JP2005302963A5 - - Google Patents

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Publication number
JP2005302963A5
JP2005302963A5 JP2004116017A JP2004116017A JP2005302963A5 JP 2005302963 A5 JP2005302963 A5 JP 2005302963A5 JP 2004116017 A JP2004116017 A JP 2004116017A JP 2004116017 A JP2004116017 A JP 2004116017A JP 2005302963 A5 JP2005302963 A5 JP 2005302963A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004116017A
Other versions
JP2005302963A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004116017A priority Critical patent/JP2005302963A/ja
Priority claimed from JP2004116017A external-priority patent/JP2005302963A/ja
Priority to US11/101,277 priority patent/US7102734B2/en
Publication of JP2005302963A publication Critical patent/JP2005302963A/ja
Publication of JP2005302963A5 publication Critical patent/JP2005302963A5/ja
Pending legal-status Critical Current

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JP2004116017A 2004-04-09 2004-04-09 露光装置 Pending JP2005302963A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004116017A JP2005302963A (ja) 2004-04-09 2004-04-09 露光装置
US11/101,277 US7102734B2 (en) 2004-04-09 2005-04-07 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004116017A JP2005302963A (ja) 2004-04-09 2004-04-09 露光装置

Publications (2)

Publication Number Publication Date
JP2005302963A JP2005302963A (ja) 2005-10-27
JP2005302963A5 true JP2005302963A5 (ja) 2007-06-07

Family

ID=35060196

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004116017A Pending JP2005302963A (ja) 2004-04-09 2004-04-09 露光装置

Country Status (2)

Country Link
US (1) US7102734B2 (ja)
JP (1) JP2005302963A (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008040265A1 (de) * 2008-07-09 2010-01-14 Carl Zeiss Smt Ag Reflektives optisches Element und Verfahren zu seiner Herstellung
WO2013109986A1 (en) * 2012-01-19 2013-07-25 Jaiswal Supriya Materials, components, and methods for use with extreme ultraviolet radiation in lithography and other applications
JPWO2015140924A1 (ja) * 2014-03-18 2017-04-06 エヌ・ティ・ティ・アドバンステクノロジ株式会社 多層膜反射鏡、分光装置、および高次高調波の分光方法
CN104749327B (zh) * 2015-04-21 2016-07-06 中国科学院长春光学精密机械与物理研究所 一种用于碳污染实验获取euv辐射的真空隔离滤光装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2615741B2 (ja) * 1988-01-22 1997-06-04 キヤノン株式会社 反射型マスクならびにこれを用いた露光装置と露光方法
EP0279670B1 (en) * 1987-02-18 1997-10-29 Canon Kabushiki Kaisha A reflection type mask
JP2545905B2 (ja) 1987-12-29 1996-10-23 キヤノン株式会社 反射型マスクならびにこれを用いた露光方法
JP3240189B2 (ja) * 1992-10-12 2001-12-17 株式会社日立製作所 光学素子及び光学素子の製造方法
JPH07147229A (ja) * 1994-08-04 1995-06-06 Canon Inc Ｘ線投影露光装置
US6228512B1 (en) 1999-05-26 2001-05-08 The Regents Of The University Of California MoRu/Be multilayers for extreme ultraviolet applications
JP2001013297A (ja) * 1999-06-30 2001-01-19 Nikon Corp 反射光学素子および露光装置
JP2001057328A (ja) * 1999-08-18 2001-02-27 Nikon Corp 反射マスク、露光装置および集積回路の製造方法
EP1260861A1 (en) * 2001-05-21 2002-11-27 ASML Netherlands B.V. Method of manufacturing a reflector, reflector manufactured thereby, phase shift mask and lithographic apparatus making use of them
EP1333323A3 (en) * 2002-02-01 2004-10-06 Nikon Corporation Self-cleaning reflective optical elements for use in x-ray optical systems, and optical systems and microlithography systems comprising same
JP2003303756A (ja) * 2002-04-09 2003-10-24 Sony Corp 極短紫外光の反射体
JP2004103824A (ja) * 2002-09-10 2004-04-02 Nikon Corp 基板搬送方法、基板搬送装置及び露光装置

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