JPS6488550A - Photomask - Google Patents
PhotomaskInfo
- Publication number
- JPS6488550A JPS6488550A JP24665487A JP24665487A JPS6488550A JP S6488550 A JPS6488550 A JP S6488550A JP 24665487 A JP24665487 A JP 24665487A JP 24665487 A JP24665487 A JP 24665487A JP S6488550 A JPS6488550 A JP S6488550A
- Authority
- JP
- Japan
- Prior art keywords
- light shielding
- shielding films
- films
- mask substrate
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To obtain a photomask with which the exfoliation of light shielding films is prevented and the chipping of a mask pattern hardly arises by providing a light transmissive protective film covering the light shielding films on the surface of the light shielding films of the photomask formed by providing the light shielding films forming the mask pattern on a light transmissive mask substrate. CONSTITUTION:Plural metallic films 2 which are the light shielding films are embedded into the upper part of the mask substrate 1. These metallic films 2 form the mask pattern and act to shut off light for exposing such as UV rays projected on the mask substrate 1. A light transmissive SiO2 film 3 which is the protective film is provided on the mask substrate 1 and the metallic films 2. The thickness of the SiO2 film 3 is preferably about 30-300nm. The function to protect the metallic films 2 degrades if the film is too thin and the accuracy of the pattern transfer degrades if the film is too thick. The light shielding films provided on the mask substrate are thus protected by the protective film, by which the chipping by the exfoliation of the light shielding films is prevented and the life is prolonged.
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24665487A JPS6488550A (en) | 1987-09-30 | 1987-09-30 | Photomask |
CA000578870A CA1315023C (en) | 1987-09-30 | 1988-09-29 | Photo-mask |
DE3856089T DE3856089T2 (en) | 1987-09-30 | 1988-09-30 | Photomasks |
DE3889053T DE3889053T2 (en) | 1987-09-30 | 1988-09-30 | Photomasks. |
EP93202205A EP0574092B1 (en) | 1987-09-30 | 1988-09-30 | Photo-masks |
EP88309089A EP0310412B1 (en) | 1987-09-30 | 1988-09-30 | Improvements in photo-masks |
US07/631,277 US5260150A (en) | 1987-09-30 | 1990-12-20 | Photo-mask with light shielding film buried in substrate |
CA000616373A CA1322685C (en) | 1987-09-30 | 1992-05-07 | Photo-mask |
US08/102,229 US5403683A (en) | 1987-09-30 | 1993-08-05 | Photo-mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24665487A JPS6488550A (en) | 1987-09-30 | 1987-09-30 | Photomask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6488550A true JPS6488550A (en) | 1989-04-03 |
JPH0544016B2 JPH0544016B2 (en) | 1993-07-05 |
Family
ID=17151633
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24665487A Granted JPS6488550A (en) | 1987-09-30 | 1987-09-30 | Photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6488550A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03114845U (en) * | 1990-03-07 | 1991-11-26 | ||
US6737198B2 (en) | 1999-01-13 | 2004-05-18 | Renesas Technology Corp. | Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit |
JP2007503621A (en) * | 2003-08-25 | 2007-02-22 | トッパン、フォウタマスクス、インク | Photomask and method for maintaining its optical properties |
KR100833029B1 (en) * | 2000-07-07 | 2008-05-27 | 가부시키가이샤 히타치세이사쿠쇼 | Manufacturing method of photomask and photomask |
JP2008175999A (en) * | 2007-01-18 | 2008-07-31 | Sk Electronics:Kk | Photomask having protective film deposited on the surface and method of manufacturing the same |
JP2008310092A (en) * | 2007-06-15 | 2008-12-25 | Shin Etsu Chem Co Ltd | Photomask |
JP2016018187A (en) * | 2014-07-11 | 2016-02-01 | 株式会社ディスコ | Method for producing exposure mask |
JP2016028442A (en) * | 2015-10-08 | 2016-02-25 | 大日本印刷株式会社 | Template |
JP2017022417A (en) * | 2016-10-21 | 2017-01-26 | 大日本印刷株式会社 | Manufacturing method of template |
CN109265013A (en) * | 2018-10-16 | 2019-01-25 | 彩虹(合肥)液晶玻璃有限公司 | Etaching device and cleaning equipment |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5023595A (en) * | 1973-06-29 | 1975-03-13 |
-
1987
- 1987-09-30 JP JP24665487A patent/JPS6488550A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5023595A (en) * | 1973-06-29 | 1975-03-13 |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03114845U (en) * | 1990-03-07 | 1991-11-26 | ||
US6737198B2 (en) | 1999-01-13 | 2004-05-18 | Renesas Technology Corp. | Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit |
KR100833029B1 (en) * | 2000-07-07 | 2008-05-27 | 가부시키가이샤 히타치세이사쿠쇼 | Manufacturing method of photomask and photomask |
JP2007503621A (en) * | 2003-08-25 | 2007-02-22 | トッパン、フォウタマスクス、インク | Photomask and method for maintaining its optical properties |
JP2008175999A (en) * | 2007-01-18 | 2008-07-31 | Sk Electronics:Kk | Photomask having protective film deposited on the surface and method of manufacturing the same |
JP2008310092A (en) * | 2007-06-15 | 2008-12-25 | Shin Etsu Chem Co Ltd | Photomask |
JP2016018187A (en) * | 2014-07-11 | 2016-02-01 | 株式会社ディスコ | Method for producing exposure mask |
JP2016028442A (en) * | 2015-10-08 | 2016-02-25 | 大日本印刷株式会社 | Template |
JP2017022417A (en) * | 2016-10-21 | 2017-01-26 | 大日本印刷株式会社 | Manufacturing method of template |
CN109265013A (en) * | 2018-10-16 | 2019-01-25 | 彩虹(合肥)液晶玻璃有限公司 | Etaching device and cleaning equipment |
Also Published As
Publication number | Publication date |
---|---|
JPH0544016B2 (en) | 1993-07-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20070705 Year of fee payment: 14 |
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FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080705 Year of fee payment: 15 |
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EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080705 Year of fee payment: 15 |