WO2008093534A1 - Euvリソグラフィ用反射型マスクブランク - Google Patents
Euvリソグラフィ用反射型マスクブランク Download PDFInfo
- Publication number
- WO2008093534A1 WO2008093534A1 PCT/JP2008/050380 JP2008050380W WO2008093534A1 WO 2008093534 A1 WO2008093534 A1 WO 2008093534A1 JP 2008050380 W JP2008050380 W JP 2008050380W WO 2008093534 A1 WO2008093534 A1 WO 2008093534A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- mask blank
- reflective mask
- euv lithography
- absorber layer
- euv
- Prior art date
Links
- 238000001900 extreme ultraviolet lithography Methods 0.000 title abstract 3
- 239000006096 absorbing agent Substances 0.000 abstract 4
- 229910052715 tantalum Inorganic materials 0.000 abstract 2
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/46—Antireflective coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
Abstract
EUV光およびパターン検査光の波長域の反射率が低く、かつ該所望の膜組成および膜厚に制御することが容易な吸収体層を有するEUVリソグラフィ用反射型マスクブランクの提供。 基板上に、EUV光を反射する反射層と、EUV光を吸収する吸収体層と、がこの順に形成されたEUVリソグラフィ用反射型マスクブランクであって、前記吸収体層が、タンタル(Ta)およびハフニウム(Hf)を含有し、前記吸収体層における、Hfの含有率が20~60at%であり、Taの含有率が40~80at%であることを特徴とするEUVリソグラフィ用反射型マスクブランク。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008556044A JP5018789B2 (ja) | 2007-01-31 | 2008-01-15 | Euvリソグラフィ用反射型マスクブランク |
EP08706000.0A EP2028681B1 (en) | 2007-01-31 | 2008-01-15 | Reflective mask blank for euv lithography |
US12/028,250 US7718324B2 (en) | 2007-01-31 | 2008-02-08 | Reflective mask blank for EUV lithography |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007021092 | 2007-01-31 | ||
JP2007-021092 | 2007-01-31 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/028,250 Continuation US7718324B2 (en) | 2007-01-31 | 2008-02-08 | Reflective mask blank for EUV lithography |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008093534A1 true WO2008093534A1 (ja) | 2008-08-07 |
Family
ID=39668381
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/050380 WO2008093534A1 (ja) | 2007-01-31 | 2008-01-15 | Euvリソグラフィ用反射型マスクブランク |
Country Status (5)
Country | Link |
---|---|
US (1) | US7718324B2 (ja) |
EP (1) | EP2028681B1 (ja) |
JP (1) | JP5018789B2 (ja) |
TW (1) | TWI471902B (ja) |
WO (1) | WO2008093534A1 (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009210802A (ja) * | 2008-03-04 | 2009-09-17 | Asahi Glass Co Ltd | Euvリソグラフィ用反射型マスクブランク |
WO2010050518A1 (ja) * | 2008-10-30 | 2010-05-06 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランク |
WO2010050520A1 (ja) * | 2008-10-30 | 2010-05-06 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランク |
JP2010251490A (ja) * | 2009-04-15 | 2010-11-04 | Hoya Corp | 反射型マスクブランク及び反射型マスクの製造方法 |
JP2010286632A (ja) * | 2009-06-11 | 2010-12-24 | Asahi Glass Co Ltd | フォトマスクブランクスの洗浄方法 |
TWI467317B (zh) * | 2009-12-09 | 2015-01-01 | Asahi Glass Co Ltd | Optical components for EUV microsurgery |
TWI467318B (zh) * | 2009-12-04 | 2015-01-01 | Asahi Glass Co Ltd | An optical member for EUV microfilm, and a method for manufacturing a substrate with a reflective layer for EUV microfilm |
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TWI444757B (zh) * | 2006-04-21 | 2014-07-11 | Asahi Glass Co Ltd | 用於極紫外光(euv)微影術之反射性空白光罩 |
EP1973147B1 (en) * | 2006-12-27 | 2011-09-28 | Asahi Glass Company, Limited | Reflective mask blanc for euv lithography |
KR101409642B1 (ko) * | 2007-04-17 | 2014-06-18 | 아사히 가라스 가부시키가이샤 | Euv 리소그래피용 반사형 마스크 블랭크 |
ES2351237T3 (es) * | 2007-09-17 | 2011-02-01 | The Tapemark Company | Envase de distribucion con aplicador. |
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JPWO2011004850A1 (ja) | 2009-07-08 | 2012-12-20 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランク |
JP5673555B2 (ja) * | 2009-12-09 | 2015-02-18 | 旭硝子株式会社 | Euvリソグラフィ用反射層付基板、euvリソグラフィ用反射型マスクブランク、euvリソグラフィ用反射型マスク、および該反射層付基板の製造方法 |
KR20130007537A (ko) | 2010-03-02 | 2013-01-18 | 아사히 가라스 가부시키가이샤 | Euv 리소그래피용 반사형 마스크 블랭크 및 그 제조 방법 |
JP5830089B2 (ja) | 2010-06-15 | 2015-12-09 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Euvリソグラフィ用のマスク、euvリソグラフィシステム、及びマスクの結像を最適化する方法 |
KR20140004057A (ko) | 2010-08-24 | 2014-01-10 | 아사히 가라스 가부시키가이샤 | Euv 리소그래피용 반사형 마스크 블랭크 |
US8562794B2 (en) * | 2010-12-14 | 2013-10-22 | Asahi Glass Company, Limited | Process for producing reflective mask blank for EUV lithography and process for producing substrate with functional film for the mask blank |
JP5971122B2 (ja) | 2011-02-01 | 2016-08-17 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランク |
JP6060636B2 (ja) | 2012-01-30 | 2017-01-18 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランク、および、euvリソグラフィ用反射型マスク |
JP6287099B2 (ja) | 2013-05-31 | 2018-03-07 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランク |
KR20180057813A (ko) * | 2016-11-22 | 2018-05-31 | 삼성전자주식회사 | 극자외선 리소그래피용 위상 반전 마스크 |
CN111679454B (zh) * | 2020-06-19 | 2023-07-07 | 联合微电子中心有限责任公司 | 半导体器件的制备方法 |
JP7318607B2 (ja) * | 2020-07-28 | 2023-08-01 | Agc株式会社 | Euvリソグラフィ用反射型マスクブランク、euvリソグラフィ用反射型マスク、およびそれらの製造方法 |
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2008
- 2008-01-15 EP EP08706000.0A patent/EP2028681B1/en not_active Not-in-force
- 2008-01-15 WO PCT/JP2008/050380 patent/WO2008093534A1/ja active Application Filing
- 2008-01-15 JP JP2008556044A patent/JP5018789B2/ja not_active Expired - Fee Related
- 2008-01-22 TW TW97102388A patent/TWI471902B/zh not_active IP Right Cessation
- 2008-02-08 US US12/028,250 patent/US7718324B2/en not_active Expired - Fee Related
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Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009210802A (ja) * | 2008-03-04 | 2009-09-17 | Asahi Glass Co Ltd | Euvリソグラフィ用反射型マスクブランク |
JP5348141B2 (ja) * | 2008-10-30 | 2013-11-20 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランク |
WO2010050518A1 (ja) * | 2008-10-30 | 2010-05-06 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランク |
WO2010050520A1 (ja) * | 2008-10-30 | 2010-05-06 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランク |
JP5348140B2 (ja) * | 2008-10-30 | 2013-11-20 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランク |
US8133643B2 (en) | 2008-10-30 | 2012-03-13 | Asahi Glass Company, Limited | Reflective mask blank for EUV lithography |
JPWO2010050520A1 (ja) * | 2008-10-30 | 2012-03-29 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランク |
JPWO2010050518A1 (ja) * | 2008-10-30 | 2012-03-29 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランク |
US8227152B2 (en) | 2008-10-30 | 2012-07-24 | Asahi Glass Company, Limited | Reflective mask blank for EUV lithography |
TWI454833B (zh) * | 2009-04-15 | 2014-10-01 | Hoya Corp | 反射型光罩基底及反射型光罩之製造方法 |
US8709685B2 (en) | 2009-04-15 | 2014-04-29 | Hoya Corporation | Reflective mask blank and method of manufacturing a reflective mask |
JP2010251490A (ja) * | 2009-04-15 | 2010-11-04 | Hoya Corp | 反射型マスクブランク及び反射型マスクの製造方法 |
TWI486702B (zh) * | 2009-04-15 | 2015-06-01 | Hoya Corp | 反射型光罩、反射型光罩之製造方法及半導體裝置之製造方法 |
KR101800882B1 (ko) * | 2009-04-15 | 2017-11-23 | 호야 가부시키가이샤 | 반사형 마스크 블랭크 및 반사형 마스크의 제조 방법 |
JP2010286632A (ja) * | 2009-06-11 | 2010-12-24 | Asahi Glass Co Ltd | フォトマスクブランクスの洗浄方法 |
TWI467318B (zh) * | 2009-12-04 | 2015-01-01 | Asahi Glass Co Ltd | An optical member for EUV microfilm, and a method for manufacturing a substrate with a reflective layer for EUV microfilm |
TWI467317B (zh) * | 2009-12-09 | 2015-01-01 | Asahi Glass Co Ltd | Optical components for EUV microsurgery |
Also Published As
Publication number | Publication date |
---|---|
US7718324B2 (en) | 2010-05-18 |
JP5018789B2 (ja) | 2012-09-05 |
EP2028681A1 (en) | 2009-02-25 |
TW200847236A (en) | 2008-12-01 |
US20080182183A1 (en) | 2008-07-31 |
EP2028681B1 (en) | 2014-04-23 |
TWI471902B (zh) | 2015-02-01 |
JPWO2008093534A1 (ja) | 2010-05-20 |
EP2028681A4 (en) | 2009-10-21 |
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