JP2005302963A - 露光装置 - Google Patents
露光装置 Download PDFInfo
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- JP2005302963A JP2005302963A JP2004116017A JP2004116017A JP2005302963A JP 2005302963 A JP2005302963 A JP 2005302963A JP 2004116017 A JP2004116017 A JP 2004116017A JP 2004116017 A JP2004116017 A JP 2004116017A JP 2005302963 A JP2005302963 A JP 2005302963A
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- 230000003287 optical effect Effects 0.000 claims abstract description 50
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 13
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 8
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 7
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 7
- 229910052712 strontium Inorganic materials 0.000 claims abstract description 6
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 6
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 4
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract description 4
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 4
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 4
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 4
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 4
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 4
- 229910052713 technetium Inorganic materials 0.000 claims abstract description 4
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 4
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 4
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 229910052790 beryllium Inorganic materials 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 41
- 235000012431 wafers Nutrition 0.000 description 30
- 238000000034 method Methods 0.000 description 19
- 239000000126 substance Substances 0.000 description 16
- 238000002310 reflectometry Methods 0.000 description 12
- 238000005286 illumination Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 239000004065 semiconductor Substances 0.000 description 11
- 238000012545 processing Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 230000007246 mechanism Effects 0.000 description 8
- 238000001514 detection method Methods 0.000 description 6
- 239000013077 target material Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 238000001444 catalytic combustion detection Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
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- 238000001035 drying Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000001017 electron-beam sputter deposition Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Epidemiology (AREA)
- High Energy & Nuclear Physics (AREA)
- General Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Public Health (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
【解決手段】波長約11nmの光を利用してマスクパターンを被処理体に転写する露光装置100であって、Be層を含む多層膜を有する反射型光学素子から構成される投影光学系130と、第1の反射率を有する第1の層と、第1の反射率よりも低い第2の反射率を有する第2の層とを有する多層膜を含み、前記マスクパターンを有する反射型マスク120とを有し、前記第1の層はV,Cr,Co,Nb,Mo,Tc,Ru,Rh,Pd,Wのいずれかを含み、前記第2の層は、Li,B,C,N,O,F,Si,Al,Ti,Sc,Fe,Ge,La,Mg,F,W,Sr,Y,Zrのいずれかを含み、第1、第2層ともBeを含まない構成とする。
【選択図】図1
Description
110 照明装置
112 EUV光源
114 照明光学系
120 反射型マスク
120a 多層膜ミラー
125 マスクステージ
130 反射型投影光学系
130a 多層膜ミラー
140 被処理体
145 ウェハステージ
150 アライメント検出機構
160 フォーカス位置検出機構
Claims (4)
- 波長約11nmの光を利用してマスクパターンを被処理体に転写する露光装置であって、
Be層を含む多層膜を有する反射型光学素子から構成される投影光学系と、
第1の屈折率を有する第1の層と、第1の屈折率の実部よりも大きい実部を有する第2の屈折率を有する第2の層とを有する多層膜を含み、前記マスクパターンを有する反射型マスクとを有し、
前記第1の層はV,Cr,Co,Nb,Mo,Tc,Ru,Rh,Pd,Wのいずれかを含み、前記第2の層は、Li,B,C,N,O,F,Si,Al,Ti,Sc,Fe,Ge,La,Mg,F,W,Sr,Y,Zrのいずれかを含むことを特徴とする露光装置。 - 前記反射型マスクの前記第1の層と前記第2の層の組み合わせは、Mo/Y、Mo/Sr、Mo/Si、Ru/B4C、Ru/BN、Rh/B4C、Rh/BN,Rh/Yのいずれかであることを特徴とする請求項1記載の露光装置。
- 前記第1の屈折率の実部と前記第2の屈折率の実部との差が0.02以上であることを特徴とする請求項1記載の露光装置。
- 請求項1記載の露光装置を用いて被処理体を露光する露光ステップと、露光された前記被処理体を現像する現像ステップとを有することを特徴とするデバイス製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004116017A JP2005302963A (ja) | 2004-04-09 | 2004-04-09 | 露光装置 |
US11/101,277 US7102734B2 (en) | 2004-04-09 | 2005-04-07 | Exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004116017A JP2005302963A (ja) | 2004-04-09 | 2004-04-09 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005302963A true JP2005302963A (ja) | 2005-10-27 |
JP2005302963A5 JP2005302963A5 (ja) | 2007-06-07 |
Family
ID=35060196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004116017A Pending JP2005302963A (ja) | 2004-04-09 | 2004-04-09 | 露光装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7102734B2 (ja) |
JP (1) | JP2005302963A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015510688A (ja) * | 2012-01-19 | 2015-04-09 | スプリヤ ジャイスワル | リソグラフィ及び他の用途における極端紫外線放射で使用する材料、成分及び方法 |
WO2015140924A1 (ja) * | 2014-03-18 | 2015-09-24 | エヌ・ティ・ティ・アドバンステクノロジ株式会社 | 多層膜反射鏡、分光装置、および高次高調波の分光方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008040265A1 (de) | 2008-07-09 | 2010-01-14 | Carl Zeiss Smt Ag | Reflektives optisches Element und Verfahren zu seiner Herstellung |
CN104749327B (zh) * | 2015-04-21 | 2016-07-06 | 中国科学院长春光学精密机械与物理研究所 | 一种用于碳污染实验获取euv辐射的真空隔离滤光装置 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01187818A (ja) * | 1988-01-22 | 1989-07-27 | Canon Inc | 反射型マスクならびにこれを用いた露光装置と露光方法 |
JPH06124876A (ja) * | 1992-10-12 | 1994-05-06 | Hitachi Ltd | 光学素子及び光学素子の製造方法 |
JPH07147229A (ja) * | 1994-08-04 | 1995-06-06 | Canon Inc | X線投影露光装置 |
JP2001013297A (ja) * | 1999-06-30 | 2001-01-19 | Nikon Corp | 反射光学素子および露光装置 |
JP2003303756A (ja) * | 2002-04-09 | 2003-10-24 | Sony Corp | 極短紫外光の反射体 |
JP2004103824A (ja) * | 2002-09-10 | 2004-04-02 | Nikon Corp | 基板搬送方法、基板搬送装置及び露光装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2545905B2 (ja) | 1987-12-29 | 1996-10-23 | キヤノン株式会社 | 反射型マスクならびにこれを用いた露光方法 |
DE3856054T2 (de) * | 1987-02-18 | 1998-03-19 | Canon K.K., Tokio/Tokyo | Reflexionsmaske |
US6228512B1 (en) | 1999-05-26 | 2001-05-08 | The Regents Of The University Of California | MoRu/Be multilayers for extreme ultraviolet applications |
JP2001057328A (ja) * | 1999-08-18 | 2001-02-27 | Nikon Corp | 反射マスク、露光装置および集積回路の製造方法 |
EP1260861A1 (en) * | 2001-05-21 | 2002-11-27 | ASML Netherlands B.V. | Method of manufacturing a reflector, reflector manufactured thereby, phase shift mask and lithographic apparatus making use of them |
EP1333323A3 (en) * | 2002-02-01 | 2004-10-06 | Nikon Corporation | Self-cleaning reflective optical elements for use in x-ray optical systems, and optical systems and microlithography systems comprising same |
-
2004
- 2004-04-09 JP JP2004116017A patent/JP2005302963A/ja active Pending
-
2005
- 2005-04-07 US US11/101,277 patent/US7102734B2/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01187818A (ja) * | 1988-01-22 | 1989-07-27 | Canon Inc | 反射型マスクならびにこれを用いた露光装置と露光方法 |
JPH06124876A (ja) * | 1992-10-12 | 1994-05-06 | Hitachi Ltd | 光学素子及び光学素子の製造方法 |
JPH07147229A (ja) * | 1994-08-04 | 1995-06-06 | Canon Inc | X線投影露光装置 |
JP2001013297A (ja) * | 1999-06-30 | 2001-01-19 | Nikon Corp | 反射光学素子および露光装置 |
JP2003303756A (ja) * | 2002-04-09 | 2003-10-24 | Sony Corp | 極短紫外光の反射体 |
JP2004103824A (ja) * | 2002-09-10 | 2004-04-02 | Nikon Corp | 基板搬送方法、基板搬送装置及び露光装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015510688A (ja) * | 2012-01-19 | 2015-04-09 | スプリヤ ジャイスワル | リソグラフィ及び他の用途における極端紫外線放射で使用する材料、成分及び方法 |
WO2015140924A1 (ja) * | 2014-03-18 | 2015-09-24 | エヌ・ティ・ティ・アドバンステクノロジ株式会社 | 多層膜反射鏡、分光装置、および高次高調波の分光方法 |
JPWO2015140924A1 (ja) * | 2014-03-18 | 2017-04-06 | エヌ・ティ・ティ・アドバンステクノロジ株式会社 | 多層膜反射鏡、分光装置、および高次高調波の分光方法 |
Also Published As
Publication number | Publication date |
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US7102734B2 (en) | 2006-09-05 |
US20050225741A1 (en) | 2005-10-13 |
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