DE3785000D1 - Kontakte von halbleiterbauelementen. - Google Patents
Kontakte von halbleiterbauelementen.Info
- Publication number
- DE3785000D1 DE3785000D1 DE8787116966T DE3785000T DE3785000D1 DE 3785000 D1 DE3785000 D1 DE 3785000D1 DE 8787116966 T DE8787116966 T DE 8787116966T DE 3785000 T DE3785000 T DE 3785000T DE 3785000 D1 DE3785000 D1 DE 3785000D1
- Authority
- DE
- Germany
- Prior art keywords
- contacts
- semiconductor components
- semiconductor
- components
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/45—Ohmic electrodes
- H01L29/456—Ohmic electrodes on silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61275801A JPS63128750A (ja) | 1986-11-19 | 1986-11-19 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3785000D1 true DE3785000D1 (de) | 1993-04-29 |
DE3785000T2 DE3785000T2 (de) | 1993-09-16 |
Family
ID=17560599
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8787116966T Expired - Lifetime DE3785000T2 (de) | 1986-11-19 | 1987-11-17 | Kontakte von halbleiterbauelementen. |
Country Status (5)
Country | Link |
---|---|
US (1) | US5116780A (de) |
EP (1) | EP0268266B1 (de) |
JP (1) | JPS63128750A (de) |
KR (1) | KR900008147B1 (de) |
DE (1) | DE3785000T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5130203A (en) * | 1988-07-28 | 1992-07-14 | Nippon Leakless Industry Co., Ltd. | Metal gasket and method of producing the same |
US5378652A (en) * | 1989-04-19 | 1995-01-03 | Kabushiki Kaisha Toshiba | Method of making a through hole in multi-layer insulating films |
US5291058A (en) * | 1989-04-19 | 1994-03-01 | Kabushiki Kaisha Toshiba | Semiconductor device silicon via fill formed in multiple dielectric layers |
KR900019195A (ko) * | 1989-05-27 | 1990-12-24 | 이만용 | 디램장치의 고집적화방법 |
US5629218A (en) * | 1989-12-19 | 1997-05-13 | Texas Instruments Incorporated | Method for forming a field-effect transistor including a mask body and source/drain contacts |
KR100200297B1 (ko) * | 1995-06-30 | 1999-06-15 | 김영환 | 반도체 소자의 콘택홀 형성방법 |
US6815762B2 (en) | 1997-05-30 | 2004-11-09 | Hitachi, Ltd. | Semiconductor integrated circuit device and process for manufacturing the same including spacers on bit lines |
JP3563530B2 (ja) * | 1996-05-31 | 2004-09-08 | 株式会社日立製作所 | 半導体集積回路装置 |
US5879998A (en) * | 1997-07-09 | 1999-03-09 | Advanced Micro Devices, Inc. | Adaptively controlled, self-aligned, short channel device and method for manufacturing same |
KR100372640B1 (ko) * | 2000-06-28 | 2003-02-17 | 주식회사 하이닉스반도체 | 선택적 에피택셜 성장을 이용한 콘택 플러그 형성방법 |
US6303450B1 (en) * | 2000-11-21 | 2001-10-16 | International Business Machines Corporation | CMOS device structures and method of making same |
KR100632036B1 (ko) * | 2002-12-30 | 2006-10-04 | 동부일렉트로닉스 주식회사 | 반도체 메모리 소자의 제조 방법 |
JP2009147035A (ja) * | 2007-12-13 | 2009-07-02 | Seiko Instruments Inc | 半導体装置およびその製造方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2225374B2 (de) * | 1971-05-28 | 1977-06-02 | Fujitsu Ltd., Kawasaki, Kanagawa (Japan) | Verfahren zum herstellen eines mos-feldeffekttransistors |
JPS49115649A (de) * | 1973-03-07 | 1974-11-05 | ||
US4011105A (en) * | 1975-09-15 | 1977-03-08 | Mos Technology, Inc. | Field inversion control for n-channel device integrated circuits |
JPS543480A (en) * | 1977-06-09 | 1979-01-11 | Fujitsu Ltd | Manufacture of semiconductor device |
US4364078A (en) * | 1978-08-15 | 1982-12-14 | Synertek | Edge barrier of polysilicon and metal for integrated circuit chips |
US4309224A (en) * | 1978-10-06 | 1982-01-05 | Tokyo Shibaura Denki Kabushiki Kaisha | Method for manufacturing a semiconductor device |
JPS55138874A (en) * | 1979-04-18 | 1980-10-30 | Fujitsu Ltd | Semiconductor device and method of fabricating the same |
US4355454A (en) * | 1979-09-05 | 1982-10-26 | Texas Instruments Incorporated | Coating device with As2 -O3 -SiO2 |
JPS5737829A (en) * | 1980-08-20 | 1982-03-02 | Fujitsu Ltd | Manufacture of semiconductor device |
US4403394A (en) * | 1980-12-17 | 1983-09-13 | International Business Machines Corporation | Formation of bit lines for ram device |
US4518981A (en) * | 1981-11-12 | 1985-05-21 | Advanced Micro Devices, Inc. | Merged platinum silicide fuse and Schottky diode and method of manufacture thereof |
JPS5968949A (ja) * | 1982-10-12 | 1984-04-19 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
JPS59201461A (ja) * | 1983-04-28 | 1984-11-15 | Toshiba Corp | 読み出し専用半導体記憶装置およびその製造方法 |
FR2555364B1 (fr) * | 1983-11-18 | 1990-02-02 | Hitachi Ltd | Procede de fabrication de connexions d'un dispositif a circuits integres a semi-conducteurs comportant en particulier un mitset |
US4636834A (en) * | 1983-12-12 | 1987-01-13 | International Business Machines Corporation | Submicron FET structure and method of making |
JPS60186051A (ja) * | 1984-03-05 | 1985-09-21 | Hitachi Ltd | Cmos半導体装置およびその製造方法 |
JPS60195972A (ja) * | 1984-03-19 | 1985-10-04 | Hitachi Ltd | 半導体装置の製造方法 |
JPS61166071A (ja) * | 1985-01-17 | 1986-07-26 | Toshiba Corp | 半導体装置及びその製造方法 |
JPS61164262A (ja) * | 1985-01-17 | 1986-07-24 | Toshiba Corp | 半導体装置 |
JPH0658912B2 (ja) * | 1985-05-07 | 1994-08-03 | 日本電信電話株式会社 | バイポーラトランジスタの製造方法 |
US4746219A (en) * | 1986-03-07 | 1988-05-24 | Texas Instruments Incorporated | Local interconnect |
JPS62245657A (ja) * | 1986-04-18 | 1987-10-26 | Toshiba Corp | 半導体装置の製造方法 |
JPH0674675A (ja) * | 1992-08-31 | 1994-03-18 | Toshiba Corp | 積層体熱交換器及び積層体熱交換器の製造方法 |
-
1986
- 1986-11-19 JP JP61275801A patent/JPS63128750A/ja active Pending
-
1987
- 1987-11-17 EP EP87116966A patent/EP0268266B1/de not_active Expired - Lifetime
- 1987-11-17 DE DE8787116966T patent/DE3785000T2/de not_active Expired - Lifetime
- 1987-11-19 KR KR1019870013031A patent/KR900008147B1/ko not_active IP Right Cessation
-
1990
- 1990-10-16 US US07/596,732 patent/US5116780A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0268266A3 (en) | 1990-01-31 |
EP0268266B1 (de) | 1993-03-24 |
EP0268266A2 (de) | 1988-05-25 |
KR880006777A (ko) | 1988-07-25 |
KR900008147B1 (ko) | 1990-11-03 |
JPS63128750A (ja) | 1988-06-01 |
DE3785000T2 (de) | 1993-09-16 |
US5116780A (en) | 1992-05-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) |