DE3856089D1 - Fotomasken - Google Patents

Fotomasken

Info

Publication number
DE3856089D1
DE3856089D1 DE3856089T DE3856089T DE3856089D1 DE 3856089 D1 DE3856089 D1 DE 3856089D1 DE 3856089 T DE3856089 T DE 3856089T DE 3856089 T DE3856089 T DE 3856089T DE 3856089 D1 DE3856089 D1 DE 3856089D1
Authority
DE
Germany
Prior art keywords
photomasks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3856089T
Other languages
English (en)
Other versions
DE3856089T2 (de
Inventor
Kenji Ohta
Junji Hirokane
Akira Shibata
Kazuo Van
Tetsuya Inui
Yoshiyuki Nagahara
Michinobu Mieda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP24665587A external-priority patent/JPS6488551A/ja
Priority claimed from JP24665487A external-priority patent/JPS6488550A/ja
Priority claimed from JP24665387A external-priority patent/JPH0652421B2/ja
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of DE3856089D1 publication Critical patent/DE3856089D1/de
Application granted granted Critical
Publication of DE3856089T2 publication Critical patent/DE3856089T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE3856089T 1987-09-30 1988-09-30 Fotomasken Expired - Fee Related DE3856089T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP24665587A JPS6488551A (en) 1987-09-30 1987-09-30 Photomask
JP24665487A JPS6488550A (en) 1987-09-30 1987-09-30 Photomask
JP24665387A JPH0652421B2 (ja) 1987-09-30 1987-09-30 フォトマスク

Publications (2)

Publication Number Publication Date
DE3856089D1 true DE3856089D1 (de) 1998-01-29
DE3856089T2 DE3856089T2 (de) 1998-06-18

Family

ID=27333504

Family Applications (2)

Application Number Title Priority Date Filing Date
DE3889053T Expired - Fee Related DE3889053T2 (de) 1987-09-30 1988-09-30 Photomasken.
DE3856089T Expired - Fee Related DE3856089T2 (de) 1987-09-30 1988-09-30 Fotomasken

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE3889053T Expired - Fee Related DE3889053T2 (de) 1987-09-30 1988-09-30 Photomasken.

Country Status (3)

Country Link
EP (2) EP0574092B1 (de)
CA (1) CA1315023C (de)
DE (2) DE3889053T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0770094B2 (ja) * 1987-12-04 1995-07-31 シャープ株式会社 ディスク状光記録媒体の製造方法および製造用フォトマスク
CA2066070A1 (en) * 1991-04-18 1992-10-19 Felix P. Shvartsman Method for read-only optically readable media
EP1055153B1 (de) * 1998-12-14 2012-01-18 Nxp B.V. Photomaske die in ihrem rand einen gegen statische entladung schützenden ring aufweist
US6376131B1 (en) * 2000-04-04 2002-04-23 Xilinx, Inc. Methods and structures for protecting reticles from ESD failure
EP1248148A1 (de) * 2001-04-05 2002-10-09 Asm Lithography B.V. Lithographische Maske mit Schutzschicht

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2438467B2 (de) * 1974-08-09 1978-04-27 Siemens Ag, 1000 Berlin Und 8000 Muenchen Druckwerkzeug zur Verwendung in einem Fotodruckverfahren
JPS5423473A (en) * 1977-07-25 1979-02-22 Cho Lsi Gijutsu Kenkyu Kumiai Photomask and method of inspecting mask pattern using same
JPS55129347A (en) * 1979-03-28 1980-10-07 Chiyou Lsi Gijutsu Kenkyu Kumiai Photomask
JPS6063537A (ja) * 1983-09-19 1985-04-11 Hitachi Ltd ホト加工用原版
JPS6086545A (ja) * 1983-10-17 1985-05-16 Fujitsu Ltd マスク保護膜
JPS6087327A (ja) * 1983-10-19 1985-05-17 Akai Electric Co Ltd クロムマスクの製造方法
JPS60166949A (ja) * 1984-02-09 1985-08-30 Matsushita Electronics Corp フオトマスク
JPS6381352A (ja) * 1986-09-26 1988-04-12 Hitachi Ltd 光学マスク

Also Published As

Publication number Publication date
EP0310412A2 (de) 1989-04-05
DE3889053T2 (de) 1994-07-21
EP0310412B1 (de) 1994-04-13
DE3889053D1 (de) 1994-05-19
EP0310412A3 (en) 1990-08-01
DE3856089T2 (de) 1998-06-18
CA1315023C (en) 1993-03-23
EP0574092B1 (de) 1997-12-17
EP0574092A1 (de) 1993-12-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee