ag Verfahren zur Herstellung einer lithographischen Reflexionsmaske insbesondere für die Strukturierung eines Halbleiterwafers sowie Reflexionsmaske
US7053988B2 (en) 2001-05-22 2006-05-30 Carl Zeiss Smt Ag. Optically polarizing retardation arrangement, and microlithography projection exposure machine
US6967168B2 (en) * 2001-06-29 2005-11-22 The Euv Limited Liability Corporation Method to repair localized amplitude defects in a EUV lithography mask blank
US6673520B2 (en) 2001-08-24 2004-01-06 Motorola, Inc. Method of making an integrated circuit using a reflective mask
US6653053B2 (en) 2001-08-27 2003-11-25 Motorola, Inc. Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask
DE10155112B4 (de) * 2001-11-09 2006-02-02 Infineon Technologies Ag Reflexionsmaske für die EUV-Lithographie und Herstellungsverfahren dafür
US6986971B2 (en) * 2002-11-08 2006-01-17 Freescale Semiconductor, Inc. Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same
DE10259331B4 (de) * 2002-12-18 2005-02-10 Infineon Technologies Ag Herstellungsverfahren für eine Photomaske für eine integrierte Schaltung und entsprechende Photomaske
DE10261137A1 (de) * 2002-12-21 2004-07-15 Carl Zeiss Smt Ag Projektionsoptik für die Lithographie und Spiegel für eine solche
US7026076B2 (en) * 2003-03-03 2006-04-11 Freescale Semiconductor, Inc. Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC
US6875546B2 (en) * 2003-03-03 2005-04-05 Freescale Semiconductor, Inc. Method of patterning photoresist on a wafer using an attenuated phase shift mask
US6986974B2 (en) * 2003-10-16 2006-01-17 Freescale Semiconductor, Inc. Attenuated phase shift mask for extreme ultraviolet lithography and method therefore
JP2005302963A (ja) * 2004-04-09 2005-10-27 Canon Inc 露光装置
JP2006049837A (ja) * 2004-06-30 2006-02-16 Canon Inc 厚膜部材パターンの製造方法
US7485410B2 (en) * 2004-06-30 2009-02-03 Canon Kabushiki Kaisha Method of manufacturing thick dielectric pattern and method of manufacturing image displaying apparatus
KR100607201B1 (ko) * 2005-01-04 2006-08-01 삼성전자주식회사 극자외선 리소그래피 공정에서 웨이퍼 상의 임계 치수편차를 보정하는 방법
ATE526679T1 (de) * 2006-12-27 2011-10-15 Asahi Glass Co Ltd Reflexionsmaskenrohling für euv-lithographie
WO2008093534A1 (ja) * 2007-01-31 2008-08-07 Asahi Glass Company, Limited Ｅｕｖリソグラフィ用反射型マスクブランク
WO2010020337A1 (en) 2008-08-21 2010-02-25 Asml Holding Nv Euv reticle substrates with high thermal conductivity
US9195132B2 (en) * 2014-01-30 2015-11-24 Globalfoundries Inc. Mask structures and methods of manufacturing

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57106031A (en) * 1980-12-23 1982-07-01 Toshiba Corp Transferring device for fine pattern
US4693933A (en) * 1983-06-06 1987-09-15 Ovonic Synthetic Materials Company, Inc. X-ray dispersive and reflective structures and method of making the structures
JPS60173551A (ja) * 1984-02-20 1985-09-06 Hideki Matsumura Ｘ線など光線の反射投影によるパタ−ン転写法
DE3790178T1 (de) * 1986-03-28 1988-04-21
EP0947882B1 (de) * 1986-07-11 2006-03-29 Canon Kabushiki Kaisha Verkleinerndes Projektionsbelichtungssystem des Reflexionstyps für Röntgenstrahlung
US4923772A (en) * 1986-10-29 1990-05-08 Kirch Steven J High energy laser mask and method of making same

Also Published As

Publication number Publication date
EP0279670A3 (de) 1990-03-14
EP0279670A2 (de) 1988-08-24
DE3856054T2 (de) 1998-03-19
US5052033A (en) 1991-09-24
EP0279670B1 (de) 1997-10-29

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